CH341910A - Verfahren zum Herstellen stabförmiger Halbleiterkristalle - Google Patents

Verfahren zum Herstellen stabförmiger Halbleiterkristalle

Info

Publication number
CH341910A
CH341910A CH341910DA CH341910A CH 341910 A CH341910 A CH 341910A CH 341910D A CH341910D A CH 341910DA CH 341910 A CH341910 A CH 341910A
Authority
CH
Switzerland
Prior art keywords
shaped semiconductor
semiconductor crystals
producing rod
producing
rod
Prior art date
Application number
Other languages
English (en)
Inventor
Theodor Dr Rummel
Amberger Eberhardt
Wiberg Egon Dr Prof
Fischer Helmut Dr Prof
Georg Dipl Chem Rosenberger
Nat Reuschel Konrad Dr Phil
Reiner Dipl Phys Emeis
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Ag filed Critical Siemens Ag
Publication of CH341910A publication Critical patent/CH341910A/de

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/02Single-crystal growth by pulling from a melt, e.g. Czochralski method adding crystallising materials or reactants forming it in situ to the melt
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B11/00Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
    • C30B11/04Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method adding crystallising materials or reactants forming it in situ to the melt
    • C30B11/08Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method adding crystallising materials or reactants forming it in situ to the melt every component of the crystal composition being added during the crystallisation
    • C30B11/10Solid or liquid components, e.g. Verneuil method
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T117/00Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10T117/10Apparatus
    • Y10T117/1024Apparatus for crystallization from liquid or supercritical state
    • Y10T117/1028Crucibleless apparatus having means providing movement of discrete droplets or solid particles to thin-film precursor [e.g., Verneuil method]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Silicon Compounds (AREA)
  • Manufacture Of Metal Powder And Suspensions Thereof (AREA)
CH341910D 1954-02-24 1955-02-22 Verfahren zum Herstellen stabförmiger Halbleiterkristalle CH341910A (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE341910X 1954-02-24
DE2907642X 1954-05-25

Publications (1)

Publication Number Publication Date
CH341910A true CH341910A (de) 1959-10-31

Family

ID=32327360

Family Applications (1)

Application Number Title Priority Date Filing Date
CH341910D CH341910A (de) 1954-02-24 1955-02-22 Verfahren zum Herstellen stabförmiger Halbleiterkristalle

Country Status (5)

Country Link
US (1) US2907642A (de)
CH (1) CH341910A (de)
FR (1) FR1133343A (de)
GB (1) GB806697A (de)
NL (1) NL95386C (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL113470C (de) * 1957-06-25
US3098741A (en) * 1958-04-03 1963-07-23 Wacker Chemie Gmbh Process for effecting crucibleless melting of materials and production of shaped bodies therefrom
US3017251A (en) * 1958-08-19 1962-01-16 Du Pont Process for the production of silicon
US3053639A (en) * 1959-02-11 1962-09-11 Union Carbide Corp Method and apparatus for growing crystals
US3092462A (en) * 1960-01-28 1963-06-04 Philips Corp Method for the manufacture of rods of meltable material
DE1153000B (de) * 1960-10-08 1963-08-22 Metallgesellschaft Ag Verfahren und Vorrichtung zur Herstellung von kompaktem Silicium
US3232745A (en) * 1960-12-05 1966-02-01 Siemens Ag Producing rod-shaped semiconductor crystals
US3367748A (en) * 1964-02-18 1968-02-06 Union Carbide Corp Process for growing high perfection crystals
US4039283A (en) * 1973-04-18 1977-08-02 Siemens Aktiengesellschaft Apparatus for producing a controlled radial path of resistance in a semiconductor monocrystalline rod
DE2319700C3 (de) * 1973-04-18 1980-11-27 Siemens Ag, 1000 Berlin Und 8000 Muenchen Verfahren zur Beeinflussung des radialen Widerstandsverlaufs in einem Halbleitereinkristallstab beim tiegellosen Zonenschmelzen und Vorrichtungen zur Durchführung des Verfahrens
US5436164A (en) * 1990-11-15 1995-07-25 Hemlock Semi-Conductor Corporation Analytical method for particulate silicon
US5108720A (en) * 1991-05-20 1992-04-28 Hemlock Semiconductor Corporation Float zone processing of particulate silicon
DE19859288A1 (de) * 1998-12-22 2000-06-29 Bayer Ag Agglomeration von Siliciumpulvern
DE102015122248A1 (de) * 2015-12-18 2017-06-22 Christian Menzel Reaktor und Verfahren zum Aufwachsen von Silizium

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US243251A (en) * 1881-06-21 Joseph t
US2475810A (en) * 1944-01-05 1949-07-12 Bell Telephone Labor Inc Preparation of silicon material
US2793103A (en) * 1954-02-24 1957-05-21 Siemens Ag Method for producing rod-shaped bodies of crystalline material

Also Published As

Publication number Publication date
NL95386C (de)
FR1133343A (fr) 1957-03-26
GB806697A (en) 1958-12-31
US2907642A (en) 1959-10-06

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