CH341910A - Verfahren zum Herstellen stabförmiger Halbleiterkristalle - Google Patents
Verfahren zum Herstellen stabförmiger HalbleiterkristalleInfo
- Publication number
- CH341910A CH341910A CH341910DA CH341910A CH 341910 A CH341910 A CH 341910A CH 341910D A CH341910D A CH 341910DA CH 341910 A CH341910 A CH 341910A
- Authority
- CH
- Switzerland
- Prior art keywords
- shaped semiconductor
- semiconductor crystals
- producing rod
- producing
- rod
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/02—Single-crystal growth by pulling from a melt, e.g. Czochralski method adding crystallising materials or reactants forming it in situ to the melt
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
- C30B11/04—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method adding crystallising materials or reactants forming it in situ to the melt
- C30B11/08—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method adding crystallising materials or reactants forming it in situ to the melt every component of the crystal composition being added during the crystallisation
- C30B11/10—Solid or liquid components, e.g. Verneuil method
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
- Y10T117/1028—Crucibleless apparatus having means providing movement of discrete droplets or solid particles to thin-film precursor [e.g., Verneuil method]
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Materials Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Silicon Compounds (AREA)
- Manufacture Of Metal Powder And Suspensions Thereof (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE341910X | 1954-02-24 | ||
DE2907642X | 1954-05-25 |
Publications (1)
Publication Number | Publication Date |
---|---|
CH341910A true CH341910A (de) | 1959-10-31 |
Family
ID=32327360
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CH341910D CH341910A (de) | 1954-02-24 | 1955-02-22 | Verfahren zum Herstellen stabförmiger Halbleiterkristalle |
Country Status (5)
Country | Link |
---|---|
US (1) | US2907642A (de) |
CH (1) | CH341910A (de) |
FR (1) | FR1133343A (de) |
GB (1) | GB806697A (de) |
NL (1) | NL95386C (de) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL113470C (de) * | 1957-06-25 | |||
US3098741A (en) * | 1958-04-03 | 1963-07-23 | Wacker Chemie Gmbh | Process for effecting crucibleless melting of materials and production of shaped bodies therefrom |
US3017251A (en) * | 1958-08-19 | 1962-01-16 | Du Pont | Process for the production of silicon |
US3053639A (en) * | 1959-02-11 | 1962-09-11 | Union Carbide Corp | Method and apparatus for growing crystals |
US3092462A (en) * | 1960-01-28 | 1963-06-04 | Philips Corp | Method for the manufacture of rods of meltable material |
DE1153000B (de) * | 1960-10-08 | 1963-08-22 | Metallgesellschaft Ag | Verfahren und Vorrichtung zur Herstellung von kompaktem Silicium |
US3232745A (en) * | 1960-12-05 | 1966-02-01 | Siemens Ag | Producing rod-shaped semiconductor crystals |
US3367748A (en) * | 1964-02-18 | 1968-02-06 | Union Carbide Corp | Process for growing high perfection crystals |
US4039283A (en) * | 1973-04-18 | 1977-08-02 | Siemens Aktiengesellschaft | Apparatus for producing a controlled radial path of resistance in a semiconductor monocrystalline rod |
DE2319700C3 (de) * | 1973-04-18 | 1980-11-27 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Verfahren zur Beeinflussung des radialen Widerstandsverlaufs in einem Halbleitereinkristallstab beim tiegellosen Zonenschmelzen und Vorrichtungen zur Durchführung des Verfahrens |
US5436164A (en) * | 1990-11-15 | 1995-07-25 | Hemlock Semi-Conductor Corporation | Analytical method for particulate silicon |
US5108720A (en) * | 1991-05-20 | 1992-04-28 | Hemlock Semiconductor Corporation | Float zone processing of particulate silicon |
DE19859288A1 (de) * | 1998-12-22 | 2000-06-29 | Bayer Ag | Agglomeration von Siliciumpulvern |
DE102015122248A1 (de) * | 2015-12-18 | 2017-06-22 | Christian Menzel | Reaktor und Verfahren zum Aufwachsen von Silizium |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US243251A (en) * | 1881-06-21 | Joseph t | ||
US2475810A (en) * | 1944-01-05 | 1949-07-12 | Bell Telephone Labor Inc | Preparation of silicon material |
US2793103A (en) * | 1954-02-24 | 1957-05-21 | Siemens Ag | Method for producing rod-shaped bodies of crystalline material |
-
0
- NL NL95386D patent/NL95386C/xx active
-
1955
- 1955-02-22 CH CH341910D patent/CH341910A/de unknown
- 1955-02-24 GB GB5607/55A patent/GB806697A/en not_active Expired
- 1955-02-24 FR FR1133343D patent/FR1133343A/fr not_active Expired
- 1955-05-19 US US509669A patent/US2907642A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
NL95386C (de) | |
FR1133343A (fr) | 1957-03-26 |
GB806697A (en) | 1958-12-31 |
US2907642A (en) | 1959-10-06 |
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