CA956166A - Photosensitive compositions for relief structures - Google Patents

Photosensitive compositions for relief structures

Info

Publication number
CA956166A
CA956166A CA131,733A CA131733A CA956166A CA 956166 A CA956166 A CA 956166A CA 131733 A CA131733 A CA 131733A CA 956166 A CA956166 A CA 956166A
Authority
CA
Canada
Prior art keywords
relief structures
photosensitive compositions
photosensitive
compositions
relief
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA131,733A
Other languages
English (en)
Other versions
CA131733S (en
Inventor
Tsunetoshi Kai
Mitsuhiro Inoue
Matuo Yoshida
Jun-Ichi Ueda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Kasei Corp
Original Assignee
Asahi Kasei Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Kasei Kogyo KK filed Critical Asahi Kasei Kogyo KK
Application granted granted Critical
Publication of CA956166A publication Critical patent/CA956166A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • C08F283/01—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to unsaturated polyesters

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
CA131,733A 1971-03-11 1972-01-05 Photosensitive compositions for relief structures Expired CA956166A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP46013009A JPS5033767B1 (member.php) 1971-03-11 1971-03-11

Publications (1)

Publication Number Publication Date
CA956166A true CA956166A (en) 1974-10-15

Family

ID=11821156

Family Applications (1)

Application Number Title Priority Date Filing Date
CA131,733A Expired CA956166A (en) 1971-03-11 1972-01-05 Photosensitive compositions for relief structures

Country Status (7)

Country Link
US (1) US3794494A (member.php)
JP (1) JPS5033767B1 (member.php)
CA (1) CA956166A (member.php)
DE (1) DE2207209C3 (member.php)
FR (1) FR2129360A5 (member.php)
GB (1) GB1350339A (member.php)
IT (1) IT944098B (member.php)

Families Citing this family (67)

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US3900325A (en) * 1972-06-12 1975-08-19 Shipley Co Light sensitive quinone diazide composition with n-3-oxohydrocarbon substituted acrylamide
US3960572A (en) * 1973-02-21 1976-06-01 Asahi Kasei Kogyo Kabushiki Kaisha Photosensitive compositions comprising a polyester-polyether block polymer
DE2429636C3 (de) * 1973-06-28 1986-05-07 Teijin Ltd., Osaka Lichtempfindliche Harzmasse
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US4518677A (en) * 1978-01-04 1985-05-21 Hercules Incorporated Process for making printing plates
CA1100148A (en) * 1978-01-04 1981-04-28 Rudolph L. Pohl Photopolymer compositions for printing plates
CA1123649A (en) * 1978-06-22 1982-05-18 Norman E. Hughes Printing plates produced using a base layer with polymerization rate greater than that of the printing layer
US4198238A (en) * 1978-06-22 1980-04-15 Hercules Incorporated Photopolymerizable composition
DE2846647A1 (de) * 1978-10-26 1980-05-08 Basf Ag Photopolymerisierbare mischung fuer die herstellung von druck- und reliefformen
DE2933805A1 (de) * 1979-08-21 1981-03-12 Siemens AG, 1000 Berlin und 8000 München Verfahren zur herstellung hochwaermebestaendiger reliefstrukturen und deren verwendung
DE2933871A1 (de) * 1979-08-21 1981-03-12 Siemens AG, 1000 Berlin und 8000 München Verfahren zur herstellung hochwaermebestaendiger reliefstrukturen und deren verwendung.
US4332873A (en) * 1979-08-22 1982-06-01 Hercules Incorporated Multilayer printing plates and process for making same
EP0030213A1 (de) * 1979-11-29 1981-06-10 Ciba-Geigy Ag Durch Licht vernetzbare Schicht auf Druckformen und Verfahren zur Herstellung von Offset-Druckplatten
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US4416974A (en) * 1979-12-05 1983-11-22 Hercules Incorporated Radiation curable ceramic pigment composition
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US4475810A (en) * 1980-10-06 1984-10-09 Hercules Incorporated Docking sensor system
US4450226A (en) * 1981-10-26 1984-05-22 Hercules Incorporated Method and apparatus for producing a printing plate
US4377679A (en) 1982-01-28 1983-03-22 Thiokol Corporation Photocurable compositions based on acrylate polyester urethanes
DE3536262A1 (de) * 1985-10-11 1987-04-16 Basf Ag Lagerstabile, in organischem loesemittel geloeste oder dispergierte vernetzbare zusammensetzungen, ihre herstellung und verwendung
DE3807929A1 (de) * 1988-03-10 1989-09-28 Basf Ag Verfahren zur herstellung von reliefformen
DE3908764C2 (de) * 1989-03-17 1994-08-11 Basf Ag Entwickler für die Herstellung photopolymerisierter flexographischer Reliefdruckformen
US5798019A (en) 1995-09-29 1998-08-25 E. I. Du Pont De Nemours And Company Methods and apparatus for forming cylindrical photosensitive elements
US5753414A (en) * 1995-10-02 1998-05-19 Macdermid Imaging Technology, Inc. Photopolymer plate having a peelable substrate
US6425327B1 (en) 1999-08-12 2002-07-30 E. I. Du Pont De Nemours And Company Method for forming a cylindrical photosensitive element
US6713646B2 (en) * 2002-04-12 2004-03-30 Biosphere Medical Degradable crosslinkers, and degradable crosslinked hydrogels comprising them
US7838699B2 (en) * 2002-05-08 2010-11-23 Biosphere Medical Embolization using degradable crosslinked hydrogels
US6884905B2 (en) * 2002-07-23 2005-04-26 Biosphere Medical Degradable carbamate-containing bis(acryloyl) crosslinkers, and degradable crosslinked hydrogels comprising them
US8435603B2 (en) * 2003-12-05 2013-05-07 Conductive Inkjet Technology Limited Formation of solid layers on substrates
US7811744B2 (en) 2004-03-03 2010-10-12 Kodak IL. Ltd. Material for infrared laser ablated engraved flexographic printing plates
US8142987B2 (en) * 2004-04-10 2012-03-27 Eastman Kodak Company Method of producing a relief image for printing
JP4342373B2 (ja) * 2004-04-30 2009-10-14 東京応化工業株式会社 凸版印刷用感光性印刷原版、凸版印刷版の製造方法、および該製造方法用遮光インク
JP2006003570A (ja) * 2004-06-16 2006-01-05 Tokyo Ohka Kogyo Co Ltd 印刷版製造用感光性組成物、並びに、これを用いた感光性印刷原版積層体および印刷版
JP2007015147A (ja) * 2005-07-05 2007-01-25 Tokyo Ohka Kogyo Co Ltd 凸版印刷用感光性積層印刷原版の製造方法、凸版印刷用感光性積層印刷原版、および凸版印刷版の製造方法
JP2007224093A (ja) * 2006-02-21 2007-09-06 Tokyo Ohka Kogyo Co Ltd 接着層形成用組成物、及びこれを用いた凸版印刷版、並びに凸版印刷版の製造方法
JP5591116B2 (ja) 2007-11-19 2014-09-17 ビーエーエスエフ ソシエタス・ヨーロピア 光沢色のためのポリマー分散液における高分岐ポリマーの使用
BRPI0820427A2 (pt) 2007-11-19 2015-05-26 Basf Se Usos de pelo menos um polímero elevadamente ramificado, e de uma dispersão polimérica aquosa, método para produzir uma dispersão polimérica aquosa, dispersão polimérica aquosa, composição aglutinante, agente de revestimento na forma de uma composição aquosa, e, método para aperfeiçoar a estabilidade de congelamento / descongelamento de uma dispersão polimérica aquosa
CA2717609C (en) 2008-03-20 2016-11-29 Basf Se Polymer dispersions containing phosphorous polymers and emulsifiers
DE102009026819A1 (de) * 2008-09-08 2010-03-11 Evonik Röhm Gmbh Monomermischung, Polymer, Beschichtungsmittel und Verfahren zur Herstellung einer Beschichtung
KR101731125B1 (ko) 2008-12-01 2017-04-27 바스프 에스이 올리고머를 포함하는 수성 결합제 조성물
US20120121921A1 (en) 2009-07-22 2012-05-17 Basf Se Aqueous polymer dispersion as a binding agent for plasters and coating materials having improved fire behavior
JP5907872B2 (ja) 2009-09-15 2016-04-26 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ ハイブリッド網状構造物に抗微生物剤を含有する水性分散液
US8785557B2 (en) 2009-12-16 2014-07-22 Basf Se Use of aqueous hybrid binders for gloss paints
EP2513154B1 (de) 2009-12-16 2015-02-25 Basf Se Verfahren zur herstellung wässriger hybridbindemittel mit niedrigem restmonomerengehalt sowie deren verwendung für hochglanzfarben
PT2536777T (pt) 2010-02-18 2016-08-25 Basf Se Dispersão polimérica, que contém um policarbonato altamente ramificado com grupos de ácidos gordos insaturados
US8476000B2 (en) 2010-06-04 2013-07-02 Ryan Vest Method of producing a relief image from a liquid photopolymer resin
AU2011347669B2 (en) 2010-12-21 2016-03-17 Basf Se Multistage polymer dispersions, method for producing same, and use thereof
US8754151B2 (en) 2010-12-21 2014-06-17 Basf Se Multistage polymer dispersions, processes for preparing them, and use thereof
EP2636714A1 (de) 2012-03-09 2013-09-11 Basf Se Mehrstufige herstellung wässriger haftklebstoffdispersionen für die herstellung von selbstkle-benden artikeln
US9096090B2 (en) 2012-05-09 2015-08-04 Ryan W. Vest Liquid platemaking with laser engraving
US8735049B2 (en) 2012-05-22 2014-05-27 Ryan W. Vest Liquid platemaking process
MY171387A (en) 2012-06-05 2019-10-10 Basf Se Use of multi-stage polymerizate dispersions to coat metal sheets
AU2013286181B2 (en) 2012-07-06 2017-02-16 Basf Se Use of aqueous hybrid binders and alkyd systems for coating agents
US9703201B2 (en) 2015-04-22 2017-07-11 Macdermid Printing Solutions, Llc Method of making relief image printing plates
KR20180070664A (ko) 2015-10-20 2018-06-26 바스프 에스이 섬유-시멘트 보드를 코팅하기 위한 코팅 조성물
US9740103B2 (en) 2015-11-09 2017-08-22 Macdermid Printing Solutions, Llc Method and apparatus for producing liquid flexographic printing plates
CN108473820B (zh) 2016-01-18 2021-03-26 巴斯夫欧洲公司 单组分层压胶粘剂用于复合膜层压的用途
EP3202795B1 (de) 2016-02-08 2018-08-08 Basf Se Verwendung einer klebstoffdispersion für die glanzfolienkaschierung
KR20180126517A (ko) 2016-03-18 2018-11-27 바스프 에스이 미분된 수성 다단계 중합체 분산액, 이의 제조 방법 및 바인더로서 이의 용도
US10625334B2 (en) 2017-04-11 2020-04-21 Macdermid Graphics Solutions, Llc Method of producing a relief image from a liquid photopolymer resin
EP3781622B1 (de) 2018-04-20 2022-10-12 Basf Se Haftklebstoffzusammensetzung mit auf vernetzung über keto- oder aldehydgruppen beruhendem gelgehalt
WO2020165125A1 (de) 2019-02-15 2020-08-20 Covestro Intellectual Property Gmbh & Co. Kg Neue systeme für die grundierung und das kleben von bodenbelägen
US12474639B2 (en) 2022-04-27 2025-11-18 Miraclon Corporation Flexographic printing mask with laser thermal imaging film
US12496846B2 (en) 2022-06-16 2025-12-16 Miraclon Corporation Mask for low contrast printed highlights

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3677920A (en) * 1968-07-06 1972-07-18 Asahi Chemical Ind Photopolymerizable diisocyanate modified unsaturated polyester containing acrylic monomers
DE2008334A1 (de) * 1969-02-24 1970-12-23 The Lubrizol Corp., Cleveland, Ohio (V.St.A.) Härtbare Formmassen auf der Basis von Polyestern
US3725231A (en) * 1971-08-20 1973-04-03 Lubrizol Corp Photosensitive diacetone acrylamide resins

Also Published As

Publication number Publication date
IT944098B (it) 1973-04-20
GB1350339A (en) 1974-04-18
JPS5033767B1 (member.php) 1975-11-04
AU3638971A (en) 1973-05-24
FR2129360A5 (member.php) 1972-10-27
US3794494A (en) 1974-02-26
DE2207209B2 (de) 1973-10-25
DE2207209A1 (de) 1972-10-19
DE2207209C3 (de) 1974-05-22

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