JPS5033767B1 - - Google Patents

Info

Publication number
JPS5033767B1
JPS5033767B1 JP46013009A JP1300971A JPS5033767B1 JP S5033767 B1 JPS5033767 B1 JP S5033767B1 JP 46013009 A JP46013009 A JP 46013009A JP 1300971 A JP1300971 A JP 1300971A JP S5033767 B1 JPS5033767 B1 JP S5033767B1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP46013009A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP46013009A priority Critical patent/JPS5033767B1/ja
Priority to US00201992A priority patent/US3794494A/en
Priority to AU36389/71A priority patent/AU435435B2/en
Priority to IT32575/71A priority patent/IT944098B/it
Priority to FR7147345A priority patent/FR2129360A5/fr
Priority to CA131,733A priority patent/CA956166A/en
Priority to DE2207209A priority patent/DE2207209C3/de
Priority to GB741672A priority patent/GB1350339A/en
Priority to US395083A priority patent/US3858510A/en
Publication of JPS5033767B1 publication Critical patent/JPS5033767B1/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • C08F283/01—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to unsaturated polyesters

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
JP46013009A 1971-03-11 1971-03-11 Pending JPS5033767B1 (ja)

Priority Applications (9)

Application Number Priority Date Filing Date Title
JP46013009A JPS5033767B1 (ja) 1971-03-11 1971-03-11
US00201992A US3794494A (en) 1971-03-11 1971-11-24 Photosensitive compositions for relief structures
AU36389/71A AU435435B2 (en) 1971-03-11 1971-12-02 Photosensitive compositions for relief structures
IT32575/71A IT944098B (it) 1971-03-11 1971-12-17 Composizioni fotosensibili per strutture in rilievo
FR7147345A FR2129360A5 (ja) 1971-03-11 1971-12-29
CA131,733A CA956166A (en) 1971-03-11 1972-01-05 Photosensitive compositions for relief structures
DE2207209A DE2207209C3 (de) 1971-03-11 1972-02-16 Neue photopolymerisierbare Gemische für lichtempfindliche, Reliefbilder liefernde Aufzeichnungsschichten
GB741672A GB1350339A (en) 1971-03-11 1972-02-17 Photosensitive compositions for relief structures
US395083A US3858510A (en) 1971-03-11 1973-09-07 Relief structures prepared from photosensitive compositions

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP46013009A JPS5033767B1 (ja) 1971-03-11 1971-03-11

Publications (1)

Publication Number Publication Date
JPS5033767B1 true JPS5033767B1 (ja) 1975-11-04

Family

ID=11821156

Family Applications (1)

Application Number Title Priority Date Filing Date
JP46013009A Pending JPS5033767B1 (ja) 1971-03-11 1971-03-11

Country Status (7)

Country Link
US (1) US3794494A (ja)
JP (1) JPS5033767B1 (ja)
CA (1) CA956166A (ja)
DE (1) DE2207209C3 (ja)
FR (1) FR2129360A5 (ja)
GB (1) GB1350339A (ja)
IT (1) IT944098B (ja)

Families Citing this family (65)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS515935B2 (ja) * 1972-04-17 1976-02-24
US3900325A (en) * 1972-06-12 1975-08-19 Shipley Co Light sensitive quinone diazide composition with n-3-oxohydrocarbon substituted acrylamide
US3960572A (en) * 1973-02-21 1976-06-01 Asahi Kasei Kogyo Kabushiki Kaisha Photosensitive compositions comprising a polyester-polyether block polymer
DE2429636C3 (de) * 1973-06-28 1986-05-07 Teijin Ltd., Osaka Lichtempfindliche Harzmasse
GB1538436A (en) * 1975-05-12 1979-01-17 Ucb Sa Halogenated photopolymerisable compositions
GB1538211A (en) * 1975-05-12 1979-01-10 Ucb Sa Halogenated photopolymerisable adhesives
JPS5492402A (en) * 1977-12-28 1979-07-21 Asahi Chemical Ind Photosensitive resin relief printing and fabrication
US4518677A (en) * 1978-01-04 1985-05-21 Hercules Incorporated Process for making printing plates
CA1100148A (en) * 1978-01-04 1981-04-28 Rudolph L. Pohl Photopolymer compositions for printing plates
CA1123649A (en) * 1978-06-22 1982-05-18 Norman E. Hughes Printing plates produced using a base layer with polymerization rate greater than that of the printing layer
US4198238A (en) * 1978-06-22 1980-04-15 Hercules Incorporated Photopolymerizable composition
DE2846647A1 (de) * 1978-10-26 1980-05-08 Basf Ag Photopolymerisierbare mischung fuer die herstellung von druck- und reliefformen
DE2933871A1 (de) * 1979-08-21 1981-03-12 Siemens AG, 1000 Berlin und 8000 München Verfahren zur herstellung hochwaermebestaendiger reliefstrukturen und deren verwendung.
DE2933805A1 (de) * 1979-08-21 1981-03-12 Siemens AG, 1000 Berlin und 8000 München Verfahren zur herstellung hochwaermebestaendiger reliefstrukturen und deren verwendung
US4332873A (en) * 1979-08-22 1982-06-01 Hercules Incorporated Multilayer printing plates and process for making same
EP0030213A1 (de) * 1979-11-29 1981-06-10 Ciba-Geigy Ag Durch Licht vernetzbare Schicht auf Druckformen und Verfahren zur Herstellung von Offset-Druckplatten
US4416974A (en) * 1979-12-05 1983-11-22 Hercules Incorporated Radiation curable ceramic pigment composition
US4306012A (en) * 1979-12-05 1981-12-15 Hercules Incorporated Process of radiation and heat treatment of printing medium
US4403566A (en) * 1980-06-23 1983-09-13 Hercules Incorporated Apparatus for producing a printing plate
US4475810A (en) * 1980-10-06 1984-10-09 Hercules Incorporated Docking sensor system
US4450226A (en) * 1981-10-26 1984-05-22 Hercules Incorporated Method and apparatus for producing a printing plate
US4377679A (en) 1982-01-28 1983-03-22 Thiokol Corporation Photocurable compositions based on acrylate polyester urethanes
DE3536262A1 (de) * 1985-10-11 1987-04-16 Basf Ag Lagerstabile, in organischem loesemittel geloeste oder dispergierte vernetzbare zusammensetzungen, ihre herstellung und verwendung
DE3807929A1 (de) * 1988-03-10 1989-09-28 Basf Ag Verfahren zur herstellung von reliefformen
DE3908764C2 (de) * 1989-03-17 1994-08-11 Basf Ag Entwickler für die Herstellung photopolymerisierter flexographischer Reliefdruckformen
US5798019A (en) 1995-09-29 1998-08-25 E. I. Du Pont De Nemours And Company Methods and apparatus for forming cylindrical photosensitive elements
US5753414A (en) * 1995-10-02 1998-05-19 Macdermid Imaging Technology, Inc. Photopolymer plate having a peelable substrate
US6425327B1 (en) 1999-08-12 2002-07-30 E. I. Du Pont De Nemours And Company Method for forming a cylindrical photosensitive element
US6713646B2 (en) 2002-04-12 2004-03-30 Biosphere Medical Degradable crosslinkers, and degradable crosslinked hydrogels comprising them
US7838699B2 (en) * 2002-05-08 2010-11-23 Biosphere Medical Embolization using degradable crosslinked hydrogels
US6884905B2 (en) * 2002-07-23 2005-04-26 Biosphere Medical Degradable carbamate-containing bis(acryloyl) crosslinkers, and degradable crosslinked hydrogels comprising them
US8435603B2 (en) * 2003-12-05 2013-05-07 Conductive Inkjet Technology Limited Formation of solid layers on substrates
US7811744B2 (en) 2004-03-03 2010-10-12 Kodak IL. Ltd. Material for infrared laser ablated engraved flexographic printing plates
US8142987B2 (en) 2004-04-10 2012-03-27 Eastman Kodak Company Method of producing a relief image for printing
JP4342373B2 (ja) * 2004-04-30 2009-10-14 東京応化工業株式会社 凸版印刷用感光性印刷原版、凸版印刷版の製造方法、および該製造方法用遮光インク
JP2006003570A (ja) * 2004-06-16 2006-01-05 Tokyo Ohka Kogyo Co Ltd 印刷版製造用感光性組成物、並びに、これを用いた感光性印刷原版積層体および印刷版
JP2007015147A (ja) * 2005-07-05 2007-01-25 Tokyo Ohka Kogyo Co Ltd 凸版印刷用感光性積層印刷原版の製造方法、凸版印刷用感光性積層印刷原版、および凸版印刷版の製造方法
JP2007224093A (ja) * 2006-02-21 2007-09-06 Tokyo Ohka Kogyo Co Ltd 接着層形成用組成物、及びこれを用いた凸版印刷版、並びに凸版印刷版の製造方法
PL2225337T3 (pl) 2007-11-19 2018-01-31 Basf Se Zastosowanie silnie rozgałęzionych polimerów w dyspersjach polimerowych do farb połyskowych
AU2008327942A1 (en) 2007-11-19 2009-05-28 Basf Se Use of highly-branched polymers for producing polymer dispersions with improved freeze/thaw stability
EP2257579B1 (de) 2008-03-20 2017-05-10 Basf Se Polymerdispersionen enthaltend phosphorhaltige polymere und emulgatoren
DE102009026819A1 (de) * 2008-09-08 2010-03-11 Evonik Röhm Gmbh Monomermischung, Polymer, Beschichtungsmittel und Verfahren zur Herstellung einer Beschichtung
ES2545733T3 (es) 2008-12-01 2015-09-15 Basf Se Composición acuosa de aglutinantes que contiene oligómeros
US20120121921A1 (en) 2009-07-22 2012-05-17 Basf Se Aqueous polymer dispersion as a binding agent for plasters and coating materials having improved fire behavior
KR20120091081A (ko) 2009-09-15 2012-08-17 바스프 에스이 하이브리드 네트워크 중 항균제를 함유하는 수성 분산액
US8785557B2 (en) 2009-12-16 2014-07-22 Basf Se Use of aqueous hybrid binders for gloss paints
PL2513154T3 (pl) 2009-12-16 2015-08-31 Basf Se Sposób wytwarzania wodnych hybrydowych środków błonotwórczych o małej zawartości monomerów resztkowych oraz zastosowanie tych środków błonotwórczych w farbach o wysokim połysku
JP5744067B2 (ja) 2010-02-18 2015-07-01 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ 不飽和脂肪酸基を有する高分岐ポリカーボネートを含有する、ポリマー分散液
US8476000B2 (en) 2010-06-04 2013-07-02 Ryan Vest Method of producing a relief image from a liquid photopolymer resin
US8754151B2 (en) 2010-12-21 2014-06-17 Basf Se Multistage polymer dispersions, processes for preparing them, and use thereof
JP5972281B2 (ja) 2010-12-21 2016-08-17 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ 多段ポリマー分散液、該分散液の製造方法および該分散液の使用
EP2636714A1 (de) 2012-03-09 2013-09-11 Basf Se Mehrstufige herstellung wässriger haftklebstoffdispersionen für die herstellung von selbstkle-benden artikeln
US9096090B2 (en) 2012-05-09 2015-08-04 Ryan W. Vest Liquid platemaking with laser engraving
US8735049B2 (en) 2012-05-22 2014-05-27 Ryan W. Vest Liquid platemaking process
JP6238972B2 (ja) 2012-06-05 2017-11-29 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ 金属薄板のコーティングのための多段ポリマー分散液の使用
RU2015103810A (ru) 2012-07-06 2016-08-27 Басф Се Применение водных гибридных связующих и алкидных систем в средствах для покрытий
US9703201B2 (en) 2015-04-22 2017-07-11 Macdermid Printing Solutions, Llc Method of making relief image printing plates
KR20180070664A (ko) 2015-10-20 2018-06-26 바스프 에스이 섬유-시멘트 보드를 코팅하기 위한 코팅 조성물
US9740103B2 (en) 2015-11-09 2017-08-22 Macdermid Printing Solutions, Llc Method and apparatus for producing liquid flexographic printing plates
JP2019509357A (ja) 2016-01-18 2019-04-04 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ 複合フィルムを貼り合わせるための一成分系ラミネート接着剤の使用
ES2693976T3 (es) 2016-02-08 2018-12-17 Basf Se Uso de una dispersión de adhesivo para la laminación de películas brillantes
CN109071733B (zh) 2016-03-18 2022-03-29 巴斯夫欧洲公司 细分散的水性多阶段聚合物分散体、其制备方法及其作为粘合剂的用途
US10625334B2 (en) 2017-04-11 2020-04-21 Macdermid Graphics Solutions, Llc Method of producing a relief image from a liquid photopolymer resin
WO2019201696A1 (de) 2018-04-20 2019-10-24 Basf Se Haftklebstoffzusammensetzung mit auf vernetzung über keto- oder aldehydgruppen beruhendem gelgehalt
CN113396059A (zh) 2019-02-15 2021-09-14 科思创知识产权两合公司 用于给地板覆盖物涂底漆并粘合的新体系

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3677920A (en) * 1968-07-06 1972-07-18 Asahi Chemical Ind Photopolymerizable diisocyanate modified unsaturated polyester containing acrylic monomers
DE2008334A1 (de) * 1969-02-24 1970-12-23 The Lubrizol Corp., Cleveland, Ohio (V.St.A.) Härtbare Formmassen auf der Basis von Polyestern
US3725231A (en) * 1971-08-20 1973-04-03 Lubrizol Corp Photosensitive diacetone acrylamide resins

Also Published As

Publication number Publication date
FR2129360A5 (ja) 1972-10-27
DE2207209C3 (de) 1974-05-22
US3794494A (en) 1974-02-26
GB1350339A (en) 1974-04-18
CA956166A (en) 1974-10-15
IT944098B (it) 1973-04-20
AU3638971A (en) 1973-05-24
DE2207209A1 (de) 1972-10-19
DE2207209B2 (de) 1973-10-25

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