CA2935252C - System and method for surface cleaning - Google Patents
System and method for surface cleaning Download PDFInfo
- Publication number
- CA2935252C CA2935252C CA2935252A CA2935252A CA2935252C CA 2935252 C CA2935252 C CA 2935252C CA 2935252 A CA2935252 A CA 2935252A CA 2935252 A CA2935252 A CA 2935252A CA 2935252 C CA2935252 C CA 2935252C
- Authority
- CA
- Canada
- Prior art keywords
- acoustic
- waves
- debris
- cleaning
- energy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 382
- 238000000034 method Methods 0.000 title claims description 65
- 239000007788 liquid Substances 0.000 claims description 69
- 239000006098 acoustic absorber Substances 0.000 claims description 53
- 239000002245 particle Substances 0.000 claims description 53
- 239000003595 mist Substances 0.000 claims description 48
- 239000007921 spray Substances 0.000 claims description 14
- 230000008878 coupling Effects 0.000 claims description 4
- 238000010168 coupling process Methods 0.000 claims description 4
- 238000005859 coupling reaction Methods 0.000 claims description 4
- 239000006096 absorbing agent Substances 0.000 claims 1
- 239000012530 fluid Substances 0.000 description 32
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 29
- 238000004519 manufacturing process Methods 0.000 description 22
- 239000000243 solution Substances 0.000 description 13
- 239000000463 material Substances 0.000 description 12
- 239000000126 substance Substances 0.000 description 12
- 239000003599 detergent Substances 0.000 description 9
- 239000000203 mixture Substances 0.000 description 9
- 238000012423 maintenance Methods 0.000 description 7
- 230000004044 response Effects 0.000 description 7
- 239000010409 thin film Substances 0.000 description 6
- 230000009471 action Effects 0.000 description 5
- 238000003491 array Methods 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- 230000005540 biological transmission Effects 0.000 description 4
- 238000010276 construction Methods 0.000 description 4
- 238000011109 contamination Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 238000002347 injection Methods 0.000 description 4
- 239000007924 injection Substances 0.000 description 4
- 230000007246 mechanism Effects 0.000 description 4
- 230000001105 regulatory effect Effects 0.000 description 4
- 230000003213 activating effect Effects 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 238000000889 atomisation Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000007689 inspection Methods 0.000 description 3
- 230000010354 integration Effects 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 239000004094 surface-active agent Substances 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- 238000005422 blasting Methods 0.000 description 2
- 230000003749 cleanliness Effects 0.000 description 2
- 230000001066 destructive effect Effects 0.000 description 2
- 230000002708 enhancing effect Effects 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 230000005284 excitation Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 238000004513 sizing Methods 0.000 description 2
- 238000009827 uniform distribution Methods 0.000 description 2
- 229920000426 Microplastic Polymers 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000002775 capsule Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 239000012636 effector Substances 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 239000000499 gel Substances 0.000 description 1
- 230000036541 health Effects 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 239000011344 liquid material Substances 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 230000008520 organization Effects 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 239000011236 particulate material Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000009419 refurbishment Methods 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 239000008237 rinsing water Substances 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 239000000565 sealant Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B5/00—Cleaning by methods involving the use of air flow or gas flow
- B08B5/04—Cleaning by suction, with or without auxiliary action
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
- B08B7/02—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by distortion, beating, or vibration of the surface to be cleaned
- B08B7/026—Using sound waves
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
- B08B7/02—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by distortion, beating, or vibration of the surface to be cleaned
- B08B7/026—Using sound waves
- B08B7/028—Using ultrasounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
- B08B7/04—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by a combination of operations
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B2203/00—Details of cleaning machines or methods involving the use or presence of liquid or steam
- B08B2203/02—Details of machines or methods for cleaning by the force of jets or sprays
- B08B2203/0288—Ultra or megasonic jets
Landscapes
- Cleaning By Liquid Or Steam (AREA)
- Cleaning In General (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US14/187,949 US10688536B2 (en) | 2014-02-24 | 2014-02-24 | System and method for surface cleaning |
US14/187,949 | 2014-02-24 | ||
PCT/US2015/014451 WO2015126628A1 (en) | 2014-02-24 | 2015-02-04 | System and method for surface cleaning |
Publications (2)
Publication Number | Publication Date |
---|---|
CA2935252A1 CA2935252A1 (en) | 2015-08-27 |
CA2935252C true CA2935252C (en) | 2021-03-30 |
Family
ID=52629661
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA2935252A Active CA2935252C (en) | 2014-02-24 | 2015-02-04 | System and method for surface cleaning |
Country Status (7)
Country | Link |
---|---|
US (2) | US10688536B2 (de) |
EP (1) | EP3110572B1 (de) |
JP (1) | JP6613249B2 (de) |
CN (1) | CN106029242B (de) |
AU (1) | AU2015219522B2 (de) |
CA (1) | CA2935252C (de) |
WO (1) | WO2015126628A1 (de) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9068775B2 (en) | 2009-02-09 | 2015-06-30 | Heat Technologies, Inc. | Ultrasonic drying system and method |
US10343193B2 (en) | 2014-02-24 | 2019-07-09 | The Boeing Company | System and method for surface cleaning |
US10488108B2 (en) * | 2014-07-01 | 2019-11-26 | Heat Technologies, Inc. | Indirect acoustic drying system and method |
EP3172515B1 (de) | 2014-07-24 | 2021-07-14 | Heat Technologies, Inc. | Akustisch gestützte wärme- und masseübertragungsvorrichtung |
US20170175568A1 (en) * | 2015-12-16 | 2017-06-22 | General Electric Company | Acoustic Cleaning of Gas Turbine Engine Components |
WO2018093958A1 (en) | 2016-11-15 | 2018-05-24 | Postprocess Technologies Inc. | Self-modifying process for rotational support structure removal in 3d printed parts using calibrated resonant frequency |
CN107442538A (zh) * | 2017-08-17 | 2017-12-08 | 京东方科技集团股份有限公司 | 清洗装置及清洗方法 |
CN109692851A (zh) * | 2017-10-20 | 2019-04-30 | 智崴资讯科技股份有限公司 | 大型屏幕除尘装置及其方法 |
CN110653235B (zh) * | 2018-06-30 | 2022-09-06 | 曹可瀚 | 物体清洗装置和清洗方法 |
US11078806B2 (en) * | 2018-12-12 | 2021-08-03 | Raytheon Technologies Corporation | Apparatus and methods for cleaning internal cavities of blades |
JP7201229B2 (ja) * | 2019-03-28 | 2023-01-10 | 株式会社エアレックス | 除染装置 |
JP7233691B2 (ja) | 2019-03-28 | 2023-03-07 | 株式会社エアレックス | 低温物品の除染方法及びこれに使用するパスボックス |
WO2021007425A1 (en) * | 2019-07-10 | 2021-01-14 | Postprocess Technologies, Inc. | Methods and system for removal of unwanted material from an additively manufactured object |
CN112296015B (zh) * | 2019-07-30 | 2023-03-07 | 理光高科技(深圳)有限公司 | 干式清洗装置 |
FR3101000B1 (fr) * | 2019-09-25 | 2022-07-15 | Lille Ecole Centrale | Procédé de fusion d’un corps au moyen d’une onde ultrasonore |
JP7373848B2 (ja) * | 2020-02-28 | 2023-11-06 | ヤマハロボティクスホールディングス株式会社 | 音響式異物除去装置 |
US12085848B2 (en) * | 2020-07-31 | 2024-09-10 | Taiwan Semiconductor Manufacturing Company, Ltd. | Photomask cleaning tool |
CN116034452A (zh) * | 2021-08-26 | 2023-04-28 | 雅马哈智能机器控股株式会社 | 超声波清洗方法 |
US12030094B2 (en) * | 2021-12-23 | 2024-07-09 | Volkswagen Aktiengesellschaft | Acousto-vibratory sensor cleaning |
Family Cites Families (60)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1538246A (en) | 1923-08-14 | 1925-05-19 | Western Electric Co | Metallic composition |
US1627961A (en) | 1926-07-23 | 1927-05-10 | John W Farley | Plate thimble for pipes |
US2164924A (en) | 1937-06-11 | 1939-07-04 | Du Pont | Electroplating |
US2987068A (en) * | 1956-05-01 | 1961-06-06 | Branson Instr | Apparatus for ultrasonic cleaning |
US3033710A (en) * | 1957-03-12 | 1962-05-08 | Branson Instr | Method of surface cleaning using ultrasonic energy |
US4069541A (en) | 1976-04-23 | 1978-01-24 | U.S. Floor Systems, Inc. | Cleaning method and apparatus |
US4595419A (en) | 1982-12-27 | 1986-06-17 | Proto-Power Corporation | Ultrasonic decontamination robot |
US4461651A (en) * | 1983-02-08 | 1984-07-24 | Foster Wheeler Limited | Sonic cleaning device and method |
US4768256A (en) | 1986-11-07 | 1988-09-06 | Motoda Electronics Co., Ltd. | Ultrasonic wiper |
US4890567A (en) | 1987-12-01 | 1990-01-02 | Caduff Edward A | Robotic ultrasonic cleaning and spraying device for ships' hulls |
DE69117127T2 (de) | 1990-10-11 | 1996-11-07 | Toda Koji | Ultraschall-Zerstäuber |
JPH05269449A (ja) * | 1992-03-03 | 1993-10-19 | Nec Corp | 超音波洗浄方法 |
JPH0679245A (ja) * | 1992-09-01 | 1994-03-22 | Ratsupu Master S F T Kk | 超音波洗浄装置及びその洗浄方法 |
JPH06262149A (ja) * | 1993-03-15 | 1994-09-20 | Satako Eng:Kk | 集束超音波によるクリーニング方法 |
JP2505143B2 (ja) * | 1993-08-31 | 1996-06-05 | 株式会社サタコエンジニヤリング | 集束超音波発生装置 |
US5531861A (en) | 1993-09-29 | 1996-07-02 | Motorola, Inc. | Chemical-mechanical-polishing pad cleaning process for use during the fabrication of semiconductor devices |
US5534076A (en) * | 1994-10-03 | 1996-07-09 | Verteg, Inc. | Megasonic cleaning system |
DE19629705A1 (de) | 1996-07-24 | 1998-01-29 | Joachim Dr Scheerer | Verfahren und Vorrichtung zur Reinigung von scheibenförmigen Gegenständen, insbesondere Wafern, mit Ultraschall und Wasser als Spülmedium |
US6039059A (en) | 1996-09-30 | 2000-03-21 | Verteq, Inc. | Wafer cleaning system |
DE19647482A1 (de) * | 1996-11-16 | 1998-06-18 | Fidor Vermoegensverwaltung Gmb | Ultraschall-Reinigungsvorrichtung |
US6247525B1 (en) | 1997-03-20 | 2001-06-19 | Georgia Tech Research Corporation | Vibration induced atomizers |
JPH1187288A (ja) * | 1997-09-05 | 1999-03-30 | Advanced Display:Kk | 基板洗浄方法および該洗浄方法に用いられる洗浄装置 |
EP0976563A1 (de) | 1998-07-31 | 2000-02-02 | Eastman Kodak Company | Berührungslose Utraschallreinigung von Tintenstrahldruckkopfkartuschen |
US6186004B1 (en) | 1999-05-27 | 2001-02-13 | The Regents Of The University Of California | Apparatus and method for remote, noninvasive characterization of structures and fluids inside containers |
US6662812B1 (en) * | 1999-07-24 | 2003-12-16 | Allen David Hertz | Method for acoustic and vibrational energy for assisted drying of solder stencils and electronic modules |
US20050195985A1 (en) | 1999-10-29 | 2005-09-08 | American Technology Corporation | Focused parametric array |
EP1237663B1 (de) | 1999-11-16 | 2006-02-22 | The Procter & Gamble Company | Reinigungsverfahren welches ultraschallwellen verwendet |
JP2002045807A (ja) | 2000-07-31 | 2002-02-12 | Optrex Corp | 基板洗浄方法およびその装置 |
EP1216642A1 (de) | 2000-12-22 | 2002-06-26 | Nilfisk-Advance A/S | Reinigungskopf für ein Oberflächenreinigungsgerät |
US6810807B2 (en) | 2001-03-12 | 2004-11-02 | Agfa Corporation | Method and apparatus for cleaning coating materials from a substrate |
US7306002B2 (en) * | 2003-01-04 | 2007-12-11 | Yong Bae Kim | System and method for wet cleaning a semiconductor wafer |
EP1635960A2 (de) * | 2003-06-06 | 2006-03-22 | P.C.T. Systems, Inc. | Verfahren und vorrichtung zur bearbeitung von substraten mit megaschallenergie |
SG166038A1 (en) * | 2003-06-24 | 2010-11-29 | Lam Res Ag | Device and method for wet treating disc-like substrates |
WO2005097360A2 (en) | 2004-04-05 | 2005-10-20 | Electrolux Home Care Products, Ltd. | Apparatus and method for cleaning surfaces |
US20060027248A1 (en) * | 2004-08-09 | 2006-02-09 | Applied Materials, Inc. | Megasonic cleaning with minimized interference |
JP2006262149A (ja) | 2005-03-17 | 2006-09-28 | Hitachi Medical Corp | 超音波探触子及び超音波診断装置 |
JP2007165661A (ja) * | 2005-12-14 | 2007-06-28 | Dainippon Screen Mfg Co Ltd | 基板処理装置および基板処理方法 |
US7784478B2 (en) | 2006-01-20 | 2010-08-31 | Akrion Systems Llc | Acoustic energy system, method and apparatus for processing flat articles |
UA95486C2 (uk) | 2006-07-07 | 2011-08-10 | Форс Текнолоджи | Спосіб та система для поліпшеного застосування високоінтенсивних акустичних хвиль |
JP2008066401A (ja) * | 2006-09-05 | 2008-03-21 | Dainippon Screen Mfg Co Ltd | 基板処理装置および基板処理方法 |
KR100852396B1 (ko) * | 2006-10-20 | 2008-08-14 | 한국기계연구원 | 초음파를 이용한 세정장치 |
KR100800174B1 (ko) * | 2006-10-20 | 2008-02-01 | 한국기계연구원 | 메가소닉 세정모듈 |
US8327861B2 (en) | 2006-12-19 | 2012-12-11 | Lam Research Corporation | Megasonic precision cleaning of semiconductor process equipment components and parts |
TWI421933B (zh) * | 2007-05-16 | 2014-01-01 | Lam Res Corp | 板狀物件之超音波濕式處理的裝置與方法 |
JP5127036B2 (ja) * | 2007-10-15 | 2013-01-23 | 株式会社サワーコーポレーション | 超音波洗浄装置 |
JP2009130287A (ja) * | 2007-11-27 | 2009-06-11 | Toshiba Corp | 半導体装置の製造装置及び半導体装置の製造方法 |
WO2009135273A1 (en) | 2008-05-08 | 2009-11-12 | Cavitus Pty Ltd | Methods and apparatus for ultrasonic cleaning |
US8217554B2 (en) | 2008-05-28 | 2012-07-10 | Fbs, Inc. | Ultrasonic vibration system and method for removing/avoiding unwanted build-up on structures |
US20100258142A1 (en) * | 2009-04-14 | 2010-10-14 | Mark Naoshi Kawaguchi | Apparatus and method for using a viscoelastic cleaning material to remove particles on a substrate |
US8828145B2 (en) * | 2009-03-10 | 2014-09-09 | Lam Research Corporation | Method of particle contaminant removal |
US8585825B2 (en) | 2008-10-30 | 2013-11-19 | Lam Research Corporation | Acoustic assisted single wafer wet clean for semiconductor wafer process |
DE102010028883A1 (de) | 2010-05-11 | 2011-11-17 | Dürr Ecoclean GmbH | Prozessbehälter |
GB201100290D0 (en) | 2011-01-10 | 2011-02-23 | Trevett David R M | Clearing precipitation from windaows |
JP5183777B2 (ja) | 2011-07-12 | 2013-04-17 | 株式会社カイジョー | 超音波洗浄装置及び超音波洗浄方法 |
US8790467B2 (en) | 2011-10-27 | 2014-07-29 | The Boeing Company | Vacuum steam cleaning apparatus and method |
US9393579B2 (en) | 2012-10-03 | 2016-07-19 | The Boeing Company | Cleaning apparatus and method of cleaning a contaminated surface |
US20140096794A1 (en) | 2012-10-04 | 2014-04-10 | The Boeing Company | Methods for Cleaning a Contaminated Surface |
US9657570B2 (en) * | 2013-03-11 | 2017-05-23 | United Technologies Corporation | Pulse jet liquid gas cleaning system |
US9192278B2 (en) * | 2013-09-30 | 2015-11-24 | Elwha Llc | Self-cleaning substrate |
US10343193B2 (en) | 2014-02-24 | 2019-07-09 | The Boeing Company | System and method for surface cleaning |
-
2014
- 2014-02-24 US US14/187,949 patent/US10688536B2/en active Active
-
2015
- 2015-02-04 CA CA2935252A patent/CA2935252C/en active Active
- 2015-02-04 WO PCT/US2015/014451 patent/WO2015126628A1/en active Application Filing
- 2015-02-04 CN CN201580010109.6A patent/CN106029242B/zh active Active
- 2015-02-04 AU AU2015219522A patent/AU2015219522B2/en active Active
- 2015-02-04 EP EP15708362.7A patent/EP3110572B1/de active Active
- 2015-02-04 JP JP2016570771A patent/JP6613249B2/ja active Active
-
2020
- 2020-05-13 US US15/930,973 patent/US11167325B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
AU2015219522B2 (en) | 2019-04-04 |
US20200290096A1 (en) | 2020-09-17 |
JP6613249B2 (ja) | 2019-11-27 |
US20150239021A1 (en) | 2015-08-27 |
CN106029242A (zh) | 2016-10-12 |
US11167325B2 (en) | 2021-11-09 |
EP3110572B1 (de) | 2023-07-05 |
CN106029242B (zh) | 2019-08-16 |
US10688536B2 (en) | 2020-06-23 |
JP2017506157A (ja) | 2017-03-02 |
AU2015219522A1 (en) | 2016-07-14 |
CA2935252A1 (en) | 2015-08-27 |
EP3110572A1 (de) | 2017-01-04 |
WO2015126628A1 (en) | 2015-08-27 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
EEER | Examination request |
Effective date: 20180529 |