CA2348653A1 - Matrice cathodique creuse pour generation de plasma - Google Patents
Matrice cathodique creuse pour generation de plasma Download PDFInfo
- Publication number
- CA2348653A1 CA2348653A1 CA002348653A CA2348653A CA2348653A1 CA 2348653 A1 CA2348653 A1 CA 2348653A1 CA 002348653 A CA002348653 A CA 002348653A CA 2348653 A CA2348653 A CA 2348653A CA 2348653 A1 CA2348653 A1 CA 2348653A1
- Authority
- CA
- Canada
- Prior art keywords
- plasma
- cells
- cathode assembly
- substrate
- generating apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J17/00—Gas-filled discharge tubes with solid cathode
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32596—Hollow cathodes
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Plasma Technology (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
La présente invention concerne un ensemble cathodique destiné à la création d'un plasma de décharge. Cette cathode est constituée d'une pluralité de cellules creuses de génération de plasma électroconductrices. Ces cellules qui sont disposées en matrice, sont électriquement connectées les unes aux autres. Le plasma produit permet de modifier les propriétés de surface de substrats tels que films, fibres, particules et autres articles.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11111698P | 1998-12-07 | 1998-12-07 | |
US60/111,116 | 1998-12-07 | ||
PCT/US1999/028841 WO2000034979A1 (fr) | 1998-12-07 | 1999-12-06 | Matrice cathodique creuse pour generation de plasma |
Publications (1)
Publication Number | Publication Date |
---|---|
CA2348653A1 true CA2348653A1 (fr) | 2000-06-15 |
Family
ID=22336697
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA002348653A Abandoned CA2348653A1 (fr) | 1998-12-07 | 1999-12-06 | Matrice cathodique creuse pour generation de plasma |
Country Status (8)
Country | Link |
---|---|
EP (1) | EP1141996A1 (fr) |
JP (1) | JP2002532828A (fr) |
KR (1) | KR20010101137A (fr) |
CN (1) | CN1331836A (fr) |
AU (1) | AU1842200A (fr) |
CA (1) | CA2348653A1 (fr) |
TW (1) | TW470995B (fr) |
WO (1) | WO2000034979A1 (fr) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10120405B4 (de) * | 2001-04-25 | 2008-08-21 | Je Plasmaconsult Gmbh | Vorrichtung zur Erzeugung eines Niedertemperatur-Plasmas |
KR20040022639A (ko) * | 2002-09-09 | 2004-03-16 | 주식회사 네오바이오텍 | 탄소계 물질 박막 형성방법 |
DE10256663B3 (de) * | 2002-12-04 | 2005-10-13 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Gasentladungslampe für EUV-Strahlung |
SE529058C2 (sv) | 2005-07-08 | 2007-04-17 | Plasma Surgical Invest Ltd | Plasmaalstrande anordning, plasmakirurgisk anordning, användning av en plasmakirurgisk anordning och förfarande för att bilda ett plasma |
SE529056C2 (sv) | 2005-07-08 | 2007-04-17 | Plasma Surgical Invest Ltd | Plasmaalstrande anordning, plasmakirurgisk anordning och användning av en plasmakirurgisk anordning |
SE529053C2 (sv) | 2005-07-08 | 2007-04-17 | Plasma Surgical Invest Ltd | Plasmaalstrande anordning, plasmakirurgisk anordning och användning av en plasmakirurgisk anordning |
JP4984285B2 (ja) * | 2007-01-23 | 2012-07-25 | 独立行政法人産業技術総合研究所 | 高密度プラズマ処理装置 |
US8742282B2 (en) * | 2007-04-16 | 2014-06-03 | General Electric Company | Ablative plasma gun |
US8735766B2 (en) | 2007-08-06 | 2014-05-27 | Plasma Surgical Investments Limited | Cathode assembly and method for pulsed plasma generation |
EP2557902B1 (fr) * | 2007-08-06 | 2016-11-23 | Plasma Surgical Investments Limited | Ensemble cathodique et procédé de génération de plasma pulsé |
US8613742B2 (en) | 2010-01-29 | 2013-12-24 | Plasma Surgical Investments Limited | Methods of sealing vessels using plasma |
US9089319B2 (en) | 2010-07-22 | 2015-07-28 | Plasma Surgical Investments Limited | Volumetrically oscillating plasma flows |
JP5702968B2 (ja) * | 2010-08-11 | 2015-04-15 | 東京エレクトロン株式会社 | プラズマ処理装置及びプラズマ制御方法 |
DE102012201956A1 (de) * | 2012-02-09 | 2013-08-14 | Krones Ag | Hohlkathoden-Gaslanze für die Innenbeschichtung von Behältern |
KR101506305B1 (ko) * | 2012-12-17 | 2015-03-26 | 한국생산기술연구원 | 중공관 단위체로 구성된 음극을 포함하는 질화처리용 플라즈마 장치 및 그를 이용한 플라즈마 질화처리 방법 |
CN103730320B (zh) * | 2013-12-23 | 2016-09-28 | 苏州市奥普斯等离子体科技有限公司 | 一种微空心阴极等离子体处理装置 |
WO2016048323A1 (fr) | 2014-09-25 | 2016-03-31 | Apple Inc. | Revêtement antiréfléchissant résistant et conforme à une géométrie 3d |
IL300972A (en) | 2020-08-28 | 2023-04-01 | Plasma Surgical Invest Ltd | Systems, methods and devices for producing radially expanded plasma flow |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4637853A (en) * | 1985-07-29 | 1987-01-20 | International Business Machines Corporation | Hollow cathode enhanced plasma for high rate reactive ion etching and deposition |
JPS644481A (en) * | 1987-06-24 | 1989-01-09 | Minoru Sugawara | Parallel-plate discharge electrode |
JPH0266941A (ja) * | 1988-08-31 | 1990-03-07 | Nec Corp | エッチング装置 |
SE503260C2 (sv) * | 1992-06-15 | 1996-04-29 | Akerlund & Rausing Ab | Förfarande för framställning av en barriärfilm medelst plasmabehandling |
EP0634778A1 (fr) * | 1993-07-12 | 1995-01-18 | The Boc Group, Inc. | Réseau de cathodes creuser |
DE19755902C1 (de) * | 1997-12-08 | 1999-05-12 | Fraunhofer Ges Forschung | Verfahren und Vorrichtung zum Vergüten von Oberflächen |
-
1999
- 1999-12-06 JP JP2000587353A patent/JP2002532828A/ja active Pending
- 1999-12-06 CA CA002348653A patent/CA2348653A1/fr not_active Abandoned
- 1999-12-06 WO PCT/US1999/028841 patent/WO2000034979A1/fr not_active Application Discontinuation
- 1999-12-06 EP EP99961943A patent/EP1141996A1/fr not_active Withdrawn
- 1999-12-06 CN CN99814158A patent/CN1331836A/zh active Pending
- 1999-12-06 KR KR1020017007066A patent/KR20010101137A/ko not_active Application Discontinuation
- 1999-12-06 AU AU18422/00A patent/AU1842200A/en not_active Abandoned
- 1999-12-07 TW TW088121388A patent/TW470995B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR20010101137A (ko) | 2001-11-14 |
AU1842200A (en) | 2000-06-26 |
CN1331836A (zh) | 2002-01-16 |
WO2000034979A1 (fr) | 2000-06-15 |
EP1141996A1 (fr) | 2001-10-10 |
JP2002532828A (ja) | 2002-10-02 |
TW470995B (en) | 2002-01-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FZDE | Dead |