CA2329412C - Masque elastomere et son utilisation dans la fabrication de dispositifs, dont des afficheurs electroluminescents pixelises - Google Patents
Masque elastomere et son utilisation dans la fabrication de dispositifs, dont des afficheurs electroluminescents pixelises Download PDFInfo
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- CA2329412C CA2329412C CA2329412A CA2329412A CA2329412C CA 2329412 C CA2329412 C CA 2329412C CA 2329412 A CA2329412 A CA 2329412A CA 2329412 A CA2329412 A CA 2329412A CA 2329412 C CA2329412 C CA 2329412C
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- MHMNJMPURVTYEJ-UHFFFAOYSA-N fluorescein-5-isothiocyanate Chemical compound O1C(=O)C2=CC(N=C=S)=CC=C2C21C1=CC=C(O)C=C1OC1=CC(O)=CC=C21 MHMNJMPURVTYEJ-UHFFFAOYSA-N 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- ORTRWBYBJVGVQC-UHFFFAOYSA-N hexadecane-1-thiol Chemical compound CCCCCCCCCCCCCCCCS ORTRWBYBJVGVQC-UHFFFAOYSA-N 0.000 description 1
- 238000012615 high-resolution technique Methods 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 239000005556 hormone Substances 0.000 description 1
- 229940088597 hormone Drugs 0.000 description 1
- 150000003949 imides Chemical class 0.000 description 1
- 239000000411 inducer Substances 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 229920000592 inorganic polymer Polymers 0.000 description 1
- 229910052747 lanthanoid Inorganic materials 0.000 description 1
- 150000002602 lanthanoids Chemical class 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 239000002523 lectin Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 238000003913 materials processing Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 239000005300 metallic glass Substances 0.000 description 1
- 238000001393 microlithography Methods 0.000 description 1
- 238000001682 microtransfer moulding Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 150000007523 nucleic acids Chemical class 0.000 description 1
- 102000039446 nucleic acids Human genes 0.000 description 1
- 108020004707 nucleic acids Proteins 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 1
- 230000036961 partial effect Effects 0.000 description 1
- ATGAWOHQWWULNK-UHFFFAOYSA-I pentapotassium;[oxido(phosphonatooxy)phosphoryl] phosphate Chemical compound [K+].[K+].[K+].[K+].[K+].[O-]P([O-])(=O)OP([O-])(=O)OP([O-])([O-])=O ATGAWOHQWWULNK-UHFFFAOYSA-I 0.000 description 1
- 229950011087 perflunafene Drugs 0.000 description 1
- UWEYRJFJVCLAGH-IJWZVTFUSA-N perfluorodecalin Chemical compound FC1(F)C(F)(F)C(F)(F)C(F)(F)[C@@]2(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)[C@@]21F UWEYRJFJVCLAGH-IJWZVTFUSA-N 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 1
- 229920000233 poly(alkylene oxides) Polymers 0.000 description 1
- 229920001643 poly(ether ketone) Polymers 0.000 description 1
- 229920000052 poly(p-xylylene) Polymers 0.000 description 1
- 229920002627 poly(phosphazenes) Polymers 0.000 description 1
- 229920000548 poly(silane) polymer Polymers 0.000 description 1
- 229920001197 polyacetylene Polymers 0.000 description 1
- 229920002401 polyacrylamide Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000015 polydiacetylene Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000012460 protein solution Substances 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000033458 reproduction Effects 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 238000012216 screening Methods 0.000 description 1
- 239000005368 silicate glass Substances 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000010944 silver (metal) Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- PJANXHGTPQOBST-UHFFFAOYSA-N stilbene Chemical compound C=1C=CC=CC=1C=CC1=CC=CC=C1 PJANXHGTPQOBST-UHFFFAOYSA-N 0.000 description 1
- 235000021286 stilbenes Nutrition 0.000 description 1
- 235000011149 sulphuric acid Nutrition 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- RYCLIXPGLDDLTM-UHFFFAOYSA-J tetrapotassium;phosphonato phosphate Chemical compound [K+].[K+].[K+].[K+].[O-]P([O-])(=O)OP([O-])([O-])=O RYCLIXPGLDDLTM-UHFFFAOYSA-J 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 238000013519 translation Methods 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 1
- LENZDBCJOHFCAS-UHFFFAOYSA-N tris Chemical compound OCC(N)(CO)CO LENZDBCJOHFCAS-UHFFFAOYSA-N 0.000 description 1
- 238000007039 two-step reaction Methods 0.000 description 1
- 238000003631 wet chemical etching Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/30—Devices specially adapted for multicolour light emission
- H10K59/35—Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Nanotechnology (AREA)
- Crystallography & Structural Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Materials Engineering (AREA)
- Theoretical Computer Science (AREA)
- Mathematical Physics (AREA)
- Composite Materials (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroluminescent Light Sources (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Details Or Accessories Of Spraying Plant Or Apparatus (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US6374298A | 1998-04-21 | 1998-04-21 | |
| US09/063,742 | 1998-04-21 | ||
| PCT/US1999/008623 WO1999054786A1 (fr) | 1998-04-21 | 1999-04-20 | Masque elastomere et son utilisation dans la fabrication de dispositifs, dont des afficheurs electroluminescents pixelises |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CA2329412A1 CA2329412A1 (fr) | 1999-10-28 |
| CA2329412C true CA2329412C (fr) | 2010-09-21 |
Family
ID=22051194
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA2329412A Expired - Fee Related CA2329412C (fr) | 1998-04-21 | 1999-04-20 | Masque elastomere et son utilisation dans la fabrication de dispositifs, dont des afficheurs electroluminescents pixelises |
Country Status (4)
| Country | Link |
|---|---|
| EP (1) | EP1080394A1 (fr) |
| JP (1) | JP2002512124A (fr) |
| CA (1) | CA2329412C (fr) |
| WO (1) | WO1999054786A1 (fr) |
Families Citing this family (48)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5776748A (en) | 1993-10-04 | 1998-07-07 | President And Fellows Of Harvard College | Method of formation of microstamped patterns on plates for adhesion of cells and other biological materials, devices and uses therefor |
| EP0929658A4 (fr) | 1996-08-26 | 2005-11-02 | Univ Princeton | Dispositifs de tri de microstructures pouvant etre scellees de maniere reversible |
| US7282240B1 (en) | 1998-04-21 | 2007-10-16 | President And Fellows Of Harvard College | Elastomeric mask and use in fabrication of devices |
| WO2001035081A1 (fr) * | 1999-11-12 | 2001-05-17 | Surromed, Inc. | Biodetection par resonance plasmonique de surface |
| CA2402737A1 (fr) * | 2000-03-17 | 2001-09-27 | Emanuele Ostuni | Technique de structuration cellulaire |
| US6686184B1 (en) | 2000-05-25 | 2004-02-03 | President And Fellows Of Harvard College | Patterning of surfaces utilizing microfluidic stamps including three-dimensionally arrayed channel networks |
| US6645432B1 (en) | 2000-05-25 | 2003-11-11 | President & Fellows Of Harvard College | Microfluidic systems including three-dimensionally arrayed channel networks |
| US7323143B2 (en) | 2000-05-25 | 2008-01-29 | President And Fellows Of Harvard College | Microfluidic systems including three-dimensionally arrayed channel networks |
| GB0013394D0 (en) * | 2000-06-01 | 2000-07-26 | Microemissive Displays Ltd | A method of creating a color optoelectronic device |
| US6770721B1 (en) | 2000-11-02 | 2004-08-03 | Surface Logix, Inc. | Polymer gel contact masks and methods and molds for making same |
| US6864065B2 (en) | 2000-11-08 | 2005-03-08 | Surface Logix, Inc. | Assays for monitoring cell motility in real-time |
| US7033821B2 (en) | 2000-11-08 | 2006-04-25 | Surface Logix, Inc. | Device for monitoring cell motility in real-time |
| US6967074B2 (en) | 2000-11-08 | 2005-11-22 | Surface Logix, Inc. | Methods of detecting immobilized biomolecules |
| US7001740B2 (en) | 2000-11-08 | 2006-02-21 | Surface Logix, Inc. | Methods of arraying biological materials using peelable and resealable devices |
| US7033819B2 (en) | 2000-11-08 | 2006-04-25 | Surface Logix, Inc. | System for monitoring cell motility in real-time |
| US7351575B2 (en) | 2000-11-08 | 2008-04-01 | Surface Logix, Inc. | Methods for processing biological materials using peelable and resealable devices |
| US6893851B2 (en) | 2000-11-08 | 2005-05-17 | Surface Logix, Inc. | Method for arraying biomolecules and for monitoring cell motility in real-time |
| US6803205B2 (en) | 2000-11-08 | 2004-10-12 | Surface Logix, Inc. | Methods of measuring enzyme activity using peelable and resealable devices |
| US6844184B2 (en) | 2000-11-08 | 2005-01-18 | Surface Logix, Inc. | Device for arraying biomolecules and for monitoring cell motility in real-time |
| US7439056B2 (en) | 2000-11-08 | 2008-10-21 | Surface Logix Inc. | Peelable and resealable devices for arraying materials |
| US7371563B2 (en) | 2000-11-08 | 2008-05-13 | Surface Logix, Inc. | Peelable and resealable devices for biochemical assays |
| WO2002086452A2 (fr) | 2001-03-23 | 2002-10-31 | President And Fellows Of Harvard College | Depot selectif de materiaux sur des surfaces agencees |
| CN100493282C (zh) | 2001-08-30 | 2009-05-27 | 夏普株式会社 | 有机电致发光装置的制造方法 |
| US6833040B2 (en) | 2001-12-19 | 2004-12-21 | Surface Logix Inc. | Apparatus and method for handling membranes |
| US6897164B2 (en) | 2002-02-14 | 2005-05-24 | 3M Innovative Properties Company | Aperture masks for circuit fabrication |
| US6821348B2 (en) | 2002-02-14 | 2004-11-23 | 3M Innovative Properties Company | In-line deposition processes for circuit fabrication |
| NL1020341C2 (nl) * | 2002-04-09 | 2003-10-13 | Stichting Tech Wetenschapp | Werkwijze voor het uitvoeren van een etsbewerking. |
| EP1529317A2 (fr) * | 2002-08-06 | 2005-05-11 | Avecia Limited | Dispositifs electroniques organiques |
| NL1022269C2 (nl) | 2002-12-24 | 2004-06-25 | Otb Group Bv | Werkwijze voor het vervaardigen van een organic electroluminescent display device, substraat ten gebruike bij een dergelijke werkwijze, alsmede een organic electroluminescent display device verkregen met de werkwijze. |
| US6926840B2 (en) | 2002-12-31 | 2005-08-09 | Eastman Kodak Company | Flexible frame for mounting a deposition mask |
| CA2549341C (fr) | 2003-12-19 | 2014-06-10 | The University Of North Carolina At Chapel Hill | Procede de fabrication de microstructures et de nanostructures au moyen de la lithographie molle ou d'impression |
| DE102004034418B4 (de) * | 2004-07-15 | 2009-06-25 | Schott Ag | Verfahren zur Herstellung struktuierter optischer Filterschichten auf Substraten |
| US7821199B2 (en) | 2004-09-08 | 2010-10-26 | Toray Industries, Inc. | Organic electroluminescent device and manufacturing method thereof |
| US20060128165A1 (en) * | 2004-12-13 | 2006-06-15 | 3M Innovative Properties Company | Method for patterning surface modification |
| KR20060079957A (ko) * | 2005-01-04 | 2006-07-07 | 삼성에스디아이 주식회사 | 포토리소그래피용 연질 포토마스크, 그 제조방법, 이를채용한 패턴 형성 방법 |
| EP1681734A1 (fr) * | 2005-01-18 | 2006-07-19 | C.S.E.M. Centre Suisse D'electronique Et De Microtechnique Sa | Dispositif électro-optique et méthode de sa fabrication |
| WO2007061448A2 (fr) | 2005-05-18 | 2007-05-31 | President And Fellows Of Harvard College | Fabrication de passages conducteurs, microcircuits et microstructures dans des reseaux microfluidiques |
| DE102006026981A1 (de) * | 2006-06-10 | 2007-12-13 | Leonhard Kurz Gmbh & Co. Kg | Verfahren zur Herstellung einer strukturierten Schicht auf einem Trägersubstrat |
| DE102007029915B4 (de) | 2006-12-20 | 2017-03-30 | Lg Display Co., Ltd. | Organisches Elektrolumineszenzbauteil und Verfahren zum Herstellen desselben |
| US7662663B2 (en) | 2007-03-28 | 2010-02-16 | Eastman Kodak Company | OLED patterning method |
| US7635609B2 (en) * | 2007-04-16 | 2009-12-22 | Eastman Kodak Company | Patterning method for light-emitting devices |
| GB0716266D0 (en) * | 2007-08-21 | 2007-09-26 | Eastman Kodak Co | Method of patterning vapour deposition by printing |
| TW200934635A (en) | 2008-02-06 | 2009-08-16 | Nano Terra Inc | Stencils with removable backings for forming micron-sized features on surfaces and methods of making and using the same |
| DE102008048127A1 (de) * | 2008-09-20 | 2010-03-25 | Mtu Aero Engines Gmbh | Vorrichtung und Verfahren zum Maskieren einer Bauteilzone |
| DE102011016453A1 (de) * | 2011-04-08 | 2013-01-17 | Universität Stuttgart | Verfahren zur Herstellung einer Siebdruckform und damit hergestellte Solarzelle |
| DE102013110037B4 (de) * | 2013-09-12 | 2018-05-09 | Osram Oled Gmbh | Verfahren zum Herstellen eines optoelektronischen Bauelementes |
| EP4071843A4 (fr) * | 2020-01-03 | 2024-01-03 | Hunetplus Co Ltd | Masque à motif photographique souple pour affichage électroluminescent organique à haute résolution, et son procédé de fabrication |
| GB2607115B (en) * | 2021-06-25 | 2023-10-04 | Cipherx Tech Ltd | Method of producing a microneedle array |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4093754A (en) * | 1976-04-15 | 1978-06-06 | Parsons Robert C | Method of making decorative panels |
| US4527988A (en) * | 1982-09-20 | 1985-07-09 | Lutz Peter L | Porous contraceptive device with an interstitial liquid |
| DE3331377A1 (de) * | 1983-08-31 | 1985-03-07 | Elmar Dr. 8000 München Messerschmitt | Siebdrucksieb |
| JPS62108206A (ja) * | 1985-11-06 | 1987-05-19 | Canon Inc | カラ−フィルタ−の製造方法 |
| GB8703107D0 (en) * | 1987-02-11 | 1987-03-18 | Era Patents Ltd | Screen for printing electrical circuits |
| DE3841317C2 (de) * | 1988-12-08 | 1996-12-05 | Nokia Deutschland Gmbh | Druckform für den Siebdruck |
| JPH02232238A (ja) * | 1989-03-04 | 1990-09-14 | Tokuyama Soda Co Ltd | シートの製造方法 |
| US5665496A (en) * | 1994-06-24 | 1997-09-09 | Nippon Oil Co., Ltd. | Method for producing color filter |
-
1999
- 1999-04-20 WO PCT/US1999/008623 patent/WO1999054786A1/fr active Application Filing
- 1999-04-20 EP EP99918698A patent/EP1080394A1/fr not_active Withdrawn
- 1999-04-20 CA CA2329412A patent/CA2329412C/fr not_active Expired - Fee Related
- 1999-04-20 JP JP2000545072A patent/JP2002512124A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| CA2329412A1 (fr) | 1999-10-28 |
| WO1999054786A9 (fr) | 2000-02-03 |
| EP1080394A1 (fr) | 2001-03-07 |
| JP2002512124A (ja) | 2002-04-23 |
| WO1999054786A1 (fr) | 1999-10-28 |
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