CA2329412A1 - Masque elastomere et son utilisation dans la fabrication de dispositifs, dont des afficheurs electroluminescents pixelises - Google Patents

Masque elastomere et son utilisation dans la fabrication de dispositifs, dont des afficheurs electroluminescents pixelises Download PDF

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Publication number
CA2329412A1
CA2329412A1 CA002329412A CA2329412A CA2329412A1 CA 2329412 A1 CA2329412 A1 CA 2329412A1 CA 002329412 A CA002329412 A CA 002329412A CA 2329412 A CA2329412 A CA 2329412A CA 2329412 A1 CA2329412 A1 CA 2329412A1
Authority
CA
Canada
Prior art keywords
mask
article
agent
microns
channels
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CA002329412A
Other languages
English (en)
Other versions
CA2329412C (fr
Inventor
Rebecca J. Jackman
David C. Duffy
George M. Whitesides
Kathleen M. Vaeth
Klavs F. Jensen
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Harvard College
Massachusetts Institute of Technology
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of CA2329412A1 publication Critical patent/CA2329412A1/fr
Application granted granted Critical
Publication of CA2329412C publication Critical patent/CA2329412C/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/30—Devices specially adapted for multicolour light emission
    • H10K59/35—Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Metallurgy (AREA)
  • Theoretical Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Mathematical Physics (AREA)
  • Organic Chemistry (AREA)
  • Composite Materials (AREA)
  • Electroluminescent Light Sources (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Details Or Accessories Of Spraying Plant Or Apparatus (AREA)
CA2329412A 1998-04-21 1999-04-20 Masque elastomere et son utilisation dans la fabrication de dispositifs, dont des afficheurs electroluminescents pixelises Expired - Fee Related CA2329412C (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US6374298A 1998-04-21 1998-04-21
US09/063,742 1998-04-21
PCT/US1999/008623 WO1999054786A1 (fr) 1998-04-21 1999-04-20 Masque elastomere et son utilisation dans la fabrication de dispositifs, dont des afficheurs electroluminescents pixelises

Publications (2)

Publication Number Publication Date
CA2329412A1 true CA2329412A1 (fr) 1999-10-28
CA2329412C CA2329412C (fr) 2010-09-21

Family

ID=22051194

Family Applications (1)

Application Number Title Priority Date Filing Date
CA2329412A Expired - Fee Related CA2329412C (fr) 1998-04-21 1999-04-20 Masque elastomere et son utilisation dans la fabrication de dispositifs, dont des afficheurs electroluminescents pixelises

Country Status (4)

Country Link
EP (1) EP1080394A1 (fr)
JP (1) JP2002512124A (fr)
CA (1) CA2329412C (fr)
WO (1) WO1999054786A1 (fr)

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US7282240B1 (en) 1998-04-21 2007-10-16 President And Fellows Of Harvard College Elastomeric mask and use in fabrication of devices
EP1236034A4 (fr) * 1999-11-12 2006-05-03 Surromed Inc Biodetection par resonance plasmonique de surface
US6893850B2 (en) * 2000-03-17 2005-05-17 President And Fellows Of Harvard College Method for cell patterning
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US6645432B1 (en) 2000-05-25 2003-11-11 President & Fellows Of Harvard College Microfluidic systems including three-dimensionally arrayed channel networks
US7323143B2 (en) 2000-05-25 2008-01-29 President And Fellows Of Harvard College Microfluidic systems including three-dimensionally arrayed channel networks
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US7371563B2 (en) 2000-11-08 2008-05-13 Surface Logix, Inc. Peelable and resealable devices for biochemical assays
US6893851B2 (en) 2000-11-08 2005-05-17 Surface Logix, Inc. Method for arraying biomolecules and for monitoring cell motility in real-time
US7439056B2 (en) 2000-11-08 2008-10-21 Surface Logix Inc. Peelable and resealable devices for arraying materials
US6864065B2 (en) 2000-11-08 2005-03-08 Surface Logix, Inc. Assays for monitoring cell motility in real-time
US6967074B2 (en) 2000-11-08 2005-11-22 Surface Logix, Inc. Methods of detecting immobilized biomolecules
US7033819B2 (en) 2000-11-08 2006-04-25 Surface Logix, Inc. System for monitoring cell motility in real-time
US7001740B2 (en) 2000-11-08 2006-02-21 Surface Logix, Inc. Methods of arraying biological materials using peelable and resealable devices
US7033821B2 (en) 2000-11-08 2006-04-25 Surface Logix, Inc. Device for monitoring cell motility in real-time
US6844184B2 (en) 2000-11-08 2005-01-18 Surface Logix, Inc. Device for arraying biomolecules and for monitoring cell motility in real-time
US7351575B2 (en) 2000-11-08 2008-04-01 Surface Logix, Inc. Methods for processing biological materials using peelable and resealable devices
US6803205B2 (en) 2000-11-08 2004-10-12 Surface Logix, Inc. Methods of measuring enzyme activity using peelable and resealable devices
AU2002306862A1 (en) 2001-03-23 2002-11-05 Children's Medical Center Corporation Selective deposition of materials on contoured surfaces
JP4522698B2 (ja) 2001-08-30 2010-08-11 シャープ株式会社 有機ｅｌ装置の製造方法
US6833040B2 (en) 2001-12-19 2004-12-21 Surface Logix Inc. Apparatus and method for handling membranes
US6821348B2 (en) * 2002-02-14 2004-11-23 3M Innovative Properties Company In-line deposition processes for circuit fabrication
US6897164B2 (en) 2002-02-14 2005-05-24 3M Innovative Properties Company Aperture masks for circuit fabrication
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WO2004013922A2 (fr) * 2002-08-06 2004-02-12 Avecia Limited Dispositifs electroniques organiques
NL1022269C2 (nl) 2002-12-24 2004-06-25 Otb Group Bv Werkwijze voor het vervaardigen van een organic electroluminescent display device, substraat ten gebruike bij een dergelijke werkwijze, alsmede een organic electroluminescent display device verkregen met de werkwijze.
US6926840B2 (en) * 2002-12-31 2005-08-09 Eastman Kodak Company Flexible frame for mounting a deposition mask
KR101376715B1 (ko) 2003-12-19 2014-03-27 더 유니버시티 오브 노쓰 캐롤라이나 엣 채플 힐 소프트 또는 임프린트 리소그래피를 이용하여 분리된 마이크로- 및 나노- 구조를 제작하는 방법
DE102004034418B4 (de) * 2004-07-15 2009-06-25 Schott Ag Verfahren zur Herstellung struktuierter optischer Filterschichten auf Substraten
WO2006027830A1 (fr) * 2004-09-08 2006-03-16 Toray Industries, Inc. Dispositif electroluminescent organique et procede de fabrication de celui-ci
US20060128165A1 (en) * 2004-12-13 2006-06-15 3M Innovative Properties Company Method for patterning surface modification
KR20060079957A (ko) * 2005-01-04 2006-07-07 삼성에스디아이 주식회사 포토리소그래피용 연질 포토마스크, 그 제조방법, 이를채용한 패턴 형성 방법
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Also Published As

Publication number Publication date
EP1080394A1 (fr) 2001-03-07
JP2002512124A (ja) 2002-04-23
WO1999054786A1 (fr) 1999-10-28
CA2329412C (fr) 2010-09-21
WO1999054786A9 (fr) 2000-02-03

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Effective date: 20160420