CA2247709A1 - Systeme optique de projection a quatre miroirs pour l'ultraviolet extreme - Google Patents
Systeme optique de projection a quatre miroirs pour l'ultraviolet extreme Download PDFInfo
- Publication number
- CA2247709A1 CA2247709A1 CA002247709A CA2247709A CA2247709A1 CA 2247709 A1 CA2247709 A1 CA 2247709A1 CA 002247709 A CA002247709 A CA 002247709A CA 2247709 A CA2247709 A CA 2247709A CA 2247709 A1 CA2247709 A1 CA 2247709A1
- Authority
- CA
- Canada
- Prior art keywords
- mirror
- concave mirror
- convex mirror
- convex
- conjugate end
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 230000003287 optical effect Effects 0.000 claims abstract description 59
- 238000004519 manufacturing process Methods 0.000 claims abstract description 5
- 239000004065 semiconductor Substances 0.000 claims abstract description 5
- 230000005670 electromagnetic radiation Effects 0.000 claims description 29
- 238000010276 construction Methods 0.000 claims description 4
- 238000000206 photolithography Methods 0.000 abstract description 6
- 235000012431 wafers Nutrition 0.000 abstract 4
- 238000005286 illumination Methods 0.000 description 11
- 230000008901 benefit Effects 0.000 description 5
- 230000004075 alteration Effects 0.000 description 3
- 238000001459 lithography Methods 0.000 description 3
- 238000001393 microlithography Methods 0.000 description 3
- 241000276498 Pollachius virens Species 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
- G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/02—Catoptric systems, e.g. image erecting and reversing system
- G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
- G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
- G02B17/0657—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
Abstract
L'invention est un système optique de projection à zone annulaire à réflexion intégrale pour la photolithographie à balayage utilisée dans la fabrication des plaquettes de semi-conducteur. Ce système de projection optique est conçu pour les longueurs d'onde dans l'ultraviolet extrême allant de 11 à 13 nm et sert à produire des champs d'image courbes pour un système de photolithographie à réduction et à balayage. Ce système optique utilise un ensemble ou une configuration de miroirs montés entre l'extrémité conjuguée longue et l'extrémité conjuguée courte, cet ensemble étant constitué par une suite de miroirs convexe, concave, convexe et concave, avec un diaphragme d'ouverture formé au second miroir convexe ou au voisinage de celui-ci. Cette suite de puissances de miroir permet d'obtenir un champ d'image relativement étendu tout en maintenant la distance entre le réticule et la plaquette inférieure à 900 mm. Le système de projection optique de l'invention produit un champ annulaire instantané pouvant atteindre 50 mm x 2 mm à la plaquette, ce qui permet au balayage de couvrir sur la plaquette un champ d'au moins 50 mm x 50 mm et accroît considérablement le débit. Il peut imprimer des détails mesurant à peine 0,05 micromètre.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/933,272 | 1997-09-18 | ||
US08/933,272 US5956192A (en) | 1997-09-18 | 1997-09-18 | Four mirror EUV projection optics |
Publications (1)
Publication Number | Publication Date |
---|---|
CA2247709A1 true CA2247709A1 (fr) | 1999-03-18 |
Family
ID=25463660
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA002247709A Abandoned CA2247709A1 (fr) | 1997-09-18 | 1998-09-18 | Systeme optique de projection a quatre miroirs pour l'ultraviolet extreme |
Country Status (6)
Country | Link |
---|---|
US (1) | US5956192A (fr) |
EP (1) | EP0903605B1 (fr) |
JP (1) | JP4309980B2 (fr) |
KR (1) | KR100597471B1 (fr) |
CA (1) | CA2247709A1 (fr) |
DE (1) | DE69813126T2 (fr) |
Families Citing this family (40)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW594438B (en) * | 1997-11-07 | 2004-06-21 | Koninkl Philips Electronics Nv | Three-mirror system for lithographic projection, and projection apparatus comprising such a mirror system |
DE10053587A1 (de) | 2000-10-27 | 2002-05-02 | Zeiss Carl | Beleuchtungssystem mit variabler Einstellung der Ausleuchtung |
US6577443B2 (en) | 1998-05-30 | 2003-06-10 | Carl-Zeiss Stiftung | Reduction objective for extreme ultraviolet lithography |
DE19923609A1 (de) * | 1998-05-30 | 1999-12-02 | Zeiss Carl Fa | Ringfeld-4-Spiegelsysteme mit konvexem Primärspiegel für die EUV-Lithographie |
US7151592B2 (en) * | 1999-02-15 | 2006-12-19 | Carl Zeiss Smt Ag | Projection system for EUV lithography |
US6985210B2 (en) * | 1999-02-15 | 2006-01-10 | Carl Zeiss Smt Ag | Projection system for EUV lithography |
USRE42118E1 (en) * | 1999-02-15 | 2011-02-08 | Carl-Zeiss-Smt Ag | Projection system for EUV lithography |
US6033079A (en) | 1999-03-15 | 2000-03-07 | Hudyma; Russell | High numerical aperture ring field projection system for extreme ultraviolet lithography |
US6188513B1 (en) | 1999-03-15 | 2001-02-13 | Russell Hudyma | High numerical aperture ring field projection system for extreme ultraviolet lithography |
JP4717974B2 (ja) * | 1999-07-13 | 2011-07-06 | 株式会社ニコン | 反射屈折光学系及び該光学系を備える投影露光装置 |
JP3770542B2 (ja) | 1999-07-22 | 2006-04-26 | コーニング インコーポレイテッド | 遠紫外軟x線投影リソグラフィー法およびマスク装置 |
EP1093021A3 (fr) | 1999-10-15 | 2004-06-30 | Nikon Corporation | Système d'exposition par projection, ainsi qu'un appareil et des méthodes utilisant ce système |
WO2002044786A2 (fr) * | 2000-11-28 | 2002-06-06 | Carl Zeiss Smt Ag | Systeme de projection catadioptrique pour une lithographie a 157 nm |
TW538256B (en) * | 2000-01-14 | 2003-06-21 | Zeiss Stiftung | Microlithographic reduction projection catadioptric objective |
US6776006B2 (en) | 2000-10-13 | 2004-08-17 | Corning Incorporated | Method to avoid striae in EUV lithography mirrors |
TW573234B (en) | 2000-11-07 | 2004-01-21 | Asml Netherlands Bv | Lithographic projection apparatus and integrated circuit device manufacturing method |
US6558261B1 (en) | 2000-11-15 | 2003-05-06 | Honeywell International Inc. | Actuator drive and display mechanism |
US6829908B2 (en) | 2002-02-27 | 2004-12-14 | Corning Incorporated | Fabrication of inclusion free homogeneous glasses |
US6832493B2 (en) | 2002-02-27 | 2004-12-21 | Corning Incorporated | High purity glass bodies formed by zero shrinkage casting |
US20030235682A1 (en) * | 2002-06-21 | 2003-12-25 | Sogard Michael R. | Method and device for controlling thermal distortion in elements of a lithography system |
US6975385B2 (en) * | 2002-11-08 | 2005-12-13 | Canon Kabushiki Kaisha | Projection optical system and exposure apparatus |
US6853440B1 (en) | 2003-04-04 | 2005-02-08 | Asml Netherlands B.V. | Position correction in Y of mask object shift due to Z offset and non-perpendicular illumination |
US8208198B2 (en) | 2004-01-14 | 2012-06-26 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
US7466489B2 (en) * | 2003-12-15 | 2008-12-16 | Susanne Beder | Projection objective having a high aperture and a planar end surface |
WO2005059645A2 (fr) * | 2003-12-19 | 2005-06-30 | Carl Zeiss Smt Ag | Objectif de projection de microlithographie comprenant des éléments cristallins |
US20080151364A1 (en) | 2004-01-14 | 2008-06-26 | Carl Zeiss Smt Ag | Catadioptric projection objective |
US7463422B2 (en) * | 2004-01-14 | 2008-12-09 | Carl Zeiss Smt Ag | Projection exposure apparatus |
CN102830487A (zh) * | 2004-01-14 | 2012-12-19 | 卡尔蔡司Smt有限责任公司 | 反射折射投影物镜 |
WO2005098504A1 (fr) | 2004-04-08 | 2005-10-20 | Carl Zeiss Smt Ag | Systeme d'imagerie comprenant un groupe de miroirs |
WO2005111689A2 (fr) | 2004-05-17 | 2005-11-24 | Carl Zeiss Smt Ag | Objectif de projection catadioptrique avec images intermediaires |
JP4337648B2 (ja) * | 2004-06-24 | 2009-09-30 | 株式会社ニコン | Euv光源、euv露光装置、及び半導体デバイスの製造方法 |
EP2192446B1 (fr) * | 2005-03-08 | 2011-10-19 | Carl Zeiss SMT GmbH | Système de projection pour microlithographie a diaphragme accessible |
KR101309880B1 (ko) * | 2005-05-13 | 2013-09-17 | 칼 짜이스 에스엠티 게엠베하 | 낮은 입사각을 갖는 육-미러 euv 프로젝션 시스템 |
JP5045429B2 (ja) * | 2007-12-27 | 2012-10-10 | コニカミノルタアドバンストレイヤー株式会社 | 斜め投射光学系 |
JP5294804B2 (ja) * | 2008-10-31 | 2013-09-18 | 三菱電機株式会社 | 光学調整装置 |
DE102009008644A1 (de) * | 2009-02-12 | 2010-11-18 | Carl Zeiss Smt Ag | Abbildende Optik sowie Projektionsbelichtungsanlage für die Mikrolithografie mit einer derartigen abbildenden Optik |
JP4935886B2 (ja) * | 2009-12-10 | 2012-05-23 | 三菱電機株式会社 | 画像読取装置 |
WO2013118615A1 (fr) | 2012-02-06 | 2013-08-15 | 株式会社ニコン | Système optique de formation d'une image réfléchissante, appareil d'exposition et procédé de fabrication d'un dispositif |
CN105589305B (zh) * | 2015-12-21 | 2017-10-03 | 中国科学院长春光学精密机械与物理研究所 | 微缩投影系统波像差检测过程中的视场点定位方法 |
JP2018157503A (ja) * | 2017-03-21 | 2018-10-04 | 富士ゼロックス株式会社 | 読取装置 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3748015A (en) * | 1971-06-21 | 1973-07-24 | Perkin Elmer Corp | Unit power imaging catoptric anastigmat |
US4240707A (en) * | 1978-12-07 | 1980-12-23 | Itek Corporation | All-reflective three element objective |
US4650315A (en) * | 1985-05-10 | 1987-03-17 | The Perkin-Elmer Corporation | Optical lithographic system |
US4733955A (en) * | 1986-04-14 | 1988-03-29 | Hughes Aircraft Company | Reflective optical triplet having a real entrance pupil |
EP0947882B1 (fr) * | 1986-07-11 | 2006-03-29 | Canon Kabushiki Kaisha | Système d'exposition, par projection en réduction, de rayons X, du type réflectif |
US4747678A (en) * | 1986-12-17 | 1988-05-31 | The Perkin-Elmer Corporation | Optical relay system with magnification |
US5063586A (en) * | 1989-10-13 | 1991-11-05 | At&T Bell Laboratories | Apparatus for semiconductor lithography |
US5315629A (en) * | 1990-10-10 | 1994-05-24 | At&T Bell Laboratories | Ringfield lithography |
US5353322A (en) * | 1992-05-05 | 1994-10-04 | Tropel Corporation | Lens system for X-ray projection lithography camera |
US5410434A (en) * | 1993-09-09 | 1995-04-25 | Ultratech Stepper, Inc. | Reflective projection system comprising four spherical mirrors |
US5815310A (en) * | 1995-12-12 | 1998-09-29 | Svg Lithography Systems, Inc. | High numerical aperture ring field optical reduction system |
-
1997
- 1997-09-18 US US08/933,272 patent/US5956192A/en not_active Expired - Fee Related
-
1998
- 1998-09-10 DE DE69813126T patent/DE69813126T2/de not_active Expired - Fee Related
- 1998-09-10 EP EP98117168A patent/EP0903605B1/fr not_active Expired - Lifetime
- 1998-09-16 KR KR1019980038158A patent/KR100597471B1/ko not_active IP Right Cessation
- 1998-09-18 CA CA002247709A patent/CA2247709A1/fr not_active Abandoned
- 1998-09-18 JP JP26493798A patent/JP4309980B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
DE69813126D1 (de) | 2003-05-15 |
KR100597471B1 (ko) | 2006-10-24 |
EP0903605A3 (fr) | 2000-05-17 |
JPH11249313A (ja) | 1999-09-17 |
EP0903605A2 (fr) | 1999-03-24 |
EP0903605B1 (fr) | 2003-04-09 |
DE69813126T2 (de) | 2004-03-04 |
US5956192A (en) | 1999-09-21 |
KR19990029826A (ko) | 1999-04-26 |
JP4309980B2 (ja) | 2009-08-05 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FZDE | Discontinued | ||
FZDE | Discontinued |
Effective date: 20030918 |