CA2062089A1 - Electrolytic cell anode - Google Patents
Electrolytic cell anodeInfo
- Publication number
- CA2062089A1 CA2062089A1 CA002062089A CA2062089A CA2062089A1 CA 2062089 A1 CA2062089 A1 CA 2062089A1 CA 002062089 A CA002062089 A CA 002062089A CA 2062089 A CA2062089 A CA 2062089A CA 2062089 A1 CA2062089 A1 CA 2062089A1
- Authority
- CA
- Canada
- Prior art keywords
- anode
- cell
- cathode
- strips
- configuration
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 239000008151 electrolyte solution Substances 0.000 claims abstract description 4
- 239000003792 electrolyte Substances 0.000 claims description 46
- 229910052751 metal Inorganic materials 0.000 claims description 41
- 239000002184 metal Substances 0.000 claims description 41
- 238000000576 coating method Methods 0.000 claims description 25
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 19
- 239000011248 coating agent Substances 0.000 claims description 19
- 229910052719 titanium Inorganic materials 0.000 claims description 19
- 239000010936 titanium Substances 0.000 claims description 19
- 239000000758 substrate Substances 0.000 claims description 14
- 239000000463 material Substances 0.000 claims description 11
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical group [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 11
- 238000009826 distribution Methods 0.000 claims description 10
- -1 platinum group metal oxides Chemical class 0.000 claims description 6
- 238000007789 sealing Methods 0.000 claims description 6
- 229910052715 tantalum Inorganic materials 0.000 claims description 6
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 6
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 5
- 230000006835 compression Effects 0.000 claims description 5
- 238000007906 compression Methods 0.000 claims description 5
- 229910052726 zirconium Inorganic materials 0.000 claims description 5
- 229910052782 aluminium Inorganic materials 0.000 claims description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 4
- 229910052758 niobium Inorganic materials 0.000 claims description 4
- 239000010955 niobium Substances 0.000 claims description 4
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 4
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 4
- 229910052721 tungsten Inorganic materials 0.000 claims description 4
- 239000010937 tungsten Substances 0.000 claims description 4
- 238000005253 cladding Methods 0.000 claims description 3
- 229910000428 cobalt oxide Inorganic materials 0.000 claims 1
- IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(ii) oxide Chemical compound [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 claims 1
- 239000003989 dielectric material Substances 0.000 claims 1
- SZVJSHCCFOBDDC-UHFFFAOYSA-N iron(II,III) oxide Inorganic materials O=[Fe]O[Fe]O[Fe]=O SZVJSHCCFOBDDC-UHFFFAOYSA-N 0.000 claims 1
- 229910044991 metal oxide Inorganic materials 0.000 claims 1
- 229910052596 spinel Inorganic materials 0.000 claims 1
- 239000011029 spinel Substances 0.000 claims 1
- 229910000859 α-Fe Inorganic materials 0.000 claims 1
- 238000004070 electrodeposition Methods 0.000 description 15
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 14
- 150000002739 metals Chemical class 0.000 description 11
- 238000000034 method Methods 0.000 description 9
- 239000011888 foil Substances 0.000 description 8
- 239000011889 copper foil Substances 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- 230000008569 process Effects 0.000 description 7
- 239000010410 layer Substances 0.000 description 6
- 239000010959 steel Substances 0.000 description 6
- 241000446313 Lamella Species 0.000 description 5
- 229910000831 Steel Inorganic materials 0.000 description 5
- 229910052802 copper Inorganic materials 0.000 description 5
- 239000010949 copper Substances 0.000 description 5
- 239000010408 film Substances 0.000 description 5
- 229910000881 Cu alloy Inorganic materials 0.000 description 4
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 4
- 229920001971 elastomer Polymers 0.000 description 4
- 238000009713 electroplating Methods 0.000 description 4
- 229910052697 platinum Inorganic materials 0.000 description 4
- 125000006850 spacer group Chemical group 0.000 description 4
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 229910052707 ruthenium Inorganic materials 0.000 description 3
- 229920002943 EPDM rubber Polymers 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000004809 Teflon Substances 0.000 description 2
- 229920006362 Teflon® Polymers 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 230000003197 catalytic effect Effects 0.000 description 2
- 238000005363 electrowinning Methods 0.000 description 2
- 229910052741 iridium Inorganic materials 0.000 description 2
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 229910052762 osmium Inorganic materials 0.000 description 2
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 229910052703 rhodium Inorganic materials 0.000 description 2
- 239000010948 rhodium Substances 0.000 description 2
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 2
- 238000005096 rolling process Methods 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- 229910000851 Alloy steel Inorganic materials 0.000 description 1
- 229910000925 Cd alloy Inorganic materials 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 1
- 239000005751 Copper oxide Substances 0.000 description 1
- 229920002449 FKM Polymers 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- 244000043261 Hevea brasiliensis Species 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 229910001128 Sn alloy Inorganic materials 0.000 description 1
- 241000282887 Suidae Species 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 238000007743 anodising Methods 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 229910000431 copper oxide Inorganic materials 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000001962 electrophoresis Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000011152 fibreglass Substances 0.000 description 1
- 229920001973 fluoroelastomer Polymers 0.000 description 1
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- HCDGVLDPFQMKDK-UHFFFAOYSA-N hexafluoropropylene Chemical group FC(F)=C(F)C(F)(F)F HCDGVLDPFQMKDK-UHFFFAOYSA-N 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 229920003052 natural elastomer Polymers 0.000 description 1
- 229920001194 natural rubber Polymers 0.000 description 1
- QELJHCBNGDEXLD-UHFFFAOYSA-N nickel zinc Chemical compound [Ni].[Zn] QELJHCBNGDEXLD-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229920001084 poly(chloroprene) Polymers 0.000 description 1
- 239000003223 protective agent Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 235000011121 sodium hydroxide Nutrition 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 229920001897 terpolymer Polymers 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
- C25C7/00—Constructional parts, or assemblies thereof, of cells; Servicing or operating of cells
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/06—Suspending or supporting devices for articles to be coated
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/10—Electrodes, e.g. composition, counter electrode
- C25D17/12—Shape or form
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrolytic Production Of Metals (AREA)
- Electroplating Methods And Accessories (AREA)
- Bipolar Transistors (AREA)
- Inert Electrodes (AREA)
- Primary Cells (AREA)
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
- Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US67298191A | 1991-03-21 | 1991-03-21 | |
| US07/672,981 | 1991-03-21 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA2062089A1 true CA2062089A1 (en) | 1992-09-22 |
Family
ID=24700825
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA002062089A Abandoned CA2062089A1 (en) | 1991-03-21 | 1992-02-28 | Electrolytic cell anode |
Country Status (7)
| Country | Link |
|---|---|
| EP (1) | EP0504939B1 (enrdf_load_stackoverflow) |
| JP (1) | JPH0647758B2 (enrdf_load_stackoverflow) |
| KR (1) | KR100249115B1 (enrdf_load_stackoverflow) |
| AT (1) | ATE141962T1 (enrdf_load_stackoverflow) |
| CA (1) | CA2062089A1 (enrdf_load_stackoverflow) |
| DE (1) | DE69213060T2 (enrdf_load_stackoverflow) |
| TW (1) | TW197534B (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2005026412A1 (en) * | 2003-09-16 | 2005-03-24 | Global Ionix Inc. | An electrolytic cell for removal of material from a solution |
Families Citing this family (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2714395B1 (fr) * | 1993-12-28 | 1996-04-05 | Lorraine Laminage | Anode soluble pour dispositif d'électrodéposition. |
| JPH07316861A (ja) * | 1994-05-24 | 1995-12-05 | Permelec Electrode Ltd | 電極構造体 |
| JP3606932B2 (ja) * | 1994-12-30 | 2005-01-05 | 石福金属興業株式会社 | 電解用複合電極 |
| TW318320B (enrdf_load_stackoverflow) * | 1995-08-07 | 1997-10-21 | Eltech Systems Corp | |
| WO1998017845A1 (fr) * | 1996-10-24 | 1998-04-30 | Ishifuku Metal Industry Co., Ltd. | Electrolyseur |
| JPH11302900A (ja) * | 1998-04-17 | 1999-11-02 | Ishifuku Metal Ind Co Ltd | 電解装置及びその組立て方法 |
| JP3261582B2 (ja) * | 2000-02-04 | 2002-03-04 | 株式会社三船鉄工所 | 電解銅箔の製造装置 |
| US6585846B1 (en) * | 2000-11-22 | 2003-07-01 | 3M Innovative Properties Company | Rotary converting apparatus and method for laminated products and packaging |
| JP4858666B2 (ja) * | 2001-09-27 | 2012-01-18 | Ｔｄｋ株式会社 | 電極装置 |
| DE10235117B3 (de) * | 2002-08-01 | 2004-02-12 | EISENMANN Maschinenbau KG (Komplementär: Eisenmann-Stiftung) | Anlage zur kataphoretischen Tauchlackierung von Gegenständen |
| JP4038194B2 (ja) * | 2004-03-03 | 2008-01-23 | 野▲崎▼工業株式会社 | 不溶性電極及びそれに使用される電極板並びにその使用方法 |
| DE102004025669A1 (de) * | 2004-05-21 | 2005-12-15 | Diaccon Gmbh | Funktionelle CVD-Diamantschichten auf großflächigen Substraten |
| US7494576B2 (en) * | 2004-08-26 | 2009-02-24 | General Electric Company | Electroplating apparatus and method for making an electroplating anode assembly |
| JP5414257B2 (ja) * | 2008-12-08 | 2014-02-12 | 株式会社昭和 | 電解用電極 |
| EP2623647B1 (en) * | 2010-09-30 | 2021-02-24 | Think Laboratory Co., Ltd. | Cylinder plating method and device |
| CN102321895B (zh) * | 2011-09-01 | 2013-10-23 | 西安航天动力机械厂 | 一种整体式阳极槽 |
| JP7005323B2 (ja) * | 2017-12-08 | 2022-01-21 | 日鉄工材株式会社 | 金属箔製造装置 |
| JP7045840B2 (ja) * | 2017-12-08 | 2022-04-01 | 日鉄工材株式会社 | 金属箔製造装置及び電極板取付体 |
| CN110565138B (zh) * | 2019-09-06 | 2024-07-02 | 陕西汉和新材料科技有限公司 | 一种新型铜箔防氧化槽液下辊机制 |
| WO2022164695A1 (en) * | 2021-02-01 | 2022-08-04 | Lam Research Corporation | Spatially and dimensionally non-uniform channelled plate for tailored hydrodynamics during electroplating |
| CN113529117B (zh) * | 2021-05-31 | 2022-12-06 | 宝鸡钛普锐斯钛阳极科技有限公司 | 一种电化学反应池 |
| KR20230082190A (ko) * | 2021-12-01 | 2023-06-08 | 에이티엑스 주식회사 | 동박 제조장치 |
| CN117926352B (zh) * | 2024-03-19 | 2024-06-14 | 江苏兴虹科技有限公司 | 一种铜箔加工用生箔分切一体设备 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA682872A (en) * | 1964-03-24 | A. Mcneill John | Apparatus for electroplating cylinders | |
| US1881713A (en) * | 1928-12-03 | 1932-10-11 | Arthur K Laukel | Flexible and adjustable anode |
| US3170699A (en) * | 1963-03-25 | 1965-02-23 | Sperry Rand Corp | Manure spreader |
| US4340449A (en) * | 1977-10-11 | 1982-07-20 | Texas Instruments Incorporated | Method for selectively electroplating portions of articles |
| US4318794A (en) * | 1980-11-17 | 1982-03-09 | Edward Adler | Anode for production of electrodeposited foil |
| US5017275A (en) * | 1989-10-23 | 1991-05-21 | Eltech Systems Corporation | Electroplating cell anode |
-
1992
- 1992-02-22 TW TW081101322A patent/TW197534B/zh active
- 1992-02-28 CA CA002062089A patent/CA2062089A1/en not_active Abandoned
- 1992-03-09 JP JP4050796A patent/JPH0647758B2/ja not_active Expired - Fee Related
- 1992-03-20 KR KR1019920004643A patent/KR100249115B1/ko not_active Expired - Fee Related
- 1992-03-20 EP EP92104923A patent/EP0504939B1/en not_active Expired - Lifetime
- 1992-03-20 AT AT92104923T patent/ATE141962T1/de not_active IP Right Cessation
- 1992-03-20 DE DE69213060T patent/DE69213060T2/de not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2005026412A1 (en) * | 2003-09-16 | 2005-03-24 | Global Ionix Inc. | An electrolytic cell for removal of material from a solution |
Also Published As
| Publication number | Publication date |
|---|---|
| ATE141962T1 (de) | 1996-09-15 |
| KR100249115B1 (ko) | 2000-04-01 |
| EP0504939A2 (en) | 1992-09-23 |
| EP0504939B1 (en) | 1996-08-28 |
| KR920018247A (ko) | 1992-10-21 |
| JPH0647758B2 (ja) | 1994-06-22 |
| TW197534B (enrdf_load_stackoverflow) | 1993-01-01 |
| JPH04346697A (ja) | 1992-12-02 |
| DE69213060D1 (de) | 1996-10-02 |
| DE69213060T2 (de) | 1997-01-23 |
| EP0504939A3 (en) | 1993-03-17 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EEER | Examination request | ||
| FZDE | Discontinued |