CA2012718A1 - Dispersion colloodale aqueuse de silice fumee sans stabilisant - Google Patents
Dispersion colloodale aqueuse de silice fumee sans stabilisantInfo
- Publication number
- CA2012718A1 CA2012718A1 CA2012718A CA2012718A CA2012718A1 CA 2012718 A1 CA2012718 A1 CA 2012718A1 CA 2012718 A CA2012718 A CA 2012718A CA 2012718 A CA2012718 A CA 2012718A CA 2012718 A1 CA2012718 A1 CA 2012718A1
- Authority
- CA
- Canada
- Prior art keywords
- fumed silica
- aqueous colloidal
- colloidal dispersion
- stabilizer
- amount
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title abstract 8
- 229910021485 fumed silica Inorganic materials 0.000 title abstract 8
- 238000001246 colloidal dispersion Methods 0.000 title abstract 4
- 239000003381 stabilizer Substances 0.000 title abstract 2
- 239000000203 mixture Substances 0.000 abstract 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 2
- 239000003513 alkali Substances 0.000 abstract 1
- 238000007865 diluting Methods 0.000 abstract 1
- 239000006185 dispersion Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
- C01B33/141—Preparation of hydrosols or aqueous dispersions
- C01B33/1415—Preparation of hydrosols or aqueous dispersions by suspending finely divided silica in water
- C01B33/1417—Preparation of hydrosols or aqueous dispersions by suspending finely divided silica in water an aqueous dispersion being obtained
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
- C03C1/006—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Dispersion Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Silicon Compounds (AREA)
- Colloid Chemistry (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US326,891 | 1989-03-21 | ||
US07/326,891 US5116535A (en) | 1989-03-21 | 1989-03-21 | Aqueous colloidal dispersion of fumed silica without a stabilizer |
Publications (2)
Publication Number | Publication Date |
---|---|
CA2012718A1 true CA2012718A1 (fr) | 1990-09-21 |
CA2012718C CA2012718C (fr) | 1996-12-03 |
Family
ID=23274180
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA002012718A Expired - Lifetime CA2012718C (fr) | 1989-03-21 | 1990-03-21 | Dispersion colloodale aqueuse de silice fumee sans stabilisant |
Country Status (13)
Country | Link |
---|---|
US (1) | US5116535A (fr) |
JP (1) | JP2935125B2 (fr) |
KR (1) | KR0145729B1 (fr) |
CN (1) | CN1028166C (fr) |
AU (1) | AU631847B2 (fr) |
BE (1) | BE1002932A5 (fr) |
BR (1) | BR9001239A (fr) |
CA (1) | CA2012718C (fr) |
DE (1) | DE4006393A1 (fr) |
FR (1) | FR2644769B1 (fr) |
GB (1) | GB2229715B (fr) |
IT (1) | IT1241073B (fr) |
MY (1) | MY116453A (fr) |
Families Citing this family (35)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6546939B1 (en) | 1990-11-05 | 2003-04-15 | Ekc Technology, Inc. | Post clean treatment |
FR2693451B1 (fr) * | 1992-07-07 | 1994-08-19 | Alcatel Nv | Procédé de fabrication d'une poudre de silice et application d'une telle poudre à la réalisation d'une préforme pour fibre optique. |
US5888587A (en) * | 1992-07-07 | 1999-03-30 | Alcatel N.V. | Method of manufacturing silica powder and use of such powder in making an optical fiber preform |
IL107932A0 (en) * | 1992-12-08 | 1994-04-12 | Miroevski Piotr Ravilevich | Method and apparatus for producing a silicon based binding composition and product prepared therefrom |
EP0727478A3 (fr) * | 1995-02-14 | 1997-06-25 | Toyota Motor Co Ltd | Composition dilatante |
US6343490B1 (en) * | 1996-05-14 | 2002-02-05 | Lucent Technologies, Inc. | Processing entailing sol-gel fabrication of silica glass |
DE69705258T2 (de) * | 1996-05-14 | 2002-04-11 | Lucent Technologies Inc., Murray Hill | Sol-Gel Verfahren zur Herstellung von Silica-Glas |
KR100510815B1 (ko) * | 1997-05-07 | 2005-10-24 | 제이에스알 가부시끼가이샤 | 무기입자의 수성분산체 및 그의 제조방법 |
KR19990023544A (ko) * | 1997-08-19 | 1999-03-25 | 마쯔모또 에이찌 | 무기 입자의 수성 분산체와 그의 제조 방법 |
US6036873A (en) * | 1997-11-26 | 2000-03-14 | Eastman Kodak Company | Process for generating precision polished non-plannar aspherical surfaces |
JP4704564B2 (ja) | 1998-10-02 | 2011-06-15 | キャボット コーポレイション | シリカ分散体、コーティング組成物、及び記録媒体 |
JP4428473B2 (ja) | 1999-01-18 | 2010-03-10 | 株式会社東芝 | 気相法無機酸化物粒子の含水固体状物質及び研磨用スラリーの製造方法 |
JP3721497B2 (ja) * | 1999-07-15 | 2005-11-30 | 株式会社フジミインコーポレーテッド | 研磨用組成物の製造方法 |
DE19936478A1 (de) * | 1999-08-03 | 2001-02-15 | Degussa | Sinterwerkstoffe |
EP1148026B1 (fr) * | 2000-04-12 | 2016-08-10 | Evonik Degussa GmbH | Dispersions |
US6679945B2 (en) | 2000-08-21 | 2004-01-20 | Degussa Ag | Pyrogenically prepared silicon dioxide |
EP1182168B1 (fr) * | 2000-08-21 | 2004-05-12 | Degussa AG | Dioxyde de silicium pyrogéniquement préparé |
US6638982B2 (en) * | 2000-11-15 | 2003-10-28 | Cabot Corporation | Method of preparing a fumed metal oxide dispersion |
US6571582B2 (en) * | 2001-04-19 | 2003-06-03 | Fitel Usa Corp. | Manufacture of silica bodies using sol-gel techniques |
WO2004005189A1 (fr) * | 2002-07-10 | 2004-01-15 | Lanewood Inc. | Dispersion aqueuse stable de microsilice |
US20040094026A1 (en) * | 2002-11-19 | 2004-05-20 | Integrity Testing Laboratory Inc. | Method of making a protective material and articles made therefrom |
JP4426192B2 (ja) * | 2003-02-14 | 2010-03-03 | ニッタ・ハース株式会社 | 研磨用組成物の製造方法 |
CN1798858B (zh) * | 2003-04-02 | 2010-06-16 | 西北大学 | 控制纳米颗粒生长的方法 |
JP2005286047A (ja) * | 2004-03-29 | 2005-10-13 | Nitta Haas Inc | 半導体研磨用組成物 |
JP2005286048A (ja) * | 2004-03-29 | 2005-10-13 | Nitta Haas Inc | 半導体研磨用組成物 |
GB0407198D0 (en) * | 2004-03-30 | 2004-05-05 | British Telecomm | Joint fault detection |
DE602005023557D1 (de) | 2004-04-12 | 2010-10-28 | Jsr Corp | Wässrige Dispersion zum chemisch-mechanischen Polieren und chemisch-mechanisches Polierverfahren |
WO2005108294A2 (fr) * | 2004-05-04 | 2005-11-17 | Cabot Corporation | Procede de preparation d'une dispersion de particules agregees d'oxydes de metaux qui possede un diametre desire des particules agregees |
DE102004054392A1 (de) * | 2004-08-28 | 2006-03-02 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zum Verbinden von Bauteilen aus hochkieselsäurehaltigem Werkstoff, sowie aus derartigen Bauteilen zusammengefügter Bauteil-Verbund |
KR100497413B1 (ko) * | 2004-11-26 | 2005-06-23 | 에이스하이텍 주식회사 | 텅스텐-화학적 기계적 연마에 유용한 슬러리 및 그 제조방법 |
US20070209288A1 (en) * | 2005-03-28 | 2007-09-13 | Yoshiharu Ohta | Semiconductor Polishing Composition |
DE102006002545A1 (de) * | 2006-01-18 | 2007-07-19 | Ewald Dörken Ag | Siliziumbasiertes Korrosionsschutzmittel |
US7989506B2 (en) * | 2007-04-04 | 2011-08-02 | Eastman Kodak Company | Method and apparatus for dispersion of high-surface-area, low-bulk-density fumed silica |
KR101673692B1 (ko) * | 2014-11-07 | 2016-11-07 | 현대자동차주식회사 | 건식 실리카 입자를 포함하는 상변이 현탁 유체 조성물 및 이의 제조방법 |
CN109942002B (zh) * | 2017-12-20 | 2020-08-28 | 中国地质大学(北京) | 一种生产氧化锆的副产物硅灰中二氧化硅微球解聚方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2884629A (en) * | 1945-11-29 | 1959-04-28 | Samuel J Mason | Metal-plate lens microwave antenna |
US2984629A (en) * | 1957-11-04 | 1961-05-16 | Cabot Corp | Aqueous dispersions of pyrogenic silica |
DE1667460B1 (de) * | 1967-10-12 | 1971-07-08 | Degussa | Verfahren zur herstellung stabiler dispersionen von pyrogen gewonnener kieselsaeure |
GB1326574A (en) * | 1970-10-30 | 1973-08-15 | Degussa | Production of stabilised dispersions of pyrogenic silica |
FR2094790A5 (fr) * | 1970-11-24 | 1972-02-04 | Degussa | Procede pour la preparation de dispersions aqueuses stables de dioxydes de silicium par voie ignee |
US4042361A (en) * | 1976-04-26 | 1977-08-16 | Corning Glass Works | Method of densifying metal oxides |
US4200445A (en) * | 1977-04-28 | 1980-04-29 | Corning Glass Works | Method of densifying metal oxides |
US4321243A (en) * | 1980-08-05 | 1982-03-23 | Cornwell Charles E | Method of producing stabilized aqueous dispersions of silica fume |
US4613454A (en) * | 1983-06-30 | 1986-09-23 | Nalco Chemical Company | Metal oxide/silica sols |
JPS60129132A (ja) * | 1983-12-14 | 1985-07-10 | Denki Kagaku Kogyo Kk | シリカヒユ−ム水分散体の製法 |
-
1989
- 1989-03-21 US US07/326,891 patent/US5116535A/en not_active Expired - Lifetime
-
1990
- 1990-02-28 CN CN90101086A patent/CN1028166C/zh not_active Expired - Lifetime
- 1990-03-01 DE DE4006393A patent/DE4006393A1/de not_active Ceased
- 1990-03-15 BR BR909001239A patent/BR9001239A/pt not_active IP Right Cessation
- 1990-03-19 GB GB9006121A patent/GB2229715B/en not_active Expired - Fee Related
- 1990-03-20 FR FR9003558A patent/FR2644769B1/fr not_active Expired - Fee Related
- 1990-03-20 JP JP2068569A patent/JP2935125B2/ja not_active Expired - Fee Related
- 1990-03-20 KR KR1019900003706A patent/KR0145729B1/ko not_active IP Right Cessation
- 1990-03-21 IT IT19747A patent/IT1241073B/it active IP Right Grant
- 1990-03-21 MY MYPI90000448A patent/MY116453A/en unknown
- 1990-03-21 AU AU52009/90A patent/AU631847B2/en not_active Ceased
- 1990-03-21 CA CA002012718A patent/CA2012718C/fr not_active Expired - Lifetime
- 1990-03-21 BE BE9000320A patent/BE1002932A5/fr not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
AU5200990A (en) | 1990-09-27 |
DE4006393A1 (de) | 1990-09-27 |
FR2644769A1 (fr) | 1990-09-28 |
AU631847B2 (en) | 1992-12-10 |
GB9006121D0 (en) | 1990-05-16 |
KR0145729B1 (ko) | 1998-08-17 |
US5116535A (en) | 1992-05-26 |
FR2644769B1 (fr) | 1994-02-04 |
MY116453A (en) | 2004-02-28 |
IT9019747A1 (it) | 1991-09-21 |
CN1045753A (zh) | 1990-10-03 |
CN1028166C (zh) | 1995-04-12 |
GB2229715A (en) | 1990-10-03 |
IT1241073B (it) | 1993-12-29 |
KR900014249A (ko) | 1990-10-23 |
JP2935125B2 (ja) | 1999-08-16 |
BR9001239A (pt) | 1991-03-26 |
IT9019747A0 (it) | 1990-03-21 |
CA2012718C (fr) | 1996-12-03 |
GB2229715B (en) | 1992-10-14 |
JPH0350112A (ja) | 1991-03-04 |
BE1002932A5 (fr) | 1991-08-27 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
EEER | Examination request | ||
MKLA | Lapsed | ||
MKEC | Expiry (correction) |
Effective date: 20121202 |