CA1307759C - Vacuum processing apparatus - Google Patents

Vacuum processing apparatus

Info

Publication number
CA1307759C
CA1307759C CA000500743A CA500743A CA1307759C CA 1307759 C CA1307759 C CA 1307759C CA 000500743 A CA000500743 A CA 000500743A CA 500743 A CA500743 A CA 500743A CA 1307759 C CA1307759 C CA 1307759C
Authority
CA
Canada
Prior art keywords
chamber
conveyor
workpiece
transporting
processing apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
CA000500743A
Other languages
French (fr)
Inventor
Walter G. Overacker
Alex Boozenny
Albany D. Grubb
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Linde LLC
Original Assignee
BOC Group Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BOC Group Inc filed Critical BOC Group Inc
Application granted granted Critical
Publication of CA1307759C publication Critical patent/CA1307759C/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G5/00Storing fluids in natural or artificial cavities or chambers in the earth
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67748Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber horizontal transfer of a single workpiece
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568Transferring the substrates through a series of coating stations

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Geology (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

ABSTRACT OF THE DISCLOSURE
A method and an apparatus for transporting workpieces into and out of a single-ended vacuum processing apparatus is disclosed. The apparatus includes a processing chamber and a second chamber which contains a workpiece transporting device comprising two conveyors on a common frame and a means for aligning the frame and each conveyor to transfer workpieces in opposite directions through the second chamber. The second chamber may be an end lock with access to the outside or an intermediate lock or holding chamber between the processing chamber and an end lock. Preferably, the conveyors comprise two parallel sets of horizontal rollers and an elevator for selectively aligning each set of rollers with a pass line along which workpieces are transferred between an end lock and a holding chamber and between a holding chamber and a processing chamber.

Description

VACUUM PROCESSING APPARATUS

BACKGROUND OF THE INVENTION
The invention is in the field of transporting workpieces into and out of a vacuum processing apparatus.
The time required to transport workpieces into and out of vacuum apparatus and to pump down to a suitable pressure is frequently a limiting factor in the rate at which workpieces can be processed. This is particularly true in high rate deposition processes where the coating time for an individual substrate is sometimes short compared to the time required to sufficiently evacuate the coating chamber. Coating apparatus has been developed where workpieces or substrates are passed through separate VACUUm locks on their way into and out of a coating or processing chamber. This increases the production rate because the volume oL tle lock can be minimized and processing can continue for successive substrates without exposure of the processing cllamber to atmospheric pressure.
U.S. Patent 3,945,903 to Svendor et al discloses a vacuun coating system comprising entrance and exit locks and roller conveyors for transporting glass sheets through the system.
In certain situations, the expense of a complete double-ended system with a vacuum lock at the both the entrance ~' and exit of the coating chamber is not warranted; An alternative is to provide a single lock and a reversible conveyor so that workpieces can enter and leave the processing chamber via the same lock. Such a system is called single-ended coater. U.S. Patent 4,405,435 to Tateishi et al discloses a single-ended vacuum coating system having multi-level workpiece cassettes and cassette elevators in both the lock and an intermediate chamber between the lock and the sputter coating chamber.

SUMMARY OF THE INVENTION
The invention is a method and an apparatus for transporting workpieces into and out of a single-ended vacuum processing apparatus. The apparatus includes a processing chamber and a second chamber which contains a workpiece transporting device comprising two conveyors on a common frame and a means for aligning the frame and each conveyor to transfer workpieces in opposite directions through the second chamber. The second chamber may be an end lock with access to the outside or an intermediate lock or holding chamber between the processing chamber and an end lock. Preferably, the conveyors comprise two parallel sets of horizontal rollers and an elevator for selectively aligning each set of rollers with a pass line along which workpieces are transferred between an end lock and a holding chamber and between a holding chamber and a processing chamber.

( BRIEF DESCRIPTION OF THE-DRAWINGS
Figure 1 is a schematic representation of a side view of a vacuum coating apparatus incorporating the invention.
Figure 2 is a side view, partially in cross-section, of a holding chamber incorporating a two-level workpiece transporting device according to the invention.
Figure 3a is a plan view of the holding chamber and workpiece transporting device of Fig. 2.
Figure 3b is an end view, partially in cross section, of the holding chamber and workpiece transporting device of Figure 2.
Figure 4 is a schematic view of a vacuum processing system comprising a processing chaober, a holding chamber and a vacuum lock which illustrates the method according to the invention.

DESCRIPTION OF THE PREFERRED EMBODIMENT
Figure 1 illustrates a single-ended vacuum processing apparatus comprising a processing chamber 10, a holding chamber 16, and a lock chamber 18. The vacuum process may be a coatin~
process in whic~ workpieces are transported from an entry buffer 12, passed a number of sputter coating sources 11 in the processing chamber and into an overrun buffer 14. The workpieces may be transported back and forth through the processing cl~amber 10 as required.

The processing area of the apparatus is separated from the holding chamber 16 by a first internal gate valve 20 which may be opened or closed as desired by an actuator 22. The holding chamber 16 and the lock 18 are interconnected by a second internal gate valve 24 activated by an actuator 26.
Access to the lock 18 from a workpiece loading and unloading area 19 is by a external gate valve 28 operable by an actuator 29. The gate valves and actuator may be of conventional design suitable for transferring workpieces of the desired size and shape. One such gate valve is shown in U.S. Patent 4,065,097 to Timin.
Each of the chambers of the processing apparatus is separately evacuable by conventional means. Lock 18 is evacuable by a blower or other mechanical pump 32. For sputtering or electron beam heated coating processes, holding chamber 16 and the processing chamber 10 are preferably evacuable by diffusion pumps 30. Processing chamber 10 may be provided with a source 34 of a desired sputtering gas.
Each chamber of the vacuum processing apparatus is provided with a conveyor for supporting and transporting workpieces. For glass sheets and similar substrates, each conveyor preferably comprises a series of parallel, horizontal rollers 42 mounted on a frame 44 and driven by a reversible motor 46. Preferably the conveyors in the separate chambers are aligned to pass substrates into and out of the apparatus along a pass line 48.

In the preferred apparatus, the holding chamber 16 is provided with a multi-level transporting device 50 which moves vertically and which includes two horizontal conveyors 52 and 54 mounted one above the other on a common frame 60. As shown in Figures 2, 3a and 3b, the frame 60 comprises two parallel upper longitudinal members 62, interconnected by a number of cross members 63, and two parallel lower longitudinal members 64, interconnected by a like number of cross members 65 aligned directly below the upper members. The upper and lower members are connected by a number of uprights 66.
When frame 60 is in its lower position (shown in Figs.
2 and 3b) it rests on legs 68 which are adjustable as necessary to ensure that the frame rests level on the bottom wall 17 of holding chamber 16. Additional legs and additional cross members between the side members may be provided as necessary depending upon the length of the workpiece transporting device.
In Figures 2, 3a and 3b, the upper conveyor 52 of device 50 is aligned with the pass line 48. An elevator is provided in order to raise the frame 60 so that lower conveyor 54 is at the pass line. As shown, the elevator comprises four ball screw jacks 70 wl~ich extend externally of the chamber 16 through vacuum seal assemblies 71 in the bottom wall 17. Each jack is provided with an oiler 75 to lubricate the seal assembly. Alternatively, the elevator may comprise hydraulic or pneumatic cylinders.

Vertical motion of the transporting device 50 is guided by four lateral guide wheels 72, two of w~lich are attached to the external face of each lower longitudinal member 64. The wheels roll along upper 73 and lower 74 bar ways mounted on opposite side walls of chamber 16. The motion of the device 50 is also guided by a longitudinal guide wheel 76 mounted on an axle 77 perpendicular to one of the lower longitudinal members 64. Wheel 76 rolls between two upper ways 78 and two lower ways 79 mounted on one side wall 15 of chamber 16. The upper and lower ways for guide wheels 72 and 76 are aligned so that the device 50 is properly aligned in its raised and lowered positions, respectively.
A number of rollers 80 are mounted for rotation in bearing blocks ~2 aligned along side rails ~2 (the blocks 82 are omitted from Fig. 2). One end of the axle 83 of each roller is fitted with two pulleys 84 and 85. As shown in Fig.
3a, corresponding pulleys of adjacent rollers are interconnected by belts 86 which ensure that the rollers turn simultaneously in the same direction.
The axle of one roller of whichever conveyor is at the pass line is coupled by a magnetic means 90, 92 to shaft 94 which extends through a rotary seal in side wall 15. The rotating shaft is driven by a reversible motor 95 outside chamber 16.
Figure 4 illustrates t'ne method of tne invention.
Eac'n part of the figure illustrates a processing chamber 100, a holding cl~amber 16 and a lock 18; The processing chamber may comprise entry and overrun buffers. Processing chamber 100 and holding chamber 16 are interconnected by a first gate valve 20. Processing chamber 16 and lock 18 are interconnected by a second gate valve 24. Workpiece access to lock 18 is provided by a third gate valve 28. Processing chamber 100 contains a first conveyor 101 and the lock 18 contains a second conveyor 102. As previously described, holding chamber 16 contains a workpiece transporting device 50 having two conveyors, upper level 52 and lower 54, and an elevator for aligning each conveyor with the pass line 48 through the vacuum processing apparatus.
In Figure 4a, valves 20 and 24 are closed. One workpiece 110 is undergoing processing in chamber 100 and an unprocessed workpiece 112 is waiting on the lower level 54 of the transporting device 50 in holding chamber 16. Since valves 20 and 24 are closed, chamber 16 may be evacuated by a diffusion pump and the pressure in the processing chamber 100 may be independently established, as desired. Valve 28 is open in order that a second unprocessed workpiece 114 may be transported from conveyor 104 in the loading and unloading area onto conveyor 102 inside the lock as illustrated in Fig. 4b.
Valve 28 may then ~e closed and lock 18 evacuated by a roughing pump.

1 30775q Transporting device 50 is aligned so that the vacant conveyor 52 is at the pass line. When processing of workpiece 110 is completed, valve 20 is opened and workpiece 110 is transported onto the vacant upper conveyor 52. The transporting device 50 then moves upward so that the lower conveyor 54 is at the pass line, as shown in Fig. 4c, and the unprocessed workpiece 112 is transported onto the conveyor 101 in the processing chamber. Valve 20 i6 closed so that processing of workpiece 112 may proceed. Valves 24 and 28 remain closed so that rough pumping of lock 18 continues.
As illustrated in Fig. 4d, valve 24 is opened and unprocessed workpiece 114 is transported into holding chamber 1~ onto the lower conveyor 54 of device 50. Then device 50 is moved down so that the upper conveyor 52 is aligned at the pass line, as shown in Fi~. 4e, and processed workpiece 110 is transported through valve 24 onto conveyor 102 in lock 18, as shown in Fig. 4f. When this has been completed, valve 24 is closed. Valve 20 remains closed so that processing of workpiece 112 continues in chamber 100. Lock 18 is vented and gate valve 28 opened to enable the transfer of processed workpiece 110 out of lock 18 onto conveyor 104. Valves 24 and 20 are closed so that the pumping of holding chamber 16 and the processing in chamber 100 to continue. The processed workpiece 110 is unloaded from conveyor 104 and replaced with an unprocessed workpiece and the the cycle continues, starting again with Fig. 4a.

1 30775q Use of a holding chamber can reduce gas bursts into the processing chamber when gate 20 is opened and enables pumping of lock 16 except for the time required to transport workpieces through gate 28 as indicated in Figs. 4a and 4f.
Efficient utilization of the processing equipment is ensured because processing may be continued except for the short time required to transfer workpieces between processing chamber 100 and holding chamber 16 as indicated in Figs. 4b and 4c.
As described in connection with Fig. 4, processed workpieces were placed on upper conveyor 52 and unprocessed workpieces were placed on lower conveyor 54. If falling debris is a problem, it may be preferable to modify the method so that processed workpieces are placed on the lower conveyor 54 below the unprocessed workpieces.
Various other modifications to the method and apparatus may be made without departing from the spirit of the invention which is defined by the following claims.

Claims (8)

1. A vacuum processing apparatus comprising:
first and second evacuable chambers;
a first gate valve interconnecting the first and second chambers;
a second gate valve for providing access to the second chamber;
a first workpiece conveyor in the first chamber;
a second workpiece conveyor outside the first and second chambers;
a workpiece transporting device in the second chamber comprising third and fourth workpiece conveyors supported on a common frame; and means for selectively aligning the frame and each of the third and fourth conveyors to transfer workpieces between the first and second chambers when the first gate valve is open and between the second chamber and the second conveyor when the second gate valve is open.
2. The vacuum processing apparatus of claim 1 further comprising a third evacuable chamber and wherein the second gate valve interconnects the second and third chambers.
3. The vacuum processing apparatus of claim 1 wherein the third and fourth conveyors are parallel.
4. The vacuum processing apparatus of claim 3 wherein each conveyor comprises a number of parallel, substantially horizontal rollers and a means for simultaneously turning the rollers.
5. The vacuum processing apparatus of claim 4 wherein the third and fourth conveyors are supported one above the other, and the conveyor aligning means comprises an elevator for moving the frame in a vertical direction.
6. The vacuum processing apparatus of claim 5 wherein the workpiece transporting device further comprises wheels mounted on the frame for guiding the movement of the frame.
7. A method for transporting workpieces into and out of a vacuum processing apparatus comprising:
processing a workpiece;
transporting the processed workpiece from a first conveyor in a first chamber to a first level of a multi-level conveyor in a second chamber;
aligning the second level of the multi-level conveyor with the first conveyor;
transporting a first unprocessed workpiece from the second level onto the first conveyor, then sealing the first chamber from the second chamber;
transporting a second unprocessed workpiece from a second conveyor outside the second chamber onto the second level;

aligning the first level with the second conveyor;
transporting the processed workpiece from the first level to the second conveyor; and sealing the second chamber.
8. The method according to claim 7 wherein the second conveyor is inside a third sealable chamber and further comprising:
transporting each processed workpiece out of the apparatus from the second conveyor;
transporting each unprocessed workpiece from outside the apparatus into the third chamber onto the second conveyor;
and sealing and evacuating the third chamber.
CA000500743A 1985-01-31 1986-01-30 Vacuum processing apparatus Expired - Lifetime CA1307759C (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US69683685A 1985-01-31 1985-01-31
US696,836 1985-01-31

Publications (1)

Publication Number Publication Date
CA1307759C true CA1307759C (en) 1992-09-22

Family

ID=24798750

Family Applications (1)

Application Number Title Priority Date Filing Date
CA000500743A Expired - Lifetime CA1307759C (en) 1985-01-31 1986-01-30 Vacuum processing apparatus

Country Status (5)

Country Link
JP (1) JPS61206722A (en)
KR (1) KR950003597B1 (en)
AU (1) AU572375B2 (en)
CA (1) CA1307759C (en)
GB (1) GB2171119B (en)

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US4676884A (en) * 1986-07-23 1987-06-30 The Boc Group, Inc. Wafer processing machine with evacuated wafer transporting and storage system
DE3827343A1 (en) * 1988-08-12 1990-02-15 Leybold Ag DEVICE ACCORDING TO THE CAROUSEL PRINCIPLE FOR COATING SUBSTRATES
DE3731444A1 (en) * 1987-09-18 1989-03-30 Leybold Ag DEVICE FOR COATING SUBSTRATES
DE4111384C2 (en) * 1991-04-09 1999-11-04 Leybold Ag Device for coating substrates
US5215420A (en) * 1991-09-20 1993-06-01 Intevac, Inc. Substrate handling and processing system
US5275709A (en) * 1991-11-07 1994-01-04 Leybold Aktiengesellschaft Apparatus for coating substrates, preferably flat, more or less plate-like substrates
DE4303462C2 (en) * 1992-03-30 1994-03-31 Leybold Ag Multi-chamber coating system
DE19500964A1 (en) * 1995-01-14 1996-07-18 Leybold Ag Cathode sputtering appts. for coating flat substrates, esp. optical components
KR100269097B1 (en) * 1996-08-05 2000-12-01 엔도 마코토 Wafer process apparatus
US6053687A (en) * 1997-09-05 2000-04-25 Applied Materials, Inc. Cost effective modular-linear wafer processing
US6235634B1 (en) 1997-10-08 2001-05-22 Applied Komatsu Technology, Inc. Modular substrate processing system
US6000905A (en) * 1998-03-13 1999-12-14 Toro-Lira; Guillermo L. High speed in-vacuum flat panel display handler
US6213704B1 (en) * 1998-05-20 2001-04-10 Applied Komatsu Technology, Inc. Method and apparatus for substrate transfer and processing
US6517303B1 (en) 1998-05-20 2003-02-11 Applied Komatsu Technology, Inc. Substrate transfer shuttle
US6206176B1 (en) 1998-05-20 2001-03-27 Applied Komatsu Technology, Inc. Substrate transfer shuttle having a magnetic drive
US6217272B1 (en) 1998-10-01 2001-04-17 Applied Science And Technology, Inc. In-line sputter deposition system
TWI294632B (en) 2000-06-27 2008-03-11 Ebara Corp Inspecting device using an electron ebam and method for making semiconductor devices with such inspection device
US6821912B2 (en) 2000-07-27 2004-11-23 Nexx Systems Packaging, Llc Substrate processing pallet and related substrate processing method and machine
US6682288B2 (en) 2000-07-27 2004-01-27 Nexx Systems Packaging, Llc Substrate processing pallet and related substrate processing method and machine
US6530733B2 (en) 2000-07-27 2003-03-11 Nexx Systems Packaging, Llc Substrate processing pallet and related substrate processing method and machine
JP3943022B2 (en) 2000-12-01 2007-07-11 株式会社荏原製作所 Board inspection equipment
ES2316892T3 (en) * 2004-03-31 2009-04-16 APPLIED MATERIALS GMBH & CO. KG CLOSURE PROVISION FOR A VACUUM TREATMENT INSTALLATION AND PROCEDURE FOR OPERATION.
EP1870487B1 (en) * 2006-06-22 2009-07-29 Applied Materials GmbH & Co. KG Vaccum coating apparatus
EP1956111B1 (en) 2007-02-09 2010-09-08 Applied Materials, Inc. Apparatus with a transport device for processing substrates
ATE555496T1 (en) 2007-03-13 2012-05-15 Applied Materials Inc DEVICE FOR MOVING A CARRIER IN A VACUUM CHAMBER
DE102007058052B4 (en) * 2007-11-30 2013-12-05 Von Ardenne Anlagentechnik Gmbh Vacuum coating system
CN102152031A (en) * 2011-01-26 2011-08-17 阮俊康 Automatic welding production line of lighter
CN113584453B (en) * 2021-07-22 2023-01-17 深圳天成真空技术有限公司 Magnetic force driven vacuum coating conveying device and conveying method

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US3945903A (en) * 1974-08-28 1976-03-23 Shatterproof Glass Corporation Sputter-coating of glass sheets or other substrates
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Also Published As

Publication number Publication date
GB8601905D0 (en) 1986-03-05
AU572375B2 (en) 1988-05-05
JPH0336735B2 (en) 1991-06-03
GB2171119A (en) 1986-08-20
GB2171119B (en) 1989-01-18
JPS61206722A (en) 1986-09-13
KR950003597B1 (en) 1995-04-14
KR860005739A (en) 1986-08-11
AU5253786A (en) 1986-08-28

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