CA1279561C - Solvents pour l'enlevement d'agents photoresistants - Google Patents

Solvents pour l'enlevement d'agents photoresistants

Info

Publication number
CA1279561C
CA1279561C CA000520952A CA520952A CA1279561C CA 1279561 C CA1279561 C CA 1279561C CA 000520952 A CA000520952 A CA 000520952A CA 520952 A CA520952 A CA 520952A CA 1279561 C CA1279561 C CA 1279561C
Authority
CA
Canada
Prior art keywords
water
weight
soluble
agent
propylene glycol
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CA000520952A
Other languages
English (en)
Inventor
Hans-Joachim Merrem
Axel Schmitt
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoechst AG
Original Assignee
Hoechst AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst AG filed Critical Hoechst AG
Priority to CA000520952A priority Critical patent/CA1279561C/fr
Application granted granted Critical
Publication of CA1279561C publication Critical patent/CA1279561C/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
CA000520952A 1985-10-22 1986-10-21 Solvents pour l'enlevement d'agents photoresistants Expired - Fee Related CA1279561C (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CA000520952A CA1279561C (fr) 1985-10-22 1986-10-21 Solvents pour l'enlevement d'agents photoresistants

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DEP3537441.1 1985-10-22
CA000520952A CA1279561C (fr) 1985-10-22 1986-10-21 Solvents pour l'enlevement d'agents photoresistants

Publications (1)

Publication Number Publication Date
CA1279561C true CA1279561C (fr) 1991-01-29

Family

ID=4134184

Family Applications (1)

Application Number Title Priority Date Filing Date
CA000520952A Expired - Fee Related CA1279561C (fr) 1985-10-22 1986-10-21 Solvents pour l'enlevement d'agents photoresistants

Country Status (1)

Country Link
CA (1) CA1279561C (fr)

Similar Documents

Publication Publication Date Title
US4765844A (en) Solvents for photoresist removal
JP2502815B2 (ja) フォトレジスト・ストリッパ
US3796602A (en) Process for stripping polymer masks from circuit boards
US4617251A (en) Stripping composition and method of using the same
KR100504979B1 (ko) 비부식성 스트리핑 및 세정 조성물
CA1194764A (fr) Composes de decapage et methodes pour enlever les resists
JP2683729B2 (ja) 架橋又は硬化したレジスト樹脂を有する減少した金属腐食を生じるアルカリ含有フォトレジストストリッピング組成物
KR100323326B1 (ko) 플라즈마 에칭 잔류물 제거용 비부식성 세정 조성물
KR880002247B1 (ko) 제막(際膜)조성물 및 내식막(耐蝕膜) 제거방법
JP4208924B2 (ja) 非水性、非腐食性マイクロエレクトロニクス洗浄組成物
JPH07295240A (ja) 非腐食性フォトレジスト剥離用組成物
US5545353A (en) Non-corrosive photoresist stripper composition
JPH04124668A (ja) レジスト用剥離剤組成物
JP2002523546A (ja) 非腐食性のストリッピングおよびクリーニング組成物
CA1329037C (fr) Composes de depouillement et methodes servant a depouiller les supports des produits de reserve precedemment appliques
DE3828513A1 (de) Abloesemittel fuer fotoresists
US20020068684A1 (en) Stripping and cleaning compositions
JP2004536181A5 (fr)
WO2003006597A1 (fr) Compositions de nettoyage de micro-elements electroniques alcalines sans ammoniac a compatibilite avec les substrats amelioree
WO2006052692A2 (fr) Composition de nettoyage apres gravure destinee a etre utilisee avec des substrats comprenant de l'aluminium
CA1279561C (fr) Solvents pour l'enlevement d'agents photoresistants
KR20030032358A (ko) 포토레지스트용 스트리퍼 조성물
EP0163202B1 (fr) Agent et méthode pour le dépouillement des couches de photoréserve
JPH0253781B2 (fr)
JP4165209B2 (ja) レジスト剥離剤

Legal Events

Date Code Title Description
MKLA Lapsed