CA1247043A - Controlled vacuum arc material deposition, method and apparatus - Google Patents

Controlled vacuum arc material deposition, method and apparatus

Info

Publication number
CA1247043A
CA1247043A CA000475374A CA475374A CA1247043A CA 1247043 A CA1247043 A CA 1247043A CA 000475374 A CA000475374 A CA 000475374A CA 475374 A CA475374 A CA 475374A CA 1247043 A CA1247043 A CA 1247043A
Authority
CA
Canada
Prior art keywords
cathode
active surface
arc
magnetic field
magnet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA000475374A
Other languages
English (en)
French (fr)
Inventor
Subbiah Ramalingam
Cai B. Qi
Kyunghoon Kim
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
University of Minnesota
Original Assignee
University of Minnesota
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by University of Minnesota filed Critical University of Minnesota
Application granted granted Critical
Publication of CA1247043A publication Critical patent/CA1247043A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means
CA000475374A 1984-03-02 1985-02-28 Controlled vacuum arc material deposition, method and apparatus Expired CA1247043A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US58584584A 1984-03-02 1984-03-02
US585,845 1990-09-20

Publications (1)

Publication Number Publication Date
CA1247043A true CA1247043A (en) 1988-12-20

Family

ID=24343205

Family Applications (1)

Application Number Title Priority Date Filing Date
CA000475374A Expired CA1247043A (en) 1984-03-02 1985-02-28 Controlled vacuum arc material deposition, method and apparatus

Country Status (4)

Country Link
EP (1) EP0174977A4 (de)
JP (1) JPS61501328A (de)
CA (1) CA1247043A (de)
WO (1) WO1985003954A1 (de)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4627904A (en) * 1984-05-17 1986-12-09 Varian Associates, Inc. Magnetron sputter device having separate confining magnetic fields to separate targets and magnetically enhanced R.F. bias
US4657619A (en) * 1985-11-29 1987-04-14 Donnell Kevin P O Diverter magnet arrangement for plasma processing system
JP2571948B2 (ja) * 1986-04-04 1997-01-16 リージェンツ オブ ザ ユニバーシティ オブ ミネソタ 耐火性金属化合物のアークコーティング
NL8601824A (nl) * 1986-07-11 1988-02-01 Hauzer Holding Werkwijze en inrichting voor het met een geleidend plasmakanaal ontsteken van een boog.
EP0285745B1 (de) * 1987-03-06 1993-05-26 Balzers Aktiengesellschaft Verfahren und Vorrichtungen zum Vakuumbeschichten mittels einer elektrischen Bogenentladung
CA1301239C (en) * 1987-03-16 1992-05-19 Hans Veltrop Method and arrangement for mechanically moving of a magnetic field generating device in a cathode arc discharge evaporating device
US5298136A (en) * 1987-08-18 1994-03-29 Regents Of The University Of Minnesota Steered arc coating with thick targets
JPH0674497B2 (ja) * 1987-11-25 1994-09-21 株式会社神戸製鋼所 セラミックス硬質膜被覆方法
GB9615548D0 (en) 1996-07-24 1996-09-04 Univ Nanyang Cathode arc source and graphite target
US6036828A (en) * 1997-08-30 2000-03-14 United Technologies Corporation Apparatus for steering the arc in a cathodic arc coater
JP4000764B2 (ja) * 2000-09-18 2007-10-31 日新電機株式会社 真空アーク蒸発装置
CZ296094B6 (cs) * 2000-12-18 2006-01-11 Shm, S. R. O. Zarízení pro odparování materiálu k povlakování predmetu
US6936145B2 (en) * 2002-02-28 2005-08-30 Ionedge Corporation Coating method and apparatus
EP3133634B1 (de) * 2015-08-09 2020-09-30 ISA Installations-, Steuerungs- und Automatisierungssystem GmbH Vorrichtung zum zünden einer vakuumbogenentladung und verfahren zu deren anwendung
CN115074678B (zh) * 2022-06-20 2023-05-16 肇庆市科润真空设备有限公司 不锈钢薄板连续镀膜用的多弧靶机构及pvd镀膜装置

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU307666A1 (ru) * 1968-09-09 1979-01-08 Sablev L P Электродуговой испаритель металлов
US3625848A (en) * 1968-12-26 1971-12-07 Alvin A Snaper Arc deposition process and apparatus
SU363375A1 (ru) * 1970-03-20 1979-01-10 Sablev L P Электродуговой испаритель металлов
US3783231A (en) * 1972-03-22 1974-01-01 V Gorbunov Apparatus for vacuum-evaporation of metals under the action of an electric arc
US3956093A (en) * 1974-12-16 1976-05-11 Airco, Inc. Planar magnetron sputtering method and apparatus
SU711787A1 (ru) * 1978-06-17 1980-10-07 Предприятие П/Я В-8851 Электродуговой испаритель металлов
US4444643A (en) * 1982-09-03 1984-04-24 Gartek Systems, Inc. Planar magnetron sputtering device
US4448799A (en) * 1983-04-21 1984-05-15 Multi-Arc Vacuum Systems Inc. Arc-initiating trigger apparatus and method for electric arc vapor deposition coating systems
US4448659A (en) * 1983-09-12 1984-05-15 Vac-Tec Systems, Inc. Method and apparatus for evaporation arc stabilization including initial target cleaning

Also Published As

Publication number Publication date
EP0174977A4 (de) 1987-02-12
WO1985003954A1 (en) 1985-09-12
JPS61501328A (ja) 1986-07-03
JPH0548298B2 (de) 1993-07-21
EP0174977A1 (de) 1986-03-26

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