CA1155797A - Procede de realisation d'un reseau optique - Google Patents
Procede de realisation d'un reseau optiqueInfo
- Publication number
- CA1155797A CA1155797A CA000380998A CA380998A CA1155797A CA 1155797 A CA1155797 A CA 1155797A CA 000380998 A CA000380998 A CA 000380998A CA 380998 A CA380998 A CA 380998A CA 1155797 A CA1155797 A CA 1155797A
- Authority
- CA
- Canada
- Prior art keywords
- substrate
- laughed
- network
- character
- resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 title claims abstract description 22
- 230000003287 optical effect Effects 0.000 title claims description 9
- 239000011347 resin Substances 0.000 claims abstract description 39
- 229920005989 resin Polymers 0.000 claims abstract description 39
- 239000000758 substrate Substances 0.000 claims abstract description 26
- 238000005468 ion implantation Methods 0.000 claims abstract description 8
- 150000002500 ions Chemical class 0.000 claims description 16
- 239000000126 substance Substances 0.000 claims description 11
- GQYHUHYESMUTHG-UHFFFAOYSA-N lithium niobate Chemical compound [Li+].[O-][Nb](=O)=O GQYHUHYESMUTHG-UHFFFAOYSA-N 0.000 claims description 8
- 238000002513 implantation Methods 0.000 claims description 7
- 239000001307 helium Substances 0.000 claims description 6
- 229910052734 helium Inorganic materials 0.000 claims description 6
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims 2
- 150000001768 cations Chemical class 0.000 claims 1
- 230000006870 function Effects 0.000 description 5
- -1 helium ions Chemical class 0.000 description 5
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229910003327 LiNbO3 Inorganic materials 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- 101100286668 Mus musculus Irak1bp1 gene Proteins 0.000 description 1
- 240000004760 Pimpinella anisum Species 0.000 description 1
- 206010070834 Sensitisation Diseases 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 238000001093 holography Methods 0.000 description 1
- 239000007943 implant Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 230000008313 sensitization Effects 0.000 description 1
- 238000009987 spinning Methods 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/48—Ion implantation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/12—Optical coatings produced by application to, or surface treatment of, optical elements by surface treatment, e.g. by irradiation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/001—Phase modulating patterns, e.g. refractive index patterns
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
- Manufacturing Optical Record Carriers (AREA)
- Holo Graphy (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR8014839 | 1980-07-03 | ||
| FR8014839A FR2486251A1 (fr) | 1980-07-03 | 1980-07-03 | Procede de realisation d'un reseau optique |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA1155797A true CA1155797A (fr) | 1983-10-25 |
Family
ID=9243808
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA000380998A Expired CA1155797A (fr) | 1980-07-03 | 1981-07-02 | Procede de realisation d'un reseau optique |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JPS5745508A (enrdf_load_stackoverflow) |
| CA (1) | CA1155797A (enrdf_load_stackoverflow) |
| DE (1) | DE3125998A1 (enrdf_load_stackoverflow) |
| FR (1) | FR2486251A1 (enrdf_load_stackoverflow) |
| GB (1) | GB2079536B (enrdf_load_stackoverflow) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2536911B1 (fr) * | 1982-11-30 | 1987-09-18 | Western Electric Co | Photodetecteur |
| AT382040B (de) * | 1983-03-01 | 1986-12-29 | Guenther Stangl | Verfahren zur herstellung von optisch strukturierten filtern fuer elektromagnetische strahlung und optisch strukturierter filter |
| JPS60123803A (ja) * | 1983-12-09 | 1985-07-02 | Pioneer Electronic Corp | マイクロフレネルレンズの製造方法 |
| JPS61149923A (ja) * | 1984-12-25 | 1986-07-08 | Sony Corp | 位相型光学的ロ−パスフイルタ |
| US4772539A (en) * | 1987-03-23 | 1988-09-20 | International Business Machines Corporation | High resolution E-beam lithographic technique |
| GB9207627D0 (en) * | 1992-04-08 | 1992-05-27 | Northern Telecom Ltd | Manufacture of optical grating structures |
| US5836075A (en) * | 1996-12-31 | 1998-11-17 | Westinghouse Electric Corporation | Process for forming combustion turbine components by transient liquid phase bonding |
| FR2870041B1 (fr) * | 2004-05-06 | 2006-11-03 | Nanoraptor Sa | Procede de fabrication d'un composant presentant un relief nanometrique et/ou des variations d'epaisseur, composant et ses derives issus de ce procede et leurs applications |
| PL439368A1 (pl) * | 2021-10-30 | 2023-05-02 | Instytut Wysokich Ciśnień Polskiej Akademii Nauk Unipress | Sposób wytwarzania obszaru o regularnie zmiennym współczynniku załamania światła w wybranej warstwie warstwowej struktury półprzewodnikowej |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1561784A (en) * | 1976-11-23 | 1980-03-05 | Atomic Energy Authority Uk | Optical components |
-
1980
- 1980-07-03 FR FR8014839A patent/FR2486251A1/fr active Granted
-
1981
- 1981-07-01 GB GB8120392A patent/GB2079536B/en not_active Expired
- 1981-07-01 DE DE19813125998 patent/DE3125998A1/de not_active Withdrawn
- 1981-07-02 CA CA000380998A patent/CA1155797A/fr not_active Expired
- 1981-07-03 JP JP10432981A patent/JPS5745508A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5745508A (en) | 1982-03-15 |
| GB2079536A (en) | 1982-01-20 |
| DE3125998A1 (de) | 1982-02-04 |
| FR2486251A1 (fr) | 1982-01-08 |
| FR2486251B1 (enrdf_load_stackoverflow) | 1983-12-16 |
| GB2079536B (en) | 1984-07-11 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MKEX | Expiry |