GB1561784A - Optical components - Google Patents

Optical components Download PDF

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Publication number
GB1561784A
GB1561784A GB4826875A GB4826875A GB1561784A GB 1561784 A GB1561784 A GB 1561784A GB 4826875 A GB4826875 A GB 4826875A GB 4826875 A GB4826875 A GB 4826875A GB 1561784 A GB1561784 A GB 1561784A
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GB
United Kingdom
Prior art keywords
substrate
ions
atoms
layer
optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB4826875A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
UK Atomic Energy Authority
Original Assignee
UK Atomic Energy Authority
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by UK Atomic Energy Authority filed Critical UK Atomic Energy Authority
Priority to GB4826875A priority Critical patent/GB1561784A/en
Publication of GB1561784A publication Critical patent/GB1561784A/en
Expired legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/12—Optical coatings produced by application to, or surface treatment of, optical elements by surface treatment, e.g. by irradiation
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/06—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/0005—Other surface treatment of glass not in the form of fibres or filaments by irradiation
    • C03C23/0055—Other surface treatment of glass not in the form of fibres or filaments by irradiation by ion implantation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/48—Ion implantation
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/25—Metals
    • C03C2217/251—Al, Cu, Mg or noble metals
    • C03C2217/252—Al
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/25—Metals
    • C03C2217/251—Al, Cu, Mg or noble metals
    • C03C2217/254—Noble metals
    • C03C2217/255—Au
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/25—Metals
    • C03C2217/251—Al, Cu, Mg or noble metals
    • C03C2217/254—Noble metals
    • C03C2217/256—Ag
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/25—Metals
    • C03C2217/257—Refractory metals
    • C03C2217/26—Cr, Mo, W
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/25—Metals
    • C03C2217/268—Other specific metals
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/30—Aspects of methods for coating glass not covered above
    • C03C2218/34—Masking

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Plasma & Fusion (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Optical Elements Other Than Lenses (AREA)

Description

(54) IMPROVEMENTS IN OR RELATING TO OPTICAL COMPONENTS (71) We, UNITED KINGDOM ATOMIC ENERGY AUTHORITY, London, a British Authority, do hereby declare the invention, for which we pray that a patent may be granted to us, and the method by which it is to be performed, to be particularly described in and by the following state menu: The present invention relates to optical components and more particularly to the formation of layers which modify the optical properties of a substrate body to provide an optical component. For the purposes of the present specification an optical component is defined as a body which includes at least one layer the purpose of which is to interact with incident radiation for a specific purpose in connection with which the optical component is to be used, and such layers are referred to herein as optical layers.
Conventionally an optical mirror is formed by depositing a reflecting layer on a surface or surfaces of a substrate body, the aforesaid surfaces being formed to the shape required to carry out the optical function of the mirror. When the aforesaid surfaces are the surfaces on which the light is incident the mirrors are known as front surfaced mirrors. Unfortunately the metals which are usually used to provide the reflecting layer, such as aluminium or silver are soft andlor liable to tarnish when exposed to the atmosphere.
Also when the metal layer is deposited by present used processes it is difficult to ensure adequate adhesion between the substrate and the deposited layer. Front surfaced mirrors therefore are easily damaged in use, may deteriorate rapidly and are difficult to clean satisfactorily.
According to the invention in one aspect there is provided an optical component comprising a body of substrate material and an optical layer as herein defined formed by subjecting the substrate to ionic bombardment thereby to implant ions atoms or molecules of a material or materials into a surface of the substrate with energies sufficient to ensure that the optical layer is formed at least in part within the substance of the substrate.
Thus the optical layer is protected against mechanical damage or chemical attack by the atmosphere. The layer may either be buried completely below the surface of the substrate without extending as far outwards as this surface, may be buried in the substrate extending as far as the surface, or may lie partially within and partially on the substrate.
A particular form of optical component according to the present invention is a master mask for use in the production of microcircuits, comprising a glass substrate having formed therein precisely defined areas of a reflecting and or absorbing layer, the said layer being constituted at least in part by atoms or ions implanted into a surface of the substrate with energies sufficient to ensure that they eventually lie below the surface of the substrate.
Also according to the present invention there is provided a process for producing an optical component as hereinbefore defined comprising the operation of subjecting a surface of a substrate body to ionic bombardment thereby to implant ions atoms of molecules of a materials or materials adapted to form an optical layer as hereinbefore defined, with energies and for a duration such that the said optical layer is formed at least in part below the surface of the substrate.
For example the substrate may be made of glass or fused silica and the implanted species may be a metal such as aluminium chromium or silver and the implantation may be continued until a fully reflecting layer is formed or it may be terminated when only a partially reflecting layer has been formed. Suitable implantation energies are between 1 KeV and 1 MeV.
In a modified form of the process the ions, atoms or molecules are implanted simultaneously with the deposition of thermal energy material, the thermal energy species being driven into the substrate by the high energy species.
Examples of processes embodying the invention will now be described with reference to the drawing accompanying the provisional specification which illustrates a process for making a mirror according to the invention.
Referring to the drawing, a substrate 1 of fused silica is subjected to bombardment by a beam 2 of aluminium ions emitted from a source 3. The substrate 1 and source 3 are enclosed in a vacuum chamber 4 attached to pumps 5 capable of maintaining a pressure below 10-4 and preferably below 10-5 Torr in the chamber 4. The ions are accelerated to energies of some 25 KeV by means of an electrode 6.
The implantation is continued until some 10-18 atoms/sq.cm are implanted. The result is to produce a highly reflective layer buried below the upper surface of substrate 1.
In another process a part-reflecting mirror was produced by bombarding a glass substrate with chromium ions having an energy of 10 KeV until some- 1017 atoms I sq.cm had been implanted.
In a third process a substrate is bombarded with a mixture of ions and atoms which need not be of the same material, the atoms produced by thermal evaporation having purely thermal energies and the ions having energies ranging from 1 KeV to 1 MeV. Atoms deposited on the surface of the substrate are driven into the substrate by bombardment from the higher energy ions (or atoms) to produce in combination with the ions a dense buried layer. Using this process a buried layer can be formed containing materials which do not readily ionise.
The process can also be used to produce shadow masks by interposing between the substrate and the ion beam a master metal shadow mask.
The method described with reference to Figure 1 may also be used to produce blanks for production of shadow masks by conventional methods. For example a glass substrate would be provided with an optical layer (as herein defined) and selected regions of the layer removed, e.g.
by etching, to form the mask. Suitable metals for the optical layer are aluminium, chromium, gold, mercury or silver.
The method may also be used to make optical filters using materials other than metals.
When making mirrors according to the invention it is not necessary for the bulk substrate to be transparent, it is only necessary for the very thin region of the substrate containing, and above, the optical layer to be transparent. For example vitreous carbon, which is not normally regarded as transparent, can be used as the substrate.
WHAT WE CLAIM IS: 1. An optical component comprising a body of substrate material and an optical layer as herein defined formed by ionic bombardment thereby to implant ions atoms or molecules of a material or materials into a surface of the substrate with energies sufficient to ensure that the optical layer is formed at least in part within the substance of the substrate.
2. An optical component according to claim 1 wherein the optical layer is formed totally within the substrate and at least the portion of the substrate above the optical layer is transparent.
3. An optical component according to claim 1 or claim 2 wherein the substrate is transparent throughout.
4. An optical component according to claim 3 wherein the optical layer is such as to render accurately delineated regions of the substrate opaque.
5. An optical component according to any preceding claim wherein the optical layer includes aluminium, chromium, gold, mercury or silver.
6. An optical component according to claim 5 wherein the optical layer is fully reflecting.
7. An optical component according to any of claims 3 to 6 wherein the substrate is made of glass or fused silica.
8. A process for producing an optical component as heseinbefore defined comprising the operation of subjecting a surface of a substrate body to ionic bombardment thereby to implant ions, atoms or molecules of a material or materials adapted to form an optical layer, as here inbefore defined, with energies and for a duration such that the optical layer is formed at least in part below the surface of the substrate.
9. A process according to claim 9 wherein thesurface of the substrate is irradiated simultaneously with high energy species and species having only thermal energies.
10. A process according to claim 8 or claim 9 wherein the ions, atoms or molecules are implanted with energies such that the optical layer is formed totally within the substrate.
11. A process according to any of claims 8 to 10 wherein the implanted ions,
**WARNING** end of DESC field may overlap start of CLMS **.

Claims (19)

**WARNING** start of CLMS field may overlap end of DESC **. when only a partially reflecting layer has been formed. Suitable implantation energies are between 1 KeV and 1 MeV. In a modified form of the process the ions, atoms or molecules are implanted simultaneously with the deposition of thermal energy material, the thermal energy species being driven into the substrate by the high energy species. Examples of processes embodying the invention will now be described with reference to the drawing accompanying the provisional specification which illustrates a process for making a mirror according to the invention. Referring to the drawing, a substrate 1 of fused silica is subjected to bombardment by a beam 2 of aluminium ions emitted from a source 3. The substrate 1 and source 3 are enclosed in a vacuum chamber 4 attached to pumps 5 capable of maintaining a pressure below 10-4 and preferably below 10-5 Torr in the chamber 4. The ions are accelerated to energies of some 25 KeV by means of an electrode 6. The implantation is continued until some 10-18 atoms/sq.cm are implanted. The result is to produce a highly reflective layer buried below the upper surface of substrate 1. In another process a part-reflecting mirror was produced by bombarding a glass substrate with chromium ions having an energy of 10 KeV until some- 1017 atoms I sq.cm had been implanted. In a third process a substrate is bombarded with a mixture of ions and atoms which need not be of the same material, the atoms produced by thermal evaporation having purely thermal energies and the ions having energies ranging from 1 KeV to 1 MeV. Atoms deposited on the surface of the substrate are driven into the substrate by bombardment from the higher energy ions (or atoms) to produce in combination with the ions a dense buried layer. Using this process a buried layer can be formed containing materials which do not readily ionise. The process can also be used to produce shadow masks by interposing between the substrate and the ion beam a master metal shadow mask. The method described with reference to Figure 1 may also be used to produce blanks for production of shadow masks by conventional methods. For example a glass substrate would be provided with an optical layer (as herein defined) and selected regions of the layer removed, e.g. by etching, to form the mask. Suitable metals for the optical layer are aluminium, chromium, gold, mercury or silver. The method may also be used to make optical filters using materials other than metals. When making mirrors according to the invention it is not necessary for the bulk substrate to be transparent, it is only necessary for the very thin region of the substrate containing, and above, the optical layer to be transparent. For example vitreous carbon, which is not normally regarded as transparent, can be used as the substrate. WHAT WE CLAIM IS:
1. An optical component comprising a body of substrate material and an optical layer as herein defined formed by ionic bombardment thereby to implant ions atoms or molecules of a material or materials into a surface of the substrate with energies sufficient to ensure that the optical layer is formed at least in part within the substance of the substrate.
2. An optical component according to claim 1 wherein the optical layer is formed totally within the substrate and at least the portion of the substrate above the optical layer is transparent.
3. An optical component according to claim 1 or claim 2 wherein the substrate is transparent throughout.
4. An optical component according to claim 3 wherein the optical layer is such as to render accurately delineated regions of the substrate opaque.
5. An optical component according to any preceding claim wherein the optical layer includes aluminium, chromium, gold, mercury or silver.
6. An optical component according to claim 5 wherein the optical layer is fully reflecting.
7. An optical component according to any of claims 3 to 6 wherein the substrate is made of glass or fused silica.
8. A process for producing an optical component as heseinbefore defined comprising the operation of subjecting a surface of a substrate body to ionic bombardment thereby to implant ions, atoms or molecules of a material or materials adapted to form an optical layer, as here inbefore defined, with energies and for a duration such that the optical layer is formed at least in part below the surface of the substrate.
9. A process according to claim 9 wherein thesurface of the substrate is irradiated simultaneously with high energy species and species having only thermal energies.
10. A process according to claim 8 or claim 9 wherein the ions, atoms or molecules are implanted with energies such that the optical layer is formed totally within the substrate.
11. A process according to any of claims 8 to 10 wherein the implanted ions,
atoms or molecules include at least one of the metals aluminium, chromium, gold, mercury or silver.
12. A process according to any of claims 8 to 12 wherein the substrate is .ransparent throughout.
13. A process according to any of claims 8 to 12 wherein the implantation is continued only so long as to produce a partially reflecting layer.
14. A process according to claim 12 wherein the substrate is transparent and there is included the operation of inserting into the path of the implanted ions, atoms, or molecules, a metal mask having an accurately defined pattern of holes therein, and the implantation is continued until the substrate is rendered opaque in the regions corresponding to the holes in the metal mask, thereby to provide a shadow mask.
15. A process according to claim 12 wherein a continuous opaque optical layer is formed and subsequently regions of the optical layer are removed thereby to provide a shadow mask.
16. A process according to any preceding claim wherein the ions, atoms or molecules are implanted with energies in the range 1 KeV to 1 MeV.
17. A process according to claim 10 wherein the substrate is made of fused silica and it is bombarded with aluminium ions having an energy of 25 KeV until a dose of 1018 ions/sq. cm. have been implanted.
18. An optical component substantially as hereinbefore described with reference to the drawing accompanying the provisional specification, and the examples.
19. A process for producing an optical component substantially as hereinbefore described with reference to the drawing accompanying the provisional specification, and the examples.
GB4826875A 1976-11-23 1976-11-23 Optical components Expired GB1561784A (en)

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Application Number Priority Date Filing Date Title
GB4826875A GB1561784A (en) 1976-11-23 1976-11-23 Optical components

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GB4826875A GB1561784A (en) 1976-11-23 1976-11-23 Optical components

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0029914A1 (en) * 1979-11-05 1981-06-10 International Business Machines Corporation Method of decreasing the optical reflectiveness of surfaces
FR2486251A1 (en) * 1980-07-03 1982-01-08 Commissariat Energie Atomique METHOD FOR PRODUCING AN OPTICAL NETWORK
EP0318440A2 (en) * 1987-11-27 1989-05-31 SOCIETA' ITALIANA VETRO - SIV - S.p.A. A process for the manufacture of glass with modified radiant energy characteristics and the product so obtained
EP0430908A1 (en) * 1989-11-29 1991-06-05 SOCIETA' ITALIANA VETRO- SIV-SpA Reflecting glass

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0029914A1 (en) * 1979-11-05 1981-06-10 International Business Machines Corporation Method of decreasing the optical reflectiveness of surfaces
FR2486251A1 (en) * 1980-07-03 1982-01-08 Commissariat Energie Atomique METHOD FOR PRODUCING AN OPTICAL NETWORK
EP0318440A2 (en) * 1987-11-27 1989-05-31 SOCIETA' ITALIANA VETRO - SIV - S.p.A. A process for the manufacture of glass with modified radiant energy characteristics and the product so obtained
EP0318440A3 (en) * 1987-11-27 1990-06-20 Societa' Italiana Vetro - Siv - S.P.A. A process for the manufacture of glass with modified radiant energy characteristics and the product so obtained
US5098792A (en) * 1987-11-27 1992-03-24 Societa Italiana Vetro - Siv - S.P.A. Process for the manufacture of glass with modified radiant energy characteristics and the product so obtained
EP0430908A1 (en) * 1989-11-29 1991-06-05 SOCIETA' ITALIANA VETRO- SIV-SpA Reflecting glass
US5102736A (en) * 1989-11-29 1992-04-07 Societa Italiana Vetro-Siv-S.P.A. Process for the manufacture of reflecting glass and the product thereof

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