CA1075955A - Thermoplastic photopolymerizable copying layer containing a benzene mercapto alkanoic acid amide derivative - Google Patents

Thermoplastic photopolymerizable copying layer containing a benzene mercapto alkanoic acid amide derivative

Info

Publication number
CA1075955A
CA1075955A CA237,470A CA237470A CA1075955A CA 1075955 A CA1075955 A CA 1075955A CA 237470 A CA237470 A CA 237470A CA 1075955 A CA1075955 A CA 1075955A
Authority
CA
Canada
Prior art keywords
adhesion
photopolymerizable
layer
laminate material
imparting substance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA237,470A
Other languages
English (en)
French (fr)
Inventor
Kurt Klupfel
Heide Sprengel
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoechst AG
Original Assignee
Hoechst AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst AG filed Critical Hoechst AG
Application granted granted Critical
Publication of CA1075955A publication Critical patent/CA1075955A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/389—Improvement of the adhesion between the insulating substrate and the metal by the use of a coupling agent, e.g. silane
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/085—Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Polymerisation Methods In General (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Laminated Bodies (AREA)
CA237,470A 1974-10-14 1975-10-10 Thermoplastic photopolymerizable copying layer containing a benzene mercapto alkanoic acid amide derivative Expired CA1075955A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19742448821 DE2448821C2 (de) 1974-10-14 1974-10-14 Verfahren zum Übertragen einer thermoplastischen photopolymerisierbaren Schicht und Schichtübertragungsmaterial

Publications (1)

Publication Number Publication Date
CA1075955A true CA1075955A (en) 1980-04-22

Family

ID=5928227

Family Applications (1)

Application Number Title Priority Date Filing Date
CA237,470A Expired CA1075955A (en) 1974-10-14 1975-10-10 Thermoplastic photopolymerizable copying layer containing a benzene mercapto alkanoic acid amide derivative

Country Status (9)

Country Link
JP (1) JPS588496B2 (ja)
BE (1) BE834453A (ja)
CA (1) CA1075955A (ja)
CH (1) CH599575A5 (ja)
DE (1) DE2448821C2 (ja)
FR (1) FR2288336A1 (ja)
GB (1) GB1530288A (ja)
IT (1) IT1048315B (ja)
SE (1) SE402653B (ja)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2849894A1 (de) 1978-11-17 1980-05-29 Hoechst Ag Verfahren zum reinigen von kupfer enthaltenden metalloberflaechen
JPS59122898U (ja) * 1983-02-07 1984-08-18 松下電器産業株式会社 衣類乾燥機
DE3909003A1 (de) * 1989-03-18 1990-09-27 Basf Ag Photopolymerisierbares schichtuebertragungsmaterial
US5320933A (en) * 1990-03-30 1994-06-14 Morton International, Inc. Photoimageable composition having improved adhesion promoter
DE4234423C2 (de) * 1992-10-13 1996-10-10 Inst Mikrotechnik Mainz Gmbh Mit einem Resist beschichtete Metall- oder Halbleitersubstrate und Verfahren zur Erzielung einer stabilen Resist-Substrat-Haftung

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA943803A (en) * 1970-04-02 1974-03-19 E. I. Du Pont De Nemours And Company Photopolymerizable compositions and process of applying same
NL7107486A (ja) * 1970-06-11 1971-12-14
US3645772A (en) * 1970-06-30 1972-02-29 Du Pont Process for improving bonding of a photoresist to copper
CA980163A (en) * 1970-12-23 1975-12-23 Jack R. Celeste Photocrosslinkable compositions and elements containing heterocyclic nitrogen-containing compounds
US3820993A (en) * 1971-05-07 1974-06-28 Horizons Research Inc Light sensitive reproduction and electron beam sensitive material

Also Published As

Publication number Publication date
DE2448821A1 (de) 1976-04-22
SE7511439L (sv) 1976-04-15
FR2288336A1 (fr) 1976-05-14
GB1530288A (en) 1978-10-25
SE402653B (sv) 1978-07-10
JPS5164919A (ja) 1976-06-04
BE834453A (fr) 1976-04-13
JPS588496B2 (ja) 1983-02-16
FR2288336B1 (ja) 1979-04-27
IT1048315B (it) 1980-11-20
CH599575A5 (ja) 1978-05-31
DE2448821C2 (de) 1986-01-30

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Legal Events

Date Code Title Description
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