CA1073400A - Electrodeposition process - Google Patents

Electrodeposition process

Info

Publication number
CA1073400A
CA1073400A CA239,861A CA239861A CA1073400A CA 1073400 A CA1073400 A CA 1073400A CA 239861 A CA239861 A CA 239861A CA 1073400 A CA1073400 A CA 1073400A
Authority
CA
Canada
Prior art keywords
electrolyte
fused
electrodeposition
temperature
solid particles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA239,861A
Other languages
English (en)
French (fr)
Inventor
Eiji Tanaka
Kenji Ogisu
Shin-Ichi Tokumoto
Hiroji Kawai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Application granted granted Critical
Publication of CA1073400A publication Critical patent/CA1073400A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/66—Electroplating: Baths therefor from melts

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Silicon Compounds (AREA)
CA239,861A 1974-11-18 1975-11-18 Electrodeposition process Expired CA1073400A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13196074A JPS5636238B2 (OSRAM) 1974-11-18 1974-11-18

Publications (1)

Publication Number Publication Date
CA1073400A true CA1073400A (en) 1980-03-11

Family

ID=15070228

Family Applications (1)

Application Number Title Priority Date Filing Date
CA239,861A Expired CA1073400A (en) 1974-11-18 1975-11-18 Electrodeposition process

Country Status (9)

Country Link
JP (1) JPS5636238B2 (OSRAM)
AU (1) AU506646B2 (OSRAM)
CA (1) CA1073400A (OSRAM)
DE (1) DE2551727C3 (OSRAM)
FR (1) FR2291294A1 (OSRAM)
GB (1) GB1504356A (OSRAM)
IT (1) IT1064458B (OSRAM)
NO (1) NO753867L (OSRAM)
SE (1) SE414196B (OSRAM)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5817269B2 (ja) * 1976-12-17 1983-04-06 ソニー株式会社 チタン又はチタン合金の電着法
JP4711724B2 (ja) * 2005-04-19 2011-06-29 学校法人同志社 溶融塩めっき用電解浴及び該電解浴を用いた溶融塩めっき方法
JP2012031471A (ja) * 2010-07-30 2012-02-16 Yoshiji Ichihara 電気めっき方法及びめっき部材の製造方法
JP6755520B2 (ja) * 2016-02-05 2020-09-16 日本製鉄株式会社 溶融塩電解による金属チタン箔の製造方法
CN107460502A (zh) * 2017-09-21 2017-12-12 北京工业大学 一种添加固相微粒的熔盐电沉积制备合金的方法
JP6875711B2 (ja) * 2020-03-23 2021-05-26 日本製鉄株式会社 溶融塩電解による金属チタン箔の製造方法

Also Published As

Publication number Publication date
SE414196B (sv) 1980-07-14
DE2551727C3 (de) 1981-01-08
AU8655475A (en) 1977-05-19
FR2291294B1 (OSRAM) 1983-10-28
GB1504356A (en) 1978-03-22
IT1064458B (it) 1985-02-18
NO753867L (OSRAM) 1976-05-19
DE2551727B2 (de) 1980-04-30
SE7512932L (sv) 1976-05-19
JPS5636238B2 (OSRAM) 1981-08-22
JPS5157605A (OSRAM) 1976-05-20
FR2291294A1 (fr) 1976-06-11
DE2551727A1 (de) 1976-05-26
AU506646B2 (en) 1980-01-17

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Legal Events

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