CA1061158A - Light sensitive layer containing o-naphthoquinone diazide, resin and aminoalkoxysilane - Google Patents

Light sensitive layer containing o-naphthoquinone diazide, resin and aminoalkoxysilane

Info

Publication number
CA1061158A
CA1061158A CA234,234A CA234234A CA1061158A CA 1061158 A CA1061158 A CA 1061158A CA 234234 A CA234234 A CA 234234A CA 1061158 A CA1061158 A CA 1061158A
Authority
CA
Canada
Prior art keywords
printing plate
amino
resin
plate according
alkoxy silane
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA234,234A
Other languages
English (en)
French (fr)
Inventor
Waltraud Kuhn
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoechst AG
Original Assignee
Hoechst AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst AG filed Critical Hoechst AG
Application granted granted Critical
Publication of CA1061158A publication Critical patent/CA1061158A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0751—Silicon-containing compounds used as adhesion-promoting additives or as means to improve adhesion

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
CA234,234A 1974-08-29 1975-08-27 Light sensitive layer containing o-naphthoquinone diazide, resin and aminoalkoxysilane Expired CA1061158A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2441315A DE2441315A1 (de) 1974-08-29 1974-08-29 Mit o-naphthochinondiazidverbindung vorsensibilisierte druckplatte

Publications (1)

Publication Number Publication Date
CA1061158A true CA1061158A (en) 1979-08-28

Family

ID=5924350

Family Applications (1)

Application Number Title Priority Date Filing Date
CA234,234A Expired CA1061158A (en) 1974-08-29 1975-08-27 Light sensitive layer containing o-naphthoquinone diazide, resin and aminoalkoxysilane

Country Status (13)

Country Link
JP (1) JPS5152002A (xx)
BE (1) BE832775A (xx)
BR (1) BR7505522A (xx)
CA (1) CA1061158A (xx)
DE (1) DE2441315A1 (xx)
DK (1) DK387175A (xx)
FR (1) FR2283461A1 (xx)
GB (1) GB1514552A (xx)
IE (1) IE41520B1 (xx)
IT (1) IT1041533B (xx)
LU (1) LU73261A1 (xx)
NL (1) NL7510061A (xx)
SE (1) SE405049B (xx)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2034911B (en) * 1978-10-26 1983-02-09 Toray Industries Dry planographic printing plate
FR2478641A1 (fr) * 1980-03-24 1981-09-25 Rhone Poulenc Ind Nouveaux photosensibilisateurs, leur procede d'obtention et leur utilisation dans des compositions photoresists
US4400100A (en) * 1981-03-02 1983-08-23 International Business Machines Corp. Four layered ribbon for electrothermal printing
DE3473359D1 (de) * 1983-06-29 1988-09-15 Fuji Photo Film Co Ltd Photosolubilizable composition
JPH04161957A (ja) * 1990-10-24 1992-06-05 Nippon Paint Co Ltd 光重合性組成物および感光性平版印刷版
JP2003119344A (ja) 2001-10-12 2003-04-23 Shin Etsu Chem Co Ltd ハイブリッド化合物、レジスト材料及びパターン形成方法
JP5407563B2 (ja) * 2008-07-04 2014-02-05 Ｊｓｒ株式会社 ポジ型感放射線性樹脂組成物

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS494851B1 (xx) * 1968-04-26 1974-02-04
US3615538A (en) * 1968-08-02 1971-10-26 Printing Dev Inc Photosensitive printing plates
JPS5119982B2 (xx) * 1972-01-26 1976-06-22
FR2193864B1 (xx) * 1972-07-31 1974-12-27 Rhone Poulenc Sa

Also Published As

Publication number Publication date
SE405049B (sv) 1978-11-13
GB1514552A (en) 1978-06-14
IE41520L (en) 1976-02-29
DK387175A (da) 1976-03-01
DE2441315A1 (de) 1976-03-11
BE832775A (fr) 1976-02-26
IT1041533B (it) 1980-01-10
JPS5152002A (en) 1976-05-08
LU73261A1 (xx) 1977-04-15
IE41520B1 (en) 1980-01-16
NL7510061A (nl) 1976-03-02
FR2283461B1 (xx) 1978-04-07
FR2283461A1 (fr) 1976-03-26
BR7505522A (pt) 1976-08-03
SE7509509L (sv) 1976-03-01

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