JPS5152002A - Oo nafutokinonjiajidojudotaide purisenshitaizushitainsatsuban - Google Patents

Oo nafutokinonjiajidojudotaide purisenshitaizushitainsatsuban

Info

Publication number
JPS5152002A
JPS5152002A JP50104489A JP10448975A JPS5152002A JP S5152002 A JPS5152002 A JP S5152002A JP 50104489 A JP50104489 A JP 50104489A JP 10448975 A JP10448975 A JP 10448975A JP S5152002 A JPS5152002 A JP S5152002A
Authority
JP
Japan
Prior art keywords
purisenshitaizushitainsatsuban
nafutokinonjiajidojudotaide
nafutokinonjiajidojudotaide purisenshitaizushitainsatsuban
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP50104489A
Other languages
Japanese (ja)
Inventor
Kuun Barutorauto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoechst AG
Original Assignee
Hoechst AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst AG filed Critical Hoechst AG
Publication of JPS5152002A publication Critical patent/JPS5152002A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0751—Silicon-containing compounds used as adhesion-promoting additives or as means to improve adhesion

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
JP50104489A 1974-08-29 1975-08-28 Oo nafutokinonjiajidojudotaide purisenshitaizushitainsatsuban Pending JPS5152002A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2441315A DE2441315A1 (en) 1974-08-29 1974-08-29 PRESSURE PLATE PRESENSITIZED WITH O-NAPHTHOQUINONDIAZIDE COMPOUND

Publications (1)

Publication Number Publication Date
JPS5152002A true JPS5152002A (en) 1976-05-08

Family

ID=5924350

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50104489A Pending JPS5152002A (en) 1974-08-29 1975-08-28 Oo nafutokinonjiajidojudotaide purisenshitaizushitainsatsuban

Country Status (13)

Country Link
JP (1) JPS5152002A (en)
BE (1) BE832775A (en)
BR (1) BR7505522A (en)
CA (1) CA1061158A (en)
DE (1) DE2441315A1 (en)
DK (1) DK387175A (en)
FR (1) FR2283461A1 (en)
GB (1) GB1514552A (en)
IE (1) IE41520B1 (en)
IT (1) IT1041533B (en)
LU (1) LU73261A1 (en)
NL (1) NL7510061A (en)
SE (1) SE405049B (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6790581B2 (en) 2001-10-12 2004-09-14 Shin-Etsu Chemical Company, Limited Hybrid compound, resist, and patterning process
JP2010033027A (en) * 2008-07-04 2010-02-12 Jsr Corp Positive radiation sensitive resin composition

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2034911B (en) * 1978-10-26 1983-02-09 Toray Industries Dry planographic printing plate
FR2478641A1 (en) * 1980-03-24 1981-09-25 Rhone Poulenc Ind Sulphonyl oxy-di:oxa-1,4-oxo-aza-tri:alkoxy-silyl hydrocarbyl benzene - useful photosensitisers in photoresist compsns.
US4400100A (en) * 1981-03-02 1983-08-23 International Business Machines Corp. Four layered ribbon for electrothermal printing
DE3473359D1 (en) * 1983-06-29 1988-09-15 Fuji Photo Film Co Ltd PHOTOSOLUBILIZABLE COMPOSITION
JPH04161957A (en) * 1990-10-24 1992-06-05 Nippon Paint Co Ltd Photopolymerizative compound and sensitive planography print plate

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4879617A (en) * 1972-01-26 1973-10-25
JPS4953629A (en) * 1972-07-31 1974-05-24

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS494851B1 (en) * 1968-04-26 1974-02-04
US3615538A (en) * 1968-08-02 1971-10-26 Printing Dev Inc Photosensitive printing plates

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4879617A (en) * 1972-01-26 1973-10-25
JPS4953629A (en) * 1972-07-31 1974-05-24

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6790581B2 (en) 2001-10-12 2004-09-14 Shin-Etsu Chemical Company, Limited Hybrid compound, resist, and patterning process
JP2010033027A (en) * 2008-07-04 2010-02-12 Jsr Corp Positive radiation sensitive resin composition

Also Published As

Publication number Publication date
IE41520L (en) 1976-02-29
SE7509509L (en) 1976-03-01
BE832775A (en) 1976-02-26
GB1514552A (en) 1978-06-14
LU73261A1 (en) 1977-04-15
SE405049B (en) 1978-11-13
FR2283461A1 (en) 1976-03-26
CA1061158A (en) 1979-08-28
DK387175A (en) 1976-03-01
NL7510061A (en) 1976-03-02
FR2283461B1 (en) 1978-04-07
IE41520B1 (en) 1980-01-16
BR7505522A (en) 1976-08-03
IT1041533B (en) 1980-01-10
DE2441315A1 (en) 1976-03-11

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