FR2283461B1 - - Google Patents

Info

Publication number
FR2283461B1
FR2283461B1 FR7526479A FR7526479A FR2283461B1 FR 2283461 B1 FR2283461 B1 FR 2283461B1 FR 7526479 A FR7526479 A FR 7526479A FR 7526479 A FR7526479 A FR 7526479A FR 2283461 B1 FR2283461 B1 FR 2283461B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7526479A
Other languages
French (fr)
Other versions
FR2283461A1 (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoechst AG
Original Assignee
Hoechst AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst AG filed Critical Hoechst AG
Publication of FR2283461A1 publication Critical patent/FR2283461A1/en
Application granted granted Critical
Publication of FR2283461B1 publication Critical patent/FR2283461B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0751—Silicon-containing compounds used as adhesion-promoting additives or as means to improve adhesion

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
FR7526479A 1974-08-29 1975-08-28 PRINTING PLATE PRESENSITED WITH O-NAPHTOQUINONE COMPOUND Granted FR2283461A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2441315A DE2441315A1 (en) 1974-08-29 1974-08-29 PRESSURE PLATE PRESENSITIZED WITH O-NAPHTHOQUINONDIAZIDE COMPOUND

Publications (2)

Publication Number Publication Date
FR2283461A1 FR2283461A1 (en) 1976-03-26
FR2283461B1 true FR2283461B1 (en) 1978-04-07

Family

ID=5924350

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7526479A Granted FR2283461A1 (en) 1974-08-29 1975-08-28 PRINTING PLATE PRESENSITED WITH O-NAPHTOQUINONE COMPOUND

Country Status (13)

Country Link
JP (1) JPS5152002A (en)
BE (1) BE832775A (en)
BR (1) BR7505522A (en)
CA (1) CA1061158A (en)
DE (1) DE2441315A1 (en)
DK (1) DK387175A (en)
FR (1) FR2283461A1 (en)
GB (1) GB1514552A (en)
IE (1) IE41520B1 (en)
IT (1) IT1041533B (en)
LU (1) LU73261A1 (en)
NL (1) NL7510061A (en)
SE (1) SE405049B (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2034911B (en) * 1978-10-26 1983-02-09 Toray Industries Dry planographic printing plate
FR2478641A1 (en) * 1980-03-24 1981-09-25 Rhone Poulenc Ind Sulphonyl oxy-di:oxa-1,4-oxo-aza-tri:alkoxy-silyl hydrocarbyl benzene - useful photosensitisers in photoresist compsns.
US4400100A (en) * 1981-03-02 1983-08-23 International Business Machines Corp. Four layered ribbon for electrothermal printing
DE3473359D1 (en) * 1983-06-29 1988-09-15 Fuji Photo Film Co Ltd PHOTOSOLUBILIZABLE COMPOSITION
JPH04161957A (en) * 1990-10-24 1992-06-05 Nippon Paint Co Ltd Photopolymerizative compound and sensitive planography print plate
JP2003119344A (en) 2001-10-12 2003-04-23 Shin Etsu Chem Co Ltd Hybrid compound, resist material and method of forming pattern
JP5407563B2 (en) * 2008-07-04 2014-02-05 Ｊｓｒ株式会社 Positive radiation sensitive resin composition

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS494851B1 (en) * 1968-04-26 1974-02-04
US3615538A (en) * 1968-08-02 1971-10-26 Printing Dev Inc Photosensitive printing plates
JPS5119982B2 (en) * 1972-01-26 1976-06-22
FR2193864B1 (en) * 1972-07-31 1974-12-27 Rhone Poulenc Sa

Also Published As

Publication number Publication date
JPS5152002A (en) 1976-05-08
BE832775A (en) 1976-02-26
IE41520L (en) 1976-02-29
DK387175A (en) 1976-03-01
SE7509509L (en) 1976-03-01
IT1041533B (en) 1980-01-10
LU73261A1 (en) 1977-04-15
NL7510061A (en) 1976-03-02
BR7505522A (en) 1976-08-03
GB1514552A (en) 1978-06-14
CA1061158A (en) 1979-08-28
SE405049B (en) 1978-11-13
FR2283461A1 (en) 1976-03-26
IE41520B1 (en) 1980-01-16
DE2441315A1 (en) 1976-03-11

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Legal Events

Date Code Title Description
ST Notification of lapse