JPS4879617A - - Google Patents

Info

Publication number
JPS4879617A
JPS4879617A JP909572A JP909572A JPS4879617A JP S4879617 A JPS4879617 A JP S4879617A JP 909572 A JP909572 A JP 909572A JP 909572 A JP909572 A JP 909572A JP S4879617 A JPS4879617 A JP S4879617A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP909572A
Other languages
Japanese (ja)
Other versions
JPS5119982B2 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP47009095A priority Critical patent/JPS5119982B2/ja
Priority to FR7302524A priority patent/FR2169217B1/fr
Priority to GB389273A priority patent/GB1376114A/en
Priority to DE19732303671 priority patent/DE2303671C3/en
Publication of JPS4879617A publication Critical patent/JPS4879617A/ja
Publication of JPS5119982B2 publication Critical patent/JPS5119982B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/0085—Azides characterised by the non-macromolecular additives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0751—Silicon-containing compounds used as adhesion-promoting additives or as means to improve adhesion

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Photoreceptors In Electrophotography (AREA)
JP47009095A 1972-01-26 1972-01-26 Expired JPS5119982B2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP47009095A JPS5119982B2 (en) 1972-01-26 1972-01-26
FR7302524A FR2169217B1 (en) 1972-01-26 1973-01-24
GB389273A GB1376114A (en) 1972-01-26 1973-01-25 Photoresist layer
DE19732303671 DE2303671C3 (en) 1972-01-26 1973-01-25 Photohardenable photoresist layer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP47009095A JPS5119982B2 (en) 1972-01-26 1972-01-26

Publications (2)

Publication Number Publication Date
JPS4879617A true JPS4879617A (en) 1973-10-25
JPS5119982B2 JPS5119982B2 (en) 1976-06-22

Family

ID=11711041

Family Applications (1)

Application Number Title Priority Date Filing Date
JP47009095A Expired JPS5119982B2 (en) 1972-01-26 1972-01-26

Country Status (3)

Country Link
JP (1) JPS5119982B2 (en)
FR (1) FR2169217B1 (en)
GB (1) GB1376114A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5152002A (en) * 1974-08-29 1976-05-08 Hoechst Ag Oo nafutokinonjiajidojudotaide purisenshitaizushitainsatsuban
JPS5741636A (en) * 1980-08-27 1982-03-08 Toshiba Corp Photoresist composition
JPS6175304A (en) * 1984-09-21 1986-04-17 Casio Comput Co Ltd Color liquid crystal display element
JPH01139650A (en) * 1987-10-15 1989-06-01 Hercules Inc Vinylsilane/azidesilane modified thermoplastic polymer composition
WO2007004345A1 (en) * 2005-06-30 2007-01-11 Toray Industries, Inc. Photosensitive resin composition and adhesion enhancer

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4491629A (en) * 1982-02-22 1985-01-01 Tokyo Shibaura Denki Kabushiki Kaisha Water soluble photoresist composition with bisazide, diazo, polymer and silane
NL8203980A (en) * 1982-10-15 1984-05-01 Philips Nv METHOD FOR THE PHOTOLITHOGRAPHIC TREATMENT OF A SUBSTRATE.
JPS60147729A (en) * 1984-01-12 1985-08-03 Toshiba Corp Photoresist composition
GB8403698D0 (en) * 1984-02-13 1984-03-14 British Telecomm Semiconductor device fabrication
US4950583A (en) * 1986-09-17 1990-08-21 Brewer Science Inc. Adhesion promoting product and process for treating an integrated circuit substrate therewith
AU603908B2 (en) * 1987-07-30 1990-11-29 Minnesota Mining And Manufacturing Company Subbing layers for photographic elements and photographic elements incorporating such layers
US4886739A (en) * 1988-08-10 1989-12-12 Eastman Kodak Company Thermally processable imaging element and process

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS494851A (en) * 1972-05-04 1974-01-17

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS494851A (en) * 1972-05-04 1974-01-17

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5152002A (en) * 1974-08-29 1976-05-08 Hoechst Ag Oo nafutokinonjiajidojudotaide purisenshitaizushitainsatsuban
JPS5741636A (en) * 1980-08-27 1982-03-08 Toshiba Corp Photoresist composition
JPS6175304A (en) * 1984-09-21 1986-04-17 Casio Comput Co Ltd Color liquid crystal display element
JPH01139650A (en) * 1987-10-15 1989-06-01 Hercules Inc Vinylsilane/azidesilane modified thermoplastic polymer composition
WO2007004345A1 (en) * 2005-06-30 2007-01-11 Toray Industries, Inc. Photosensitive resin composition and adhesion enhancer
US7977028B2 (en) 2005-06-30 2011-07-12 Toray Industries, Inc. Photosensitive resin composition and adhesion promoter

Also Published As

Publication number Publication date
DE2303671A1 (en) 1973-08-09
JPS5119982B2 (en) 1976-06-22
FR2169217B1 (en) 1983-05-27
DE2303671B2 (en) 1975-10-23
GB1376114A (en) 1974-12-04
FR2169217A1 (en) 1973-09-07

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