FR2169217B1 - - Google Patents

Info

Publication number
FR2169217B1
FR2169217B1 FR7302524A FR7302524A FR2169217B1 FR 2169217 B1 FR2169217 B1 FR 2169217B1 FR 7302524 A FR7302524 A FR 7302524A FR 7302524 A FR7302524 A FR 7302524A FR 2169217 B1 FR2169217 B1 FR 2169217B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7302524A
Other languages
French (fr)
Other versions
FR2169217A1 (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of FR2169217A1 publication Critical patent/FR2169217A1/fr
Application granted granted Critical
Publication of FR2169217B1 publication Critical patent/FR2169217B1/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/0085—Azides characterised by the non-macromolecular additives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0751—Silicon-containing compounds used as adhesion-promoting additives or as means to improve adhesion

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Photoreceptors In Electrophotography (AREA)
FR7302524A 1972-01-26 1973-01-24 Expired FR2169217B1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP47009095A JPS5119982B2 (en) 1972-01-26 1972-01-26

Publications (2)

Publication Number Publication Date
FR2169217A1 FR2169217A1 (en) 1973-09-07
FR2169217B1 true FR2169217B1 (en) 1983-05-27

Family

ID=11711041

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7302524A Expired FR2169217B1 (en) 1972-01-26 1973-01-24

Country Status (3)

Country Link
JP (1) JPS5119982B2 (en)
FR (1) FR2169217B1 (en)
GB (1) GB1376114A (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2441315A1 (en) * 1974-08-29 1976-03-11 Hoechst Ag PRESSURE PLATE PRESENSITIZED WITH O-NAPHTHOQUINONDIAZIDE COMPOUND
JPS5741636A (en) * 1980-08-27 1982-03-08 Toshiba Corp Photoresist composition
US4491629A (en) * 1982-02-22 1985-01-01 Tokyo Shibaura Denki Kabushiki Kaisha Water soluble photoresist composition with bisazide, diazo, polymer and silane
NL8203980A (en) * 1982-10-15 1984-05-01 Philips Nv METHOD FOR THE PHOTOLITHOGRAPHIC TREATMENT OF A SUBSTRATE.
JPS60147729A (en) * 1984-01-12 1985-08-03 Toshiba Corp Photoresist composition
GB8403698D0 (en) * 1984-02-13 1984-03-14 British Telecomm Semiconductor device fabrication
JPS6175304A (en) * 1984-09-21 1986-04-17 Casio Comput Co Ltd Color liquid crystal display element
US4950583A (en) * 1986-09-17 1990-08-21 Brewer Science Inc. Adhesion promoting product and process for treating an integrated circuit substrate therewith
AU603908B2 (en) * 1987-07-30 1990-11-29 Minnesota Mining And Manufacturing Company Subbing layers for photographic elements and photographic elements incorporating such layers
US4812519A (en) * 1987-10-15 1989-03-14 Hercules Incorporated Crosslinking of vinyl silane and azidosilane modified thermoplastic polymers by moisture
US4886739A (en) * 1988-08-10 1989-12-12 Eastman Kodak Company Thermally processable imaging element and process
EP1909142B1 (en) * 2005-06-30 2015-06-24 Toray Industries, Inc. Photosensitive resin composition and adhesion enhancer

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS494851A (en) * 1972-05-04 1974-01-17

Also Published As

Publication number Publication date
DE2303671A1 (en) 1973-08-09
JPS5119982B2 (en) 1976-06-22
DE2303671B2 (en) 1975-10-23
JPS4879617A (en) 1973-10-25
GB1376114A (en) 1974-12-04
FR2169217A1 (en) 1973-09-07

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Legal Events

Date Code Title Description
ST Notification of lapse