CA1061156A - Lithographic plate with layer of photosensitive diazo-oxide resin - Google Patents

Lithographic plate with layer of photosensitive diazo-oxide resin

Info

Publication number
CA1061156A
CA1061156A CA220,777A CA220777A CA1061156A CA 1061156 A CA1061156 A CA 1061156A CA 220777 A CA220777 A CA 220777A CA 1061156 A CA1061156 A CA 1061156A
Authority
CA
Canada
Prior art keywords
group
photosensitive
printing plate
lithographic printing
quinonediazide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA220,777A
Other languages
English (en)
French (fr)
Inventor
Masayuki Iwasaki
Hiroshi Misu
Shizuo Miyano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Application granted granted Critical
Publication of CA1061156A publication Critical patent/CA1061156A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F112/00—Homopolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F112/02—Monomers containing only one unsaturated aliphatic radical
    • C08F112/04—Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F112/14—Monomers containing only one unsaturated aliphatic radical containing one ring substituted by hetero atoms or groups containing heteroatoms
    • C08F112/22—Oxygen
    • C08F112/24—Phenols or alcohols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/30—Introducing nitrogen atoms or nitrogen-containing groups

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Emergency Medicine (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
CA220,777A 1974-02-21 1975-02-21 Lithographic plate with layer of photosensitive diazo-oxide resin Expired CA1061156A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP49020925A JPS5236043B2 (US06350818-20020226-C00016.png) 1974-02-21 1974-02-21

Publications (1)

Publication Number Publication Date
CA1061156A true CA1061156A (en) 1979-08-28

Family

ID=12040784

Family Applications (1)

Application Number Title Priority Date Filing Date
CA220,777A Expired CA1061156A (en) 1974-02-21 1975-02-21 Lithographic plate with layer of photosensitive diazo-oxide resin

Country Status (5)

Country Link
JP (1) JPS5236043B2 (US06350818-20020226-C00016.png)
CA (1) CA1061156A (US06350818-20020226-C00016.png)
DE (1) DE2507548C2 (US06350818-20020226-C00016.png)
FR (1) FR2262329B1 (US06350818-20020226-C00016.png)
GB (1) GB1494043A (US06350818-20020226-C00016.png)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4439516A (en) * 1982-03-15 1984-03-27 Shipley Company Inc. High temperature positive diazo photoresist processing using polyvinyl phenol
JPS58205147A (ja) * 1982-05-25 1983-11-30 Sumitomo Chem Co Ltd ポジ型フオトレジスト組成物
JPS62227143A (ja) * 1986-03-28 1987-10-06 Toshiba Corp 感光性組成物
FR2648468B1 (fr) * 1989-05-30 1992-12-04 Commissariat Energie Atomique Composition de resine sensible aux rayonnements uv et aux electrons
JP2567282B2 (ja) * 1989-10-02 1996-12-25 日本ゼオン株式会社 ポジ型レジスト組成物
DE4106356A1 (de) * 1991-02-28 1992-09-03 Hoechst Ag Strahlungsempfindliche polymere mit naphthochinon-2-diazid-4-sulfonyl-gruppen und deren verwendung in einem positiv arbeitenden aufzeichnungsmaterial
JP3290316B2 (ja) 1994-11-18 2002-06-10 富士写真フイルム株式会社 感光性平版印刷版
JP3506295B2 (ja) 1995-12-22 2004-03-15 富士写真フイルム株式会社 ポジ型感光性平版印刷版
KR100363695B1 (ko) * 1998-12-31 2003-04-11 주식회사 하이닉스반도체 유기난반사방지중합체및그의제조방법
US6528228B2 (en) * 1999-12-22 2003-03-04 Kodak Polychrome Graphics, Llc Chemical resistant underlayer for positive-working printing plates
DE602006009919D1 (de) 2006-08-03 2009-12-03 Agfa Graphics Nv Flachdruckplattenträger
DE602007006822D1 (de) 2007-11-30 2010-07-08 Agfa Graphics Nv Verfahren zur Behandlung einer Lithografiedruckplatte
ES2430562T3 (es) 2008-03-04 2013-11-21 Agfa Graphics N.V. Método para la fabricación de un soporte de una plancha de impresión litográfica
EP2106924B1 (en) 2008-03-31 2011-06-29 Agfa Graphics N.V. A method for treating a lithographic printing plate
ES2655798T3 (es) 2014-12-08 2018-02-21 Agfa Nv Sistema para reducir los residuos de ablación
CA3017777A1 (en) 2016-03-16 2017-09-21 Agfa Nv Method for processing a lithographic printing plate
EP3637188A1 (en) 2018-10-08 2020-04-15 Agfa Nv An effervescent developer precursor for processing a lithographic printing plate precursor
CN112650023B (zh) * 2020-12-23 2023-07-14 上海彤程电子材料有限公司 一种高分辨率光刻胶组合物及其应用

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1375461A (US06350818-20020226-C00016.png) * 1972-05-05 1974-11-27

Also Published As

Publication number Publication date
GB1494043A (en) 1977-12-07
JPS50113305A (US06350818-20020226-C00016.png) 1975-09-05
DE2507548C2 (de) 1984-10-11
DE2507548A1 (de) 1975-09-04
FR2262329A1 (US06350818-20020226-C00016.png) 1975-09-19
JPS5236043B2 (US06350818-20020226-C00016.png) 1977-09-13
FR2262329B1 (US06350818-20020226-C00016.png) 1977-04-15

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