CA1048328A - Revetements phototraitables - Google Patents

Revetements phototraitables

Info

Publication number
CA1048328A
CA1048328A CA214897A CA214897A CA1048328A CA 1048328 A CA1048328 A CA 1048328A CA 214897 A CA214897 A CA 214897A CA 214897 A CA214897 A CA 214897A CA 1048328 A CA1048328 A CA 1048328A
Authority
CA
Canada
Prior art keywords
photo
epoxy
acid
reaction
phr
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA214897A
Other languages
English (en)
Other versions
CA214897S (en
Inventor
Michael J. Canestaro
Joseph G. Cutillo
George P. Schmitt
Oscar R. Abolafia
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Application granted granted Critical
Publication of CA1048328A publication Critical patent/CA1048328A/fr
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/026—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from the reaction products of polyepoxides and unsaturated monocarboxylic acids, their anhydrides, halogenides or esters with low molecular weight
    • C08F299/028—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from the reaction products of polyepoxides and unsaturated monocarboxylic acids, their anhydrides, halogenides or esters with low molecular weight photopolymerisable compositions
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/50—Amines
    • C08G59/5033—Amines aromatic
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Epoxy Resins (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
CA214897A 1973-12-20 1974-11-27 Revetements phototraitables Expired CA1048328A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US42687773A 1973-12-20 1973-12-20

Publications (1)

Publication Number Publication Date
CA1048328A true CA1048328A (fr) 1979-02-13

Family

ID=23692577

Family Applications (1)

Application Number Title Priority Date Filing Date
CA214897A Expired CA1048328A (fr) 1973-12-20 1974-11-27 Revetements phototraitables

Country Status (9)

Country Link
JP (1) JPS5234935B2 (fr)
BR (1) BR7410702D0 (fr)
CA (1) CA1048328A (fr)
CH (1) CH613287A5 (fr)
ES (1) ES433118A1 (fr)
FR (1) FR2255629B1 (fr)
GB (1) GB1448643A (fr)
IT (1) IT1030846B (fr)
NL (1) NL7415671A (fr)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4169732A (en) * 1978-01-09 1979-10-02 International Business Machines Corporation Photosensitive coating composition and use thereof
NO159729C (no) * 1978-11-01 1989-02-01 Coates Brothers & Co Fremgangsmaate for fremstilling av et moenster av loddemetall paa et lag elektrisk ledende metall baaret av et ikke-ledende underlag.
JPS5622364A (en) 1979-08-01 1981-03-02 Matsushita Electric Ind Co Ltd Coating composition
US4390615A (en) 1979-11-05 1983-06-28 Courtney Robert W Coating compositions
DE3374413D1 (en) * 1982-06-24 1987-12-17 Ciba Geigy Ag Photopolymerisable coating, photopolymerisable material and its use
JPS61125019A (ja) * 1984-11-16 1986-06-12 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション 集積回路製造方法及びその方法に使用する光導電性フオトレジスト複合体
US4933398A (en) * 1987-07-01 1990-06-12 Ciba-Geigy Corporation Photosensitive epoxy resins and use thereof
GB8715436D0 (en) * 1987-07-01 1987-08-05 Ciba Geigy Ag Substituted anthraquinones
JPH0491104A (ja) * 1990-08-06 1992-03-24 Ootex Kk 光重合反応開始剤

Also Published As

Publication number Publication date
GB1448643A (en) 1976-09-08
JPS5234935B2 (fr) 1977-09-06
DE2459179A1 (de) 1975-06-26
JPS5097324A (fr) 1975-08-02
FR2255629A1 (fr) 1975-07-18
DE2459179B2 (de) 1977-04-21
NL7415671A (nl) 1975-06-24
IT1030846B (it) 1979-04-10
FR2255629B1 (fr) 1976-10-22
ES433118A1 (es) 1976-11-16
CH613287A5 (en) 1979-09-14
BR7410702D0 (pt) 1975-09-02

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