GB1448643A - Photosensitive materials - Google Patents
Photosensitive materialsInfo
- Publication number
- GB1448643A GB1448643A GB5034474A GB5034474A GB1448643A GB 1448643 A GB1448643 A GB 1448643A GB 5034474 A GB5034474 A GB 5034474A GB 5034474 A GB5034474 A GB 5034474A GB 1448643 A GB1448643 A GB 1448643A
- Authority
- GB
- United Kingdom
- Prior art keywords
- epoxide
- reaction
- photosensitiser
- coatings
- added
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
- C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
- C08F299/026—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from the reaction products of polyepoxides and unsaturated monocarboxylic acids, their anhydrides, halogenides or esters with low molecular weight
- C08F299/028—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from the reaction products of polyepoxides and unsaturated monocarboxylic acids, their anhydrides, halogenides or esters with low molecular weight photopolymerisable compositions
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/50—Amines
- C08G59/5033—Amines aromatic
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
Abstract
In order to produce photopolymerisable coatings, an epoxide prepolymer containing at least two epoxide groups per molecule is reacted with an alpha, beta-ethylenically unsaturated carboxylic acid, a photosensitiser is added to the reaction product, and the resultant composition is applied to a substrate. Simultaneously with or subsequently to the reaction of the epoxide, an addition reaction is carried out between the epoxide and a primary aromatic amine. A mixture of an optionally substituted anthraquinone and an organic halogen compound is added as photosensitiser to the reaction product. These coatings can be used in a photolytic process for the production of printed circuits.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US42687773A | 1973-12-20 | 1973-12-20 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1448643A true GB1448643A (en) | 1976-09-08 |
Family
ID=23692577
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB5034474A Expired GB1448643A (en) | 1973-12-20 | 1974-11-20 | Photosensitive materials |
Country Status (9)
Country | Link |
---|---|
JP (1) | JPS5234935B2 (en) |
BR (1) | BR7410702D0 (en) |
CA (1) | CA1048328A (en) |
CH (1) | CH613287A5 (en) |
ES (1) | ES433118A1 (en) |
FR (1) | FR2255629B1 (en) |
GB (1) | GB1448643A (en) |
IT (1) | IT1030846B (en) |
NL (1) | NL7415671A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2440978A1 (en) * | 1978-11-01 | 1980-06-06 | Coates Brothers & Co | COATING COMPOSITIONS AND METHOD FOR FORMING A COATING FROM SAID COMPOSITION |
US4390615A (en) | 1979-11-05 | 1983-06-28 | Courtney Robert W | Coating compositions |
US4404075A (en) | 1979-08-01 | 1983-09-13 | Matsushita Electric Industrial Co., Ltd. | Radiation curable coating composition comprising three or more (meth) acryloyl polyfunctional monomer, phenol novolak epoxy (meth) acrylate oligomer, and a photoinitiator |
US4601973A (en) * | 1982-06-24 | 1986-07-22 | Ciba-Geigy Corporation | Photopolymerizable coating agent, a photopolymerizable material and its use |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4169732A (en) * | 1978-01-09 | 1979-10-02 | International Business Machines Corporation | Photosensitive coating composition and use thereof |
JPS61125019A (en) * | 1984-11-16 | 1986-06-12 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | Manufacture of ic and photoconductive photoresist composite used therefor |
GB8715436D0 (en) * | 1987-07-01 | 1987-08-05 | Ciba Geigy Ag | Substituted anthraquinones |
US4933398A (en) * | 1987-07-01 | 1990-06-12 | Ciba-Geigy Corporation | Photosensitive epoxy resins and use thereof |
JPH0491104A (en) * | 1990-08-06 | 1992-03-24 | Ootex Kk | Photopolymerization reaction initiator |
-
1974
- 1974-10-18 FR FR7439740A patent/FR2255629B1/fr not_active Expired
- 1974-11-20 GB GB5034474A patent/GB1448643A/en not_active Expired
- 1974-11-27 CA CA214897A patent/CA1048328A/en not_active Expired
- 1974-11-29 IT IT2998874A patent/IT1030846B/en active
- 1974-12-02 NL NL7415671A patent/NL7415671A/en not_active Application Discontinuation
- 1974-12-17 CH CH1680474A patent/CH613287A5/en not_active IP Right Cessation
- 1974-12-19 ES ES433118A patent/ES433118A1/en not_active Expired
- 1974-12-20 JP JP14582574A patent/JPS5234935B2/ja not_active Expired
- 1974-12-20 BR BR1070274A patent/BR7410702D0/en unknown
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2440978A1 (en) * | 1978-11-01 | 1980-06-06 | Coates Brothers & Co | COATING COMPOSITIONS AND METHOD FOR FORMING A COATING FROM SAID COMPOSITION |
US4404075A (en) | 1979-08-01 | 1983-09-13 | Matsushita Electric Industrial Co., Ltd. | Radiation curable coating composition comprising three or more (meth) acryloyl polyfunctional monomer, phenol novolak epoxy (meth) acrylate oligomer, and a photoinitiator |
US4390615A (en) | 1979-11-05 | 1983-06-28 | Courtney Robert W | Coating compositions |
US4601973A (en) * | 1982-06-24 | 1986-07-22 | Ciba-Geigy Corporation | Photopolymerizable coating agent, a photopolymerizable material and its use |
US4693961A (en) * | 1982-06-24 | 1987-09-15 | Ciba-Geigy Corporation | Photopolymerizable coating agent, a photopolymerizable material and its use |
Also Published As
Publication number | Publication date |
---|---|
CA1048328A (en) | 1979-02-13 |
CH613287A5 (en) | 1979-09-14 |
DE2459179A1 (en) | 1975-06-26 |
ES433118A1 (en) | 1976-11-16 |
FR2255629A1 (en) | 1975-07-18 |
JPS5097324A (en) | 1975-08-02 |
FR2255629B1 (en) | 1976-10-22 |
IT1030846B (en) | 1979-04-10 |
BR7410702D0 (en) | 1975-09-02 |
DE2459179B2 (en) | 1977-04-21 |
JPS5234935B2 (en) | 1977-09-06 |
NL7415671A (en) | 1975-06-24 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
ATE82290T1 (en) | ALDITOLDIACETALS OF HIGH PURITY AND FREE OF ORGANIC SOLVENTS TRACES AND PROCESSES FOR THEIR PRODUCTION. | |
GB1448643A (en) | Photosensitive materials | |
SE7706145L (en) | COATING COMPOSITION | |
GB1450994A (en) | Process for the preparation of a resin | |
DE3860999D1 (en) | COMPOSITIONS OF POLYARYL ALKANOLIGOMERS CONTAINING XYLOL GROUPS AND METHOD FOR THE PRODUCTION THEREOF. | |
GB1541460A (en) | Process for the preparation of acetoacetarylamides | |
ATE4905T1 (en) | PROCESS FOR THE MANUFACTURE OF AQUEOUS EPOXY RESIN DISPERSIONS AND THEIR USE. | |
CH624815B (en) | PROCESS FOR PRINTING SUBSTRATES CONTAINING ACID GROUPS WITH CATIONIC COLORS AND THEIR PRODUCTION. | |
BR8203729A (en) | PROCESS FOR THE MANUFACTURE OF EPOXIDES | |
GB1454037A (en) | Process for preparing perchloromethylbenzene | |
GB1536320A (en) | Process for the mono-diazotization of aromatic diamines | |
JPS5649773A (en) | Pigment paste aid | |
ZA833361B (en) | Polyalkyldiazaspirodecanylacetic acid derivatives,a process for their preparation and their use as light stabilizers for organic polymers | |
JPS567796A (en) | Organic silicon compound | |
JPS51133206A (en) | Process for preparation of alpha,omega-diiodopolyfluoroalkanes | |
GB1062769A (en) | Pigments of the 3-hydroxyquinophthalone series and processes for their manufacture | |
JPS55111259A (en) | Production of printing plate | |
DE3666045D1 (en) | Process for the preparation of films | |
CH423244A (en) | Process for the production of poly (ethylene glycol terephthalate) by reacting dimethyl terephthalate with ethylene glycol and polycondensation of the reaction product | |
JPS5219635A (en) | Process for esterification | |
GB999084A (en) | A process of manufacturing tri-o-acyl derivatives of 6-azauridine | |
JPS5217416A (en) | Process for preparation of long chain unsaturated carboxylic acid este r | |
GB996724A (en) | Improvements in and relating to hardenable polyepoxides | |
GB1099863A (en) | Photochemical reaction process | |
Cooke | A photochemical vinylcyclopropane to cyclopentene rearrangement |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PCNP | Patent ceased through non-payment of renewal fee |