CA1038325A - Compositions and process for the electrodeposition of metals - Google Patents
Compositions and process for the electrodeposition of metalsInfo
- Publication number
- CA1038325A CA1038325A CA203,082A CA203082A CA1038325A CA 1038325 A CA1038325 A CA 1038325A CA 203082 A CA203082 A CA 203082A CA 1038325 A CA1038325 A CA 1038325A
- Authority
- CA
- Canada
- Prior art keywords
- aqueous solution
- metal
- copper
- metal ion
- composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000203 mixture Substances 0.000 title claims abstract description 22
- 238000000034 method Methods 0.000 title claims abstract description 21
- 238000004070 electrodeposition Methods 0.000 title claims abstract description 11
- 229910052751 metal Inorganic materials 0.000 title abstract description 42
- 239000002184 metal Substances 0.000 title abstract description 42
- 150000002739 metals Chemical group 0.000 title abstract description 9
- 229910021645 metal ion Inorganic materials 0.000 claims abstract description 18
- 239000007864 aqueous solution Substances 0.000 claims abstract description 14
- -1 methylene phosphonic acid Chemical compound 0.000 claims abstract description 14
- 238000009713 electroplating Methods 0.000 claims description 34
- 239000010949 copper Substances 0.000 claims description 20
- 229910052802 copper Inorganic materials 0.000 claims description 18
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 17
- 150000001875 compounds Chemical class 0.000 claims description 11
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 10
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 8
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 8
- 229910052725 zinc Inorganic materials 0.000 claims description 8
- 239000011701 zinc Substances 0.000 claims description 8
- 229910052793 cadmium Inorganic materials 0.000 claims description 5
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 claims description 5
- 229910052742 iron Inorganic materials 0.000 claims description 5
- 229910052759 nickel Inorganic materials 0.000 claims description 4
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical group [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 claims description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052783 alkali metal Inorganic materials 0.000 claims description 3
- 150000001340 alkali metals Chemical group 0.000 claims description 3
- 125000005210 alkyl ammonium group Chemical group 0.000 claims description 3
- 150000001412 amines Chemical group 0.000 claims description 3
- 229910052804 chromium Inorganic materials 0.000 claims description 3
- 239000011651 chromium Substances 0.000 claims description 3
- 229910052739 hydrogen Inorganic materials 0.000 claims description 3
- 239000001257 hydrogen Substances 0.000 claims description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 3
- 238000007747 plating Methods 0.000 description 14
- 239000000243 solution Substances 0.000 description 14
- 239000000654 additive Substances 0.000 description 9
- 150000003839 salts Chemical class 0.000 description 8
- 229910001369 Brass Inorganic materials 0.000 description 7
- DBVJJBKOTRCVKF-UHFFFAOYSA-N Etidronic acid Chemical compound OP(=O)(O)C(O)(C)P(O)(O)=O DBVJJBKOTRCVKF-UHFFFAOYSA-N 0.000 description 7
- 239000010951 brass Substances 0.000 description 7
- 229910000831 Steel Inorganic materials 0.000 description 6
- 239000010959 steel Substances 0.000 description 6
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 5
- 239000002253 acid Substances 0.000 description 4
- 150000002825 nitriles Chemical class 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 150000001450 anions Chemical class 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 239000000872 buffer Substances 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 229910000365 copper sulfate Inorganic materials 0.000 description 2
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 2
- LELOWRISYMNNSU-UHFFFAOYSA-N hydrogen cyanide Chemical compound N#C LELOWRISYMNNSU-UHFFFAOYSA-N 0.000 description 2
- 125000000325 methylidene group Chemical group [H]C([H])=* 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- KRKNYBCHXYNGOX-UHFFFAOYSA-K Citrate Chemical compound [O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O KRKNYBCHXYNGOX-UHFFFAOYSA-K 0.000 description 1
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 241001163743 Perlodes Species 0.000 description 1
- SZKKRCSOSQAJDE-UHFFFAOYSA-N Schradan Chemical compound CN(C)P(=O)(N(C)C)OP(=O)(N(C)C)N(C)C SZKKRCSOSQAJDE-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- YDONNITUKPKTIG-UHFFFAOYSA-N [Nitrilotris(methylene)]trisphosphonic acid Chemical compound OP(O)(=O)CN(CP(O)(O)=O)CP(O)(O)=O YDONNITUKPKTIG-UHFFFAOYSA-N 0.000 description 1
- 159000000021 acetate salts Chemical class 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 125000001118 alkylidene group Chemical group 0.000 description 1
- GCPXMJHSNVMWNM-UHFFFAOYSA-N arsenous acid Chemical class O[As](O)O GCPXMJHSNVMWNM-UHFFFAOYSA-N 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 239000010953 base metal Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 239000006172 buffering agent Substances 0.000 description 1
- 150000001721 carbon Chemical group 0.000 description 1
- 239000010406 cathode material Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000000536 complexating effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 150000004696 coordination complex Chemical class 0.000 description 1
- 229910001431 copper ion Inorganic materials 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- MCWXGJITAZMZEV-UHFFFAOYSA-N dimethoate Chemical compound CNC(=O)CSP(=S)(OC)OC MCWXGJITAZMZEV-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000007710 freezing Methods 0.000 description 1
- 230000008014 freezing Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 231100001261 hazardous Toxicity 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 230000007775 late Effects 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 150000002903 organophosphorus compounds Chemical class 0.000 description 1
- 125000001997 phenyl group Chemical class [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 150000003009 phosphonic acids Chemical class 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 231100000614 poison Toxicity 0.000 description 1
- 230000007096 poisonous effect Effects 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US373051A US3914162A (en) | 1973-06-25 | 1973-06-25 | Compositions and process for the electrodeposition of metals |
Publications (1)
Publication Number | Publication Date |
---|---|
CA1038325A true CA1038325A (en) | 1978-09-12 |
Family
ID=23470708
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA203,082A Expired CA1038325A (en) | 1973-06-25 | 1974-06-21 | Compositions and process for the electrodeposition of metals |
Country Status (11)
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52106331A (en) * | 1976-03-05 | 1977-09-06 | Kosaku Kk | Plating bath |
DE2732777C2 (de) * | 1977-07-20 | 1979-09-13 | Benckiser-Knapsack Gmbh, 6802 Ladenburg | N-Carboxyalkan-aminoalkan-polyphosphonsäuren und deren Alkalisalze sowie Verfahren zu ihrer Herstellung |
DE2756516A1 (de) | 1977-12-19 | 1979-06-21 | Hoechst Ag | Wasch- und reinigungsmittel |
US4265715A (en) * | 1979-07-13 | 1981-05-05 | Oxy Metal Industries Corporation | Silver electrodeposition process |
USH325H (en) | 1980-07-30 | 1987-09-01 | Richardson Chemical Company | Electroless deposition of transition metals |
US4469569A (en) * | 1983-01-03 | 1984-09-04 | Omi International Corporation | Cyanide-free copper plating process |
FR2538815B1 (fr) * | 1983-01-03 | 1990-02-02 | Omi Int Corp | Procede pour former, par electrolyse, un revetement de cuivre sur un substrat, a partir d'un bain exempt de cyanure, et anode pour la mise en oeuvre de ce procede |
US4979987A (en) * | 1988-07-19 | 1990-12-25 | First Miss Gold, Inc. | Precious metals recovery from refractory carbonate ores |
US5021324A (en) * | 1990-10-05 | 1991-06-04 | Polychrome Corporation | Printing plate protectant |
US5266212A (en) * | 1992-10-13 | 1993-11-30 | Enthone-Omi, Inc. | Purification of cyanide-free copper plating baths |
US5607570A (en) * | 1994-10-31 | 1997-03-04 | Rohbani; Elias | Electroplating solution |
US7604783B2 (en) | 2004-12-22 | 2009-10-20 | Placer Dome Technical Services Limited | Reduction of lime consumption when treating refractor gold ores or concentrates |
RU2338814C2 (ru) * | 2005-11-18 | 2008-11-20 | Федеральное государственное образовательное учреждение высшего профессионального образования "Астраханский государственный технический университет" | Электролит для электроосаждения кадмия |
US8061888B2 (en) | 2006-03-17 | 2011-11-22 | Barrick Gold Corporation | Autoclave with underflow dividers |
US8252254B2 (en) | 2006-06-15 | 2012-08-28 | Barrick Gold Corporation | Process for reduced alkali consumption in the recovery of silver |
CN110392751B (zh) * | 2017-03-31 | 2022-05-17 | 日本电镀工程股份有限公司 | 电解银电镀液 |
CN113832509B (zh) * | 2021-09-30 | 2022-08-26 | 深圳市联合蓝海黄金材料科技股份有限公司 | 用于在镍镀层上电镀金的镀液和在镍镀层上电镀金的方法和镀金件 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2673214A (en) * | 1952-06-11 | 1954-03-23 | Bersworth | Polyhydroxyamino acid compounds |
US2961311A (en) * | 1955-12-13 | 1960-11-22 | Dow Chemical Co | Metal ion control |
US3293176A (en) * | 1964-04-01 | 1966-12-20 | Le Roy A White | Method of chelating with an ethergroup-containing sequestering agent |
DE1496917A1 (de) * | 1964-09-22 | 1969-05-22 | Monsanto Co | Elektrolytbaeder sowie Verfahren fuer die Herstellung galvanischer UEberzuege |
DE1217950B (de) * | 1965-02-25 | 1966-06-02 | Henkel & Cie Gmbh | Verfahren zur Herstellung neuer Perhydrate von Aminoalkylphosphonsaeuren |
FR96342E (enrdf_load_stackoverflow) * | 1967-12-09 | 1972-06-16 | ||
GB1392242A (en) * | 1971-07-26 | 1975-04-30 | Technic | Process for producing by electrodeposition bright deposits of gold and its alloys |
BE791401A (fr) * | 1971-11-15 | 1973-05-14 | Monsanto Co | Compositions et procedes electrochimiques |
-
1973
- 1973-06-25 US US373051A patent/US3914162A/en not_active Expired - Lifetime
-
1974
- 1974-01-01 AR AR254353A patent/AR207452A1/es active
- 1974-06-21 CA CA203,082A patent/CA1038325A/en not_active Expired
- 1974-06-24 JP JP49071438A patent/JPS5036322A/ja active Pending
- 1974-06-24 DE DE2430250A patent/DE2430250A1/de not_active Withdrawn
- 1974-06-24 FR FR7421880A patent/FR2234388B1/fr not_active Expired
- 1974-06-24 GB GB2793974A patent/GB1438080A/en not_active Expired
- 1974-06-24 SE SE7408241A patent/SE7408241L/xx unknown
- 1974-06-24 BR BR5129/74A patent/BR7405129D0/pt unknown
- 1974-06-24 IT IT24337/74A patent/IT1015337B/it active
- 1974-06-25 BE BE145834A patent/BE816806A/xx unknown
Also Published As
Publication number | Publication date |
---|---|
BR7405129D0 (pt) | 1975-01-21 |
AR207452A1 (es) | 1976-10-08 |
FR2234388A1 (enrdf_load_stackoverflow) | 1975-01-17 |
SE7408241L (enrdf_load_stackoverflow) | 1974-12-27 |
GB1438080A (enrdf_load_stackoverflow) | 1976-06-03 |
US3914162A (en) | 1975-10-21 |
JPS5036322A (enrdf_load_stackoverflow) | 1975-04-05 |
IT1015337B (it) | 1977-05-10 |
BE816806A (fr) | 1974-12-27 |
DE2430250A1 (de) | 1975-01-23 |
USB373051I5 (enrdf_load_stackoverflow) | 1975-01-28 |
FR2234388B1 (enrdf_load_stackoverflow) | 1978-02-17 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CA1038325A (en) | Compositions and process for the electrodeposition of metals | |
US3706634A (en) | Electrochemical compositions and processes | |
KR101502804B1 (ko) | Pd 및 Pd-Ni 전해질 욕조 | |
GB2144769A (en) | Zinc and zinc alloy electroplating | |
US4469569A (en) | Cyanide-free copper plating process | |
US3475293A (en) | Electrodeposition of metals | |
CA1103197A (en) | Electroplating gold-cobalt alloys | |
JP2005517814A (ja) | 有機酸錯化剤を含む電気めっき溶液 | |
US4066517A (en) | Electrodeposition of palladium | |
US3879270A (en) | Compositions and process for the electrodeposition of metals | |
US4391679A (en) | Electrolytic bath and process for the deposition of gold alloy coatings | |
GB2069004A (en) | Bright palladium electrodeposition | |
GB2179676A (en) | Zinc alloy electroplating | |
US4478692A (en) | Electrodeposition of palladium-silver alloys | |
CN100424232C (zh) | 镍电镀液 | |
US4069113A (en) | Electroplating gold alloys and electrolytes therefor | |
US6054037A (en) | Halogen additives for alkaline copper use for plating zinc die castings | |
SE438872B (sv) | Forfarande och medel for att elektrolytiskt utfella jern och atminstone en av metallerna nickel och kobolt | |
US4521282A (en) | Cyanide-free copper electrolyte and process | |
JPS5937354B2 (ja) | 金合金電気めっき浴および金合金 | |
US4439285A (en) | Trivalent chromium electrolyte and process employing neodymium reducing agent | |
US4615774A (en) | Gold alloy plating bath and process | |
US4134804A (en) | Cyanide-free zinc plating bath and process | |
CA1183858A (en) | Additive and alkaline zinc electroplating bath and process | |
US4207148A (en) | Electroplating bath for the electrodeposition of tin and tin/cadmium deposits |