CA1018475A - Method and apparatus for thin film deposition on a substrate - Google Patents

Method and apparatus for thin film deposition on a substrate

Info

Publication number
CA1018475A
CA1018475A CA189,611A CA189611A CA1018475A CA 1018475 A CA1018475 A CA 1018475A CA 189611 A CA189611 A CA 189611A CA 1018475 A CA1018475 A CA 1018475A
Authority
CA
Canada
Prior art keywords
substrate
thin film
film deposition
deposition
thin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA189,611A
Other languages
English (en)
Inventor
Manfred R. Kuehnle
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Coulter Information Systems Inc
Original Assignee
Coulter Information Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Coulter Information Systems Inc filed Critical Coulter Information Systems Inc
Application granted granted Critical
Publication of CA1018475A publication Critical patent/CA1018475A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32733—Means for moving the material to be treated
    • H01J37/32752—Means for moving the material to be treated for moving the material across the discharge
    • H01J37/32761—Continuous moving
    • H01J37/3277—Continuous moving of continuous material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3464—Sputtering using more than one target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
CA189,611A 1973-01-12 1974-01-07 Method and apparatus for thin film deposition on a substrate Expired CA1018475A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US323133A US3884787A (en) 1973-01-12 1973-01-12 Sputtering method for thin film deposition on a substrate

Publications (1)

Publication Number Publication Date
CA1018475A true CA1018475A (en) 1977-10-04

Family

ID=23257860

Family Applications (1)

Application Number Title Priority Date Filing Date
CA189,611A Expired CA1018475A (en) 1973-01-12 1974-01-07 Method and apparatus for thin film deposition on a substrate

Country Status (15)

Country Link
US (1) US3884787A (ja)
JP (1) JPS5747267B2 (ja)
AT (1) AT341335B (ja)
BE (1) BE809464A (ja)
CA (1) CA1018475A (ja)
CH (1) CH597622A5 (ja)
DD (1) DD109035A5 (ja)
DE (1) DE2400587A1 (ja)
FR (1) FR2322667A1 (ja)
GB (1) GB1461921A (ja)
IL (1) IL43966A (ja)
IT (1) IT1002650B (ja)
LU (1) LU69122A1 (ja)
NL (1) NL7317670A (ja)
SE (1) SE392919B (ja)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3939052A (en) * 1975-01-15 1976-02-17 Riley Leon H Depositing optical fibers
GB2010676B (en) * 1977-12-27 1982-05-19 Alza Corp Diffusional drug delivery device with block copolymer as drug carrier
US4331526A (en) * 1979-09-24 1982-05-25 Coulter Systems Corporation Continuous sputtering apparatus and method
US4290877A (en) * 1980-09-08 1981-09-22 The United States Of America As Represented By The Secretary Of The Interior Sputtering apparatus for coating elongated tubes and strips
US4384532A (en) * 1980-10-31 1983-05-24 Staff Arthur B Table extension for the handicapped
US4343881A (en) * 1981-07-06 1982-08-10 Savin Corporation Multilayer photoconductive assembly with intermediate heterojunction
US4389295A (en) * 1982-05-06 1983-06-21 Gte Products Corporation Thin film phosphor sputtering process
JPS5976571A (ja) * 1982-10-25 1984-05-01 Natl House Ind Co Ltd 塗布装置
GB8332394D0 (en) * 1983-12-05 1984-01-11 Pilkington Brothers Plc Coating apparatus
NL8602759A (nl) * 1986-10-31 1988-05-16 Bekaert Sa Nv Werkwijze en inrichting voor het behandelen van een langwerpig substraat, dat van een deklaag voorzien is; alsmede volgens die werkwijze behandelde substraten en met deze substraten versterkte voorwerpen uit polymeermateriaal.
US5219668A (en) * 1986-10-31 1993-06-15 N.V. Bekaert S.A. Process and apparatus for the treatment of coated, elongated substrate, as well as substrates thus treated and articles of polymeric material reinforced with these substrates
US4849087A (en) * 1988-02-11 1989-07-18 Southwall Technologies Apparatus for obtaining transverse uniformity during thin film deposition on extended substrate
EP0364619B1 (de) * 1988-10-19 1993-12-29 Ibm Deutschland Gmbh Vorrichtung zum Plasma- oder reaktiven Ionenätzen und Verfahren zum Ätzen schlecht wärmeleitender Substrate
DE29600991U1 (de) * 1996-01-20 1997-05-22 Strämke, Siegfried, Dr.-Ing., 52538 Selfkant Plasmareaktor
US5725706A (en) * 1996-03-12 1998-03-10 The Whitaker Corporation Laser transfer deposition
US6066826A (en) * 1998-03-16 2000-05-23 Yializis; Angelo Apparatus for plasma treatment of moving webs
EP1347077B1 (en) * 2002-03-15 2006-05-17 VHF Technologies SA Apparatus and method for the production of flexible semiconductor devices
CH696013A5 (de) * 2002-10-03 2006-11-15 Tetra Laval Holdings & Finance Vorrichtung zur Behandlung eines bandförmigen Materials in einem Plasma-unterstützten Prozess.
US6906008B2 (en) * 2003-06-26 2005-06-14 Superpower, Inc. Apparatus for consecutive deposition of high-temperature superconducting (HTS) buffer layers
US7169232B2 (en) * 2004-06-01 2007-01-30 Eastman Kodak Company Producing repetitive coatings on a flexible substrate
ES2344904T3 (es) * 2004-12-29 2010-09-09 Sca Hygiene Products Ab Dispensador de toallas de papel "manos libres" y un sistema dispensador.
DE102005058869A1 (de) * 2005-12-09 2007-06-14 Cis Solartechnik Gmbh & Co. Kg Verfahren und Vorrichtung zur Beschichtung von Bändern
KR100750654B1 (ko) * 2006-09-15 2007-08-20 한국전기연구원 장선 테이프 증착장치
KR100928222B1 (ko) * 2007-10-31 2009-11-24 한국전기연구원 가이드 롤러가 구비된 장선 증착 장치
US20090194505A1 (en) * 2008-01-24 2009-08-06 Microcontinuum, Inc. Vacuum coating techniques
EP2113585A1 (en) * 2008-04-29 2009-11-04 Applied Materials, Inc. Apparatus and method for coating of a web in vacuum by twisting and guiding the web multiple times along a roller past a processing region
TW201110831A (en) * 2009-09-03 2011-03-16 Chunghwa Picture Tubes Ltd Plasma apparatus and method of fabricating nano-crystalline silicon thin film
PL2508315T3 (pl) 2011-04-07 2014-02-28 Gedore Werkzeugfabrik Gmbh & Co Kg Klin rozszczepiający
WO2014120295A2 (en) * 2012-10-22 2014-08-07 Proportional Technologies, Inc. Method and apparatus for coating thin foil with a boron coating
KR20140061808A (ko) * 2012-11-14 2014-05-22 삼성디스플레이 주식회사 유기물 증착 장치
US10112836B2 (en) * 2012-11-26 2018-10-30 The Regents Of The University Of Michigan Continuous nanosynthesis apparatus and process
KR20230053660A (ko) * 2020-08-21 2023-04-21 어플라이드 머티어리얼스, 인코포레이티드 플렉시블 기판을 프로세싱하기 위한 프로세싱 시스템 및 플렉시블 기판의 속성 및 플렉시블 기판 상의 하나 이상의 코팅들의 속성 중 적어도 하나를 측정하는 방법

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2249710A (en) * 1935-02-18 1941-07-15 Ind Rayon Corp Apparatus for continuously processing thread or the like
NL143409C (ja) * 1947-11-20
US3068510A (en) * 1959-12-14 1962-12-18 Radiation Res Corp Polymerizing method and apparatus
BE599444A (ja) * 1960-02-03
US3343207A (en) * 1963-10-14 1967-09-26 Monsanto Co Novelty yarn apparatus
US3272175A (en) * 1965-05-12 1966-09-13 Heraeus Gmbh W C Vapor deposition means for strip-coating continuously moving, helically wound ribbon
US3477902A (en) * 1965-10-14 1969-11-11 Radiation Res Corp Process for making tires by exposure to an ionized gas and treatment with resorcinol-formaldehyde/latex composition and the product
DE1802932B2 (de) * 1968-10-14 1974-11-14 W.C. Heraeus Gmbh, 6450 Hanau Verfahren zur Herstellung eines elektrischen Schaltkontaktes
US3598639A (en) * 1968-12-09 1971-08-10 Bror Olov Nikolaus Hansson Method of continuously producing metal wire and profiles
US3700489A (en) * 1970-07-30 1972-10-24 Ethicon Inc Process for applying a thin coating of polytetrafluoroethylene

Also Published As

Publication number Publication date
AT341335B (de) 1978-02-10
US3884787A (en) 1975-05-20
LU69122A1 (ja) 1975-12-09
JPS5747267B2 (ja) 1982-10-08
ATA9674A (de) 1977-05-15
GB1461921A (en) 1977-01-19
DE2400587A1 (de) 1974-07-18
NL7317670A (ja) 1974-07-16
IL43966A (en) 1976-12-31
CH597622A5 (ja) 1978-04-14
BE809464A (fr) 1974-07-08
DD109035A5 (ja) 1974-10-12
IT1002650B (it) 1976-05-20
IL43966A0 (en) 1974-06-30
JPS49104972A (ja) 1974-10-04
SE392919B (sv) 1977-04-25
FR2322667A1 (fr) 1977-04-01
FR2322667B1 (ja) 1978-10-27

Similar Documents

Publication Publication Date Title
CA1018475A (en) Method and apparatus for thin film deposition on a substrate
CA1000651A (en) Method and apparatus for depositing film on a substrate
CA1016496A (en) Thin film deposition apparatus using segmented target means
CA1035255A (en) Thin film coating apparatus
CA1027895A (en) Method for coating a substrate
CA952661A (en) Method for coating a substrate
CA1000466A (en) Method and apparatus for slitting a film
CA997632A (en) Method and apparatus for coating a substrate with plastic
JPS5285083A (en) Apparatus for coating with thin film
AU477153B2 (en) A process for forming resinous films on aluminium-bearing substrates
CA1021444A (en) Electronic apparatus equipped on a flexible substratum
CA1022438A (en) Method of epitaxially depositing a semiconductor material on a substrate
DE3069815D1 (en) Method and apparatus for pretreating a substrate, method and apparatus for pretreating a substrate and depositing a thin metallic film thereon
CA998825A (en) Process and apparatus for reacting a thin liquid film with a gas
CA988453A (en) Method and apparatus for curing a coating of a substrate
AU457184B2 (en) Apparatus for depositing liquid on discrete areas ofa substrate
CA901399A (en) Process for depositing carbon film on a substrate
AU483835B2 (en) Method and apparatus for depositing filmon a substrate, and products produced thereby
JPS525682A (en) Sputtering apparatus for long length substrates
CA1030824A (en) Method for coating a substrate with insulating particles
JPS5373268A (en) Method for coating film on plate
CA988457A (en) Method for depositing corundum onto a substrate
CA862662A (en) Apparatus for forming a thin film
AU469872B2 (en) Method and apparatus for vapor depositing coating on substrates
CA899616A (en) Apparatus for coating a thin, uniform thickness stripe on a substrate