BRPI0511114A - silicato estruturado hidrófobo, semelhante a sal - Google Patents
silicato estruturado hidrófobo, semelhante a salInfo
- Publication number
- BRPI0511114A BRPI0511114A BRPI0511114-5A BRPI0511114A BRPI0511114A BR PI0511114 A BRPI0511114 A BR PI0511114A BR PI0511114 A BRPI0511114 A BR PI0511114A BR PI0511114 A BRPI0511114 A BR PI0511114A
- Authority
- BR
- Brazil
- Prior art keywords
- silicate
- salt
- combination
- structured
- structured silicate
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G9/00—Developers
- G03G9/08—Developers with toner particles
- G03G9/097—Plasticisers; Charge controlling agents
- G03G9/09708—Inorganic compounds
- G03G9/09725—Silicon-oxides; Silicates
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
- C09C1/40—Compounds of aluminium
- C09C1/42—Clays
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/80—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70
- C01P2002/88—Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70 by thermal analysis data, e.g. TGA, DTA, DSC
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/51—Particles with a specific particle size distribution
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/12—Surface area
Landscapes
- Chemical & Material Sciences (AREA)
- Dispersion Chemistry (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Detergent Compositions (AREA)
- Silicates, Zeolites, And Molecular Sieves (AREA)
- Silicon Compounds (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
SILICATO ESTRUTURADO HIDRóFOBO, SEMELHANTE A SAL. A presente invenção refere-se a um silicato estruturado hidrófobo similar a sal. O cátion do silicato estruturado similar a sal é um cátion orgânico molecular baixo ou uma combinação do mesmo com um íon NH~ 4~ ¬ +¬, H~ 3~O¬ +¬, metal alquila, metal alcalino-terroso, íon de metal terroso e/ou de transição. O ânion do silicato estruturado similar a sal é uma ilha, anel, grupo, cadeia, faixa, camada ou silicato tridimensional ou uma combinação dos mesmos. O silicato estruturado é produzido por: a) reação de um silicato estruturado, cujo cátion é NH~ 4~¬ +¬, H~ 3~O¬ +¬, um íon de metal alcalino, íon de metal alcalino-terroso, íon de metal terroso, um íon de metal de transição ou uma combinação dos mesmos e o cujo ânion é uma ilha, anel, grupo, cadeia, faixa, camada ou silicato tridimensional ou uma combinação dos mesmos, em uma dispersão aquosa com um cátion orgânico de peso molecular inferior; por b) adição e combinação intensiva com a dispersão aquosa do silicato estruturado, de um composto hidrófobo do grupo de ceras e sabões metálicos em uma quantidade variando de 0,2 a 200% em peso do silicato estruturado similar a sal na etapa (a), antes, durante e/ou após a etapa (a) ser realizada; e por (c) remoção, secagem e isolamento opcional, na forma de um pó, do silicato estruturado hidrófobo similar a sal produzido durante a etapa (b).
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102004024001A DE102004024001A1 (de) | 2004-05-14 | 2004-05-14 | Hydrophobiertes salzartiges Struktursilikat |
PCT/EP2005/004542 WO2005111729A2 (de) | 2004-05-14 | 2005-04-28 | Hydrophobiertes salzartiges struktursilikat |
Publications (1)
Publication Number | Publication Date |
---|---|
BRPI0511114A true BRPI0511114A (pt) | 2007-11-27 |
Family
ID=35311139
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BRPI0511114-5A BRPI0511114A (pt) | 2004-05-14 | 2005-04-28 | silicato estruturado hidrófobo, semelhante a sal |
Country Status (8)
Country | Link |
---|---|
US (1) | US20080107986A1 (pt) |
EP (1) | EP1749064A2 (pt) |
JP (1) | JP2007537120A (pt) |
CN (1) | CN101098940A (pt) |
BR (1) | BRPI0511114A (pt) |
CA (1) | CA2566386A1 (pt) |
DE (1) | DE102004024001A1 (pt) |
WO (1) | WO2005111729A2 (pt) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7943280B2 (en) * | 2006-03-15 | 2011-05-17 | Ricoh Company, Ltd. | Toner containing a laminar inorganic mineral in which part or all of the ions present between layers are modified by organic ions |
EP2037325B1 (en) * | 2006-06-30 | 2013-07-24 | Zeon Corporation | Electrostatic image-developing toner |
JP4721969B2 (ja) * | 2006-07-12 | 2011-07-13 | 花王株式会社 | 電子写真用トナー |
US7939237B2 (en) | 2007-08-17 | 2011-05-10 | Xerox Corporation | Nano-sized composites containing polymer modified clays and method for making toner particles using same |
US7892714B2 (en) * | 2007-08-17 | 2011-02-22 | Xerox Corporation | Toner particles having nano-sized composites containing polymer modified clays |
US20090067876A1 (en) * | 2007-09-10 | 2009-03-12 | Takuya Seshita | Image forming method, image forming apparatus and process cartridge |
US8377620B2 (en) * | 2007-11-30 | 2013-02-19 | Ricoh Company, Limited | Image forming apparatus, image forming method, and toner for image forming apparatus |
JP5471865B2 (ja) * | 2010-06-14 | 2014-04-16 | 株式会社リコー | トナー、並びに、現像剤及び画像形成方法 |
EP2407505A1 (de) * | 2010-07-12 | 2012-01-18 | Bayer MaterialScience AG | Polymermaterial mit organisch modifizierten Schichtsilikaten |
JP2013080200A (ja) * | 2011-05-02 | 2013-05-02 | Ricoh Co Ltd | 電子写真用トナー、現像剤、及び画像形成装置 |
CN103827230B (zh) * | 2011-08-03 | 2016-07-06 | 堺化学工业株式会社 | 复合粉体及其制造方法 |
JP5900072B2 (ja) * | 2012-03-21 | 2016-04-06 | 株式会社リコー | 電子写真用トナー、現像剤、画像形成装置、及び電子写真用トナーの製造方法 |
DE102013005479A1 (de) | 2013-03-28 | 2014-10-02 | Institut für Kunststofftechnologie und -recycling e.V. | Verfahren zur Herstellung von Pulverlack-Beschichtungsmassen mit antimikrobieller Wirkung |
CN104342327B (zh) * | 2013-08-08 | 2018-01-12 | 厦门泰益新洁净科技有限公司 | 一种油污清洁剂及其制备和使用方法 |
JP6746889B2 (ja) * | 2015-09-25 | 2020-08-26 | 富士ゼロックス株式会社 | 光輝性トナー、静電荷像現像剤、トナーカートリッジ、プロセスカートリッジ、画像形成装置、及び画像形成方法 |
CN111717924A (zh) * | 2020-05-15 | 2020-09-29 | 苏州国建慧投矿物新材料有限公司 | 一种改性膨润土及其制备方法和应用 |
CN113731632A (zh) * | 2021-09-02 | 2021-12-03 | 江西金泰源陶瓷有限公司 | 一种陶瓷干法制粉收尘除杂一体化装置 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CH531989A (de) * | 1967-10-12 | 1972-12-31 | Degussa | Verfahren zur Herstellung von organisch modifizierten Kieselsäuren und Silikaten |
JP2682220B2 (ja) * | 1990-09-17 | 1997-11-26 | 富士ゼロックス株式会社 | 静電荷像用現像剤 |
US5248581A (en) * | 1990-11-22 | 1993-09-28 | Tomoegawa Paper Co., Ltd. | Toner for electrophotography |
ATE259007T1 (de) * | 1993-03-09 | 2004-02-15 | Trevira Gmbh | Elektretfasern mit verbesserter ladungsstabilität,verfahren zu ihrer herstellung, und textilmaterial enthaltend diese elektretfasern |
DE19707448C2 (de) * | 1997-02-25 | 1998-11-26 | Clariant Gmbh | Verfahren zur Herstellung von kristallinen Natriumsilikaten |
DE19707449C1 (de) * | 1997-02-25 | 1998-04-09 | Clariant Gmbh | Verfahren zur Herstellung von kristallinen Natriumsilikaten |
DE19727894A1 (de) * | 1997-07-01 | 1999-05-06 | Clariant Gmbh | Synthetisches Magnesiumsilikat |
DE19957245A1 (de) * | 1999-11-27 | 2001-05-31 | Clariant Gmbh | Verwendung von salzartigen Struktursilikaten als Ladungssteuermittel |
DE10235570A1 (de) * | 2002-08-03 | 2004-02-19 | Clariant Gmbh | Verwendung von Salzen schichtartiger Doppelhydroxide |
DE10235571A1 (de) * | 2002-08-03 | 2004-02-12 | Clariant Gmbh | Verwendung von Salzen schichtartiger Doppelhydroxide als Ladungssteuermittel |
KR20060025524A (ko) * | 2003-06-12 | 2006-03-21 | 쉬드-케미아크티엔게젤샤프트 | 폴리머에서 박리를 개선시키는 나노복합재료 첨가제의 제조방법 |
-
2004
- 2004-05-14 DE DE102004024001A patent/DE102004024001A1/de not_active Withdrawn
-
2005
- 2005-04-28 BR BRPI0511114-5A patent/BRPI0511114A/pt not_active Application Discontinuation
- 2005-04-28 JP JP2007511965A patent/JP2007537120A/ja not_active Withdrawn
- 2005-04-28 CA CA002566386A patent/CA2566386A1/en not_active Abandoned
- 2005-04-28 US US11/596,639 patent/US20080107986A1/en not_active Abandoned
- 2005-04-28 EP EP05733904A patent/EP1749064A2/de not_active Withdrawn
- 2005-04-28 WO PCT/EP2005/004542 patent/WO2005111729A2/de active Application Filing
- 2005-04-28 CN CNA2005800218496A patent/CN101098940A/zh active Pending
Also Published As
Publication number | Publication date |
---|---|
EP1749064A2 (de) | 2007-02-07 |
WO2005111729A3 (de) | 2006-06-08 |
WO2005111729A2 (de) | 2005-11-24 |
CN101098940A (zh) | 2008-01-02 |
US20080107986A1 (en) | 2008-05-08 |
JP2007537120A (ja) | 2007-12-20 |
DE102004024001A1 (de) | 2005-12-08 |
CA2566386A1 (en) | 2005-11-24 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
B11A | Dismissal acc. art.33 of ipl - examination not requested within 36 months of filing | ||
B11Y | Definitive dismissal - extension of time limit for request of examination expired [chapter 11.1.1 patent gazette] |