BR7706777A - Tecnica para evitar a degradacao de juncoes epitaxia-isolamento diretamente polarizadas - Google Patents

Tecnica para evitar a degradacao de juncoes epitaxia-isolamento diretamente polarizadas

Info

Publication number
BR7706777A
BR7706777A BR7706777A BR7706777A BR7706777A BR 7706777 A BR7706777 A BR 7706777A BR 7706777 A BR7706777 A BR 7706777A BR 7706777 A BR7706777 A BR 7706777A BR 7706777 A BR7706777 A BR 7706777A
Authority
BR
Brazil
Prior art keywords
epitaxy
technique
avoid degradation
directly polarized
insulation
Prior art date
Application number
BR7706777A
Other languages
English (en)
Portuguese (pt)
Inventor
R Ayers
R Hamaker
Original Assignee
Ibm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibm filed Critical Ibm
Publication of BR7706777A publication Critical patent/BR7706777A/pt

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76Making of isolation regions between components
    • H01L21/761PN junctions
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/0603Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions
    • H01L29/0607Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration
    • H01L29/0611Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse biased devices
    • H01L29/0615Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse biased devices by the doping profile or the shape or the arrangement of the PN junction, or with supplementary regions, e.g. junction termination extension [JTE]

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Ceramic Engineering (AREA)
  • Element Separation (AREA)
  • Electroluminescent Light Sources (AREA)
  • Bipolar Transistors (AREA)
BR7706777A 1976-10-28 1977-10-07 Tecnica para evitar a degradacao de juncoes epitaxia-isolamento diretamente polarizadas BR7706777A (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/736,646 US4113512A (en) 1976-10-28 1976-10-28 Technique for preventing forward biased epi-isolation degradation

Publications (1)

Publication Number Publication Date
BR7706777A true BR7706777A (pt) 1978-08-22

Family

ID=24960699

Family Applications (1)

Application Number Title Priority Date Filing Date
BR7706777A BR7706777A (pt) 1976-10-28 1977-10-07 Tecnica para evitar a degradacao de juncoes epitaxia-isolamento diretamente polarizadas

Country Status (12)

Country Link
US (1) US4113512A (de)
JP (1) JPS5354490A (de)
BR (1) BR7706777A (de)
CA (1) CA1057419A (de)
CH (1) CH619072A5 (de)
DE (1) DE2746700A1 (de)
ES (1) ES463621A1 (de)
FR (1) FR2369687A1 (de)
GB (1) GB1584990A (de)
IT (1) IT1114162B (de)
NL (1) NL7711278A (de)
SE (1) SE431272B (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4178190A (en) * 1975-06-30 1979-12-11 Rca Corporation Method of making a bipolar transistor with high-low emitter impurity concentration
US5041896A (en) * 1989-07-06 1991-08-20 General Electric Company Symmetrical blocking high voltage semiconductor device and method of fabrication
TW274628B (de) * 1994-06-03 1996-04-21 At & T Corp
JP3408098B2 (ja) * 1997-02-20 2003-05-19 キヤノン株式会社 固体撮像装置及びx線撮像装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1050805A (de) * 1964-06-23 1900-01-01
US3551760A (en) * 1966-03-28 1970-12-29 Hitachi Ltd Semiconductor device with an inversion preventing layer formed in a diffused region
US3653988A (en) * 1968-02-05 1972-04-04 Bell Telephone Labor Inc Method of forming monolithic semiconductor integrated circuit devices
US3631311A (en) * 1968-03-26 1971-12-28 Telefunken Patent Semiconductor circuit arrangement with integrated base leakage resistance
US3964705A (en) * 1970-12-23 1976-06-22 Bassani S.P.A. Frame for the mounting of interchangeable electrical units
US3697827A (en) * 1971-02-09 1972-10-10 Unitrode Corp Structure and formation of semiconductors with transverse conductivity gradients
US3760239A (en) * 1971-06-09 1973-09-18 Cress S Coaxial inverted geometry transistor having buried emitter
DE2241600A1 (de) * 1971-08-26 1973-03-01 Dionics Inc Hochspannungs-p-n-uebergang und seine anwendung in halbleiterschaltelementen, sowie verfahren zu seiner herstellung
US3921199A (en) * 1973-07-31 1975-11-18 Texas Instruments Inc Junction breakdown voltage by means of ion implanted compensation guard ring
US4021270A (en) * 1976-06-28 1977-05-03 Motorola, Inc. Double master mask process for integrated circuit manufacture

Also Published As

Publication number Publication date
FR2369687A1 (fr) 1978-05-26
CH619072A5 (de) 1980-08-29
DE2746700A1 (de) 1978-05-11
ES463621A1 (es) 1978-07-01
IT1114162B (it) 1986-01-27
SE431272B (sv) 1984-01-23
DE2746700C2 (de) 1988-12-22
FR2369687B1 (de) 1980-08-01
US4113512A (en) 1978-09-12
SE7711985L (sv) 1978-04-29
GB1584990A (en) 1981-02-18
CA1057419A (en) 1979-06-26
JPS5354490A (en) 1978-05-17
NL7711278A (de) 1978-05-03
JPS5424270B2 (de) 1979-08-20

Similar Documents

Publication Publication Date Title
MX146326A (es) Mejoras a articulo absorbente
DK489777A (da) Benzamidderivater
FR2346087A1 (fr) Element a filetage exterieur
SE7703914L (sv) Polariseringsomkopplare for mikrovagor
MX143548A (es) Mejoras a cosechadora
DD129613A1 (de) Futterzusaetze fuer wiederkaeuer
AR211629A1 (es) Procedimiento para limpiar impurezas
SE7702467L (sv) Effekthalvledarelement
BR7705458A (pt) Elemento regulador para afetar um trecho de regulagem
IT1196403B (it) Perfezionamenti apportati a dispositivi termoretraibili
IT1087596B (it) Perfezionamenti apportati a dispositivi di comando
MX4467E (es) Mejoras a consistometros
FI773327A (fi) Ljusledande element foer inbyggd i optiska transmissionsorgan
IT1068216B (it) Circuito di polarizzazione di fotodiodi a valanga
BR7706777A (pt) Tecnica para evitar a degradacao de juncoes epitaxia-isolamento diretamente polarizadas
BR7706207A (pt) Processo para preparar um uretano
SE7714655L (sv) Substituerade pyridinkarboxylsyror
BR7707104A (pt) Dispositivo para produzir fitilhos
BR7708014A (pt) Arranjo para impedir perdas de parafusos
BE859096A (nl) Bitumenhoudende samenstelling
MX4638E (es) Proceso para preparar 1-tiazolil imidazolidinonas
AR225295A1 (es) Dispositivo mejorado para determinar malondialdehido
SE7708340L (sv) Salicylsyraderivat
AR213309A1 (es) Procedimiento para preparar 2-amino-isotioureidobencenos substituidos
FR2345821A1 (fr) Element galvanique a remplir