JPS5354490A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPS5354490A
JPS5354490A JP10373377A JP10373377A JPS5354490A JP S5354490 A JPS5354490 A JP S5354490A JP 10373377 A JP10373377 A JP 10373377A JP 10373377 A JP10373377 A JP 10373377A JP S5354490 A JPS5354490 A JP S5354490A
Authority
JP
Japan
Prior art keywords
semiconductor device
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10373377A
Other languages
English (en)
Other versions
JPS5424270B2 (ja
Inventor
Rii Iaazu Robaato
Ueebaa Hameekaa Reimondo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of JPS5354490A publication Critical patent/JPS5354490A/ja
Publication of JPS5424270B2 publication Critical patent/JPS5424270B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76Making of isolation regions between components
    • H01L21/761PN junctions
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/0603Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions
    • H01L29/0607Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration
    • H01L29/0611Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse biased devices
    • H01L29/0615Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse biased devices by the doping profile or the shape or the arrangement of the PN junction, or with supplementary regions, e.g. junction termination extension [JTE]

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Element Separation (AREA)
  • Electroluminescent Light Sources (AREA)
  • Bipolar Transistors (AREA)
JP10373377A 1976-10-28 1977-08-31 Semiconductor device Granted JPS5354490A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/736,646 US4113512A (en) 1976-10-28 1976-10-28 Technique for preventing forward biased epi-isolation degradation

Publications (2)

Publication Number Publication Date
JPS5354490A true JPS5354490A (en) 1978-05-17
JPS5424270B2 JPS5424270B2 (ja) 1979-08-20

Family

ID=24960699

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10373377A Granted JPS5354490A (en) 1976-10-28 1977-08-31 Semiconductor device

Country Status (12)

Country Link
US (1) US4113512A (ja)
JP (1) JPS5354490A (ja)
BR (1) BR7706777A (ja)
CA (1) CA1057419A (ja)
CH (1) CH619072A5 (ja)
DE (1) DE2746700A1 (ja)
ES (1) ES463621A1 (ja)
FR (1) FR2369687A1 (ja)
GB (1) GB1584990A (ja)
IT (1) IT1114162B (ja)
NL (1) NL7711278A (ja)
SE (1) SE431272B (ja)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4178190A (en) * 1975-06-30 1979-12-11 Rca Corporation Method of making a bipolar transistor with high-low emitter impurity concentration
US5041896A (en) * 1989-07-06 1991-08-20 General Electric Company Symmetrical blocking high voltage semiconductor device and method of fabrication
TW274628B (ja) * 1994-06-03 1996-04-21 At & T Corp
JP3408098B2 (ja) * 1997-02-20 2003-05-19 キヤノン株式会社 固体撮像装置及びx線撮像装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USB377311I5 (ja) * 1964-06-23 1900-01-01
US3551760A (en) * 1966-03-28 1970-12-29 Hitachi Ltd Semiconductor device with an inversion preventing layer formed in a diffused region
US3653988A (en) * 1968-02-05 1972-04-04 Bell Telephone Labor Inc Method of forming monolithic semiconductor integrated circuit devices
US3631311A (en) * 1968-03-26 1971-12-28 Telefunken Patent Semiconductor circuit arrangement with integrated base leakage resistance
US3964705A (en) * 1970-12-23 1976-06-22 Bassani S.P.A. Frame for the mounting of interchangeable electrical units
US3697827A (en) * 1971-02-09 1972-10-10 Unitrode Corp Structure and formation of semiconductors with transverse conductivity gradients
US3760239A (en) * 1971-06-09 1973-09-18 Cress S Coaxial inverted geometry transistor having buried emitter
DE2241600A1 (de) * 1971-08-26 1973-03-01 Dionics Inc Hochspannungs-p-n-uebergang und seine anwendung in halbleiterschaltelementen, sowie verfahren zu seiner herstellung
US3921199A (en) * 1973-07-31 1975-11-18 Texas Instruments Inc Junction breakdown voltage by means of ion implanted compensation guard ring
US4021270A (en) * 1976-06-28 1977-05-03 Motorola, Inc. Double master mask process for integrated circuit manufacture

Also Published As

Publication number Publication date
BR7706777A (pt) 1978-08-22
GB1584990A (en) 1981-02-18
DE2746700A1 (de) 1978-05-11
US4113512A (en) 1978-09-12
SE7711985L (sv) 1978-04-29
FR2369687A1 (fr) 1978-05-26
FR2369687B1 (ja) 1980-08-01
NL7711278A (ja) 1978-05-03
CH619072A5 (ja) 1980-08-29
ES463621A1 (es) 1978-07-01
CA1057419A (en) 1979-06-26
IT1114162B (it) 1986-01-27
JPS5424270B2 (ja) 1979-08-20
SE431272B (sv) 1984-01-23
DE2746700C2 (ja) 1988-12-22

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