BR112017005262A2 - composição de resina fotossensível, precursor de placa de impressão planográfica, método para produzir uma placa de impressão planográfica, e composto de polímero - Google Patents

composição de resina fotossensível, precursor de placa de impressão planográfica, método para produzir uma placa de impressão planográfica, e composto de polímero

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Publication number
BR112017005262A2
BR112017005262A2 BR112017005262A BR112017005262A BR112017005262A2 BR 112017005262 A2 BR112017005262 A2 BR 112017005262A2 BR 112017005262 A BR112017005262 A BR 112017005262A BR 112017005262 A BR112017005262 A BR 112017005262A BR 112017005262 A2 BR112017005262 A2 BR 112017005262A2
Authority
BR
Brazil
Prior art keywords
printing plate
resin composition
photosensitive resin
planographic printing
bond
Prior art date
Application number
BR112017005262A
Other languages
English (en)
Other versions
BR112017005262B1 (pt
Inventor
Nozaki Atsuyasu
Mukaiyama Rena
Sato Takashi
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of BR112017005262A2 publication Critical patent/BR112017005262A2/pt
Publication of BR112017005262B1 publication Critical patent/BR112017005262B1/pt

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00—Printing plates or foils; Materials therefor
    • B41N1/12—Printing plates or foils; Materials therefor non-metallic other than stone, e.g. printing plates or foils comprising inorganic materials in an organic matrix
    • B41N1/14—Lithographic printing foils
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/02—Polyamines
    • C08G73/026—Wholly aromatic polyamines
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/02—Positive working, i.e. the exposed (imaged) areas are removed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/06—Developable by an alkaline solution
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/26—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Thermal Sciences (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

resumo ?composição de resina fotossensível, precursor de placa de impressão planográfica, método para produzir uma placa de impressão planográfica, e composto de polímero? trata-se de uma composição de resina fotossensível que habilita a produção de um precursor de placa de impressão litográfica que tem uma porção sem imagem que tem solubilidade satisfatória em uma solução aquosa alcalina e que habilita a produção de uma placa de impressão litográfica que tem resistência química excelente e durabilidade de impressão excelente, um precursor de placa de impressão litográfica obtido com o uso da composição de resina fotossensível, um método para produzir uma placa de impressão litográfica e um novo composto de polímero. a composição de resina fotossensível da presente invenção contém: um composto de polímero que tem uma ligação de amina ou uma ligação de sal de amônio quaternário, e pelo menos uma ligação selecionada a partir do grupo que consiste em uma ligação de ureia, uma ligação de uretano, e uma ligação de carbonato na cadeia principal e tem um grupo sulfonamida ou um grupo hidroxila fenólica na cadeia principal e/ou na cadeia lateral; e um material absorvedor de infravermelho.
BR112017005262-8A 2014-09-26 2015-08-31 Composição de resina fotossensível do tipo positiva, precursor de placa de impressão litográfica do tipo positivo, método para produzir uma placa de impressão litográfica e composto de polímero linear BR112017005262B1 (pt)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2014196598 2014-09-26
JP2014-196598 2014-09-26
PCT/JP2015/074803 WO2016047392A1 (ja) 2014-09-26 2015-08-31 感光性樹脂組成物、平版印刷版原版、平版印刷版の作製方法、及び、高分子化合物

Publications (2)

Publication Number Publication Date
BR112017005262A2 true BR112017005262A2 (pt) 2017-12-12
BR112017005262B1 BR112017005262B1 (pt) 2022-08-30

Family

ID=55580920

Family Applications (1)

Application Number Title Priority Date Filing Date
BR112017005262-8A BR112017005262B1 (pt) 2014-09-26 2015-08-31 Composição de resina fotossensível do tipo positiva, precursor de placa de impressão litográfica do tipo positivo, método para produzir uma placa de impressão litográfica e composto de polímero linear

Country Status (6)

Country Link
US (1) US10363733B2 (pt)
EP (1) EP3182205B1 (pt)
JP (1) JP6185187B2 (pt)
CN (1) CN107077069B (pt)
BR (1) BR112017005262B1 (pt)
WO (1) WO2016047392A1 (pt)

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WO2018061511A1 (ja) * 2016-09-29 2018-04-05 富士フイルム株式会社 ポジ型平版印刷版原版、及び、平版印刷版の作製方法
JP2020064082A (ja) 2017-02-17 2020-04-23 富士フイルム株式会社 ポジ型平版印刷版原版、及び、平版印刷版の作製方法
BR112019000016A2 (pt) 2017-10-31 2020-05-05 Fujifilm Corp precursor de placa de impressão litográfica, método para produção de placa de impressão litográfica, método de impressão e método para produção de suporte de alumínio
WO2020045585A1 (ja) * 2018-08-31 2020-03-05 富士フイルム株式会社 平版印刷版の作製方法
WO2020110650A1 (ja) * 2018-11-27 2020-06-04 富士フイルム株式会社 平版印刷版原版、及び、平版印刷版の作製方法
JP7389128B2 (ja) 2019-09-30 2023-11-29 富士フイルム株式会社 平版印刷版原版、平版印刷版の作製方法、及び、平版印刷方法
WO2021065279A1 (ja) 2019-09-30 2021-04-08 富士フイルム株式会社 平版印刷版原版、平版印刷版の作製方法、及び、平版印刷方法
CN118046659A (zh) 2019-09-30 2024-05-17 富士胶片株式会社 平版印刷版原版、平版印刷版的制作方法及平版印刷方法
WO2021132665A1 (ja) 2019-12-27 2021-07-01 富士フイルム株式会社 平版印刷方法
EP4112321A4 (en) 2020-02-28 2023-08-09 FUJIFILM Corporation ORIGINAL PLATE OF LITHOGRAPHIC PRINTING PLATE, METHOD OF MAKING LITHOGRAPHIC PRINTING PLATE AND METHOD OF LITHOGRAPHIC PRINTING
JP2021182133A (ja) * 2020-05-18 2021-11-25 信越化学工業株式会社 ポジ型レジスト材料及びパターン形成方法
EP4159455A4 (en) 2020-05-29 2023-10-04 FUJIFILM Corporation ORIGINAL PLATE OF PRESS DEVELOPMENT TYPE LITHOGRAPHIC PRINTING PLATE, METHOD FOR MANUFACTURING LITHOGRAPHIC PRINTING PLATE, AND LITHOGRAPHIC PRINTING METHOD
CN115697717A (zh) 2020-05-29 2023-02-03 富士胶片株式会社 机上显影型平版印刷版原版、平版印刷版的制作方法及平版印刷方法
CN115697718A (zh) 2020-05-29 2023-02-03 富士胶片株式会社 机上显影型平版印刷版原版、平版印刷版的制作方法及平版印刷方法
WO2021241457A1 (ja) 2020-05-29 2021-12-02 富士フイルム株式会社 機上現像型平版印刷版原版、平版印刷版の作製方法、及び、平版印刷方法
EP4159460A4 (en) 2020-05-29 2023-11-08 FUJIFILM Corporation LAMINATED BODY
WO2021256341A1 (ja) 2020-06-17 2021-12-23 富士フイルム株式会社 機上現像型平版印刷版原版、平版印刷版の作製方法、及び、平版印刷方法
WO2022025068A1 (ja) 2020-07-31 2022-02-03 富士フイルム株式会社 機上現像型平版印刷版原版、平版印刷版の作製方法、及び、平版印刷方法
WO2022163777A1 (ja) 2021-01-28 2022-08-04 富士フイルム株式会社 機上現像型平版印刷版原版、平版印刷版の作製方法、及び、平版印刷方法
EP4299332A1 (en) 2021-02-26 2024-01-03 FUJIFILM Corporation On-press-development-type planographic printing plate precursor, method for fabricating planographic printing plate, planographic printing method, and coloring agent

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Also Published As

Publication number Publication date
CN107077069B (zh) 2020-08-14
US20170173938A1 (en) 2017-06-22
JP6185187B2 (ja) 2017-08-23
EP3182205A1 (en) 2017-06-21
EP3182205A4 (en) 2017-08-23
BR112017005262B1 (pt) 2022-08-30
WO2016047392A1 (ja) 2016-03-31
JPWO2016047392A1 (ja) 2017-04-27
US10363733B2 (en) 2019-07-30
EP3182205B1 (en) 2021-04-07
CN107077069A (zh) 2017-08-18

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