BR112012020967A2 - substrato vítreo revestido de camadas com resistência mecânica aprimorada - Google Patents
substrato vítreo revestido de camadas com resistência mecânica aprimoradaInfo
- Publication number
- BR112012020967A2 BR112012020967A2 BR112012020967A BR112012020967A BR112012020967A2 BR 112012020967 A2 BR112012020967 A2 BR 112012020967A2 BR 112012020967 A BR112012020967 A BR 112012020967A BR 112012020967 A BR112012020967 A BR 112012020967A BR 112012020967 A2 BR112012020967 A2 BR 112012020967A2
- Authority
- BR
- Brazil
- Prior art keywords
- substrate
- mechanical strength
- glassy substrate
- enhanced mechanical
- oxide
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title abstract 6
- 150000004767 nitrides Chemical class 0.000 abstract 4
- 239000011521 glass Substances 0.000 abstract 2
- 238000010438 heat treatment Methods 0.000 abstract 1
- 239000005344 low-emissivity glass Substances 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3435—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a nitride, oxynitride, boronitride or carbonitride
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3441—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising carbon, a carbide or oxycarbide
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C4/00—Compositions for glass with special properties
- C03C4/14—Compositions for glass with special properties for electro-conductive glass
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022466—Electrodes made of transparent conductive layers, e.g. TCO, ITO layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/036—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
- H01L31/0392—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/036—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
- H01L31/0392—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate
- H01L31/03923—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate including AIBIIICVI compound materials, e.g. CIS, CIGS
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/90—Other aspects of coatings
- C03C2217/94—Transparent conductive oxide layers [TCO] being part of a multilayer coating
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/152—Deposition methods from the vapour phase by cvd
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/541—CuInSe2 material PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
- Y10T428/2495—Thickness [relative or absolute]
- Y10T428/24967—Absolute thicknesses specified
- Y10T428/24975—No layer or component greater than 5 mils thick
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
- Y10T428/264—Up to 3 mils
- Y10T428/265—1 mil or less
Abstract
substrato vítreo revestido de camadas com resistência mecânica aprimorada. o objetivo da presente invenção é um substrato transparente vítreo, associado a uma camada eletrocondutora transparente capaz de constituir um eletrodo de módulo fotovoltaico, e formada por um óxido dopado, caracterizado pela interposicão, entre o substrato vítreo e a camada eletrocondutora transparente, de uma camada com vários primeiror(s) nitreto(s) ou oxinitreto(s), ou óxido(s) ou oxicarbureto(s) com boas propriedades de adesão ao vidro, e de um ou vários terceiro(s) nitreto(s) ou oxinitreto(s), ou óxido(s) ou oxicarbureto(s) suscetível(s) de constituir, eventualmente no estado dopado; uma camada eletrocondutora transparente; o processo de fabricação de tal substrato; um módulo fotovoltaio, um vidro de aquecimento conformado, uma tela de plasma, um eletrodo de lâmpada plana e um vidro de baixa emissividade que compreende tal substrato.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1051244A FR2956659B1 (fr) | 2010-02-22 | 2010-02-22 | Substrat verrier revetu de couches a tenue mecanique amelioree |
PCT/FR2011/050226 WO2011101572A1 (fr) | 2010-02-22 | 2011-02-04 | Substrat verrier revetu de couches a tenue mecanique amelioree |
Publications (1)
Publication Number | Publication Date |
---|---|
BR112012020967A2 true BR112012020967A2 (pt) | 2016-05-03 |
Family
ID=42790588
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR112012020967A BR112012020967A2 (pt) | 2010-02-22 | 2011-02-04 | substrato vítreo revestido de camadas com resistência mecânica aprimorada |
Country Status (9)
Country | Link |
---|---|
US (1) | US20130025672A1 (pt) |
EP (1) | EP2539292A1 (pt) |
JP (1) | JP5841074B2 (pt) |
KR (1) | KR101774611B1 (pt) |
CN (1) | CN102803173B (pt) |
BR (1) | BR112012020967A2 (pt) |
FR (1) | FR2956659B1 (pt) |
WO (1) | WO2011101572A1 (pt) |
ZA (1) | ZA201206501B (pt) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2982608B1 (fr) * | 2011-11-16 | 2013-11-22 | Saint Gobain | Couche barriere aux metaux alcalins a base de sioc |
KR20140138137A (ko) * | 2012-02-28 | 2014-12-03 | 아사히 가라스 가부시키가이샤 | 적층체의 제조 방법, 및 적층체 |
FR2993999B1 (fr) * | 2012-07-27 | 2014-09-12 | Nanomade Concept | Procede pour la fabrication d'une surface tactile transparente et surface tactile obtenue par un tel procede |
CN103590001B (zh) * | 2013-11-20 | 2016-01-20 | 温州大学 | 一种高强度多层膜系光电玻璃及其制备方法 |
WO2016181739A1 (ja) * | 2015-05-11 | 2016-11-17 | 旭硝子株式会社 | 車両用の断熱ガラスユニット |
JPWO2016181740A1 (ja) * | 2015-05-11 | 2018-03-01 | 旭硝子株式会社 | 車両用の断熱ガラスユニットおよびその製造方法 |
JP2017001924A (ja) * | 2015-06-15 | 2017-01-05 | 日本板硝子株式会社 | コーティング膜つきガラス板 |
PL3319915T3 (pl) * | 2015-07-07 | 2020-06-15 | Agc Glass Europe | Szklane podłoże o podwyższonej odporności na warunki atmosferyczne i środki chemiczne |
GB2582886B (en) * | 2018-10-08 | 2023-03-29 | Pilkington Group Ltd | Process for preparing a coated glass substrate |
WO2021141812A1 (en) * | 2020-01-10 | 2021-07-15 | Cardinal Cg Company | Alloy oxide overcoat indium tin oxide coatings, coated glazings, and production methods |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA1134214A (en) | 1978-03-08 | 1982-10-26 | Roy G. Gordon | Deposition method |
GB8630918D0 (en) | 1986-12-24 | 1987-02-04 | Pilkington Brothers Plc | Coatings on glass |
ATE186039T1 (de) * | 1991-12-26 | 1999-11-15 | Atochem North America Elf | Zusammensetzung einer deckschicht für glas |
US5356718A (en) | 1993-02-16 | 1994-10-18 | Ppg Industries, Inc. | Coating apparatus, method of coating glass, compounds and compositions for coating glasss and coated glass substrates |
FR2736632B1 (fr) | 1995-07-12 | 1997-10-24 | Saint Gobain Vitrage | Vitrage muni d'une couche conductrice et/ou bas-emissive |
US5756192A (en) * | 1996-01-16 | 1998-05-26 | Ford Motor Company | Multilayer coating for defrosting glass |
FR2759362B1 (fr) * | 1997-02-10 | 1999-03-12 | Saint Gobain Vitrage | Substrat transparent muni d'au moins une couche mince a base de nitrure ou d'oxynitrure de silicium et son procede d'obtention |
FR2891269B1 (fr) * | 2005-09-23 | 2007-11-09 | Saint Gobain | Substrat transparent muni d'une electrode |
FR2913973B1 (fr) * | 2007-03-21 | 2011-02-18 | Saint Gobain | Substrat verrier revetu de couches a tenue mecanique amelioree |
FR2911336B3 (fr) * | 2007-01-15 | 2009-03-20 | Saint Gobain | Substrat verrier revetu de couches a tenue mecanique amelioree |
KR101456560B1 (ko) * | 2007-01-15 | 2014-10-31 | 쌩-고벵 글래스 프랑스 | 향상된 기계적 강도를 갖는 층으로 코팅된 유리 기판 |
AR069169A1 (es) * | 2007-11-02 | 2010-01-06 | Agc Flat Glass Europe Sa | Metodo para fabricar un recubrimiento transparente de un oxido conductor para aplicaciones fotovoltaicas en peliculas finas |
-
2010
- 2010-02-22 FR FR1051244A patent/FR2956659B1/fr not_active Expired - Fee Related
-
2011
- 2011-02-04 JP JP2012554391A patent/JP5841074B2/ja not_active Expired - Fee Related
- 2011-02-04 EP EP11708062A patent/EP2539292A1/fr not_active Withdrawn
- 2011-02-04 BR BR112012020967A patent/BR112012020967A2/pt not_active IP Right Cessation
- 2011-02-04 KR KR1020127024674A patent/KR101774611B1/ko active IP Right Grant
- 2011-02-04 US US13/580,319 patent/US20130025672A1/en not_active Abandoned
- 2011-02-04 WO PCT/FR2011/050226 patent/WO2011101572A1/fr active Application Filing
- 2011-02-04 CN CN201180014906.3A patent/CN102803173B/zh not_active Expired - Fee Related
-
2012
- 2012-08-29 ZA ZA2012/06501A patent/ZA201206501B/en unknown
Also Published As
Publication number | Publication date |
---|---|
KR101774611B1 (ko) | 2017-09-04 |
KR20120131191A (ko) | 2012-12-04 |
CN102803173A (zh) | 2012-11-28 |
EP2539292A1 (fr) | 2013-01-02 |
FR2956659B1 (fr) | 2014-10-10 |
WO2011101572A1 (fr) | 2011-08-25 |
JP2013520391A (ja) | 2013-06-06 |
US20130025672A1 (en) | 2013-01-31 |
FR2956659A1 (fr) | 2011-08-26 |
JP5841074B2 (ja) | 2016-01-06 |
ZA201206501B (en) | 2013-05-29 |
CN102803173B (zh) | 2016-08-03 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
B06F | Objections, documents and/or translations needed after an examination request according [chapter 6.6 patent gazette] | ||
B08F | Application fees: application dismissed [chapter 8.6 patent gazette] |
Free format text: REFERENTE A 8A ANUIDADE. |
|
B08K | Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette] |
Free format text: EM VIRTUDE DO ARQUIVAMENTO PUBLICADO NA RPI 2500 DE 04-12-2018 E CONSIDERANDO AUSENCIA DE MANIFESTACAO DENTRO DOS PRAZOS LEGAIS, INFORMO QUE CABE SER MANTIDO O ARQUIVAMENTO DO PEDIDO DE PATENTE, CONFORME O DISPOSTO NO ARTIGO 12, DA RESOLUCAO 113/2013. |