BR112012001313A2 - dispositivo de laser de emissão na superfície, arranjo de laser de emissão na superfície, escaner ótico, e aparelho de formação de imagem. - Google Patents
dispositivo de laser de emissão na superfície, arranjo de laser de emissão na superfície, escaner ótico, e aparelho de formação de imagem.Info
- Publication number
- BR112012001313A2 BR112012001313A2 BR112012001313A BR112012001313A BR112012001313A2 BR 112012001313 A2 BR112012001313 A2 BR 112012001313A2 BR 112012001313 A BR112012001313 A BR 112012001313A BR 112012001313 A BR112012001313 A BR 112012001313A BR 112012001313 A2 BR112012001313 A2 BR 112012001313A2
- Authority
- BR
- Brazil
- Prior art keywords
- emission laser
- surface emission
- imaging apparatus
- optical scanner
- laser device
- Prior art date
Links
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G15/00—Apparatus for electrographic processes using a charge pattern
- G03G15/04—Apparatus for electrographic processes using a charge pattern for exposing, i.e. imagewise exposure by optically projecting the original image on a photoconductive recording material
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/435—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material
- B41J2/44—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material using single radiation source per colour, e.g. lighting beams or shutter arrangements
- B41J2/442—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material using single radiation source per colour, e.g. lighting beams or shutter arrangements using lasers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/435—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material
- B41J2/47—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material using the combination of scanning and modulation of light
- B41J2/471—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material using the combination of scanning and modulation of light using dot sequential main scanning by means of a light deflector, e.g. a rotating polygonal mirror
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/10—Scanning systems
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G15/00—Apparatus for electrographic processes using a charge pattern
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18386—Details of the emission surface for influencing the near- or far-field, e.g. a grating on the surface
- H01S5/18391—Aperiodic structuring to influence the near- or far-field distribution
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
- H01S5/42—Arrays of surface emitting lasers
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N1/00—Scanning, transmission or reproduction of documents or the like, e.g. facsimile transmission; Details thereof
- H04N1/04—Scanning arrangements, i.e. arrangements for the displacement of active reading or reproducing elements relative to the original or reproducing medium, or vice versa
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18308—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement
- H01S5/18311—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement using selective oxidation
- H01S5/18313—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a special structure for lateral current or light confinement using selective oxidation by oxidizing at least one of the DBR layers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18355—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] having a defined polarisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18361—Structure of the reflectors, e.g. hybrid mirrors
- H01S5/18377—Structure of the reflectors, e.g. hybrid mirrors comprising layers of different kind of materials, e.g. combinations of semiconducting with dielectric or metallic layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
- H01S5/18386—Details of the emission surface for influencing the near- or far-field, e.g. a grating on the surface
- H01S5/18394—Apertures, e.g. defined by the shape of the upper electrode
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
- H01S5/3202—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures grown on specifically orientated substrates, or using orientation dependent growth
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
- H01S5/42—Arrays of surface emitting lasers
- H01S5/423—Arrays of surface emitting lasers having a vertical cavity
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Multimedia (AREA)
- Signal Processing (AREA)
- Semiconductor Lasers (AREA)
- Mechanical Optical Scanning Systems (AREA)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010118940 | 2010-05-25 | ||
JP2010-118940 | 2010-05-25 | ||
JP2011-050962 | 2011-03-09 | ||
JP2011050962A JP5754624B2 (ja) | 2010-05-25 | 2011-03-09 | 面発光レーザ素子、面発光レーザアレイ、光走査装置、画像形成装置及び面発光レーザ素子の製造方法 |
PCT/JP2011/061918 WO2011148957A1 (en) | 2010-05-25 | 2011-05-18 | Surface-emitting laser device, surface-emitting laser array, optical scanner, and image forming apparatus |
Publications (2)
Publication Number | Publication Date |
---|---|
BR112012001313A2 true BR112012001313A2 (pt) | 2018-03-13 |
BR112012001313B1 BR112012001313B1 (pt) | 2020-11-03 |
Family
ID=45003946
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR112012001313-0A BR112012001313B1 (pt) | 2010-05-25 | 2011-05-18 | dispositivo laser de emissão superficial, arranjo de laser de emissão superficial, escâner óptico e aparelho de formação de imagem |
Country Status (8)
Country | Link |
---|---|
US (2) | US8736652B2 (pt) |
EP (1) | EP2577822B1 (pt) |
JP (1) | JP5754624B2 (pt) |
KR (1) | KR101357878B1 (pt) |
CN (1) | CN102474073B (pt) |
BR (1) | BR112012001313B1 (pt) |
CA (1) | CA2766897C (pt) |
WO (1) | WO2011148957A1 (pt) |
Families Citing this family (17)
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JP5929259B2 (ja) | 2011-05-17 | 2016-06-01 | 株式会社リコー | 面発光レーザ素子、光走査装置及び画像形成装置 |
JP2012248795A (ja) * | 2011-05-31 | 2012-12-13 | Toshiba Corp | 半導体発光素子およびその製造方法 |
JP5999303B2 (ja) | 2011-06-24 | 2016-09-28 | 株式会社リコー | 面発光レーザアレイ及び画像形成装置 |
JP2013051398A (ja) | 2011-08-01 | 2013-03-14 | Ricoh Co Ltd | 面発光レーザ素子、光走査装置及び画像形成装置 |
JP6303255B2 (ja) | 2011-12-02 | 2018-04-04 | 株式会社リコー | 面発光レーザ素子及び原子発振器 |
JP6102525B2 (ja) | 2012-07-23 | 2017-03-29 | 株式会社リコー | 面発光レーザ素子及び原子発振器 |
JP6107089B2 (ja) | 2012-11-30 | 2017-04-05 | 株式会社リコー | 面発光レーザ素子及び原子発振器 |
KR20140095392A (ko) * | 2013-01-24 | 2014-08-01 | 삼성전자주식회사 | 질화물 반도체 발광소자 |
JP2015008271A (ja) * | 2013-05-31 | 2015-01-15 | 株式会社リコー | 面発光レーザ素子及び原子発振器 |
JP7123068B2 (ja) * | 2017-10-31 | 2022-08-22 | ローム株式会社 | 面発光半導体レーザ |
KR102462030B1 (ko) * | 2018-06-14 | 2022-11-01 | 인테벡, 인코포레이티드 | 멀티 칼라 절연 코팅 및 uv 잉크젯 프린팅 |
JP7166871B2 (ja) * | 2018-10-18 | 2022-11-08 | スタンレー電気株式会社 | 垂直共振器型発光素子 |
JP7215266B2 (ja) * | 2019-03-19 | 2023-01-31 | 株式会社リコー | 面発光レーザ素子、光源装置及び検出装置 |
JP7367484B2 (ja) | 2019-11-22 | 2023-10-24 | 株式会社リコー | 面発光レーザ素子、面発光レーザ、面発光レーザ装置、光源装置及び検出装置 |
US20220352693A1 (en) * | 2021-04-30 | 2022-11-03 | Lumentum Operations Llc | Methods for incorporating a control structure within a vertical cavity surface emitting laser device cavity |
KR102609002B1 (ko) * | 2022-01-18 | 2023-12-04 | 인하대학교 산학협력단 | 질화물 반도체 레이저 소자 및 그의 제조 방법 |
KR102609001B1 (ko) * | 2022-01-18 | 2023-12-04 | 인하대학교 산학협력단 | 질화물 반도체 레이저 소자 및 그의 제조 방법 |
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JP5320991B2 (ja) * | 2008-01-28 | 2013-10-23 | 株式会社リコー | 面発光レーザ、面発光レーザアレイ、光走査装置、画像形成装置、光伝送モジュール及び光伝送システム |
JP5408477B2 (ja) | 2008-05-13 | 2014-02-05 | 株式会社リコー | 面発光レーザ素子、面発光レーザアレイ、光走査装置及び画像形成装置 |
JP5316783B2 (ja) | 2008-05-15 | 2013-10-16 | 株式会社リコー | 面発光レーザ素子、面発光レーザアレイ、光走査装置及び画像形成装置 |
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JP5316784B2 (ja) | 2008-06-11 | 2013-10-16 | 株式会社リコー | 面発光レーザ素子、面発光レーザアレイ、光走査装置及び画像形成装置 |
JP5106487B2 (ja) * | 2008-07-31 | 2012-12-26 | キヤノン株式会社 | 面発光レーザの製造方法及び面発光レーザアレイの製造方法、該製造方法による面発光レーザアレイを備えている光学機器 |
JP2010118940A (ja) | 2008-11-13 | 2010-05-27 | Sony Corp | 画像処理装置、画像処理方法、及びプログラム |
JP5261754B2 (ja) | 2008-11-27 | 2013-08-14 | 株式会社リコー | 面発光レーザ素子、面発光レーザアレイ、光走査装置及び画像形成装置 |
JP2011018876A (ja) | 2009-06-09 | 2011-01-27 | Ricoh Co Ltd | 面発光レーザ素子の製造方法、光走査装置、画像形成装置及び酸化装置 |
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2011
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US20130070039A1 (en) | 2013-03-21 |
CN102474073A (zh) | 2012-05-23 |
JP2012009818A (ja) | 2012-01-12 |
CA2766897C (en) | 2015-04-28 |
BR112012001313B1 (pt) | 2020-11-03 |
US8736652B2 (en) | 2014-05-27 |
US9176417B2 (en) | 2015-11-03 |
US20140219683A1 (en) | 2014-08-07 |
KR101357878B1 (ko) | 2014-02-03 |
WO2011148957A1 (en) | 2011-12-01 |
JP5754624B2 (ja) | 2015-07-29 |
EP2577822A4 (en) | 2014-04-02 |
EP2577822B1 (en) | 2015-02-25 |
CA2766897A1 (en) | 2011-12-01 |
CN102474073B (zh) | 2014-07-30 |
EP2577822A1 (en) | 2013-04-10 |
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