BR0307076A - Precursor para placa de impressão planográfica sensìvel à luz e método para o seu processamento - Google Patents

Precursor para placa de impressão planográfica sensìvel à luz e método para o seu processamento

Info

Publication number
BR0307076A
BR0307076A BR0307076-0A BR0307076A BR0307076A BR 0307076 A BR0307076 A BR 0307076A BR 0307076 A BR0307076 A BR 0307076A BR 0307076 A BR0307076 A BR 0307076A
Authority
BR
Brazil
Prior art keywords
precursor
processing
printing plate
planographic printing
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
BR0307076-0A
Other languages
English (en)
Inventor
Kazuhiko Hirabayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Medical and Graphic Inc and Hyogo Prefecture
Konica Minolta Medical and Graphic Inc
Original Assignee
Konica Minolta Medical and Graphic Inc and Hyogo Prefecture
Konica Minolta Medical and Graphic Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Medical and Graphic Inc and Hyogo Prefecture, Konica Minolta Medical and Graphic Inc filed Critical Konica Minolta Medical and Graphic Inc and Hyogo Prefecture
Publication of BR0307076A publication Critical patent/BR0307076A/pt
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/127—Spectral sensitizer containing

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)

Abstract

"PRECURSOR PARA PLACA DE IMPRESSãO PLANOGRáFICA SENSìVEL à LUZ E MéTODO PARA O SEU PROCESSAMENTO". Apresenta-se um precursor para placa de impressão planográfica sensível à luz e um método para o seu processamento, o precursor compreendendo um suporte hidrofílico e disposto no mesmo, uma camada sensível à luz fotopolimerizável contendo um composto representado através da seguinte fórmula (1) ou (2) e um composto representado através da seguinte fórmula (3) ou (4):
BR0307076-0A 2002-06-24 2003-12-19 Precursor para placa de impressão planográfica sensìvel à luz e método para o seu processamento Withdrawn BR0307076A (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2002182681 2002-06-24
JP2002185985 2002-06-26

Publications (1)

Publication Number Publication Date
BR0307076A true BR0307076A (pt) 2005-02-15

Family

ID=29720907

Family Applications (1)

Application Number Title Priority Date Filing Date
BR0307076-0A Withdrawn BR0307076A (pt) 2002-06-24 2003-12-19 Precursor para placa de impressão planográfica sensìvel à luz e método para o seu processamento

Country Status (4)

Country Link
US (2) US7074546B2 (pt)
EP (1) EP1378793A2 (pt)
CN (1) CN100428056C (pt)
BR (1) BR0307076A (pt)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7147989B2 (en) * 2003-02-10 2006-12-12 Konica Minolta Holdings, Inc. Photosensitive composition, planographic printing plate and processing method of planograhic printing plate
JP2004325726A (ja) * 2003-04-24 2004-11-18 Konica Minolta Medical & Graphic Inc 感光性組成物および感光性平版印刷版
JP2005084092A (ja) * 2003-09-04 2005-03-31 Fuji Photo Film Co Ltd 感光性平版印刷版
US20050058911A1 (en) * 2003-09-17 2005-03-17 Konica Minolta Medical & Graphic, Inc. Holographic recording medium, holographic recording method and holographic information medium
JP2005274813A (ja) * 2004-03-24 2005-10-06 Konica Minolta Medical & Graphic Inc 平版印刷版の作製方法
JP2005275223A (ja) * 2004-03-26 2005-10-06 Konica Minolta Medical & Graphic Inc 平版印刷版の作製方法
JP4368323B2 (ja) * 2005-03-25 2009-11-18 富士フイルム株式会社 感光性平版印刷版
JP4613115B2 (ja) * 2005-08-30 2011-01-12 富士フイルム株式会社 光重合型感光性平版印刷版
JP4966528B2 (ja) * 2005-09-14 2012-07-04 旭化成イーマテリアルズ株式会社 パターン形成材料、並びにパターン形成装置及びパターン形成方法
JPWO2008010400A1 (ja) * 2006-07-20 2009-12-17 コニカミノルタエムジー株式会社 感光性平版印刷版材料
CN102681210B (zh) * 2012-05-23 2013-12-04 杏晖光学（厦门）有限公司 自然灰色防护镜片
EP2869122A4 (en) * 2012-06-29 2016-03-02 Fujifilm Corp METHOD FOR CONCENTRATING PROCESS WASTEWATER AND RECYCLING PROCESS FOR WASTE WATER
CN102816089B (zh) * 2012-07-06 2014-06-11 华南理工大学 含季铵盐及氨基甲酸酯结构的抗菌性甲基丙烯酸酯单体及其制备方法和应用
CN102816088B (zh) * 2012-07-06 2014-05-07 华南理工大学 含叔胺结构不含双酚a结构的甲基丙烯酸酯大单体及其制法和应用
JP6420819B2 (ja) 2013-03-19 2018-11-07 スリーエム イノベイティブ プロパティズ カンパニー フリーラジカル重合法及びそれによる物品
US9568822B2 (en) * 2013-06-14 2017-02-14 Agfa Graphics Nv Lithographic printing plate precursor
US9482954B2 (en) * 2013-06-14 2016-11-01 Agfa Graphics Nv Lithographic printing plate precursor

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3717558A (en) * 1972-03-30 1973-02-20 Scm Corp Photopolymerization catalyst comprising a metallocene and an active halogen-containing compound
DE3710281A1 (de) * 1987-03-28 1988-10-06 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
DE3710279A1 (de) 1987-03-28 1988-10-06 Hoechst Ag Polymerisierbare verbindungen und diese enthaltendes durch strahlung polymerisierbares gemisch
JPH0827539B2 (ja) 1987-09-28 1996-03-21 富士写真フイルム株式会社 光重合性組成物
US5273862A (en) * 1988-07-29 1993-12-28 Hoechst Aktiengesellschaft Photopolymerizable recording material comprising a cover layer substantially impermeable to oxygen, binds oxygen and is soluble in water at 20°C.
DE3832032A1 (de) 1988-09-21 1990-03-22 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
DE4007428A1 (de) * 1990-03-09 1991-09-12 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
DE4008815A1 (de) 1990-03-20 1991-09-26 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
US5055372A (en) * 1990-04-23 1991-10-08 The Mead Corporation Photohardenable composition containing borate salts and ketone initiators
DE4013358A1 (de) 1990-04-26 1991-10-31 Hoechst Ag Verfahren zur herstellung von druckformen oder photoresists durch bildmaessiges bestrahlen eines photopolymerisierbaren aufzeichnungsmaterials
JP3470253B2 (ja) 1996-07-24 2003-11-25 コニカミノルタホールディングス株式会社 光開始剤、光重合組成物、ラジカル発生方法、平版印刷版作成用感光材料及び平版印刷版の作成方法
JPH1062978A (ja) * 1996-08-21 1998-03-06 Konica Corp 光開始剤、光重合組成物、ラジカル発生方法、平版印刷版作成用感光性材料及び平版印刷版の作成方法
US5983498A (en) * 1996-10-18 1999-11-16 Lieberman; Christopher E. Nail clipper with receptacle
US6335144B1 (en) * 1999-04-27 2002-01-01 Fuji Photo Film Co., Ltd. Photopolymerizable composition for short wavelength semiconductor laser exposure
DE19940921A1 (de) 1999-08-27 2001-03-01 Agfa Gevaert Ag Photopolymerisierbares Gemisch und damit hergestelltes Aufzeichnungsmaterial
JP2003043673A (ja) * 2001-07-26 2003-02-13 Fuji Photo Film Co Ltd 光重合性平版印刷版の製版方法
JP3969109B2 (ja) * 2002-02-08 2007-09-05 コニカミノルタホールディングス株式会社 感光性平版印刷版及びその記録方法
US20030186165A1 (en) * 2002-03-28 2003-10-02 Agfa-Gevaert Photopolymerizable composition sensitized for the wavelength range from 300 to 450 nm
US7314699B2 (en) * 2002-04-29 2008-01-01 Agfa Graphics Nv Radiation-sensitive mixture and recording material produced therewith
EP1413925A3 (en) * 2002-10-23 2004-08-25 Konica Minolta Holdings, Inc. Photosensitive composition and photosensitive lithographic printing plate
JP2004325726A (ja) * 2003-04-24 2004-11-18 Konica Minolta Medical & Graphic Inc 感光性組成物および感光性平版印刷版

Also Published As

Publication number Publication date
EP1378793A2 (en) 2004-01-07
US20040005515A1 (en) 2004-01-08
CN1469195A (zh) 2004-01-21
US7407735B2 (en) 2008-08-05
US7074546B2 (en) 2006-07-11
US20060134550A1 (en) 2006-06-22
CN100428056C (zh) 2008-10-22

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Legal Events

Date Code Title Description
B08F Application dismissed because of non-payment of annual fees [chapter 8.6 patent gazette]

Free format text: REFERENTE A 6A,7A E 8A ANUIDADE(S).

B08K Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette]

Free format text: NAO APRESENTADA A GUIA DE CUMPRIMENTO DE EXIGENCIA. REFERENTE AS 6A, 7A E 8A ANUIDADES.