BR0307076A - Precursor para placa de impressão planográfica sensìvel à luz e método para o seu processamento - Google Patents
Precursor para placa de impressão planográfica sensìvel à luz e método para o seu processamentoInfo
- Publication number
- BR0307076A BR0307076A BR0307076-0A BR0307076A BR0307076A BR 0307076 A BR0307076 A BR 0307076A BR 0307076 A BR0307076 A BR 0307076A BR 0307076 A BR0307076 A BR 0307076A
- Authority
- BR
- Brazil
- Prior art keywords
- precursor
- processing
- printing plate
- planographic printing
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/127—Spectral sensitizer containing
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
Abstract
"PRECURSOR PARA PLACA DE IMPRESSãO PLANOGRáFICA SENSìVEL à LUZ E MéTODO PARA O SEU PROCESSAMENTO". Apresenta-se um precursor para placa de impressão planográfica sensível à luz e um método para o seu processamento, o precursor compreendendo um suporte hidrofílico e disposto no mesmo, uma camada sensível à luz fotopolimerizável contendo um composto representado através da seguinte fórmula (1) ou (2) e um composto representado através da seguinte fórmula (3) ou (4):
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002182681 | 2002-06-24 | ||
JP2002185985 | 2002-06-26 |
Publications (1)
Publication Number | Publication Date |
---|---|
BR0307076A true BR0307076A (pt) | 2005-02-15 |
Family
ID=29720907
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR0307076-0A Withdrawn BR0307076A (pt) | 2002-06-24 | 2003-12-19 | Precursor para placa de impressão planográfica sensìvel à luz e método para o seu processamento |
Country Status (4)
Country | Link |
---|---|
US (2) | US7074546B2 (pt) |
EP (1) | EP1378793A2 (pt) |
CN (1) | CN100428056C (pt) |
BR (1) | BR0307076A (pt) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7147989B2 (en) * | 2003-02-10 | 2006-12-12 | Konica Minolta Holdings, Inc. | Photosensitive composition, planographic printing plate and processing method of planograhic printing plate |
JP2004325726A (ja) * | 2003-04-24 | 2004-11-18 | Konica Minolta Medical & Graphic Inc | 感光性組成物および感光性平版印刷版 |
JP2005084092A (ja) * | 2003-09-04 | 2005-03-31 | Fuji Photo Film Co Ltd | 感光性平版印刷版 |
US20050058911A1 (en) * | 2003-09-17 | 2005-03-17 | Konica Minolta Medical & Graphic, Inc. | Holographic recording medium, holographic recording method and holographic information medium |
JP2005274813A (ja) * | 2004-03-24 | 2005-10-06 | Konica Minolta Medical & Graphic Inc | 平版印刷版の作製方法 |
JP2005275223A (ja) * | 2004-03-26 | 2005-10-06 | Konica Minolta Medical & Graphic Inc | 平版印刷版の作製方法 |
JP4368323B2 (ja) * | 2005-03-25 | 2009-11-18 | 富士フイルム株式会社 | 感光性平版印刷版 |
JP4613115B2 (ja) * | 2005-08-30 | 2011-01-12 | 富士フイルム株式会社 | 光重合型感光性平版印刷版 |
JP4966528B2 (ja) * | 2005-09-14 | 2012-07-04 | 旭化成イーマテリアルズ株式会社 | パターン形成材料、並びにパターン形成装置及びパターン形成方法 |
JPWO2008010400A1 (ja) * | 2006-07-20 | 2009-12-17 | コニカミノルタエムジー株式会社 | 感光性平版印刷版材料 |
CN102681210B (zh) * | 2012-05-23 | 2013-12-04 | 杏晖光学(厦门)有限公司 | 自然灰色防护镜片 |
EP2869122A4 (en) * | 2012-06-29 | 2016-03-02 | Fujifilm Corp | METHOD FOR CONCENTRATING PROCESS WASTEWATER AND RECYCLING PROCESS FOR WASTE WATER |
CN102816089B (zh) * | 2012-07-06 | 2014-06-11 | 华南理工大学 | 含季铵盐及氨基甲酸酯结构的抗菌性甲基丙烯酸酯单体及其制备方法和应用 |
CN102816088B (zh) * | 2012-07-06 | 2014-05-07 | 华南理工大学 | 含叔胺结构不含双酚a结构的甲基丙烯酸酯大单体及其制法和应用 |
JP6420819B2 (ja) | 2013-03-19 | 2018-11-07 | スリーエム イノベイティブ プロパティズ カンパニー | フリーラジカル重合法及びそれによる物品 |
US9568822B2 (en) * | 2013-06-14 | 2017-02-14 | Agfa Graphics Nv | Lithographic printing plate precursor |
US9482954B2 (en) * | 2013-06-14 | 2016-11-01 | Agfa Graphics Nv | Lithographic printing plate precursor |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3717558A (en) * | 1972-03-30 | 1973-02-20 | Scm Corp | Photopolymerization catalyst comprising a metallocene and an active halogen-containing compound |
DE3710281A1 (de) * | 1987-03-28 | 1988-10-06 | Hoechst Ag | Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial |
DE3710279A1 (de) | 1987-03-28 | 1988-10-06 | Hoechst Ag | Polymerisierbare verbindungen und diese enthaltendes durch strahlung polymerisierbares gemisch |
JPH0827539B2 (ja) | 1987-09-28 | 1996-03-21 | 富士写真フイルム株式会社 | 光重合性組成物 |
US5273862A (en) * | 1988-07-29 | 1993-12-28 | Hoechst Aktiengesellschaft | Photopolymerizable recording material comprising a cover layer substantially impermeable to oxygen, binds oxygen and is soluble in water at 20°C. |
DE3832032A1 (de) | 1988-09-21 | 1990-03-22 | Hoechst Ag | Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial |
DE4007428A1 (de) * | 1990-03-09 | 1991-09-12 | Hoechst Ag | Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial |
DE4008815A1 (de) | 1990-03-20 | 1991-09-26 | Hoechst Ag | Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial |
US5055372A (en) * | 1990-04-23 | 1991-10-08 | The Mead Corporation | Photohardenable composition containing borate salts and ketone initiators |
DE4013358A1 (de) | 1990-04-26 | 1991-10-31 | Hoechst Ag | Verfahren zur herstellung von druckformen oder photoresists durch bildmaessiges bestrahlen eines photopolymerisierbaren aufzeichnungsmaterials |
JP3470253B2 (ja) | 1996-07-24 | 2003-11-25 | コニカミノルタホールディングス株式会社 | 光開始剤、光重合組成物、ラジカル発生方法、平版印刷版作成用感光材料及び平版印刷版の作成方法 |
JPH1062978A (ja) * | 1996-08-21 | 1998-03-06 | Konica Corp | 光開始剤、光重合組成物、ラジカル発生方法、平版印刷版作成用感光性材料及び平版印刷版の作成方法 |
US5983498A (en) * | 1996-10-18 | 1999-11-16 | Lieberman; Christopher E. | Nail clipper with receptacle |
US6335144B1 (en) * | 1999-04-27 | 2002-01-01 | Fuji Photo Film Co., Ltd. | Photopolymerizable composition for short wavelength semiconductor laser exposure |
DE19940921A1 (de) | 1999-08-27 | 2001-03-01 | Agfa Gevaert Ag | Photopolymerisierbares Gemisch und damit hergestelltes Aufzeichnungsmaterial |
JP2003043673A (ja) * | 2001-07-26 | 2003-02-13 | Fuji Photo Film Co Ltd | 光重合性平版印刷版の製版方法 |
JP3969109B2 (ja) * | 2002-02-08 | 2007-09-05 | コニカミノルタホールディングス株式会社 | 感光性平版印刷版及びその記録方法 |
US20030186165A1 (en) * | 2002-03-28 | 2003-10-02 | Agfa-Gevaert | Photopolymerizable composition sensitized for the wavelength range from 300 to 450 nm |
US7314699B2 (en) * | 2002-04-29 | 2008-01-01 | Agfa Graphics Nv | Radiation-sensitive mixture and recording material produced therewith |
EP1413925A3 (en) * | 2002-10-23 | 2004-08-25 | Konica Minolta Holdings, Inc. | Photosensitive composition and photosensitive lithographic printing plate |
JP2004325726A (ja) * | 2003-04-24 | 2004-11-18 | Konica Minolta Medical & Graphic Inc | 感光性組成物および感光性平版印刷版 |
-
2003
- 2003-05-22 US US10/443,943 patent/US7074546B2/en not_active Expired - Lifetime
- 2003-05-26 EP EP03011834A patent/EP1378793A2/en not_active Withdrawn
- 2003-06-20 CN CNB031490689A patent/CN100428056C/zh not_active Expired - Lifetime
- 2003-12-19 BR BR0307076-0A patent/BR0307076A/pt not_active Withdrawn
-
2006
- 2006-01-18 US US11/334,334 patent/US7407735B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP1378793A2 (en) | 2004-01-07 |
US20040005515A1 (en) | 2004-01-08 |
CN1469195A (zh) | 2004-01-21 |
US7407735B2 (en) | 2008-08-05 |
US7074546B2 (en) | 2006-07-11 |
US20060134550A1 (en) | 2006-06-22 |
CN100428056C (zh) | 2008-10-22 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
B08F | Application dismissed because of non-payment of annual fees [chapter 8.6 patent gazette] |
Free format text: REFERENTE A 6A,7A E 8A ANUIDADE(S). |
|
B08K | Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette] |
Free format text: NAO APRESENTADA A GUIA DE CUMPRIMENTO DE EXIGENCIA. REFERENTE AS 6A, 7A E 8A ANUIDADES. |