BR0304820A - Mecanismo de formação de pelìcula de cvd de plasma e método para a fabricação de um recipiente de plástico revestido por uma pelìcula de cvd - Google Patents

Mecanismo de formação de pelìcula de cvd de plasma e método para a fabricação de um recipiente de plástico revestido por uma pelìcula de cvd

Info

Publication number
BR0304820A
BR0304820A BR0304820-9A BR0304820A BR0304820A BR 0304820 A BR0304820 A BR 0304820A BR 0304820 A BR0304820 A BR 0304820A BR 0304820 A BR0304820 A BR 0304820A
Authority
BR
Brazil
Prior art keywords
cvd film
container
wall
film forming
plastic container
Prior art date
Application number
BR0304820-9A
Other languages
English (en)
Inventor
Kenichi Hama
Tsuyoshi Kage
Keishu Takemoto
Takumi Kobayashi
Original Assignee
Mitsubishi Shoji Plastics Corp
Youtec Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Shoji Plastics Corp, Youtec Co Ltd filed Critical Mitsubishi Shoji Plastics Corp
Publication of BR0304820A publication Critical patent/BR0304820A/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
    • B65D23/00—Details of bottles or jars not otherwise provided for
    • B65D23/02—Linings or internal coatings
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
    • B65D23/00—Details of bottles or jars not otherwise provided for
    • B65D23/08—Coverings or external coatings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Inorganic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Details Of Rigid Or Semi-Rigid Containers (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

"MECANISMO DE FORMAçãO DE PELìCULA DE CVD DE PLASMA E MéTODO PARA A FABRICAçãO DE UM RECIPIENTE DE PLáSTICO REVESTIDO POR UMA PELìCULA DE CVD". A restrição que o eletrodo externo de um aparelho formador de película de CVD convencional precisa ter uma estrutura cóncava que inclui uma concavidade destinada a acomodar um recipiente e tem um formato geralmente similar ao formato externo do recipiente é eliminada. Um aparelho de formação de película de CVD de plasma é caracterizado pelo fato de que um gás externo do recipiente é suprido no espaço definido entre a parede interna de um eletrodo externo e a superfície externa de um recipiente espaçado da parede interna, sendo que o plasma produzido desse modo do gás externo do recipiente na formação de uma película por CVD serve como condutor e transmite uma alta freq³ência à parede externa do recipiente, é gerado um estado no qual a parede interna do eletrodo externo entra equivalentemente em contato com a superfície externa do recipiente de plástico, e uma voltagem de auto-polarização uniforme é aplicada à parede interna do recipiente.
BR0304820-9A 2002-04-11 2003-04-09 Mecanismo de formação de pelìcula de cvd de plasma e método para a fabricação de um recipiente de plástico revestido por uma pelìcula de cvd BR0304820A (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2002109547 2002-04-11
PCT/JP2003/004530 WO2003085165A1 (fr) 2002-04-11 2003-04-09 Appareil de formation d'un film cvd plasma et procede de fabrication d'un conteneur plastique de revetement de film cvc

Publications (1)

Publication Number Publication Date
BR0304820A true BR0304820A (pt) 2004-06-15

Family

ID=28786588

Family Applications (1)

Application Number Title Priority Date Filing Date
BR0304820-9A BR0304820A (pt) 2002-04-11 2003-04-09 Mecanismo de formação de pelìcula de cvd de plasma e método para a fabricação de um recipiente de plástico revestido por uma pelìcula de cvd

Country Status (9)

Country Link
US (1) US20050229851A1 (pt)
EP (1) EP1493839A1 (pt)
JP (1) JPWO2003085165A1 (pt)
KR (1) KR20040106292A (pt)
CN (1) CN1646727A (pt)
AU (1) AU2003236027A1 (pt)
BR (1) BR0304820A (pt)
WO (1) WO2003085165A1 (pt)
ZA (1) ZA200309541B (pt)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050118365A1 (en) * 2002-04-26 2005-06-02 Shunzo Miyazaki Plastic containers coated on the inner surface and process for production thereof
JP2005105294A (ja) * 2003-09-26 2005-04-21 Mitsubishi Shoji Plast Kk Ｃｖｄ成膜装置及びｃｖｄ膜コーティングプラスチック容器の製造方法
JP2005113202A (ja) * 2003-10-08 2005-04-28 Mitsubishi Shoji Plast Kk プラズマｃｖｄ成膜装置
FR2872718B1 (fr) * 2004-07-08 2006-10-20 Sidel Sa Sa Procede de traitement d'un recipient comportant des phases de pompage a vide et machine pour sa mise en oeuvre
WO2006126677A1 (ja) * 2005-05-27 2006-11-30 Kirin Beer Kabushiki Kaisha ガスバリア性プラスチック容器の製造装置、その容器の製造方法及びその容器
AU2011236081B2 (en) * 2005-05-27 2012-05-17 Kirin Beer Kabushiki Kaisha Apparatus for manufacturing gas barrier plastic container, method for manufacturing the container, and the container
WO2007029050A1 (en) * 2005-09-09 2007-03-15 Sidel Barrier layer
JP4816914B2 (ja) * 2006-02-27 2011-11-16 凸版印刷株式会社 成膜圧力を調整可能な成膜方法
DE102006032568A1 (de) * 2006-07-12 2008-01-17 Stein, Ralf Verfahren zur plasmagestützten chemischen Gasphasenabscheidung an der Innenwand eines Hohlkörpers
US7896635B2 (en) * 2006-09-28 2011-03-01 The Japan Steel Works, Ltd. Method and apparatus for forming hollow moldings having thin film on inner surface
US20080202414A1 (en) * 2007-02-23 2008-08-28 General Electric Company Methods and devices for coating an interior surface of a plastic container
FR2929295A1 (fr) * 2008-03-25 2009-10-02 Becton Dickinson France Soc Pa Appareil pour le traitement par plasma de corps creux
JP5603201B2 (ja) * 2010-10-27 2014-10-08 サントリーホールディングス株式会社 樹脂製容器の表面改質方法および樹脂製容器の表面改質装置
JP6047308B2 (ja) * 2012-05-28 2016-12-21 日精エー・エス・ビー機械株式会社 樹脂容器用コーティング装置
US9404334B2 (en) 2012-08-31 2016-08-02 Baker Hughes Incorporated Downhole elastomeric components including barrier coatings
US11472590B2 (en) * 2016-05-05 2022-10-18 The Coca-Cola Company Containers and methods for improved mechanical strength
GB201614332D0 (en) * 2016-08-22 2016-10-05 Innano As Method and system for treating a surface
DE102020118718A1 (de) * 2020-07-15 2022-01-20 Rheinisch-Westfälische Technische Hochschule Aachen, Körperschaft des öffentlichen Rechts Verfahren und Vorrichtung zur Außenwand- und/oder Innenwandbeschichtung von Hohlkörpern
CN115613004A (zh) * 2021-07-12 2023-01-17 北京印刷学院 内壁镀膜的塑料管及制备方法
CN115384033A (zh) * 2022-09-20 2022-11-25 湖南千山制药机械股份有限公司 塑料容器内镀模组、注吹镀一体机及注吹镀灌封一体机
CN115366381A (zh) * 2022-09-20 2022-11-22 湖南千山制药机械股份有限公司 塑料封装容器注吹镀灌封一体机

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4505923B2 (ja) * 2000-02-04 2010-07-21 東洋製罐株式会社 被覆プラスチック容器
JP2001335945A (ja) * 2000-05-24 2001-12-07 Mitsubishi Shoji Plast Kk Ｃｖｄ成膜装置及びｃｖｄ成膜方法
JP3952695B2 (ja) * 2000-05-26 2007-08-01 学校法人金沢工業大学 高分子化合物製容器の表面改質方法とその装置
JP3993971B2 (ja) * 2000-08-09 2007-10-17 北海製罐株式会社 ガスバリア被覆層を有するプラスチック製容器及びその製法
JP3880797B2 (ja) * 2001-01-12 2007-02-14 ふくはうちテクノロジー株式会社 ダイヤモンドライクカーボン膜の製膜装置

Also Published As

Publication number Publication date
ZA200309541B (en) 2004-07-28
CN1646727A (zh) 2005-07-27
US20050229851A1 (en) 2005-10-20
EP1493839A1 (en) 2005-01-05
AU2003236027A1 (en) 2003-10-20
WO2003085165A1 (fr) 2003-10-16
AU2003236027A8 (en) 2003-10-20
JPWO2003085165A1 (ja) 2005-08-11
KR20040106292A (ko) 2004-12-17

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