BR0304820A - Mecanismo de formação de pelìcula de cvd de plasma e método para a fabricação de um recipiente de plástico revestido por uma pelìcula de cvd - Google Patents
Mecanismo de formação de pelìcula de cvd de plasma e método para a fabricação de um recipiente de plástico revestido por uma pelìcula de cvdInfo
- Publication number
- BR0304820A BR0304820A BR0304820-9A BR0304820A BR0304820A BR 0304820 A BR0304820 A BR 0304820A BR 0304820 A BR0304820 A BR 0304820A BR 0304820 A BR0304820 A BR 0304820A
- Authority
- BR
- Brazil
- Prior art keywords
- cvd film
- container
- wall
- film forming
- plastic container
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
- B65D23/00—Details of bottles or jars not otherwise provided for
- B65D23/02—Linings or internal coatings
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
- B65D23/00—Details of bottles or jars not otherwise provided for
- B65D23/08—Coverings or external coatings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Metallurgy (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Inorganic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Details Of Rigid Or Semi-Rigid Containers (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
"MECANISMO DE FORMAçãO DE PELìCULA DE CVD DE PLASMA E MéTODO PARA A FABRICAçãO DE UM RECIPIENTE DE PLáSTICO REVESTIDO POR UMA PELìCULA DE CVD". A restrição que o eletrodo externo de um aparelho formador de película de CVD convencional precisa ter uma estrutura cóncava que inclui uma concavidade destinada a acomodar um recipiente e tem um formato geralmente similar ao formato externo do recipiente é eliminada. Um aparelho de formação de película de CVD de plasma é caracterizado pelo fato de que um gás externo do recipiente é suprido no espaço definido entre a parede interna de um eletrodo externo e a superfície externa de um recipiente espaçado da parede interna, sendo que o plasma produzido desse modo do gás externo do recipiente na formação de uma película por CVD serve como condutor e transmite uma alta freq³ência à parede externa do recipiente, é gerado um estado no qual a parede interna do eletrodo externo entra equivalentemente em contato com a superfície externa do recipiente de plástico, e uma voltagem de auto-polarização uniforme é aplicada à parede interna do recipiente.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002109547 | 2002-04-11 | ||
PCT/JP2003/004530 WO2003085165A1 (fr) | 2002-04-11 | 2003-04-09 | Appareil de formation d'un film cvd plasma et procede de fabrication d'un conteneur plastique de revetement de film cvc |
Publications (1)
Publication Number | Publication Date |
---|---|
BR0304820A true BR0304820A (pt) | 2004-06-15 |
Family
ID=28786588
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR0304820-9A BR0304820A (pt) | 2002-04-11 | 2003-04-09 | Mecanismo de formação de pelìcula de cvd de plasma e método para a fabricação de um recipiente de plástico revestido por uma pelìcula de cvd |
Country Status (9)
Country | Link |
---|---|
US (1) | US20050229851A1 (pt) |
EP (1) | EP1493839A1 (pt) |
JP (1) | JPWO2003085165A1 (pt) |
KR (1) | KR20040106292A (pt) |
CN (1) | CN1646727A (pt) |
AU (1) | AU2003236027A1 (pt) |
BR (1) | BR0304820A (pt) |
WO (1) | WO2003085165A1 (pt) |
ZA (1) | ZA200309541B (pt) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20050007341A (ko) * | 2002-04-26 | 2005-01-17 | 호카이세이칸가부시끼가이샤 | 내면 피복 플라스틱 용기 및 그 제조 방법 |
JP2005105294A (ja) * | 2003-09-26 | 2005-04-21 | Mitsubishi Shoji Plast Kk | Cvd成膜装置及びcvd膜コーティングプラスチック容器の製造方法 |
JP2005113202A (ja) * | 2003-10-08 | 2005-04-28 | Mitsubishi Shoji Plast Kk | プラズマcvd成膜装置 |
FR2872718B1 (fr) * | 2004-07-08 | 2006-10-20 | Sidel Sa Sa | Procede de traitement d'un recipient comportant des phases de pompage a vide et machine pour sa mise en oeuvre |
AU2011236081B2 (en) * | 2005-05-27 | 2012-05-17 | Kirin Beer Kabushiki Kaisha | Apparatus for manufacturing gas barrier plastic container, method for manufacturing the container, and the container |
JP5260050B2 (ja) | 2005-05-27 | 2013-08-14 | 麒麟麦酒株式会社 | ガスバリア性プラスチック容器の製造装置及びその容器の製造方法 |
EP1922435A1 (en) * | 2005-09-09 | 2008-05-21 | Sidel | Barrier layer |
JP4816914B2 (ja) * | 2006-02-27 | 2011-11-16 | 凸版印刷株式会社 | 成膜圧力を調整可能な成膜方法 |
DE102006032568A1 (de) * | 2006-07-12 | 2008-01-17 | Stein, Ralf | Verfahren zur plasmagestützten chemischen Gasphasenabscheidung an der Innenwand eines Hohlkörpers |
US7896635B2 (en) * | 2006-09-28 | 2011-03-01 | The Japan Steel Works, Ltd. | Method and apparatus for forming hollow moldings having thin film on inner surface |
US20080202414A1 (en) * | 2007-02-23 | 2008-08-28 | General Electric Company | Methods and devices for coating an interior surface of a plastic container |
FR2929295A1 (fr) * | 2008-03-25 | 2009-10-02 | Becton Dickinson France Soc Pa | Appareil pour le traitement par plasma de corps creux |
JP5603201B2 (ja) * | 2010-10-27 | 2014-10-08 | サントリーホールディングス株式会社 | 樹脂製容器の表面改質方法および樹脂製容器の表面改質装置 |
JP6047308B2 (ja) * | 2012-05-28 | 2016-12-21 | 日精エー・エス・ビー機械株式会社 | 樹脂容器用コーティング装置 |
US9404334B2 (en) | 2012-08-31 | 2016-08-02 | Baker Hughes Incorporated | Downhole elastomeric components including barrier coatings |
MX2018013537A (es) * | 2016-05-05 | 2019-01-31 | Coca Cola Co | Contenedores y procedimientos para una resistencia mecánica mejorada. |
GB201614332D0 (en) * | 2016-08-22 | 2016-10-05 | Innano As | Method and system for treating a surface |
DE102020118718A1 (de) * | 2020-07-15 | 2022-01-20 | Rheinisch-Westfälische Technische Hochschule Aachen, Körperschaft des öffentlichen Rechts | Verfahren und Vorrichtung zur Außenwand- und/oder Innenwandbeschichtung von Hohlkörpern |
CN115613004A (zh) * | 2021-07-12 | 2023-01-17 | 北京印刷学院 | 内壁镀膜的塑料管及制备方法 |
CN115366381A (zh) * | 2022-09-20 | 2022-11-22 | 湖南千山制药机械股份有限公司 | 塑料封装容器注吹镀灌封一体机 |
CN115384033A (zh) * | 2022-09-20 | 2022-11-25 | 湖南千山制药机械股份有限公司 | 塑料容器内镀模组、注吹镀一体机及注吹镀灌封一体机 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4505923B2 (ja) * | 2000-02-04 | 2010-07-21 | 東洋製罐株式会社 | 被覆プラスチック容器 |
JP2001335945A (ja) * | 2000-05-24 | 2001-12-07 | Mitsubishi Shoji Plast Kk | Cvd成膜装置及びcvd成膜方法 |
JP3952695B2 (ja) * | 2000-05-26 | 2007-08-01 | 学校法人金沢工業大学 | 高分子化合物製容器の表面改質方法とその装置 |
JP3993971B2 (ja) * | 2000-08-09 | 2007-10-17 | 北海製罐株式会社 | ガスバリア被覆層を有するプラスチック製容器及びその製法 |
JP3880797B2 (ja) * | 2001-01-12 | 2007-02-14 | ふくはうちテクノロジー株式会社 | ダイヤモンドライクカーボン膜の製膜装置 |
-
2003
- 2003-04-09 BR BR0304820-9A patent/BR0304820A/pt not_active Application Discontinuation
- 2003-04-09 KR KR10-2004-7014622A patent/KR20040106292A/ko not_active Application Discontinuation
- 2003-04-09 CN CNA038081768A patent/CN1646727A/zh active Pending
- 2003-04-09 AU AU2003236027A patent/AU2003236027A1/en not_active Abandoned
- 2003-04-09 WO PCT/JP2003/004530 patent/WO2003085165A1/ja not_active Application Discontinuation
- 2003-04-09 US US10/510,218 patent/US20050229851A1/en not_active Abandoned
- 2003-04-09 JP JP2003582334A patent/JPWO2003085165A1/ja not_active Ceased
- 2003-04-09 EP EP03745987A patent/EP1493839A1/en not_active Withdrawn
- 2003-12-09 ZA ZA200309541A patent/ZA200309541B/xx unknown
Also Published As
Publication number | Publication date |
---|---|
KR20040106292A (ko) | 2004-12-17 |
EP1493839A1 (en) | 2005-01-05 |
AU2003236027A1 (en) | 2003-10-20 |
ZA200309541B (en) | 2004-07-28 |
WO2003085165A1 (fr) | 2003-10-16 |
CN1646727A (zh) | 2005-07-27 |
AU2003236027A8 (en) | 2003-10-20 |
US20050229851A1 (en) | 2005-10-20 |
JPWO2003085165A1 (ja) | 2005-08-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
B11Y | Definitive dismissal - extension of time limit for request of examination expired [chapter 11.1.1 patent gazette] |