ZA200309541B - Plasma CVD film forming apparatus and method for manufacturing CVD film coating plastic container. - Google Patents

Plasma CVD film forming apparatus and method for manufacturing CVD film coating plastic container.

Info

Publication number
ZA200309541B
ZA200309541B ZA200309541A ZA200309541A ZA200309541B ZA 200309541 B ZA200309541 B ZA 200309541B ZA 200309541 A ZA200309541 A ZA 200309541A ZA 200309541 A ZA200309541 A ZA 200309541A ZA 200309541 B ZA200309541 B ZA 200309541B
Authority
ZA
South Africa
Prior art keywords
cvd film
forming apparatus
plastic container
manufacturing
coating plastic
Prior art date
Application number
ZA200309541A
Other languages
English (en)
Inventor
Kenichi Hama
Tsuyoshi Kage
Keishu Takemoto
Takumi Kobayashi
Original Assignee
Mitsubishi Shoji Plastics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Shoji Plastics Corp filed Critical Mitsubishi Shoji Plastics Corp
Publication of ZA200309541B publication Critical patent/ZA200309541B/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
    • B65D23/00—Details of bottles or jars not otherwise provided for
    • B65D23/02—Linings or internal coatings
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
    • B65D23/00—Details of bottles or jars not otherwise provided for
    • B65D23/08—Coverings or external coatings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Inorganic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Details Of Rigid Or Semi-Rigid Containers (AREA)
  • Chemical Vapour Deposition (AREA)
ZA200309541A 2002-04-11 2003-12-09 Plasma CVD film forming apparatus and method for manufacturing CVD film coating plastic container. ZA200309541B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002109547 2002-04-11

Publications (1)

Publication Number Publication Date
ZA200309541B true ZA200309541B (en) 2004-07-28

Family

ID=28786588

Family Applications (1)

Application Number Title Priority Date Filing Date
ZA200309541A ZA200309541B (en) 2002-04-11 2003-12-09 Plasma CVD film forming apparatus and method for manufacturing CVD film coating plastic container.

Country Status (9)

Country Link
US (1) US20050229851A1 (pt)
EP (1) EP1493839A1 (pt)
JP (1) JPWO2003085165A1 (pt)
KR (1) KR20040106292A (pt)
CN (1) CN1646727A (pt)
AU (1) AU2003236027A1 (pt)
BR (1) BR0304820A (pt)
WO (1) WO2003085165A1 (pt)
ZA (1) ZA200309541B (pt)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20050007341A (ko) * 2002-04-26 2005-01-17 호카이세이칸가부시끼가이샤 내면 피복 플라스틱 용기 및 그 제조 방법
JP2005105294A (ja) * 2003-09-26 2005-04-21 Mitsubishi Shoji Plast Kk Ｃｖｄ成膜装置及びｃｖｄ膜コーティングプラスチック容器の製造方法
JP2005113202A (ja) * 2003-10-08 2005-04-28 Mitsubishi Shoji Plast Kk プラズマｃｖｄ成膜装置
FR2872718B1 (fr) * 2004-07-08 2006-10-20 Sidel Sa Sa Procede de traitement d'un recipient comportant des phases de pompage a vide et machine pour sa mise en oeuvre
AU2011236081B2 (en) * 2005-05-27 2012-05-17 Kirin Beer Kabushiki Kaisha Apparatus for manufacturing gas barrier plastic container, method for manufacturing the container, and the container
JP5260050B2 (ja) 2005-05-27 2013-08-14 麒麟麦酒株式会社 ガスバリア性プラスチック容器の製造装置及びその容器の製造方法
EP1922435A1 (en) * 2005-09-09 2008-05-21 Sidel Barrier layer
JP4816914B2 (ja) * 2006-02-27 2011-11-16 凸版印刷株式会社 成膜圧力を調整可能な成膜方法
DE102006032568A1 (de) * 2006-07-12 2008-01-17 Stein, Ralf Verfahren zur plasmagestützten chemischen Gasphasenabscheidung an der Innenwand eines Hohlkörpers
US7896635B2 (en) * 2006-09-28 2011-03-01 The Japan Steel Works, Ltd. Method and apparatus for forming hollow moldings having thin film on inner surface
US20080202414A1 (en) * 2007-02-23 2008-08-28 General Electric Company Methods and devices for coating an interior surface of a plastic container
FR2929295A1 (fr) * 2008-03-25 2009-10-02 Becton Dickinson France Soc Pa Appareil pour le traitement par plasma de corps creux
JP5603201B2 (ja) * 2010-10-27 2014-10-08 サントリーホールディングス株式会社 樹脂製容器の表面改質方法および樹脂製容器の表面改質装置
JP6047308B2 (ja) * 2012-05-28 2016-12-21 日精エー・エス・ビー機械株式会社 樹脂容器用コーティング装置
US9404334B2 (en) 2012-08-31 2016-08-02 Baker Hughes Incorporated Downhole elastomeric components including barrier coatings
MX2018013537A (es) * 2016-05-05 2019-01-31 Coca Cola Co Contenedores y procedimientos para una resistencia mecánica mejorada.
GB201614332D0 (en) * 2016-08-22 2016-10-05 Innano As Method and system for treating a surface
DE102020118718A1 (de) * 2020-07-15 2022-01-20 Rheinisch-Westfälische Technische Hochschule Aachen, Körperschaft des öffentlichen Rechts Verfahren und Vorrichtung zur Außenwand- und/oder Innenwandbeschichtung von Hohlkörpern
CN115613004A (zh) * 2021-07-12 2023-01-17 北京印刷学院 内壁镀膜的塑料管及制备方法
CN115366381A (zh) * 2022-09-20 2022-11-22 湖南千山制药机械股份有限公司 塑料封装容器注吹镀灌封一体机
CN115384033A (zh) * 2022-09-20 2022-11-25 湖南千山制药机械股份有限公司 塑料容器内镀模组、注吹镀一体机及注吹镀灌封一体机

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4505923B2 (ja) * 2000-02-04 2010-07-21 東洋製罐株式会社 被覆プラスチック容器
JP2001335945A (ja) * 2000-05-24 2001-12-07 Mitsubishi Shoji Plast Kk Ｃｖｄ成膜装置及びｃｖｄ成膜方法
JP3952695B2 (ja) * 2000-05-26 2007-08-01 学校法人金沢工業大学 高分子化合物製容器の表面改質方法とその装置
JP3993971B2 (ja) * 2000-08-09 2007-10-17 北海製罐株式会社 ガスバリア被覆層を有するプラスチック製容器及びその製法
JP3880797B2 (ja) * 2001-01-12 2007-02-14 ふくはうちテクノロジー株式会社 ダイヤモンドライクカーボン膜の製膜装置

Also Published As

Publication number Publication date
KR20040106292A (ko) 2004-12-17
EP1493839A1 (en) 2005-01-05
AU2003236027A1 (en) 2003-10-20
BR0304820A (pt) 2004-06-15
WO2003085165A1 (fr) 2003-10-16
CN1646727A (zh) 2005-07-27
AU2003236027A8 (en) 2003-10-20
US20050229851A1 (en) 2005-10-20
JPWO2003085165A1 (ja) 2005-08-11

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