BR0304664A - Pré-aquecedor de gás e processo para o controle de distribuição do gás reativo pré-aquecido em uma estufa cvi para o adensamento de substratos anulares porosos - Google Patents

Pré-aquecedor de gás e processo para o controle de distribuição do gás reativo pré-aquecido em uma estufa cvi para o adensamento de substratos anulares porosos

Info

Publication number
BR0304664A
BR0304664A BR0304664-8A BR0304664A BR0304664A BR 0304664 A BR0304664 A BR 0304664A BR 0304664 A BR0304664 A BR 0304664A BR 0304664 A BR0304664 A BR 0304664A
Authority
BR
Brazil
Prior art keywords
gas
cvi
greenhouse
passages
annular
Prior art date
Application number
BR0304664-8A
Other languages
English (en)
Other versions
BR0304664B1 (pt
Inventor
Eric Sion
Yvan Baudry
Original Assignee
Messier Bugatti
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Messier Bugatti filed Critical Messier Bugatti
Publication of BR0304664A publication Critical patent/BR0304664A/pt
Publication of BR0304664B1 publication Critical patent/BR0304664B1/pt

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04Coating on selected surface areas, e.g. using masks
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26Deposition of carbon only
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04Coating on selected surface areas, e.g. using masks
    • C23C16/045Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Furnace Details (AREA)

Abstract

"PRé-AQUECEDOR DE GáS E PROCESSO PARA O CONTROLE DE DISTRIBUIçãO DO GáS REATIVO PRé-AQUECIDO EM UMA ESTUFA CVI PARA O ADENSAMENTO DE SUBSTRATOS ANULARES POROSOS". Um pré-aquecedor de gás para uma estufa CVI projetado para o adensamento de substratos anulares porosos dispostos em uma multiplicidade de pilhas anulares verticais de substratos, compreendendo: uma manga de material condutor de calor se apoiando sobre a parede de fundo de um susceptor e delimitado uma câmara de pré-aquecimento de gás, com uma abertura de introdução de gás na câmara de pré-aquecimento de gás; um conjunto trocador de calor localizado na câmara de pré-aquecimento de gás; uma placa de distribuição de gás se apoiando sobre a manga, cobrindo a câmara de pré-aquecimento de gás e dotada com uma multiplicidade de passagens para o gás pré-aquecido; uma placa de suporte de carga para sustentar as pilhas de substratos anulares e dotada com uma multiplicidade de passagens em comunicação com passagens respectivas da placa de distribuição e gás e coincidindo com os volumes internos das ilhas respectivas de substratos anulares; e bocais inseridos nas passagens comunicando a zona de pré-aquecimento de gás com os volumes internos das pilhas respectivas de substratos anulares para ajustar os fluxos de gás pré-aquecido admitido respectivamente nos volumes internos citados.
BRPI0304664-8B1A 2002-05-06 2003-05-05 pré-aquecedor de gás em uma estufa cvi para o adensamento de substratos anulares porosos dispostos em uma multiplicidade de pilhas verticais anulares de substratos e processo para o controle de distribuição do gás reagente pré-aquecido BR0304664B1 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/139,553 US6572371B1 (en) 2002-05-06 2002-05-06 Gas preheater and process for controlling distribution of preheated reactive gas in a CVI furnace for densification of porous annular substrates
PCT/EP2003/005259 WO2003093531A1 (en) 2002-05-06 2003-05-05 Gas preheater

Publications (2)

Publication Number Publication Date
BR0304664A true BR0304664A (pt) 2004-08-03
BR0304664B1 BR0304664B1 (pt) 2013-07-09

Family

ID=22487231

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0304664-8B1A BR0304664B1 (pt) 2002-05-06 2003-05-05 pré-aquecedor de gás em uma estufa cvi para o adensamento de substratos anulares porosos dispostos em uma multiplicidade de pilhas verticais anulares de substratos e processo para o controle de distribuição do gás reagente pré-aquecido

Country Status (13)

Country Link
US (1) US6572371B1 (pt)
EP (1) EP1501963B1 (pt)
JP (1) JP4417831B2 (pt)
KR (1) KR101057215B1 (pt)
CN (1) CN100371494C (pt)
AU (1) AU2003242547C1 (pt)
BR (1) BR0304664B1 (pt)
CA (1) CA2484915C (pt)
IL (1) IL164970A (pt)
MX (1) MXPA04011025A (pt)
RU (1) RU2315821C2 (pt)
UA (1) UA79779C2 (pt)
WO (1) WO2003093531A1 (pt)

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US7476419B2 (en) * 1998-10-23 2009-01-13 Goodrich Corporation Method for measurement of weight during a CVI/CVD process
US6669988B2 (en) * 2001-08-20 2003-12-30 Goodrich Corporation Hardware assembly for CVI/CVD processes
DE60108078T2 (de) * 2001-04-12 2005-12-01 Infineon Technologies Sc300 Gmbh & Co. Ohg Heizungsanlage und Verfahren zur Heizung für einen Reaktor
US6758909B2 (en) * 2001-06-05 2004-07-06 Honeywell International Inc. Gas port sealing for CVD/CVI furnace hearth plates
US6953605B2 (en) * 2001-12-26 2005-10-11 Messier-Bugatti Method for densifying porous substrates by chemical vapour infiltration with preheated gas
US7431585B2 (en) * 2002-01-24 2008-10-07 Applied Materials, Inc. Apparatus and method for heating substrates
US20040253377A1 (en) * 2002-10-24 2004-12-16 Bok Lowell D. Batch and continuous CVI densification furnace
CN1304912C (zh) * 2005-02-21 2007-03-14 西北工业大学 碳/碳复合材料热梯度化学气相渗透过程温度自动控制器
US8057855B1 (en) 2005-05-31 2011-11-15 Goodrich Corporation Non-pressure gradient single cycle CVI/CVD apparatus and method
US7691443B2 (en) * 2005-05-31 2010-04-06 Goodrich Corporation Non-pressure gradient single cycle CVI/CVD apparatus and method
KR100792396B1 (ko) * 2005-10-11 2008-01-08 주식회사 유진테크 파티션 구조형 가열유닛과 이를 이용한 히팅장치
US7811085B2 (en) * 2006-05-04 2010-10-12 Honeywell International Inc. Gas preheater for chemical vapor processing furnace
US7771194B2 (en) * 2006-05-26 2010-08-10 Honeywell International Inc. Gas preheater for chemical vapor processing furnace having circuitous passages
WO2008052923A2 (en) * 2006-10-29 2008-05-08 Messier-Bugatti Method of densifying porous articles
IL198123A0 (en) * 2008-04-18 2009-12-24 Snecma Propulsion Solide A heat treatment oven with inductive heating
JP5730496B2 (ja) * 2009-05-01 2015-06-10 株式会社日立国際電気 熱処理装置、半導体デバイスの製造方法および基板処理方法
US11326255B2 (en) * 2013-02-07 2022-05-10 Uchicago Argonne, Llc ALD reactor for coating porous substrates
FR3018526B1 (fr) * 2014-03-14 2021-06-11 Herakles Installation de densification cvi comprenant une zone de prechauffage a forte capacite
DE102014226138A1 (de) 2014-12-16 2016-06-16 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zum Herstellen einer Vorrichtung mit einer dreidimensionalen magnetischen Struktur
DE102016215617A1 (de) * 2016-08-19 2018-02-22 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zum Herstellen eines Hohlraums mit poröser Struktur
DE102016215616B4 (de) 2016-08-19 2020-02-20 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zum Herstellen einer magnetischen Struktur und Vorrichtung
CN108106412B (zh) * 2017-11-16 2019-10-15 山东道普安制动材料有限公司 一种高效率刹车盘生产设备及应用
CN107779843B (zh) * 2017-12-11 2019-10-08 湖南顶立科技有限公司 一种化学气相沉积炉
CN108588678B (zh) * 2018-05-07 2020-06-09 西安航空制动科技有限公司 一种化学气相沉积炉气体预热装置
US10731252B2 (en) * 2018-05-25 2020-08-04 Rolls-Royce High Temperature Composites Apparatus and method for coating specimens
FR3084672B1 (fr) * 2018-08-03 2020-10-16 Safran Ceram Procede de densification par infiltration chimique en phase gazeuse de substrats annulaires poreux
FR3084892B1 (fr) 2018-08-10 2020-11-06 Safran Ceram Procede de densification par infiltration chimique en phase gazeuse de substrats annulaire poreux
CN110699667A (zh) * 2019-11-25 2020-01-17 美尔森银河新材料(烟台)有限公司 一种炭炭坩埚生产装置
US11111578B1 (en) 2020-02-13 2021-09-07 Uchicago Argonne, Llc Atomic layer deposition of fluoride thin films
US12065738B2 (en) 2021-10-22 2024-08-20 Uchicago Argonne, Llc Method of making thin films of sodium fluorides and their derivatives by ALD
US12000046B1 (en) * 2021-12-29 2024-06-04 Rolls-Royce High Temperature Composites, Inc. Load assemblies for loading parts in a furnace
US11932941B1 (en) 2021-12-29 2024-03-19 Rolls-Royce High Temperature Composites, Inc. Load assemblies for loading parts in a furnace
US12078417B1 (en) 2021-12-29 2024-09-03 Rolls-Royce High Temperature Composites, Inc. Load assemblies for loading parts in a furnace
US11912628B1 (en) 2021-12-29 2024-02-27 Rolls-Royce High Temperature Composites, Inc. Slurry infiltration fixture
US11901169B2 (en) 2022-02-14 2024-02-13 Uchicago Argonne, Llc Barrier coatings
CN114990521A (zh) * 2022-06-22 2022-09-02 湖南九华碳素高科有限公司 一种卧式装炉沉积炉
CN116043193A (zh) * 2022-12-06 2023-05-02 湖南恒升热工机械设备有限公司 一种气相沉积炉

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ATE172753T1 (de) * 1994-11-16 1998-11-15 Goodrich Co B F Vorrichtung zur druckfeld cvd/cvi, verfahren und produkt
US5480678A (en) 1994-11-16 1996-01-02 The B. F. Goodrich Company Apparatus for use with CVI/CVD processes

Also Published As

Publication number Publication date
RU2004132226A (ru) 2005-06-27
CN100371494C (zh) 2008-02-27
AU2003242547B2 (en) 2008-07-31
EP1501963B1 (en) 2012-08-08
AU2003242547C1 (en) 2009-01-22
MXPA04011025A (es) 2005-02-14
UA79779C2 (en) 2007-07-25
CA2484915C (en) 2010-04-13
US6572371B1 (en) 2003-06-03
JP2005524773A (ja) 2005-08-18
IL164970A0 (en) 2005-12-18
CN1650042A (zh) 2005-08-03
KR101057215B1 (ko) 2011-08-16
AU2003242547A1 (en) 2003-11-17
EP1501963A1 (en) 2005-02-02
CA2484915A1 (en) 2003-11-13
JP4417831B2 (ja) 2010-02-17
KR20040108781A (ko) 2004-12-24
WO2003093531A1 (en) 2003-11-13
RU2315821C2 (ru) 2008-01-27
IL164970A (en) 2010-06-16
BR0304664B1 (pt) 2013-07-09

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Legal Events

Date Code Title Description
B07A Application suspended after technical examination (opinion) [chapter 7.1 patent gazette]
B06A Patent application procedure suspended [chapter 6.1 patent gazette]
B06A Patent application procedure suspended [chapter 6.1 patent gazette]
B09A Decision: intention to grant [chapter 9.1 patent gazette]
B25A Requested transfer of rights approved

Owner name: MESSIER-BUGATTI-DOWTY (FR)

B16A Patent or certificate of addition of invention granted [chapter 16.1 patent gazette]

Free format text: PRAZO DE VALIDADE: 10 (DEZ) ANOS CONTADOS A PARTIR DE 09/07/2013, OBSERVADAS AS CONDICOES LEGAIS.

B21F Lapse acc. art. 78, item iv - on non-payment of the annual fees in time

Free format text: REFERENTE A 11A ANUIDADE.

B24J Lapse because of non-payment of annual fees (definitively: art 78 iv lpi, resolution 113/2013 art. 12)

Free format text: EM VIRTUDE DA EXTINCAO PUBLICADA NA RPI 2260 DE 29-04-2014 E CONSIDERANDO AUSENCIA DE MANIFESTACAO DENTRO DOS PRAZOS LEGAIS, INFORMO QUE CABE SER MANTIDA A EXTINCAO DA PATENTE E SEUS CERTIFICADOS, CONFORME O DISPOSTO NO ARTIGO 12, DA RESOLUCAO 113/2013.