BR0103789A - Processo de purificação de compostos contendo tântalo - Google Patents
Processo de purificação de compostos contendo tântaloInfo
- Publication number
- BR0103789A BR0103789A BR0103789-7A BR0103789A BR0103789A BR 0103789 A BR0103789 A BR 0103789A BR 0103789 A BR0103789 A BR 0103789A BR 0103789 A BR0103789 A BR 0103789A
- Authority
- BR
- Brazil
- Prior art keywords
- compounds containing
- purification process
- containing tantalum
- purification
- compounds
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G35/00—Compounds of tantalum
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/12—Surface area
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/80—Compositional purity
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/80—Compositional purity
- C01P2006/82—Compositional purity water content
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Manufacture And Refinement Of Metals (AREA)
Abstract
"PROCESSO DE PURIFICAçãO DE COMPOSTOS CONTENDO TâNTALO". Processo de dissolução direta para purificação de óxido de tântalo de amónio hidratado classificação técnica (HATO), (NH~ 4~)~ 2-x~H~ x~Ta~ 2~O~ 6~.nH~ 2~O), e compostos correlatos, tais como, hidróxido de tântalo e óxido de tântalo. O processo preferivelmente utiliza bifluoreto de amónio como fonte de flúor, no lugar do ácido fluorídrico usado nos processos convencionais. Outros compostos fluoreto, tais como, NaF, KF e CaF~ 2~ podem também ser usados.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/652,517 US6383459B1 (en) | 2000-08-31 | 2000-08-31 | Method for purifying a tantalum compound using a fluoride compound and sulfuric acid |
Publications (1)
Publication Number | Publication Date |
---|---|
BR0103789A true BR0103789A (pt) | 2002-05-07 |
Family
ID=24617111
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR0103789-7A BR0103789A (pt) | 2000-08-31 | 2001-08-30 | Processo de purificação de compostos contendo tântalo |
Country Status (5)
Country | Link |
---|---|
US (1) | US6383459B1 (pt) |
CN (1) | CN1206380C (pt) |
AU (1) | AU780618B2 (pt) |
BR (1) | BR0103789A (pt) |
DE (1) | DE10142692B4 (pt) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7964085B1 (en) | 2002-11-25 | 2011-06-21 | Applied Materials, Inc. | Electrochemical removal of tantalum-containing materials |
US20060105182A1 (en) * | 2004-11-16 | 2006-05-18 | Applied Materials, Inc. | Erosion resistant textured chamber surface |
US7182925B2 (en) * | 2003-04-24 | 2007-02-27 | Osram Sylvania Inc. | Tantalum concentrates dissolution and purification method |
US7910218B2 (en) * | 2003-10-22 | 2011-03-22 | Applied Materials, Inc. | Cleaning and refurbishing chamber components having metal coatings |
US7579067B2 (en) * | 2004-11-24 | 2009-08-25 | Applied Materials, Inc. | Process chamber component with layered coating and method |
US8617672B2 (en) | 2005-07-13 | 2013-12-31 | Applied Materials, Inc. | Localized surface annealing of components for substrate processing chambers |
US7762114B2 (en) | 2005-09-09 | 2010-07-27 | Applied Materials, Inc. | Flow-formed chamber component having a textured surface |
US7981262B2 (en) * | 2007-01-29 | 2011-07-19 | Applied Materials, Inc. | Process kit for substrate processing chamber |
US7942969B2 (en) | 2007-05-30 | 2011-05-17 | Applied Materials, Inc. | Substrate cleaning chamber and components |
CN101808770A (zh) * | 2007-10-15 | 2010-08-18 | 高温特殊金属公司 | 利用回收的废料作为源材料制备钽粉末的方法 |
CN102583539A (zh) * | 2011-01-11 | 2012-07-18 | 辽宁石油化工大学 | 氟钽酸钾的热分解合成方法 |
CN102336438B (zh) * | 2011-06-29 | 2014-11-12 | 宁夏东方钽业股份有限公司 | 利用回收钠还原制备钽粉的副产物制备氟钽酸钾的方法 |
CN103352117B (zh) * | 2013-07-17 | 2015-01-21 | 内蒙古科技大学 | 从低品位含铌矿中提取铌的方法 |
CN110964928B (zh) * | 2019-12-20 | 2021-09-10 | 西安瑞鑫科金属材料有限责任公司 | 一种从含钽物料中溶解钽的方法 |
CN117020215A (zh) * | 2021-12-15 | 2023-11-10 | 宁夏东方钽业股份有限公司 | 采用碱土金属还原氧化钽生产电容器用钽粉的方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1802242A (en) * | 1926-05-20 | 1931-04-21 | Intermetal Corp | Production of oxy compounds of tantalum and columbium from the ores |
US2888320A (en) * | 1955-12-21 | 1959-05-26 | Andrew T Mccord | Process of extracting and recovering columbium and tantalum values from their ores and products thereof |
US3117833A (en) | 1958-09-25 | 1964-01-14 | Fansteel Metallurgical Corp | Process of purifying and separating columbium and tantalum values from each other |
US3653850A (en) * | 1969-04-14 | 1972-04-04 | Norton Co | Process for purifying tantalum fluoride salts |
US3712939A (en) | 1971-03-29 | 1973-01-23 | Union Carbide Corp | Method for recovering tantalum and/or columbium |
JPS56114831A (en) | 1980-02-15 | 1981-09-09 | Toshiba Corp | Recovery of tantalum from scrap containing tantalum |
SU1149572A1 (ru) * | 1983-03-02 | 1986-11-07 | Институт Химии И Технологии Редких Элементов Минерального Сырья Кольского Филиала Ан Ссср Им.С.М.Кирова | Способ получени фторотанталатов щелочных мателлов |
JPS61146717A (ja) | 1984-12-18 | 1986-07-04 | Sumitomo Chem Co Ltd | タンタルの精製方法 |
US5635146A (en) | 1995-11-30 | 1997-06-03 | Osram Sylvania Inc. | Method for the dissolution and purification of tantalum pentoxide |
US6010676A (en) | 1997-09-12 | 2000-01-04 | Osram Sylvania Inc. | Method for making a highly pure tantalum compound |
-
2000
- 2000-08-31 US US09/652,517 patent/US6383459B1/en not_active Expired - Fee Related
-
2001
- 2001-08-30 BR BR0103789-7A patent/BR0103789A/pt not_active Application Discontinuation
- 2001-08-31 CN CN01125397.5A patent/CN1206380C/zh not_active Expired - Fee Related
- 2001-08-31 AU AU65583/01A patent/AU780618B2/en not_active Ceased
- 2001-08-31 DE DE10142692A patent/DE10142692B4/de not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
DE10142692B4 (de) | 2008-12-18 |
AU780618B2 (en) | 2005-04-07 |
AU6558301A (en) | 2002-03-07 |
US6383459B1 (en) | 2002-05-07 |
CN1340631A (zh) | 2002-03-20 |
DE10142692A1 (de) | 2002-03-14 |
CN1206380C (zh) | 2005-06-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
B06A | Patent application procedure suspended [chapter 6.1 patent gazette] | ||
B06A | Patent application procedure suspended [chapter 6.1 patent gazette] | ||
B11B | Dismissal acc. art. 36, par 1 of ipl - no reply within 90 days to fullfil the necessary requirements |