BR0004579A - Dispositivo micromecânico e método para a sua fabricação - Google Patents

Dispositivo micromecânico e método para a sua fabricação

Info

Publication number
BR0004579A
BR0004579A BR0004579-9A BR0004579A BR0004579A BR 0004579 A BR0004579 A BR 0004579A BR 0004579 A BR0004579 A BR 0004579A BR 0004579 A BR0004579 A BR 0004579A
Authority
BR
Brazil
Prior art keywords
silicon
sensors
micromechanical device
manufacturing
manufacture
Prior art date
Application number
BR0004579-9A
Other languages
English (en)
Inventor
Daniel Lapadatu
Terju Kvisteroy
Henrik Jakobsen
Original Assignee
Sensonor Asa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sensonor Asa filed Critical Sensonor Asa
Publication of BR0004579A publication Critical patent/BR0004579A/pt

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
    • G01P3/00—Measuring linear or angular speed; Measuring differences of linear or angular speeds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B7/00—Microstructural systems; Auxiliary parts of microstructural devices or systems
    • B81B7/0032—Packages or encapsulation
    • B81B7/0045—Packages or encapsulation for reducing stress inside of the package structure
    • B81B7/0048—Packages or encapsulation for reducing stress inside of the package structure between the MEMS die and the substrate
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B3/00—Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
    • B81B3/0064—Constitution or structural means for improving or controlling the physical properties of a device
    • B81B3/0067—Mechanical properties
    • B81B3/0072—For controlling internal stress or strain in moving or flexible elements, e.g. stress compensating layers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01C—MEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
    • G01C19/00—Gyroscopes; Turn-sensitive devices using vibrating masses; Turn-sensitive devices without moving masses; Measuring angular rate using gyroscopic effects
    • G01C19/56—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces
    • G01C19/5719—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces using planar vibrating masses driven in a translation vibration along an axis
    • G01C19/5733—Structural details or topology
    • G01C19/5755—Structural details or topology the devices having a single sensing mass
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
    • G01P1/00—Details of instruments
    • G01P1/006—Details of instruments used for thermal compensation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
    • G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
    • G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
    • G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
    • G01P15/0802—Details
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2201/00—Specific applications of microelectromechanical systems
    • B81B2201/03—Microengines and actuators
    • B81B2201/032—Bimorph and unimorph actuators, e.g. piezo and thermo
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2203/00—Basic microelectromechanical structures
    • B81B2203/01—Suspended structures, i.e. structures allowing a movement
    • B81B2203/0109—Bridges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
    • G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
    • G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
    • G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
    • G01P2015/0805—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration
    • G01P2015/0822—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining out-of-plane movement of the mass
    • G01P2015/0825—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining out-of-plane movement of the mass for one single degree of freedom of movement of the mass
    • G01P2015/0828—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining out-of-plane movement of the mass for one single degree of freedom of movement of the mass the mass being of the paddle type being suspended at one of its longitudinal ends
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S73/00—Measuring and testing
    • Y10S73/01—Vibration

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Radar, Positioning & Navigation (AREA)
  • Remote Sensing (AREA)
  • Mechanical Engineering (AREA)
  • Pressure Sensors (AREA)
  • Weting (AREA)
  • Gyroscopes (AREA)
  • Micromachines (AREA)

Abstract

Patente de Invenção: DISPOSITIVO MICROMECâNICO E MéTODO PARA A SUA FABRICAçãO. Uma estrutura de pedestal e seu método de fabricação enfatiza a montagem por liberação de sensores micromecânicos em particular de um sensor de aceleração, sensores de taxa angular, sensores de inclinação, ou de aceleração angular. Pelo menos uma massa sísmica de silício é usada como elemento sensor. A pelo menos uma massa sísmica de silício é unida à moldura de silício por meio de pelo menos um pedestal de montagem, cuja superfície é ligada a uma pastilha de cobertura, seja de vidro ou silício.
BR0004579-9A 1999-10-29 2000-10-02 Dispositivo micromecânico e método para a sua fabricação BR0004579A (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP99308589A EP1096260B1 (en) 1999-10-29 1999-10-29 Micromechanical device

Publications (1)

Publication Number Publication Date
BR0004579A true BR0004579A (pt) 2001-05-29

Family

ID=8241708

Family Applications (1)

Application Number Title Priority Date Filing Date
BR0004579-9A BR0004579A (pt) 1999-10-29 2000-10-02 Dispositivo micromecânico e método para a sua fabricação

Country Status (7)

Country Link
US (1) US6684699B1 (pt)
EP (1) EP1096260B1 (pt)
JP (1) JP2001203371A (pt)
KR (1) KR20010050327A (pt)
CN (1) CN1143135C (pt)
BR (1) BR0004579A (pt)
DE (1) DE69925837T2 (pt)

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US6795605B1 (en) * 2000-08-01 2004-09-21 Cheetah Omni, Llc Micromechanical optical switch
US7145704B1 (en) * 2003-11-25 2006-12-05 Cheetah Omni, Llc Optical logic gate based optical router
EP1423713A1 (en) 2001-08-24 2004-06-02 Honeywell International Inc. Hermetically sealed silicon micro-machined electromechanical system (mems) device having diffused conductors
US7110671B1 (en) * 2001-12-03 2006-09-19 Cheetah Omni, Llc Method and apparatus for scheduling communication using a star switching fabric
US6848304B2 (en) * 2003-04-28 2005-02-01 Analog Devices, Inc. Six degree-of-freedom micro-machined multi-sensor
CN1297470C (zh) * 2003-07-28 2007-01-31 华新丽华股份有限公司 采用微结构间隙控制技术形成的结构及其形成方法
US20060037398A1 (en) * 2004-08-19 2006-02-23 Rich David B Method for making an impact detector
FI119299B (fi) * 2005-06-17 2008-09-30 Vti Technologies Oy Menetelmä kapasitiivisen kiihtyvyysanturin valmistamiseksi ja kapasitiivinen kiihtyvyysanturi
JP4945167B2 (ja) * 2006-05-12 2012-06-06 スタンレー電気株式会社 半導体発光素子の製造方法及び該製造方法により製造された半導体発光素子の実装方法
DE102008040970A1 (de) * 2008-08-04 2010-02-11 Robert Bosch Gmbh Mikromechanische Vorrichtung mit Kavernen mit unterschiedlichem atmosphärischen Innendruck
FR2944102B1 (fr) * 2009-04-03 2011-06-10 Onera (Off Nat Aerospatiale) Element vibrant sur deux modes decouples et application a un gyrometre vibrant.
DE102010010931A1 (de) * 2010-03-10 2011-09-15 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Piezoresistiver Wandler
EP2378246A1 (en) 2010-04-16 2011-10-19 SensoNor Technologies AS MEMS Structure for an Angular Rate Sensor
CN104797943A (zh) * 2012-11-19 2015-07-22 株式会社村田制作所 角加速度传感器
CN104797944B (zh) * 2012-11-19 2017-03-08 株式会社村田制作所 角加速度传感器
WO2014196320A1 (ja) * 2013-06-04 2014-12-11 株式会社村田製作所 加速度センサ
CN111650401B (zh) * 2020-06-03 2021-05-07 西安交通大学 一种同平面贴装的金属基集成式谐振加速度计
GB2624843A (en) 2022-07-08 2024-06-05 Autorient Tech As Micromechanical devices and methods of manufacturing thereof

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2176607B (en) * 1985-06-18 1988-01-13 Standard Telephones Cables Ltd Accelerometer device
GB2192718B (en) * 1986-07-15 1990-06-13 Stc Plc Accelerometer or seismometer
US4945765A (en) * 1988-08-31 1990-08-07 Kearfott Guidance & Navigation Corp. Silicon micromachined accelerometer
US5594172A (en) * 1989-06-21 1997-01-14 Nissan Motor Co., Ltd. Semiconductor accelerometer having a cantilevered beam with a triangular or pentagonal cross section
JPH05240874A (ja) * 1991-12-06 1993-09-21 Canon Inc 角速度センサ
US5643803A (en) * 1992-09-18 1997-07-01 Nippondenso Co., Ltd. Production method of a semiconductor dynamic sensor
US5484073A (en) * 1994-03-28 1996-01-16 I/O Sensors, Inc. Method for fabricating suspension members for micromachined sensors
JP3305516B2 (ja) * 1994-10-31 2002-07-22 株式会社東海理化電機製作所 静電容量式加速度センサ及びその製造方法
US5591679A (en) * 1995-04-12 1997-01-07 Sensonor A/S Sealed cavity arrangement method
JPH11258265A (ja) * 1998-03-16 1999-09-24 Akebono Brake Ind Co Ltd 半導体加速度センサ及びその製造方法

Also Published As

Publication number Publication date
DE69925837D1 (de) 2005-07-21
DE69925837T2 (de) 2005-10-27
KR20010050327A (ko) 2001-06-15
EP1096260A1 (en) 2001-05-02
JP2001203371A (ja) 2001-07-27
US6684699B1 (en) 2004-02-03
CN1294303A (zh) 2001-05-09
EP1096260B1 (en) 2005-06-15
CN1143135C (zh) 2004-03-24

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Legal Events

Date Code Title Description
B08F Application dismissed because of non-payment of annual fees [chapter 8.6 patent gazette]

Free format text: REFERENTE A 5 A 7A ANUIDADES

B08K Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette]

Free format text: REFERENTE AO DESPACHO 8.6 PUBLICADO NA RPI 1913 DE 04/09/2007.