BE878143A - Procede et montage pour la regulation de la vitesse de vaporisation de substances oxydables pendant le depot par vaporisation sous vide dans une atmosphere reactive - Google Patents
Procede et montage pour la regulation de la vitesse de vaporisation de substances oxydables pendant le depot par vaporisation sous vide dans une atmosphere reactiveInfo
- Publication number
- BE878143A BE878143A BE0/196650A BE196650A BE878143A BE 878143 A BE878143 A BE 878143A BE 0/196650 A BE0/196650 A BE 0/196650A BE 196650 A BE196650 A BE 196650A BE 878143 A BE878143 A BE 878143A
- Authority
- BE
- Belgium
- Prior art keywords
- vaporization
- regulating
- assembly
- reactive atmosphere
- substances during
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE2834813A DE2834813C2 (de) | 1978-08-09 | 1978-08-09 | Verfahren und Vorrichtung zur Regelung der Verdampfungsrate oxidierbarer Stoffe beim reaktiven Vakuumaufdampfen |
Publications (1)
Publication Number | Publication Date |
---|---|
BE878143A true BE878143A (fr) | 1979-12-03 |
Family
ID=6046549
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BE0/196650A BE878143A (fr) | 1978-08-09 | 1979-08-08 | Procede et montage pour la regulation de la vitesse de vaporisation de substances oxydables pendant le depot par vaporisation sous vide dans une atmosphere reactive |
Country Status (7)
Country | Link |
---|---|
US (2) | US4287224A (de) |
BE (1) | BE878143A (de) |
CH (1) | CH641498A5 (de) |
DE (1) | DE2834813C2 (de) |
FR (1) | FR2433055A1 (de) |
GB (1) | GB2028380B (de) |
NL (1) | NL7906040A (de) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
HU180339B (en) * | 1980-03-28 | 1983-02-28 | Egyesuelt Izzolampa | Spectacle lens coated by interference filter layer for industrial flame adjusting purposes |
US4382421A (en) * | 1980-04-11 | 1983-05-10 | Vetco, Inc. | Tube coating apparatus |
JPS58167767A (ja) * | 1982-03-26 | 1983-10-04 | Clarion Co Ltd | 薄膜形成方法 |
US4495889A (en) * | 1982-11-24 | 1985-01-29 | Riley Thomas J | Polymeric film coating apparatus |
US4518623A (en) * | 1982-11-24 | 1985-05-21 | Riley Thomas J | Polymeric film coating method with continuous deposition pressure control |
US4526802A (en) * | 1983-03-31 | 1985-07-02 | Clarion Co., Ltd. | Film deposition equipment |
US4517220A (en) * | 1983-08-15 | 1985-05-14 | Motorola, Inc. | Deposition and diffusion source control means and method |
US4645685A (en) * | 1984-03-26 | 1987-02-24 | Kuraray Co., Ltd. | Method for producing an optical recording medium by a chalcogenide suboxide |
US4609562A (en) * | 1984-12-20 | 1986-09-02 | Westinghouse Electric Corp. | Apparatus and method for depositing coating onto porous substrate |
DE3523286A1 (de) * | 1985-06-28 | 1987-01-08 | Kaltenbach & Voigt | Stabfoermiger lichtleiter fuer medizinische zwecke |
US4719120A (en) * | 1986-09-29 | 1988-01-12 | The United States Of America As Represented By The Secretary Of The Navy | Detection of oxygen in thin films |
US5601652A (en) * | 1989-08-03 | 1997-02-11 | United Technologies Corporation | Apparatus for applying ceramic coatings |
US5087477A (en) * | 1990-02-05 | 1992-02-11 | United Technologies Corporation | Eb-pvd method for applying ceramic coatings |
CH686253A5 (de) * | 1992-08-28 | 1996-02-15 | Balzers Hochvakuum | Verfahren zur Regelung des Reaktionsgrades sowie Beschichtungsanlage. |
US5405108A (en) * | 1992-09-03 | 1995-04-11 | The United States Of America As Represented By The Secretary Of The Air Force | Space debris clearing device |
DE4427581A1 (de) | 1994-08-04 | 1996-02-08 | Leybold Ag | Verfahren zum Aufbringen einer transparenten Metalloxidschicht auf eine Folie |
US6428848B1 (en) * | 1998-08-06 | 2002-08-06 | Toray Industries, Inc. | Method for producing a metal evaporated article |
EP1580822A1 (de) * | 2004-03-24 | 2005-09-28 | Samsung SDI Co., Ltd. | Organischer Feldeffekttransistor und Verfahren zu dessen Herstellung |
DE102004018435A1 (de) * | 2004-04-06 | 2005-10-27 | Carl Zeiss | Vorrichtung zum beidseitigen Beschichten von Substraten mit einer hydrophoben Schicht |
DE202005008165U1 (de) * | 2005-05-20 | 2005-10-06 | Leybold Optics Gmbh | Vorrichtung zum beidseitigen Beschichten von Substraten |
US20130142942A1 (en) * | 2011-11-17 | 2013-06-06 | Abbott Diabetes Care Inc. | Methods of Making a Reference Electrode for an Electrochemical Sensor |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1104283B (de) * | 1952-06-25 | 1961-04-06 | Alois Vogt Dr | Verfahren zum Herstellen von duennen Schichten auf Unterlagen durch Verdampfen von Metallverbindungen |
GB1010456A (en) * | 1962-10-02 | 1965-11-17 | G V Planer Ltd | Means for measuring and/or controlling the evaporation rate in vacuum evaporation processes |
US3316386A (en) * | 1964-05-20 | 1967-04-25 | Bendix Corp | Multiple evaporation rate monitor and control |
US3982049A (en) * | 1969-06-16 | 1976-09-21 | Rockwell International Corporation | Method for producing single crystal films |
BE817066R (fr) * | 1973-11-29 | 1974-10-16 | Enceinte de reaction pour le depot de matiere semi-concuctrice sur des corps de support chauffes | |
US3962488A (en) * | 1974-08-09 | 1976-06-08 | Ppg Industries, Inc. | Electrically conductive coating |
JPS5315273A (en) * | 1976-07-29 | 1978-02-10 | Toshiba Corp | Forming method for transparent thin film of oxide |
FR2371009A1 (fr) * | 1976-11-15 | 1978-06-09 | Commissariat Energie Atomique | Procede de controle du depot de couches par pulverisation reactive et dispositif de mise en oeuvre |
-
1978
- 1978-08-09 DE DE2834813A patent/DE2834813C2/de not_active Expired
-
1979
- 1979-07-20 CH CH677079A patent/CH641498A5/de not_active IP Right Cessation
- 1979-08-07 NL NL7906040A patent/NL7906040A/nl not_active Application Discontinuation
- 1979-08-07 GB GB7927475A patent/GB2028380B/en not_active Expired
- 1979-08-08 BE BE0/196650A patent/BE878143A/xx not_active IP Right Cessation
- 1979-08-09 US US06/065,013 patent/US4287224A/en not_active Expired - Lifetime
- 1979-08-09 FR FR7920415A patent/FR2433055A1/fr active Granted
-
1981
- 1981-05-04 US US06/260,484 patent/US4408563A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
FR2433055A1 (fr) | 1980-03-07 |
FR2433055B1 (de) | 1983-12-16 |
DE2834813C2 (de) | 1983-01-20 |
US4408563A (en) | 1983-10-11 |
DE2834813A1 (de) | 1980-03-13 |
GB2028380B (en) | 1982-11-03 |
CH641498A5 (de) | 1984-02-29 |
US4287224A (en) | 1981-09-01 |
GB2028380A (en) | 1980-03-05 |
NL7906040A (nl) | 1980-02-12 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RE | Patent lapsed |
Owner name: LEYBOLD-HERAEUS G.M.B.H. Effective date: 19930831 |