GB2306512B - Vacuum coating plant with a crucible disposed in the vacuum chamber for holding material to be evaporated - Google Patents

Vacuum coating plant with a crucible disposed in the vacuum chamber for holding material to be evaporated

Info

Publication number
GB2306512B
GB2306512B GB9619914A GB9619914A GB2306512B GB 2306512 B GB2306512 B GB 2306512B GB 9619914 A GB9619914 A GB 9619914A GB 9619914 A GB9619914 A GB 9619914A GB 2306512 B GB2306512 B GB 2306512B
Authority
GB
United Kingdom
Prior art keywords
evaporated
holding material
vacuum
coating plant
crucible disposed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
GB9619914A
Other versions
GB9619914D0 (en
GB2306512A (en
Inventor
Gerd Hoffmann
Rainer Ludwig
Norbert Ross
Gerhard Steiniger
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Balzers und Leybold Deutschland Holding AG
Original Assignee
Leybold AG
Balzers und Leybold Deutschland Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leybold AG, Balzers und Leybold Deutschland Holding AG filed Critical Leybold AG
Publication of GB9619914D0 publication Critical patent/GB9619914D0/en
Publication of GB2306512A publication Critical patent/GB2306512A/en
Application granted granted Critical
Publication of GB2306512B publication Critical patent/GB2306512B/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/31—Processing objects on a macro-scale
    • H01J2237/3132—Evaporating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
GB9619914A 1995-10-27 1996-09-24 Vacuum coating plant with a crucible disposed in the vacuum chamber for holding material to be evaporated Expired - Fee Related GB2306512B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE1995139986 DE19539986A1 (en) 1995-10-27 1995-10-27 Vacuum coating system with a crucible arranged in the vacuum chamber for receiving material to be evaporated

Publications (3)

Publication Number Publication Date
GB9619914D0 GB9619914D0 (en) 1996-11-06
GB2306512A GB2306512A (en) 1997-05-07
GB2306512B true GB2306512B (en) 1999-06-16

Family

ID=7775904

Family Applications (1)

Application Number Title Priority Date Filing Date
GB9619914A Expired - Fee Related GB2306512B (en) 1995-10-27 1996-09-24 Vacuum coating plant with a crucible disposed in the vacuum chamber for holding material to be evaporated

Country Status (4)

Country Link
JP (1) JPH09165674A (en)
DE (1) DE19539986A1 (en)
GB (1) GB2306512B (en)
IT (1) IT1284577B1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109609922A (en) * 2019-01-02 2019-04-12 京东方科技集团股份有限公司 Film preparation device, method and system

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2339800B (en) * 1998-07-24 2003-04-09 Gen Vacuum Equipment Ltd A vacuum process for depositing zinc sulphide and other coatings on flexible moving web
CN101619446A (en) 2008-06-30 2010-01-06 鸿富锦精密工业（深圳）有限公司 Coating evaporation carrier and vacuum coater using same
CN107686968A (en) * 2017-08-14 2018-02-13 武汉华星光电半导体显示技术有限公司 Crucible and deposition system is deposited
CN114622169A (en) * 2022-04-27 2022-06-14 华天慧创科技（西安）有限公司 Antifouling film coating device and antifouling film coating method

Citations (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4029466A (en) * 1974-08-08 1977-06-14 Denki Kagaku Kogyo Kabushiki Kaisha Container for evaporation of metal
US4386113A (en) * 1980-05-29 1983-05-31 Matsushita Electric Industrial Co., Ltd. Method of making a magnetic recording medium
US4516525A (en) * 1982-10-28 1985-05-14 International Business Machines Corporation Electron gun equipment for vacuum deposition
JPS60200979A (en) * 1984-03-26 1985-10-11 Tanaka Kikinzoku Kogyo Kk Clad vessel
JPS61187126A (en) * 1985-02-14 1986-08-20 Konishiroku Photo Ind Co Ltd Manufacture of magnetic recording medium
JPS6428366A (en) * 1987-07-22 1989-01-30 Shimadzu Corp Crucible of vacuum deposition device
US4810531A (en) * 1984-10-13 1989-03-07 Metal Box Plc Vapor deposition of tin
JPH02290964A (en) * 1989-04-28 1990-11-30 Hoya Corp Crucible for holding vapor deposition material
JPH04116155A (en) * 1990-09-06 1992-04-16 Seiko Instr Inc Formation of thin film
US5122389A (en) * 1990-03-02 1992-06-16 Fuji Photo Film Co., Ltd. Vacuum evaporation method and apparatus
US5133604A (en) * 1991-07-30 1992-07-28 Davidson Textron Inc. Method and apparatus for evaluating evaporating boats based on evaporation rate characteristics
US5302208A (en) * 1992-02-08 1994-04-12 Leybold Aktiengesellschaft Vacuum coating installation
WO1996021749A1 (en) * 1994-09-28 1996-07-18 Advanced Ceramics Corporation High density flash evaporator

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3552352A (en) * 1968-02-13 1971-01-05 Du Pont Electron beam vaporization coating apparatus
DE2628765C3 (en) * 1976-06-26 1979-01-11 Leybold-Heraeus Gmbh & Co Kg, 5000 Koeln Apparatus for vapor deposition, in particular sublimable substances, in a vacuum by means of an electron beam source
JPS58130443A (en) * 1982-01-28 1983-08-03 Fuji Photo Film Co Ltd Production of magnetic recording medium
DE3641718A1 (en) * 1986-12-06 1988-06-16 Leybold Ag METHOD FOR PRODUCING WRAPS FROM INSULATING FILMS COATED CONDUCTIVELY IN A VACUUM
DE3708716C2 (en) * 1987-03-18 1993-11-04 Hans Prof Dr Rer Nat Oechsner HIGH FREQUENCY ION SOURCE
JP2612602B2 (en) * 1987-12-17 1997-05-21 東洋インキ製造 株式会社 Manufacturing method and apparatus for continuous vapor deposition film
DE3920834A1 (en) * 1989-06-24 1991-02-21 Leybold Ag MICROWAVE CATHODE SPRAYING DEVICE
GB2251631B (en) * 1990-12-19 1994-10-12 Mitsubishi Electric Corp Thin-film forming apparatus
CH683776A5 (en) * 1991-12-05 1994-05-13 Alusuisse Lonza Services Ag Coating a substrate surface with a permeation barrier.
DE4203631C2 (en) * 1992-02-08 2000-06-08 Leybold Ag Device for treating an oxide layer

Patent Citations (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4029466A (en) * 1974-08-08 1977-06-14 Denki Kagaku Kogyo Kabushiki Kaisha Container for evaporation of metal
US4386113A (en) * 1980-05-29 1983-05-31 Matsushita Electric Industrial Co., Ltd. Method of making a magnetic recording medium
US4516525A (en) * 1982-10-28 1985-05-14 International Business Machines Corporation Electron gun equipment for vacuum deposition
JPS60200979A (en) * 1984-03-26 1985-10-11 Tanaka Kikinzoku Kogyo Kk Clad vessel
US4810531A (en) * 1984-10-13 1989-03-07 Metal Box Plc Vapor deposition of tin
JPS61187126A (en) * 1985-02-14 1986-08-20 Konishiroku Photo Ind Co Ltd Manufacture of magnetic recording medium
JPS6428366A (en) * 1987-07-22 1989-01-30 Shimadzu Corp Crucible of vacuum deposition device
JPH02290964A (en) * 1989-04-28 1990-11-30 Hoya Corp Crucible for holding vapor deposition material
US5122389A (en) * 1990-03-02 1992-06-16 Fuji Photo Film Co., Ltd. Vacuum evaporation method and apparatus
JPH04116155A (en) * 1990-09-06 1992-04-16 Seiko Instr Inc Formation of thin film
US5133604A (en) * 1991-07-30 1992-07-28 Davidson Textron Inc. Method and apparatus for evaluating evaporating boats based on evaporation rate characteristics
US5302208A (en) * 1992-02-08 1994-04-12 Leybold Aktiengesellschaft Vacuum coating installation
WO1996021749A1 (en) * 1994-09-28 1996-07-18 Advanced Ceramics Corporation High density flash evaporator

Non-Patent Citations (5)

* Cited by examiner, † Cited by third party
Title
WPI Accession no 85-292991/47 & JP 60 200 979 A *
WPI Accession no 86-260458/40 & JP 61 187 126 A *
WPI Accession no 89-074190/10 & JP 01 028 366 A *
WPI Accession no 91-018696/03 & JP 02 290 964 A *
WPI Accession no 92-187637/23 & JP 04 116 155 A *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109609922A (en) * 2019-01-02 2019-04-12 京东方科技集团股份有限公司 Film preparation device, method and system
CN109609922B (en) * 2019-01-02 2021-04-20 京东方科技集团股份有限公司 Thin film preparation device, method and system

Also Published As

Publication number Publication date
ITMI961952A1 (en) 1998-03-24
DE19539986A1 (en) 1997-04-30
GB9619914D0 (en) 1996-11-06
IT1284577B1 (en) 1998-05-21
GB2306512A (en) 1997-05-07
JPH09165674A (en) 1997-06-24

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20020924