JPH09165674A - Vacuum coating apparatus - Google Patents
Vacuum coating apparatusInfo
- Publication number
- JPH09165674A JPH09165674A JP28559496A JP28559496A JPH09165674A JP H09165674 A JPH09165674 A JP H09165674A JP 28559496 A JP28559496 A JP 28559496A JP 28559496 A JP28559496 A JP 28559496A JP H09165674 A JPH09165674 A JP H09165674A
- Authority
- JP
- Japan
- Prior art keywords
- crucible
- metal
- graphite
- vaporized
- sheet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001771 vacuum deposition Methods 0.000 title claims description 10
- 239000000463 material Substances 0.000 claims abstract description 27
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 21
- 239000011248 coating agent Substances 0.000 claims abstract description 19
- 238000000576 coating method Methods 0.000 claims abstract description 19
- 238000010894 electron beam technology Methods 0.000 claims abstract description 19
- 229910052751 metal Inorganic materials 0.000 claims abstract description 14
- 239000002184 metal Substances 0.000 claims abstract description 14
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 11
- 229910002804 graphite Inorganic materials 0.000 claims abstract description 11
- 239000010439 graphite Substances 0.000 claims abstract description 11
- 239000000203 mixture Substances 0.000 claims abstract description 6
- 229910010293 ceramic material Inorganic materials 0.000 claims abstract description 5
- 239000002131 composite material Substances 0.000 claims abstract description 5
- 150000004706 metal oxides Chemical class 0.000 claims description 18
- 239000003870 refractory metal Substances 0.000 claims description 3
- 230000008016 vaporization Effects 0.000 claims description 3
- 239000000758 substrate Substances 0.000 claims 3
- 230000000717 retained effect Effects 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 3
- 229910052750 molybdenum Inorganic materials 0.000 abstract description 3
- 229910052814 silicon oxide Inorganic materials 0.000 abstract description 3
- 229910052721 tungsten Inorganic materials 0.000 abstract description 3
- 229910052715 tantalum Inorganic materials 0.000 abstract description 2
- 150000001875 compounds Chemical class 0.000 abstract 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 14
- 238000001704 evaporation Methods 0.000 description 7
- 239000002985 plastic film Substances 0.000 description 7
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 6
- 229910052760 oxygen Inorganic materials 0.000 description 6
- 239000001301 oxygen Substances 0.000 description 6
- 239000002245 particle Substances 0.000 description 6
- 229910052782 aluminium Inorganic materials 0.000 description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- 230000008020 evaporation Effects 0.000 description 4
- 239000011888 foil Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 239000002304 perfume Substances 0.000 description 3
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000011733 molybdenum Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- -1 SiO x Chemical class 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 235000013305 food Nutrition 0.000 description 1
- 235000020130 leben Nutrition 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000005022 packaging material Substances 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 239000012254 powdered material Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
- H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/31—Processing objects on a macro-scale
- H01J2237/3132—Evaporating
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Physical Vapour Deposition (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、真空被覆装置であ
って、蒸発させようとする材料を収容するための坩堝が
真空室内に配置されており、坩堝内に存在する、金属、
例えばSiO、MgO、Al2O3またはSiO2のよ
うな金属酸化物、または金属と金属酸化物とから成る混
合物のような材料を蒸発させるための電子ビーム源が坩
堝に向けられており、蒸発させようとする材料から所定
の間隔を置いて基体、例えばローラを介して案内された
シートが保持されている形式のものに関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a vacuum coating apparatus, in which a crucible for containing a material to be vaporized is arranged in a vacuum chamber, a metal existing in the crucible,
An electron beam source for vaporizing a material such as a metal oxide such as SiO, MgO, Al 2 O 3 or SiO 2 or a mixture of metal and metal oxide is directed at the crucible, The present invention relates to a type in which a base body, for example, a sheet guided through rollers is held at a predetermined distance from the material to be made to be made.
【0002】[0002]
【従来の技術】ドイツ連邦共和国特許第2628765
号明細書に基づき、特に昇華可能な材料を真空中で蒸着
する装置が公知である。この公知の装置は、蒸発させよ
うとする材料のための、開口を備えた容器と、加速され
かつ集束された電子ビームを発生させるための加速アノ
ードを備えた電子ビーム源とから成っている。この電子
ビーム源は容器に向けられている。電子ビーム源と容器
との間のビーム経路には、電子ビームのための水平方向
の跳ね返りプレートが配置されている。この跳ね返りプ
レートの、跳ね返り面とは離反した下面は容器中空室に
向いており、跳ね返りプレートは電子ビームのための衝
突個所の外部に設けられた、蒸気噴流のための流出口を
残して、容器をカバーしている。PRIOR ART German Federal Patent No. 2628765
On the basis of U.S. Pat. No. 4,962,819, a device for depositing in particular a sublimable material in a vacuum is known. This known device consists of a container with an opening for the material to be evaporated and an electron beam source with an accelerating anode for producing an accelerated and focused electron beam. The electron beam source is aimed at the container. A horizontal bounce plate for the electron beam is arranged in the beam path between the electron beam source and the container. The lower surface of the bounce plate, which is separated from the bounce surface, faces the hollow chamber of the container, and the bounce plate leaves the outlet for the steam jet, which is provided outside the collision point for the electron beam. Covers.
【0003】このような公知の装置は、一般的に使用可
能な電子ビーム蒸発器によって、粉末状の材料を初めか
ら連続的に、かつスパッタ粒子(Spritzen)およびダスト
を生ぜしめることなしに、比較的長時間にわたって蒸発
させるという課題を解決する。[0003] Such a known device compares a generally usable electron beam evaporator with powdered material from the beginning continuously and without producing sprit particles and dust. Solve the problem of evaporating for a very long time.
【0004】さらに、ドイツ連邦共和国特許出願公開第
4203632号明細書に基づき公知の真空被覆装置に
は、蒸発させようとする材料が位置する容器と、この容
器に位置する材料を蒸発させるための蒸発装置とが設け
られている。被覆しようとする材料は、蒸発しようとす
る材料から所定の間隔を置いて位置している。さらにこ
の公知の真空被覆装置には、蒸発させようとする材料
と、被覆しようとする材料との間の空間にマイクロ波を
発振するマイクロ波発振器が設けられている。Furthermore, a vacuum coating device known from DE-A-4203632 discloses a container in which the material to be evaporated is located and an evaporation for evaporating the material located in this container. And a device. The material to be coated is spaced a predetermined distance from the material to be vaporized. Furthermore, this known vacuum coating apparatus is provided with a microwave oscillator that oscillates microwaves in the space between the material to be vaporized and the material to be coated.
【0005】このような公知の装置により、プラスチッ
クシートにおける金属酸化物被覆体の特性を改善するこ
とができる。With such a known device, the properties of the metal oxide coating on the plastic sheet can be improved.
【0006】透明なプラスチックシートが、強化されて
食品の包装のために使用される。この場合、第1にポリ
マープラスチックから成るシートが考えられる。このよ
うなシートはフレキシブルではあるものの、香料、水ま
たは酸素を透過させるという欠点を有している。このよ
うな物質の拡散を回避したい場合には、一般的には、ア
ルミニウムフォイルまたはアルミニウムが蒸着されたプ
ラスチックシートが使用される。しかしながらこのよう
なフォイルおよびシートは、比較的廃棄しにくく、マイ
クロ波および光を透過させないという欠点を有してい
る。工業諸国のほぼ全ての家庭に電子レンジが普及して
いることにより、包装材料のマイクロ波透過性は多くの
場合、極めて重要である。Transparent plastic sheets have been reinforced and used for packaging food products. In this case, firstly a sheet of polymeric plastic is conceivable. Although such a sheet is flexible, it has the drawback of allowing perfume, water or oxygen to pass through. If it is desired to avoid such material diffusion, aluminum foil or aluminum vapor deposited plastic sheets are typically used. However, such foils and sheets have the drawback of being relatively difficult to dispose of and impermeable to microwaves and light. Due to the widespread use of microwave ovens in almost every household in industrialized countries, microwave transparency of packaging materials is often crucial.
【0007】マイクロ波を透過させるプラスチックシー
トの利点と、香料、水および酸素を完全に遮断するアル
ミニウムフォイルの利点とを1つにまとめるために、ポ
リマーシートを金属酸化物で被覆することが既に公知で
ある。この場合、酸化珪素が被覆材料として特に大きな
役割を有する。酸化珪素で被覆されたプラスチックシー
トは、その積層構造、および、酸素と水蒸気と香料とに
対するバリア特性の点で見て、アルミニウムフォイルま
たはアルミニウムで被覆されたプラスチックシートと類
似の特性を有している。しかしながら、SiOxのよう
な金属酸化物でプラスチックシートを被覆するために
は、一般の被覆技術とは著しく異なるプロセス技術が必
要となる。それというのは金属酸化物は金属と異なり、
固相から蒸発させられなければならないからである。It is already known to coat polymer sheets with metal oxides in order to combine the advantages of a plastic sheet that is transparent to microwaves with the advantage of an aluminum foil that completely blocks perfume, water and oxygen. Is. In this case, silicon oxide plays a particularly important role as a coating material. Silicon oxide coated plastic sheets have properties similar to aluminum foil or aluminum coated plastic sheets in terms of their laminated structure and barrier properties to oxygen, water vapor and perfume. . However, coating a plastic sheet with a metal oxide such as SiO x requires a process technique that is significantly different from general coating techniques. Because metal oxides are different from metals,
Because it must be evaporated from the solid phase.
【0008】SiOx層は、蒸発炉または電子ビーム蒸
発器を用いてSiOを蒸発させることにより製造される
(T. Krug, K. Ruebsam: Die neue “glaeserne Lebens
mittelverpackung” in “neue Verpackung”, Huethig
-Verlag, 1991参照)。SiOは昇華するので、つまり固
体状態から液相を介さずに直接に蒸発するので、特別な
坩堝が必要である。許容範囲内のコストで経済的に生産
するための前提となる数m/sの帯状シート速度を達成
するためには、約1350℃の蒸発温度に合わせた坩堝
が必要となる。SiOx−1の蒸気が、制御された反応
性の雰囲気で酸化し、これにより、被覆しようとするシ
ートに、x=1.5〜1.8の酸化度が達成される。2
000Åよりも薄いSiOx層は、容易に曲げ可能であ
るという利点を有している。さらに、SiOxは化学的
に不活性であり、水に対して耐腐食性を有している。S
iOは、電子ビームによって蒸発することができる。そ
れというのはこのSiOは比較的高い蒸気圧を有してい
るからである。しかしながら他の金属酸化物、例えばM
gO+SiO2の場合にも所要の高い蒸着速度を達成す
るためには、1800℃以上の温度が必要となる。The SiO x layer is produced by evaporating SiO using an evaporation furnace or an electron beam evaporator (T. Krug, K. Ruebsam: Die neue “glaeserne Lebens.
mittelverpackung ”in“ neue Verpackung ”, Huethig
-See Verlag, 1991). Since SiO sublimes, that is, evaporates directly from the solid state without passing through the liquid phase, a special crucible is required. In order to achieve a strip sheet speed of several m / s, which is a prerequisite for economical production at an acceptable cost, a crucible adapted to the evaporation temperature of about 1350 ° C. is required. The SiO x -1 vapor oxidizes in a controlled, reactive atmosphere, whereby a degree of oxidation of x = 1.5-1.8 is achieved in the sheet to be coated. 2
SiO x layers thinner than 000Å have the advantage of being easily bendable. Furthermore, SiO x is chemically inert and has corrosion resistance to water. S
iO can be evaporated by an electron beam. This is because this SiO has a relatively high vapor pressure. However, other metal oxides such as M
Even in the case of gO + SiO 2 , a temperature of 1800 ° C. or higher is necessary to achieve the required high vapor deposition rate.
【0009】直接的に電子ビームによって金属酸化物
(例えばSiOx)を蒸発させる場合には、電子ビーム
の衝突点における酸化物表面の高い温度に帰因するスパ
ッタ粒子が生ぜしめられる。このような材料粒子はシー
トに衝突し、その場所で付着したままになるか、または
そればかりかシートを貫通してしまう。これによりバリ
ア特性を悪化させる孔がシートに形成されてしまう。シ
ートに付着した粒子は、のちの印刷時に不都合を生ぜし
める。When the metal oxide (eg, SiO x ) is directly vaporized by the electron beam, sputtered particles are generated due to the high temperature of the oxide surface at the collision point of the electron beam. Such material particles impact the sheet and either remain attached there or even penetrate the sheet. As a result, holes are formed in the sheet that deteriorate the barrier properties. The particles adhering to the sheet cause inconvenience during later printing.
【0010】[0010]
【発明が解決しようとする課題】本発明の課題は、冒頭
で述べた形式の真空被覆装置を改良して、金属酸化物、
または金属酸化物と金属との混合物を、スパッタ粒子を
生ぜしめることなしに高速かつ高品質でシートに被覆す
ることを可能にすることである。このような装置は長い
耐用寿命を有し、かつ高いプロセス安定性を可能にする
のが望ましい。さらに、コンベンショナルな蒸発炉に比
べて特に良好な横方向調整が可能になるのが望ましい。SUMMARY OF THE INVENTION The object of the present invention is to improve the vacuum coating equipment of the type mentioned at the outset to provide metal oxides,
Or to allow the mixture of metal oxides and metals to be applied to the sheet at high speed and quality without producing sputtered particles. It is desirable for such a device to have a long service life and allow for high process stability. Furthermore, it is desirable to be able to have a particularly good lateral adjustment as compared to conventional evaporation furnaces.
【0011】[0011]
【課題を解決するための手段】この課題を解決するため
に本発明の構成では、坩堝が、例えばモリブデン、タン
タルまたはタングステンのような高融点金属、黒鉛、黒
鉛複合体またはセラミックス材料から形成されているよ
うにした。In order to solve this problem, in the constitution of the present invention, the crucible is formed of a refractory metal such as molybdenum, tantalum or tungsten, graphite, a graphite composite or a ceramic material. I was supposed to.
【0012】[0012]
【発明の効果】本発明のように構成されていると、金属
酸化物、または金属酸化物と金属との混合物をシートに
高速かつ高品質で被覆することができる。According to the present invention, the sheet can be coated with the metal oxide or the mixture of the metal oxide and the metal at high speed and with high quality.
【0013】[0013]
【発明の実施の形態】次に本発明を図面に示した実施の
形態について説明する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, embodiments of the present invention shown in the drawings will be described.
【0014】図面には円筒形の受容体1が示されてい
る。この受容体には、開口を備えた細長い坩堝2が配置
されている。この坩堝2の上方には、被覆ローラ3が設
けられている。この被覆ローラは被覆室4を上方に向か
って仕切っている。この被覆ローラ3を介して連続的
に、被覆しようとするシート5が走行する。このシート
は、供給側ロール6から繰り出されて、巻き取り側ロー
ル7に巻き取られる。A cylindrical receiver 1 is shown in the drawing. An elongated crucible 2 with an opening is arranged in this receiver. A covering roller 3 is provided above the crucible 2. The coating roller partitions the coating chamber 4 upward. The sheet 5 to be coated runs continuously through the coating roller 3. This sheet is unrolled from the supply-side roll 6 and wound on the winding-side roll 7.
【0015】坩堝2を加熱するためには電子銃8が役立
つ。この電子銃の電子ビーム9は、磁気コイル10によ
って坩堝10に向かって変向させられる。蒸発させよう
とする材料(SiOxのような金属酸化物、金属または
金属化合物)が坩堝2内に位置している。この坩堝は開
口、ギャップまたはスリット15を被覆ローラ3に向か
って備えている。An electron gun 8 serves to heat the crucible 2. The electron beam 9 of the electron gun is deflected by the magnetic coil 10 toward the crucible 10. The material to be evaporated (metal oxide such as SiO x , metal or metal compound) is located in the crucible 2. This crucible is provided with openings, gaps or slits 15 towards the coating roller 3.
【0016】発生する蒸気塊にプラズマを発生させるた
めに、ホーンアンテナ11によってマイクロ波エネルギ
が被覆室4内にもたらされる。Microwave energy is introduced into the coating chamber 4 by the horn antenna 11 in order to generate a plasma in the vapor mass that is generated.
【0017】上記のような装置において、筒形もしくは
管形の坩堝2は電子ビーム9によって全被覆幅にわたっ
て均一に加熱される。坩堝2の上面には、スリット15
が位置している。これらのスリットを通って、蒸気状の
金属酸化物が流出し、シートに凝縮する。材料全体が均
一に加熱され、蒸気が比較的小さな孔を通ってしか逃げ
ることができないので、被覆速度が極めて高い場合にも
スパッタ粒子発生が阻止される。In the apparatus as described above, the cylindrical or tubular crucible 2 is uniformly heated by the electron beam 9 over the entire coating width. A slit 15 is provided on the upper surface of the crucible 2.
Is located. Through these slits, vaporous metal oxides flow out and condense on the sheet. Sputtered particle generation is prevented even at very high coating rates because the entire material is uniformly heated and vapor can only escape through the relatively small pores.
【0018】坩堝は、例えばモリブデン、タングステ
ン、黒鉛、黒鉛繊維複合材料またはセラミックス材料の
ような極めて高い融点を有する材料から成っている。The crucible is made of a material having an extremely high melting point, such as molybdenum, tungsten, graphite, a graphite fiber composite material or a ceramic material.
【0019】図示の装置においては、蒸発器とシートと
の間にプラズマを例えばマイクロ波励起によって点火す
ることも可能である。これによりシートが、場合によっ
て衝突する、電子ビームの散乱電子によって放電され
る。In the device shown, it is also possible to ignite a plasma between the evaporator and the sheet, for example by microwave excitation. This causes the sheet to be discharged by the scattered electrons of the electron beam, which in some cases collide.
【0020】酸素源12は、被覆室4に接続された導管
13を介して、必要な場合に酸素を供給することができ
るので、例えばSiOが蒸発してSiOxとしてシート
に沈積させられる。The oxygen source 12 can supply oxygen if required via a conduit 13 connected to the coating chamber 4, so that, for example, SiO evaporates and is deposited on the sheet as SiO x .
【図1】本発明による真空被覆装置の1実施例を示す部
分概略図である。FIG. 1 is a partial schematic view showing an embodiment of a vacuum coating apparatus according to the present invention.
1 受容体、 2 坩堝、 3 被覆ローラ、 4 被
覆室、 5 シート、6 供給側ロール、 7 巻き取
り側ロール、 8 電子銃、 9 電子ビーム、 10
磁気コイル、 11 ホーンアンテナ、 12 酸素
源、 13導管、 15 貫通孔DESCRIPTION OF SYMBOLS 1 receptor, 2 crucible, 3 coating roller, 4 coating chamber, 5 sheet, 6 supply side roll, 7 winding side roll, 8 electron gun, 9 electron beam, 10
Magnetic coil, 11 horn antenna, 12 oxygen source, 13 conduit, 15 through hole
───────────────────────────────────────────────────── フロントページの続き (72)発明者 ゲルト ホフマン ドイツ連邦共和国 ブルーフケーベル ラ ングシュトラーセ 13 (72)発明者 ライナー ルートヴィッヒ ドイツ連邦共和国 ヘースバッハ グリュ ンタール 15 (72)発明者 ノルベルト ロス ドイツ連邦共和国 マインタール ハイン シュトラーセ 1 (72)発明者 ゲルハルト シュタイニーガー ドイツ連邦共和国 ロネブルク フェルト シュトラーセ 8 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Gerd Hofmann, Federal Republic of Germany Bruch Kabel Langstrasse 13 (72) Inventor, Reiner Ludwig, Germany Heesbach Gruntal 15 (72) Inventor Norbert Ross, Mainland, Germany Strasse 1 (72) Inventor Gerhard Steinieger Germany Roneburg Feldstraße 8
Claims (2)
する材料を収容するための坩堝(2)が真空室内に配置
されており、坩堝(2)内に存在する、金属、金属酸化
物または金属と金属酸化物との混合物のような材料を蒸
発させるための電子ビーム源(8)が坩堝(2)に向け
られており、蒸発させようとする材料から所定の間隔を
置いて基体が保持されている形式のものにおいて、 坩堝(2)が、高融点金属、黒鉛、黒鉛複合体またはセ
ラミックス材料から形成されていることを特徴とする、
真空被覆装置。1. A vacuum coating apparatus, wherein a crucible (2) for containing a material to be vaporized is arranged in a vacuum chamber, and a metal or a metal oxide existing in the crucible (2). Alternatively, an electron beam source (8) for vaporizing a material such as a mixture of a metal and a metal oxide is directed to the crucible (2), and the substrate is placed at a predetermined distance from the material to be vaporized. In the retained type, the crucible (2) is characterized by being formed of a refractory metal, graphite, a graphite composite or a ceramic material,
Vacuum coating equipment.
する材料を収容するための坩堝(2)が被覆室(4)内
に配置されており、該坩堝(2)内に存在する、金属、
金属酸化物または金属と金属酸化物との混合物のような
材料を蒸発させるための電子ビーム源(8)が坩堝
(2)に向けられており、蒸発させようとする材料から
所定の間隔を置いて基体が保持されており、さらに、該
基体(5)と、蒸発させようとする材料との間に生ぜし
められた蒸気塊にプラズマを発生させるためのマイクロ
波エネルギを供給するためにホーンアンテナ(11)が
設けられている形式のものにおいて、 坩堝(2)が、ほぼ閉じられた容器の形で形成されてい
て、基体(5)に向いた側に、多数の開口、スリットま
たは貫通孔(15)を有しており、該開口、スリットま
たは貫通孔(15)を通って、蒸発させられた材料が、
基体(5)の方向に流出可能であり、坩堝(2)が、高
融点金属、黒鉛、黒鉛複合体またはセラミックス材料か
ら形成されていることを特徴とする、真空被覆装置。2. A vacuum coating apparatus, wherein a crucible (2) for containing a material to be vaporized is arranged in a coating chamber (4) and is present in the crucible (2). metal,
An electron beam source (8) for vaporizing a material such as a metal oxide or a mixture of metal and metal oxide is directed at the crucible (2) and at a predetermined distance from the material to be vaporized. A horn antenna for supplying microwave energy for generating a plasma in the vapor mass generated between the substrate (5) and the material to be vaporized. In the type provided with (11), the crucible (2) is formed in the form of a substantially closed container and has a number of openings, slits or through holes on the side facing the base body (5). (15) through which the evaporated material passes through the opening, slit or through hole (15),
A vacuum coating device, which is capable of flowing toward a substrate (5) and characterized in that the crucible (2) is formed of a refractory metal, graphite, a graphite composite or a ceramic material.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE1995139986 DE19539986A1 (en) | 1995-10-27 | 1995-10-27 | Vacuum coating system with a crucible arranged in the vacuum chamber for receiving material to be evaporated |
DE19539986.2 | 1995-10-27 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH09165674A true JPH09165674A (en) | 1997-06-24 |
Family
ID=7775904
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP28559496A Pending JPH09165674A (en) | 1995-10-27 | 1996-10-28 | Vacuum coating apparatus |
Country Status (4)
Country | Link |
---|---|
JP (1) | JPH09165674A (en) |
DE (1) | DE19539986A1 (en) |
GB (1) | GB2306512B (en) |
IT (1) | IT1284577B1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8273180B2 (en) | 2008-06-30 | 2012-09-25 | Hon Hai Precision Industry Co., Ltd. | Device for film coating |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2339800B (en) * | 1998-07-24 | 2003-04-09 | Gen Vacuum Equipment Ltd | A vacuum process for depositing zinc sulphide and other coatings on flexible moving web |
CN107686968A (en) * | 2017-08-14 | 2018-02-13 | 武汉华星光电半导体显示技术有限公司 | Crucible and deposition system is deposited |
CN109609922B (en) * | 2019-01-02 | 2021-04-20 | 京东方科技集团股份有限公司 | Thin film preparation device, method and system |
CN114622169A (en) * | 2022-04-27 | 2022-06-14 | 华天慧创科技(西安)有限公司 | Antifouling film coating device and antifouling film coating method |
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US3552352A (en) * | 1968-02-13 | 1971-01-05 | Du Pont | Electron beam vaporization coating apparatus |
US4029466A (en) * | 1974-08-08 | 1977-06-14 | Denki Kagaku Kogyo Kabushiki Kaisha | Container for evaporation of metal |
DE2628765C3 (en) * | 1976-06-26 | 1979-01-11 | Leybold-Heraeus Gmbh & Co Kg, 5000 Koeln | Apparatus for vapor deposition, in particular sublimable substances, in a vacuum by means of an electron beam source |
JPS6037530B2 (en) * | 1980-05-29 | 1985-08-27 | 松下電器産業株式会社 | Method for manufacturing magnetic recording media |
JPS58130443A (en) * | 1982-01-28 | 1983-08-03 | Fuji Photo Film Co Ltd | Production of magnetic recording medium |
EP0111611B1 (en) * | 1982-10-28 | 1987-05-13 | International Business Machines Corporation | Method and apparatus for vacuum evaporation coating using an electron gun |
JPS60200979A (en) * | 1984-03-26 | 1985-10-11 | Tanaka Kikinzoku Kogyo Kk | Clad vessel |
GB8425917D0 (en) * | 1984-10-13 | 1984-11-21 | Metal Box Plc | Evaporating metal |
JPS61187126A (en) * | 1985-02-14 | 1986-08-20 | Konishiroku Photo Ind Co Ltd | Manufacture of magnetic recording medium |
DE3641718A1 (en) * | 1986-12-06 | 1988-06-16 | Leybold Ag | METHOD FOR PRODUCING WRAPS FROM INSULATING FILMS COATED CONDUCTIVELY IN A VACUUM |
DE3708716C2 (en) * | 1987-03-18 | 1993-11-04 | Hans Prof Dr Rer Nat Oechsner | HIGH FREQUENCY ION SOURCE |
JPS6428366A (en) * | 1987-07-22 | 1989-01-30 | Shimadzu Corp | Crucible of vacuum deposition device |
JP2612602B2 (en) * | 1987-12-17 | 1997-05-21 | 東洋インキ製造 株式会社 | Manufacturing method and apparatus for continuous vapor deposition film |
JP2790654B2 (en) * | 1989-04-28 | 1998-08-27 | ホーヤ株式会社 | Method for forming titanium dioxide film on plastic lens substrate |
DE3920834A1 (en) * | 1989-06-24 | 1991-02-21 | Leybold Ag | MICROWAVE CATHODE SPRAYING DEVICE |
US5122389A (en) * | 1990-03-02 | 1992-06-16 | Fuji Photo Film Co., Ltd. | Vacuum evaporation method and apparatus |
JPH04116155A (en) * | 1990-09-06 | 1992-04-16 | Seiko Instr Inc | Formation of thin film |
GB2251631B (en) * | 1990-12-19 | 1994-10-12 | Mitsubishi Electric Corp | Thin-film forming apparatus |
US5133604A (en) * | 1991-07-30 | 1992-07-28 | Davidson Textron Inc. | Method and apparatus for evaluating evaporating boats based on evaporation rate characteristics |
CH683776A5 (en) * | 1991-12-05 | 1994-05-13 | Alusuisse Lonza Services Ag | Coating a substrate surface with a permeation barrier. |
DE4203631C2 (en) * | 1992-02-08 | 2000-06-08 | Leybold Ag | Device for treating an oxide layer |
DE4203632C2 (en) * | 1992-02-08 | 2003-01-23 | Applied Films Gmbh & Co Kg | Vacuum coating system |
GB2313846B (en) * | 1994-09-28 | 1999-05-26 | Advanced Ceramics Corp | High density flash evaporator |
-
1995
- 1995-10-27 DE DE1995139986 patent/DE19539986A1/en not_active Withdrawn
-
1996
- 1996-09-24 GB GB9619914A patent/GB2306512B/en not_active Expired - Fee Related
- 1996-09-24 IT IT96MI001952A patent/IT1284577B1/en active IP Right Grant
- 1996-10-28 JP JP28559496A patent/JPH09165674A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8273180B2 (en) | 2008-06-30 | 2012-09-25 | Hon Hai Precision Industry Co., Ltd. | Device for film coating |
Also Published As
Publication number | Publication date |
---|---|
ITMI961952A1 (en) | 1998-03-24 |
IT1284577B1 (en) | 1998-05-21 |
GB9619914D0 (en) | 1996-11-06 |
GB2306512B (en) | 1999-06-16 |
DE19539986A1 (en) | 1997-04-30 |
GB2306512A (en) | 1997-05-07 |
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