BE858410A - Masse a copier photosensible - Google Patents

Masse a copier photosensible

Info

Publication number
BE858410A
BE858410A BE180680A BE180680A BE858410A BE 858410 A BE858410 A BE 858410A BE 180680 A BE180680 A BE 180680A BE 180680 A BE180680 A BE 180680A BE 858410 A BE858410 A BE 858410A
Authority
BE
Belgium
Prior art keywords
photosensitive copy
copy mass
mass
photosensitive
copy
Prior art date
Application number
BE180680A
Other languages
English (en)
French (fr)
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of BE858410A publication Critical patent/BE858410A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
    • G03F7/0217—Polyurethanes; Epoxy resins

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
BE180680A 1976-09-08 1977-09-05 Masse a copier photosensible BE858410A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
LU75749A LU75749A1 (de) 1976-09-08 1976-09-08

Publications (1)

Publication Number Publication Date
BE858410A true BE858410A (fr) 1978-03-06

Family

ID=19728347

Family Applications (1)

Application Number Title Priority Date Filing Date
BE180680A BE858410A (fr) 1976-09-08 1977-09-05 Masse a copier photosensible

Country Status (17)

Country Link
US (1) US4186017A (de)
JP (1) JPS5333116A (de)
AT (1) AT354843B (de)
AU (1) AU520188B2 (de)
BE (1) BE858410A (de)
BR (1) BR7705952A (de)
CA (1) CA1112092A (de)
DE (1) DE2739774A1 (de)
DK (1) DK398377A (de)
ES (1) ES462165A1 (de)
FR (1) FR2364488A1 (de)
GB (1) GB1589225A (de)
LU (1) LU75749A1 (de)
NL (1) NL7709745A (de)
PT (1) PT67011B (de)
SE (1) SE7709953L (de)
ZA (1) ZA775351B (de)

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2809774A1 (de) * 1978-03-07 1979-09-13 Hoechst Ag Verfahren und entwicklerloesung zum entwickeln von belichteten lichtempfindlichen kopierschichten
DE2948554A1 (de) * 1979-12-03 1981-06-04 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch
DE3036077A1 (de) * 1980-09-25 1982-05-06 Hoechst Ag, 6000 Frankfurt Lichthaertbares gemisch und damit hergestelltes lichtempfindliches kopiermaterial
US4448873A (en) * 1982-03-18 1984-05-15 American Hoechst Corporation Negative working diazo contact film
US4729935A (en) * 1982-03-18 1988-03-08 Hoechst Celanese Corporation Process for the production of photographic images utilizing a negative working diazo contact film
DE3364925D1 (en) * 1982-06-03 1986-09-04 Hoechst Co American Photosensitive composition developable with water, and photosensitive copying material produced therefrom
JPS59222842A (ja) * 1983-06-01 1984-12-14 Fuji Photo Film Co Ltd 平版印刷版用感光性組成物
US4544466A (en) * 1983-12-06 1985-10-01 Phillips Petroleum Company Process of making U.V. cured polyurethanes using diazonium salt promoters
US4549945A (en) * 1984-01-11 1985-10-29 Phillips Petroleum Company UV Cured polyurethanes using organotin promoters
DE3409888A1 (de) * 1984-03-17 1985-09-19 Hoechst Ag, 6230 Frankfurt Lichtempfindliches aufzeichnungsmaterial und dessen verwendung in einem verfahren zum herstellen einer druckform oder einer gedruckten schaltung
GB8414867D0 (en) * 1984-06-11 1984-07-18 Minnesota Mining & Mfg Pre-press proofing system
JPH0782236B2 (ja) * 1984-10-12 1995-09-06 三菱化学株式会社 感光性組成物
CA1308595C (en) * 1985-11-22 1992-10-13 Toshiaki Aoai Photosensitive composition
US4877711A (en) * 1986-05-19 1989-10-31 Fuji Photo Film Co., Ltd. Light-sensitive diazo photopolymerizable composition with polyurethane having carbon-carbon unsaturated and a carboxyl group
DE3644163A1 (de) * 1986-12-23 1988-07-07 Hoechst Ag Lichtempfindliches gemisch auf basis eines diazoniumsalz-polykondensationsprodukts und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial
JP2810998B2 (ja) * 1987-10-15 1998-10-15 コニカ 株式会社 感光性組成物
JPH01102456A (ja) * 1987-10-15 1989-04-20 Konica Corp 感光性組成物
JPH01102457A (ja) * 1987-10-15 1989-04-20 Konica Corp 感光性組成物
JP2622711B2 (ja) * 1988-03-28 1997-06-18 三菱化学株式会社 感光性組成物
JP2657516B2 (ja) * 1988-04-05 1997-09-24 コニカ株式会社 感光性組成物
JP2671406B2 (ja) * 1988-07-19 1997-10-29 三菱化学株式会社 感光性組成物
JP2768692B2 (ja) * 1988-08-01 1998-06-25 株式会社日立製作所 感放射線組成物及びパターン形成方法
DE3841025A1 (de) * 1988-12-06 1990-06-07 Hoechst Ag Durch strahlung polymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
DE3920229A1 (de) * 1989-06-21 1991-01-03 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
DE3920230A1 (de) * 1989-06-21 1991-01-24 Hoechst Ag Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial
US5238772A (en) * 1989-06-21 1993-08-24 Hoechst Aktiengesellschaft Photopolymerizable mixture and recording material containing free-radically polymerizable compound, photosensitive polymerization initiator and polyurethane binder grafted with vinyl alcohol and vinyl acetal units
US5242779A (en) * 1989-06-21 1993-09-07 Hoechst Aktiengesellschaft Photosensitive mixture containing photocurable compound and polyurethane binder with grafted vinyl alcohol units, carboxylic acid vinyl ester units and vinyl acetal units
JP2687018B2 (ja) * 1989-08-31 1997-12-08 富士写真フイルム株式会社 感光性組成物
US5232813A (en) * 1990-01-31 1993-08-03 Fuji Photo Film Co., Ltd. Ps plate for use in making lithographic printing plate requiring no dampening water utilizing irradiation cured primer layer containing polyurethane resin and diazonium salt polycondensate photopolymerizable light-sensitive layer and silicone rubber layer
JP2627565B2 (ja) * 1990-02-19 1997-07-09 富士写真フイルム株式会社 感光性平版印刷版
JPH03240060A (ja) * 1990-02-19 1991-10-25 Fuji Photo Film Co Ltd 感光性平版印刷版
JP2681418B2 (ja) * 1990-02-21 1997-11-26 富士写真フイルム株式会社 平版印刷版の製造方法
JPH03290663A (ja) * 1990-04-09 1991-12-20 Fuji Photo Film Co Ltd 感光性組成物
JPH03296756A (ja) * 1990-04-16 1991-12-27 Fuji Photo Film Co Ltd 画像形成方法
JP2709532B2 (ja) * 1991-03-01 1998-02-04 富士写真フイルム株式会社 感光性平版印刷版
DE4439184A1 (de) 1994-11-03 1996-05-09 Hoechst Ag Lichtempfindliches Aufzeichnungsmaterial
US6638679B2 (en) * 2001-07-12 2003-10-28 Kodak Polychrome Graphics, Llc Photosensitive compositions having mixtures of alkoxy and non-alkoxy diazonium salt containing compounds

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2770612A (en) * 1952-01-23 1956-11-13 Goodrich Co B F Elastomeric dhsocyanate-modified polyesters
US3208850A (en) * 1962-04-11 1965-09-28 Kalvar Corp Vesicular type photographic materials comprising a polyurethane resin containing light decomposable compounds
US3867147A (en) * 1969-05-20 1975-02-18 Hoechst Co American Light-sensitive diazo compounds and reproduction material employing the same
US3644289A (en) * 1969-05-29 1972-02-22 Upjohn Co Light sensitive polyurethanes prepared from hydroxyl containing polymer and an isocyanato-stilbene compound
US3655625A (en) * 1969-07-28 1972-04-11 Lithoplate Inc Polyurethane-cinnamate photopolymer
US3660097A (en) * 1969-11-28 1972-05-02 Polychrome Corp Diazo-polyurethane light-sensitive compositions
JPS5034964B1 (de) * 1970-03-30 1975-11-12
DE2053363C3 (de) * 1970-10-30 1980-09-18 Hoechst Ag, 6000 Frankfurt Lichtempfindliches Gemisch
IT1000315B (it) * 1972-12-14 1976-03-30 Polychrome Corp Perfezionamento nelle composizioni monomere diazoiche insature potosensibili
NL177718C (nl) * 1973-02-22 1985-11-01 Siemens Ag Werkwijze ter vervaardiging van reliefstructuren uit warmte-bestendige polymeren.

Also Published As

Publication number Publication date
FR2364488B1 (de) 1980-01-18
GB1589225A (en) 1981-05-07
AT354843B (de) 1979-01-25
PT67011B (pt) 1979-02-13
ATA639877A (de) 1979-06-15
NL7709745A (nl) 1978-03-10
JPS5333116A (en) 1978-03-28
US4186017A (en) 1980-01-29
BR7705952A (pt) 1978-06-27
AU520188B2 (en) 1982-01-21
ZA775351B (en) 1978-07-26
DK398377A (da) 1978-03-09
SE7709953L (sv) 1978-03-09
ES462165A1 (es) 1978-11-01
PT67011A (pt) 1977-10-01
DE2739774A1 (de) 1978-03-09
LU75749A1 (de) 1978-04-27
CA1112092A (en) 1981-11-10
FR2364488A1 (fr) 1978-04-07
DE2739774C2 (de) 1989-11-30
AU2840877A (en) 1979-03-08

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Legal Events

Date Code Title Description
RE Patent lapsed

Owner name: HOECHST A.G.

Effective date: 19890930