BE841190A - Matiere a copier photosensible - Google Patents

Matiere a copier photosensible

Info

Publication number
BE841190A
BE841190A BE166510A BE166510A BE841190A BE 841190 A BE841190 A BE 841190A BE 166510 A BE166510 A BE 166510A BE 166510 A BE166510 A BE 166510A BE 841190 A BE841190 A BE 841190A
Authority
BE
Belgium
Prior art keywords
copy material
photosensitive copy
photosensitive
copy
Prior art date
Application number
BE166510A
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of BE841190A publication Critical patent/BE841190A/fr

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
BE166510A 1975-04-29 1976-04-27 Matiere a copier photosensible BE841190A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US57266275A 1975-04-29 1975-04-29

Publications (1)

Publication Number Publication Date
BE841190A true BE841190A (fr) 1976-10-27

Family

ID=24288819

Family Applications (1)

Application Number Title Priority Date Filing Date
BE166510A BE841190A (fr) 1975-04-29 1976-04-27 Matiere a copier photosensible

Country Status (4)

Country Link
BE (1) BE841190A (fr)
DE (1) DE2617088A1 (fr)
FR (1) FR2309896A1 (fr)
GB (1) GB1546971A (fr)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1119447A (fr) * 1978-09-06 1982-03-09 John P. Vikesland Composition photoresistante a action positive, renfermant une resine d'urethane a liaison transversale, une resine epoxyde vulcanisee, et un photosensibilisateur
DE3023201A1 (de) * 1980-06-21 1982-01-07 Hoechst Ag, 6000 Frankfurt Positiv arbeitendes strahlungsempfindliches gemisch
EP0087262A1 (fr) * 1982-02-22 1983-08-31 Minnesota Mining And Manufacturing Company Compositions photosensibles à effet positif
DE3445276A1 (de) * 1984-12-12 1986-06-19 Hoechst Ag, 6230 Frankfurt Strahlungsempfindliches gemisch, daraus hergestelltes lichtempfindliches aufzeichnungsmaterial und verfahren zur herstellung einer flachdruckform
US5183722A (en) * 1989-12-01 1993-02-02 Tosoh Corporation Positive photosensitive composition for forming lenses containing 1,2-naphthoquinone diazide sulfonate photosensitizer, alkali-soluble resin and thermosetting agent and process for producing the composition
US6462107B1 (en) 1997-12-23 2002-10-08 The Texas A&M University System Photoimageable compositions and films for printed wiring board manufacture
EP2233288A1 (fr) * 2009-03-23 2010-09-29 Founder Fine Chemical Industry Co., Ltd. Composition sensible au rayonnement et procédé de préparation de composition sensible au rayonnement

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1538320A (fr) * 1965-11-02 1968-09-06 Ferrania Spa Procédé de fabrication de matrices présensibilisées pour l'impression offset
DE2053363C3 (de) * 1970-10-30 1980-09-18 Hoechst Ag, 6000 Frankfurt Lichtempfindliches Gemisch
AR205345A1 (es) * 1973-06-20 1976-04-30 Minnesota Mining & Mfg Composicion organofilica fotosensible y placa litografica preparada con la misma

Also Published As

Publication number Publication date
DE2617088A1 (de) 1976-11-11
FR2309896A1 (fr) 1976-11-26
FR2309896B1 (fr) 1979-04-20
GB1546971A (en) 1979-06-06

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Legal Events

Date Code Title Description
RE Patent lapsed

Owner name: PROCEDE ET INSTALLATION POUR LA CONFECTION DE LAME

Effective date: 19840427