BE843723A - Compositions photopolymerisables a base d'esters de diacides et de polymethyleneglycols a groupes terminaux acrylate et methacrylate, et elements formes a partir de ces compositions - Google Patents

Compositions photopolymerisables a base d'esters de diacides et de polymethyleneglycols a groupes terminaux acrylate et methacrylate, et elements formes a partir de ces compositions

Info

Publication number
BE843723A
BE843723A BE168586A BE168586A BE843723A BE 843723 A BE843723 A BE 843723A BE 168586 A BE168586 A BE 168586A BE 168586 A BE168586 A BE 168586A BE 843723 A BE843723 A BE 843723A
Authority
BE
Belgium
Prior art keywords
compositions
polymethyleneglycols
acrylate
terminal groups
elements formed
Prior art date
Application number
BE168586A
Other languages
English (en)
French (fr)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of BE843723A publication Critical patent/BE843723A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
    • C08F291/18—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00 on to irradiated or oxidised macromolecules

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
BE168586A 1975-07-03 1976-07-02 Compositions photopolymerisables a base d'esters de diacides et de polymethyleneglycols a groupes terminaux acrylate et methacrylate, et elements formes a partir de ces compositions BE843723A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US59310675A 1975-07-03 1975-07-03

Publications (1)

Publication Number Publication Date
BE843723A true BE843723A (fr) 1977-01-03

Family

ID=24373410

Family Applications (1)

Application Number Title Priority Date Filing Date
BE168586A BE843723A (fr) 1975-07-03 1976-07-02 Compositions photopolymerisables a base d'esters de diacides et de polymethyleneglycols a groupes terminaux acrylate et methacrylate, et elements formes a partir de ces compositions

Country Status (5)

Country Link
JP (2) JPS529091A (xx)
BE (1) BE843723A (xx)
DE (1) DE2628562B2 (xx)
FR (1) FR2316627A1 (xx)
GB (1) GB1524264A (xx)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2628562B2 (de) * 1975-07-03 1979-03-01 E.I. Du Pont De Nemours And Co., Wilmington, Del. (V.St.A.) Photopolymerisierbare Massen und ihre Verwendung
DE2933827A1 (de) * 1979-08-21 1981-03-12 Siemens AG, 1000 Berlin und 8000 München Verfahren zur herstellung hochwaermebestaendiger reliefstrukturen und deren verwendung.
DE2952697A1 (de) * 1979-12-29 1981-07-02 Hoechst Ag, 6230 Frankfurt Durch strahlung polymerisierbares gemisch und damit hergestelltes strahlungsempfindliches kopiermaterial
US4322490A (en) * 1980-11-17 1982-03-30 Eastman Kodak Company Photopolymerizable compositions featuring improved monomers
JPS57196229A (en) * 1981-05-26 1982-12-02 Horizons Research Inc Plasma developable photosensitive composition and formation and development of image
JP2826331B2 (ja) * 1988-12-15 1998-11-18 ダイセル化学工業株式会社 光重合性組成物
JPH038314A (ja) * 1989-06-06 1991-01-16 Matsushita Electric Ind Co Ltd 電解コンデンサ用アルミニウムケース

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE604100A (xx) * 1960-06-03
GB1235769A (en) * 1969-03-20 1971-06-16 Ppg Industries Inc Highly radiation-sensitive telomerized polyesters
JPS5034444B2 (xx) * 1971-08-20 1975-11-08
JPS5340537B2 (xx) * 1974-12-27 1978-10-27
DE2628562B2 (de) * 1975-07-03 1979-03-01 E.I. Du Pont De Nemours And Co., Wilmington, Del. (V.St.A.) Photopolymerisierbare Massen und ihre Verwendung

Also Published As

Publication number Publication date
GB1524264A (en) 1978-09-13
FR2316627A1 (fr) 1977-01-28
JPS529091A (en) 1977-01-24
DE2628562B2 (de) 1979-03-01
DE2628562A1 (de) 1977-01-27
FR2316627B1 (xx) 1981-10-30
JPS5540485A (en) 1980-03-21

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Legal Events

Date Code Title Description
RE Patent lapsed

Owner name: E.I. DU PONT DE NEMOURS AND CY

Effective date: 19870731