FR2316627A1 - Compositions photopolymerisables a base d'esters de diacides et de polymethyleneglycols a groupes terminaux acrylate et methacrylate, et elements formes a partir de ces compositions - Google Patents

Compositions photopolymerisables a base d'esters de diacides et de polymethyleneglycols a groupes terminaux acrylate et methacrylate, et elements formes a partir de ces compositions

Info

Publication number
FR2316627A1
FR2316627A1 FR7619907A FR7619907A FR2316627A1 FR 2316627 A1 FR2316627 A1 FR 2316627A1 FR 7619907 A FR7619907 A FR 7619907A FR 7619907 A FR7619907 A FR 7619907A FR 2316627 A1 FR2316627 A1 FR 2316627A1
Authority
FR
France
Prior art keywords
compositions
polymethyleneglycols
acrylate
terminal groups
elements formed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7619907A
Other languages
English (en)
Other versions
FR2316627B1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of FR2316627A1 publication Critical patent/FR2316627A1/fr
Application granted granted Critical
Publication of FR2316627B1 publication Critical patent/FR2316627B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
    • C08F291/18—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00 on to irradiated or oxidised macromolecules

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Polymerisation Methods In General (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
FR7619907A 1975-07-03 1976-06-30 Compositions photopolymerisables a base d'esters de diacides et de polymethyleneglycols a groupes terminaux acrylate et methacrylate, et elements formes a partir de ces compositions Granted FR2316627A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US59310675A 1975-07-03 1975-07-03

Publications (2)

Publication Number Publication Date
FR2316627A1 true FR2316627A1 (fr) 1977-01-28
FR2316627B1 FR2316627B1 (fr) 1981-10-30

Family

ID=24373410

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7619907A Granted FR2316627A1 (fr) 1975-07-03 1976-06-30 Compositions photopolymerisables a base d'esters de diacides et de polymethyleneglycols a groupes terminaux acrylate et methacrylate, et elements formes a partir de ces compositions

Country Status (5)

Country Link
JP (2) JPS529091A (fr)
BE (1) BE843723A (fr)
DE (1) DE2628562B2 (fr)
FR (1) FR2316627A1 (fr)
GB (1) GB1524264A (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0026820A1 (fr) * 1979-08-21 1981-04-15 Siemens Aktiengesellschaft Procédé de formation de structures en relief stables à haute température, structures en relief ainsi fabriquées et leur utilisation
FR2494458A1 (fr) * 1980-11-17 1982-05-21 Eastman Kodak Co Composition polymerisable photosensible

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2628562B2 (de) * 1975-07-03 1979-03-01 E.I. Du Pont De Nemours And Co., Wilmington, Del. (V.St.A.) Photopolymerisierbare Massen und ihre Verwendung
DE2952697A1 (de) * 1979-12-29 1981-07-02 Hoechst Ag, 6230 Frankfurt Durch strahlung polymerisierbares gemisch und damit hergestelltes strahlungsempfindliches kopiermaterial
JPS57196229A (en) * 1981-05-26 1982-12-02 Horizons Research Inc Plasma developable photosensitive composition and formation and development of image
JP2826331B2 (ja) * 1988-12-15 1998-11-18 ダイセル化学工業株式会社 光重合性組成物
JPH038314A (ja) * 1989-06-06 1991-01-16 Matsushita Electric Ind Co Ltd 電解コンデンサ用アルミニウムケース

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3202513A (en) * 1960-06-03 1965-08-24 Du Pont Photopolymerizable compositions containing stannous salts of acids and elements produced therefrom
GB1235769A (en) * 1969-03-20 1971-06-16 Ppg Industries Inc Highly radiation-sensitive telomerized polyesters

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5034444B2 (fr) * 1971-08-20 1975-11-08
JPS5340537B2 (fr) * 1974-12-27 1978-10-27
DE2628562B2 (de) * 1975-07-03 1979-03-01 E.I. Du Pont De Nemours And Co., Wilmington, Del. (V.St.A.) Photopolymerisierbare Massen und ihre Verwendung

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3202513A (en) * 1960-06-03 1965-08-24 Du Pont Photopolymerizable compositions containing stannous salts of acids and elements produced therefrom
GB1235769A (en) * 1969-03-20 1971-06-16 Ppg Industries Inc Highly radiation-sensitive telomerized polyesters

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
EXBK/73 *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0026820A1 (fr) * 1979-08-21 1981-04-15 Siemens Aktiengesellschaft Procédé de formation de structures en relief stables à haute température, structures en relief ainsi fabriquées et leur utilisation
FR2494458A1 (fr) * 1980-11-17 1982-05-21 Eastman Kodak Co Composition polymerisable photosensible

Also Published As

Publication number Publication date
FR2316627B1 (fr) 1981-10-30
BE843723A (fr) 1977-01-03
JPS529091A (en) 1977-01-24
JPS5540485A (en) 1980-03-21
GB1524264A (en) 1978-09-13
DE2628562B2 (de) 1979-03-01
DE2628562A1 (de) 1977-01-27

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Legal Events

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