BE771537A - Appareil a faisceau electronique - Google Patents

Appareil a faisceau electronique

Info

Publication number
BE771537A
BE771537A BE771537A BE771537A BE771537A BE 771537 A BE771537 A BE 771537A BE 771537 A BE771537 A BE 771537A BE 771537 A BE771537 A BE 771537A BE 771537 A BE771537 A BE 771537A
Authority
BE
Belgium
Prior art keywords
beam device
electronic beam
electronic
Prior art date
Application number
BE771537A
Other languages
English (en)
French (fr)
Inventor
Poole J B Le
Original Assignee
Philips Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Nv filed Critical Philips Nv
Publication of BE771537A publication Critical patent/BE771537A/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
    • H01J29/56—Arrangements for controlling cross-section of ray or beam; Arrangements for correcting aberration of beam, e.g. due to lenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/063—Geometrical arrangement of electrodes for beam-forming
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/067—Replacing parts of guns; Mutual adjustment of electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/145—Combinations of electrostatic and magnetic lenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J41/00—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas; Discharge tubes for evacuation by diffusion of ions
    • H01J41/02—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas
    • H01J41/04—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas with ionisation by means of thermionic cathodes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
BE771537A 1970-08-21 1971-08-19 Appareil a faisceau electronique BE771537A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL7012387A NL7012387A (enrdf_load_stackoverflow) 1970-08-21 1970-08-21

Publications (1)

Publication Number Publication Date
BE771537A true BE771537A (fr) 1972-02-21

Family

ID=19810827

Family Applications (1)

Application Number Title Priority Date Filing Date
BE771537A BE771537A (fr) 1970-08-21 1971-08-19 Appareil a faisceau electronique

Country Status (8)

Country Link
US (1) US3731094A (enrdf_load_stackoverflow)
BE (1) BE771537A (enrdf_load_stackoverflow)
CA (1) CA937340A (enrdf_load_stackoverflow)
CH (1) CH536026A (enrdf_load_stackoverflow)
FR (1) FR2104603A5 (enrdf_load_stackoverflow)
GB (1) GB1367360A (enrdf_load_stackoverflow)
NL (1) NL7012387A (enrdf_load_stackoverflow)
SE (1) SE377001B (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3912930A (en) * 1973-09-26 1975-10-14 Physics Int Co Electron beam focusing system
EP0417354A1 (en) * 1989-09-15 1991-03-20 Koninklijke Philips Electronics N.V. Electron beam apparatus with charge-up compensation
ATA4694A (de) * 1994-01-13 1994-11-15 Ims Ionen Mikrofab Syst Projektionssystem fuer geladene teilchen

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2233264A (en) * 1938-12-27 1941-02-25 Rca Corp Electron lens
GB578273A (en) * 1943-03-03 1946-06-21 British Thomson Houston Co Ltd Improvements in electron optical systems
BE477488A (enrdf_load_stackoverflow) * 1945-08-28
US2890342A (en) * 1954-09-29 1959-06-09 Gen Electric System for charge neutralization
NL285301A (enrdf_load_stackoverflow) * 1961-11-15
US3209147A (en) * 1963-03-05 1965-09-28 Centre Nat Rech Scient Electron lens spherical aberration correcting device comprising a current carrying wire section on the lens axis

Also Published As

Publication number Publication date
SE377001B (enrdf_load_stackoverflow) 1975-06-16
DE2138892B2 (de) 1977-03-24
US3731094A (en) 1973-05-01
CH536026A (de) 1973-04-15
NL7012387A (enrdf_load_stackoverflow) 1972-02-23
FR2104603A5 (enrdf_load_stackoverflow) 1972-04-14
CA937340A (en) 1973-11-20
GB1367360A (en) 1974-09-18
DE2138892A1 (de) 1972-02-24

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