NL285301A - - Google Patents

Info

Publication number
NL285301A
NL285301A NL285301DA NL285301A NL 285301 A NL285301 A NL 285301A NL 285301D A NL285301D A NL 285301DA NL 285301 A NL285301 A NL 285301A
Authority
NL
Netherlands
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication of NL285301A publication Critical patent/NL285301A/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
    • H01J29/58—Arrangements for focusing or reflecting ray or beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/14—Lenses magnetic
    • H01J37/141—Electromagnetic lenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Electron Beam Exposure (AREA)
  • Electron Sources, Ion Sources (AREA)
NL285301D 1961-11-15 NL285301A (enrdf_load_stackoverflow)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US152531A US3100260A (en) 1961-11-15 1961-11-15 Electron lens for reduction of spherical aberration

Publications (1)

Publication Number Publication Date
NL285301A true NL285301A (enrdf_load_stackoverflow)

Family

ID=22543323

Family Applications (1)

Application Number Title Priority Date Filing Date
NL285301D NL285301A (enrdf_load_stackoverflow) 1961-11-15

Country Status (6)

Country Link
US (1) US3100260A (enrdf_load_stackoverflow)
CH (1) CH407356A (enrdf_load_stackoverflow)
DE (1) DE1236097B (enrdf_load_stackoverflow)
GB (1) GB995387A (enrdf_load_stackoverflow)
NL (1) NL285301A (enrdf_load_stackoverflow)
SE (1) SE300852B (enrdf_load_stackoverflow)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3452241A (en) * 1966-09-06 1969-06-24 Rca Corp Electron gun suitable for electron microscope
DE1905937B1 (de) * 1969-02-06 1971-01-14 Corpuscular Forschungs Stiftun Stigmator zur elektrischen Kompensation von Abbildungsfehlern bei elektronenoptischen Systemen mit Hohlstrahlen und Ringblendenden
DE1937482C3 (de) * 1969-07-23 1974-10-10 Max-Planck-Gesellschaft Zur Foerderung Der Wissenschaften E.V., 3400 Goettingen Mikrostrahlsonde
NL7012387A (enrdf_load_stackoverflow) * 1970-08-21 1972-02-23 Philips Nv
US3996468A (en) * 1972-01-28 1976-12-07 Nasa Electron microscope aperture system
GB1416043A (en) * 1972-01-28 1975-12-03 Nasa Electron microscope aperture system
US4002912A (en) * 1975-12-30 1977-01-11 The United States Of America As Represented By The United States Energy Research And Development Administration Electrostatic lens to focus an ion beam to uniform density
DE2752598C3 (de) * 1977-11-25 1981-10-15 Dr.-Ing. Rudolf Hell Gmbh, 2300 Kiel Verfahren zum Betrieb einer elektromagnetischen fokussierenden elektronen-optischen Linsenanordnung und Linsenanordnung hierfür
JPS5842935B2 (ja) * 1978-04-07 1983-09-22 日本電子株式会社 走査電子顕微鏡等の対物レンズ
AU534599B2 (en) * 1978-08-25 1984-02-09 Commonwealth Scientific And Industrial Research Organisation Cold cathode ion soirce
US4438336A (en) 1982-03-26 1984-03-20 Fraunhofer-Gesellschaft Zur Forderung Der Angewandten Forschung E.V. Corpuscular radiation device for producing an irradiation pattern on a workpiece
JPS6091544A (ja) * 1983-10-24 1985-05-22 Anelva Corp オ−ジエ分析装置
US4725736A (en) * 1986-08-11 1988-02-16 Electron Beam Memories Electrostatic electron gun with integrated electron beam deflection and/or stigmating system
US7947964B2 (en) * 2006-11-21 2011-05-24 Hitachi High-Technologies Corporation Charged particle beam orbit corrector and charged particle beam apparatus
JP5153348B2 (ja) * 2008-01-09 2013-02-27 株式会社日立ハイテクノロジーズ 荷電粒子ビーム軌道補正器及び荷電粒子ビーム装置
JP6747687B2 (ja) * 2014-08-25 2020-08-26 ナショナル ユニヴァーシティー オブ シンガポール 収差補正装置、これを有するデバイス、および荷電粒子の収差を補正するための方法
US10096448B2 (en) * 2015-04-27 2018-10-09 National University Corporation Nagoya University Spherical aberration corrector for electromagnetic lens for charged particle beam
JP7124216B2 (ja) * 2019-05-15 2022-08-23 株式会社日立ハイテク 荷電粒子線装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL192009A (enrdf_load_stackoverflow) * 1953-11-02
BE536427A (enrdf_load_stackoverflow) * 1954-03-11

Also Published As

Publication number Publication date
US3100260A (en) 1963-08-06
DE1236097B (de) 1967-03-09
SE300852B (enrdf_load_stackoverflow) 1968-05-13
GB995387A (en) 1965-06-16
CH407356A (de) 1966-02-15

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