BR7102601D0 - Aparelho de feixe eletronico - Google Patents

Aparelho de feixe eletronico

Info

Publication number
BR7102601D0
BR7102601D0 BR2601/71A BR260171A BR7102601D0 BR 7102601 D0 BR7102601 D0 BR 7102601D0 BR 2601/71 A BR2601/71 A BR 2601/71A BR 260171 A BR260171 A BR 260171A BR 7102601 D0 BR7102601 D0 BR 7102601D0
Authority
BR
Brazil
Prior art keywords
electronic beam
appliance
beam appliance
electronic
Prior art date
Application number
BR2601/71A
Other languages
English (en)
Inventor
J King
Original Assignee
Union Carbide Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Union Carbide Corp filed Critical Union Carbide Corp
Publication of BR7102601D0 publication Critical patent/BR7102601D0/pt

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
BR2601/71A 1970-05-01 1971-04-30 Aparelho de feixe eletronico BR7102601D0 (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US3357870A 1970-05-01 1970-05-01

Publications (1)

Publication Number Publication Date
BR7102601D0 true BR7102601D0 (pt) 1973-05-31

Family

ID=21871217

Family Applications (1)

Application Number Title Priority Date Filing Date
BR2601/71A BR7102601D0 (pt) 1970-05-01 1971-04-30 Aparelho de feixe eletronico

Country Status (5)

Country Link
US (1) US3610986A (pt)
JP (1) JPS5136519B1 (pt)
BR (1) BR7102601D0 (pt)
FR (1) FR2091054A5 (pt)
GB (1) GB1329228A (pt)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8617351B2 (en) 2002-07-09 2013-12-31 Applied Materials, Inc. Plasma reactor with minimal D.C. coils for cusp, solenoid and mirror fields for plasma uniformity and device damage reduction
US7196283B2 (en) 2000-03-17 2007-03-27 Applied Materials, Inc. Plasma reactor overhead source power electrode with low arcing tendency, cylindrical gas outlets and shaped surface
US6894245B2 (en) * 2000-03-17 2005-05-17 Applied Materials, Inc. Merie plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression
US7220937B2 (en) * 2000-03-17 2007-05-22 Applied Materials, Inc. Plasma reactor with overhead RF source power electrode with low loss, low arcing tendency and low contamination
US8048806B2 (en) 2000-03-17 2011-11-01 Applied Materials, Inc. Methods to avoid unstable plasma states during a process transition
US7141757B2 (en) * 2000-03-17 2006-11-28 Applied Materials, Inc. Plasma reactor with overhead RF source power electrode having a resonance that is virtually pressure independent
US6586886B1 (en) 2001-12-19 2003-07-01 Applied Materials, Inc. Gas distribution plate electrode for a plasma reactor
TWI283899B (en) 2002-07-09 2007-07-11 Applied Materials Inc Capacitively coupled plasma reactor with magnetic plasma control
US7470626B2 (en) 2003-05-16 2008-12-30 Applied Materials, Inc. Method of characterizing a chamber based upon concurrent behavior of selected plasma parameters as a function of source power, bias power and chamber pressure
US7910013B2 (en) 2003-05-16 2011-03-22 Applied Materials, Inc. Method of controlling a chamber based upon predetermined concurrent behavior of selected plasma parameters as a function of source power, bias power and chamber pressure
US7247218B2 (en) 2003-05-16 2007-07-24 Applied Materials, Inc. Plasma density, energy and etch rate measurements at bias power input and real time feedback control of plasma source and bias power
US7795153B2 (en) 2003-05-16 2010-09-14 Applied Materials, Inc. Method of controlling a chamber based upon predetermined concurrent behavior of selected plasma parameters as a function of selected chamber parameters
US7901952B2 (en) 2003-05-16 2011-03-08 Applied Materials, Inc. Plasma reactor control by translating desired values of M plasma parameters to values of N chamber parameters
US7452824B2 (en) 2003-05-16 2008-11-18 Applied Materials, Inc. Method of characterizing a chamber based upon concurrent behavior of selected plasma parameters as a function of plural chamber parameters
US7359177B2 (en) 2005-05-10 2008-04-15 Applied Materials, Inc. Dual bias frequency plasma reactor with feedback control of E.S.C. voltage using wafer voltage measurement at the bias supply output
US8719960B2 (en) * 2008-01-31 2014-05-06 The Board Of Trustees Of The University Of Illinois Temperature-dependent nanoscale contact potential measurement technique and device
US8387443B2 (en) * 2009-09-11 2013-03-05 The Board Of Trustees Of The University Of Illinois Microcantilever with reduced second harmonic while in contact with a surface and nano scale infrared spectrometer
WO2013016528A1 (en) * 2011-07-28 2013-01-31 The Board Of Trustees Of The University Of Illinois Electron emission device

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1064101A (en) * 1964-07-13 1967-04-05 Atomic Energy Authority Uk Improvements in or relating to ion sources
US3482096A (en) * 1965-08-02 1969-12-02 Field Emission Corp High energy field emission electron radiation pulse generator,x-ray apparatus and system employing same
US3517240A (en) * 1968-11-04 1970-06-23 Gen Electric Method and apparatus for forming a focused monoenergetic ion beam

Also Published As

Publication number Publication date
GB1329228A (en) 1973-09-05
DE2121407B2 (de) 1976-09-16
DE2121407A1 (de) 1971-11-11
US3610986A (en) 1971-10-05
JPS5136519B1 (pt) 1976-10-08
FR2091054A5 (pt) 1972-01-14

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