GB1329228A - Electron beam apparatus - Google Patents

Electron beam apparatus

Info

Publication number
GB1329228A
GB1329228A GB1236971A GB1236971A GB1329228A GB 1329228 A GB1329228 A GB 1329228A GB 1236971 A GB1236971 A GB 1236971A GB 1236971 A GB1236971 A GB 1236971A GB 1329228 A GB1329228 A GB 1329228A
Authority
GB
United Kingdom
Prior art keywords
cathode
main
auxiliary
anode
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1236971A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Union Carbide Corp
Original Assignee
Union Carbide Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Union Carbide Corp filed Critical Union Carbide Corp
Publication of GB1329228A publication Critical patent/GB1329228A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns

Abstract

1329228 Electron guns UNION CARBIDE CORP 30 April 1971 [1 May 1970] 12369/71 Heading H1D An electron gun for a welding apparatus comprises a thermionic cathode 15, Fig. 1, disposed opposite an apertured main anode 19 and heated by electrons from a glow discharge between an auxiliary cathode 1 and anode 7. The auxiliary cathode is preferably concave in order to focus the emitted electrons on to the main cathode, and the radius of the concavity is preferably twice the cathode radius. The auxiliary anode 7 surrounds the auxiliary cathode and may be connected to the main cathode by a lead 17. In Fig. 1, the auxiliary discharge is produced by a 10KV potential within an insulated enclosure 5 in a gas pressure of 10- 20 microns, and the main gun operates at 60KV in a gas pressure of 0À1 microns. Back-firing is prevented by (a) feeding the gas through a bubbler unit 25 and/or through an insulated tube connected to a gas bottle which is insulated from earth, (b) providing a flange 9 on the pilot anode 7 outside the insulator 2 to move the field stress outside the chamber C, (c) providing an insulating or conductive baffle (not shown) below the gas exhaust apertures 27, (d) providing a control ring 11 in contact with the Faraday dark space and preferably connected to the anode through a high resistance 12, the gas inlet and exhaust apertures passing through the ring. The power of the main beam may be controlled either by controlling the auxiliary discharge or, if the emitting cathode 15 is insulated from the main cathode electrode 16, by altering the bias between these two members. In a modification, Fig. 4 (not shown), the main cathode structure is secured to the bottom of a cup-shaped conductor which forms the wall of the auxiliary discharge chamber. In a further modification, Fig. 5 (not shown), an inner wire mesh or solid cup is attached to the control ring and spaced by a gap or by insulating material from the cup-shaped conductor. Opposite the main cathode the mesh cup has an opening in which a tube may be inserted. The diameter of the opening is such that the main beam can pass through it but fringing electrons are intercepted, and the effect is to stabilize the focus against the effects of changes in pressure.
GB1236971A 1970-05-01 1971-04-30 Electron beam apparatus Expired GB1329228A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US3357870A 1970-05-01 1970-05-01

Publications (1)

Publication Number Publication Date
GB1329228A true GB1329228A (en) 1973-09-05

Family

ID=21871217

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1236971A Expired GB1329228A (en) 1970-05-01 1971-04-30 Electron beam apparatus

Country Status (5)

Country Link
US (1) US3610986A (en)
JP (1) JPS5136519B1 (en)
BR (1) BR7102601D0 (en)
FR (1) FR2091054A5 (en)
GB (1) GB1329228A (en)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8048806B2 (en) 2000-03-17 2011-11-01 Applied Materials, Inc. Methods to avoid unstable plasma states during a process transition
US6894245B2 (en) * 2000-03-17 2005-05-17 Applied Materials, Inc. Merie plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression
US7220937B2 (en) * 2000-03-17 2007-05-22 Applied Materials, Inc. Plasma reactor with overhead RF source power electrode with low loss, low arcing tendency and low contamination
US7141757B2 (en) * 2000-03-17 2006-11-28 Applied Materials, Inc. Plasma reactor with overhead RF source power electrode having a resonance that is virtually pressure independent
US8617351B2 (en) 2002-07-09 2013-12-31 Applied Materials, Inc. Plasma reactor with minimal D.C. coils for cusp, solenoid and mirror fields for plasma uniformity and device damage reduction
US7196283B2 (en) 2000-03-17 2007-03-27 Applied Materials, Inc. Plasma reactor overhead source power electrode with low arcing tendency, cylindrical gas outlets and shaped surface
US6586886B1 (en) 2001-12-19 2003-07-01 Applied Materials, Inc. Gas distribution plate electrode for a plasma reactor
TWI283899B (en) 2002-07-09 2007-07-11 Applied Materials Inc Capacitively coupled plasma reactor with magnetic plasma control
US7901952B2 (en) 2003-05-16 2011-03-08 Applied Materials, Inc. Plasma reactor control by translating desired values of M plasma parameters to values of N chamber parameters
US7247218B2 (en) 2003-05-16 2007-07-24 Applied Materials, Inc. Plasma density, energy and etch rate measurements at bias power input and real time feedback control of plasma source and bias power
US7452824B2 (en) 2003-05-16 2008-11-18 Applied Materials, Inc. Method of characterizing a chamber based upon concurrent behavior of selected plasma parameters as a function of plural chamber parameters
US7470626B2 (en) 2003-05-16 2008-12-30 Applied Materials, Inc. Method of characterizing a chamber based upon concurrent behavior of selected plasma parameters as a function of source power, bias power and chamber pressure
US7795153B2 (en) 2003-05-16 2010-09-14 Applied Materials, Inc. Method of controlling a chamber based upon predetermined concurrent behavior of selected plasma parameters as a function of selected chamber parameters
US7910013B2 (en) 2003-05-16 2011-03-22 Applied Materials, Inc. Method of controlling a chamber based upon predetermined concurrent behavior of selected plasma parameters as a function of source power, bias power and chamber pressure
US7359177B2 (en) * 2005-05-10 2008-04-15 Applied Materials, Inc. Dual bias frequency plasma reactor with feedback control of E.S.C. voltage using wafer voltage measurement at the bias supply output
US8719960B2 (en) * 2008-01-31 2014-05-06 The Board Of Trustees Of The University Of Illinois Temperature-dependent nanoscale contact potential measurement technique and device
US8387443B2 (en) * 2009-09-11 2013-03-05 The Board Of Trustees Of The University Of Illinois Microcantilever with reduced second harmonic while in contact with a surface and nano scale infrared spectrometer
US9685295B2 (en) * 2011-07-28 2017-06-20 The Board Of Trustees Of The University Of Illinois Electron emission device

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1064101A (en) * 1964-07-13 1967-04-05 Atomic Energy Authority Uk Improvements in or relating to ion sources
US3482096A (en) * 1965-08-02 1969-12-02 Field Emission Corp High energy field emission electron radiation pulse generator,x-ray apparatus and system employing same
US3517240A (en) * 1968-11-04 1970-06-23 Gen Electric Method and apparatus for forming a focused monoenergetic ion beam

Also Published As

Publication number Publication date
FR2091054A5 (en) 1972-01-14
JPS5136519B1 (en) 1976-10-08
DE2121407A1 (en) 1971-11-11
DE2121407B2 (en) 1976-09-16
US3610986A (en) 1971-10-05
BR7102601D0 (en) 1973-05-31

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee